公开(公告)号：US10157766B2

公开(公告)日：2018-12-18

申请号：US15112429

申请日：2014-03-19

Applicant: Un-Byoung Kang ,  Joonsik Sohn ,  Jung-Seok Ahn ,  Chungsun Lee ,  Taeje Cho

Inventor： Un-Byoung Kang ,  Joonsik Sohn ,  Jung-Seok Ahn ,  Chungsun Lee ,  Taeje Cho

IPC: H01L21/683 ,  H01L21/48 ,  H01L21/56 ,  H01L21/768 ,  H01L21/78 ,  H01L23/544 ,  H01L25/065 ,  H01L25/00 ,  H01L23/00

Abstract: Provided are methods of fabricating a semiconductor device. According to the method, a first glue layer, a first release layer, a second glue layer, and a second release layer may be sequentially interposed between a carrier and a device wafer. All of the first glue layer, the first release layer, the second glue layer, and the second release layer may be formed of thermosetting resin.

公开(公告)号：US20170004990A1

公开(公告)日：2017-01-05

申请号：US15112429

申请日：2014-03-19

Applicant: Un-Byoung Kang ,  Joonsik Sohn ,  Jung-Seok Ahn ,  Chungsun Lee ,  Taeje Cho

Inventor： Un-Byoung Kang ,  Joonsik Sohn ,  Jung-Seok Ahn ,  Chungsun Lee ,  Taeje Cho

IPC: H01L21/683 ,  H01L23/00 ,  H01L25/00 ,  H01L21/78 ,  H01L23/544 ,  H01L25/065 ,  H01L21/48 ,  H01L21/56

CPC classification number: H01L21/6836 ,  H01L21/48 ,  H01L21/4853 ,  H01L21/56 ,  H01L21/561 ,  H01L21/563 ,  H01L21/565 ,  H01L21/568 ,  H01L21/6835 ,  H01L21/76898 ,  H01L21/78 ,  H01L23/544 ,  H01L24/02 ,  H01L24/03 ,  H01L24/06 ,  H01L24/13 ,  H01L24/16 ,  H01L24/17 ,  H01L24/29 ,  H01L24/32 ,  H01L24/92 ,  H01L24/94 ,  H01L24/97 ,  H01L25/0657 ,  H01L25/50 ,  H01L2221/68327 ,  H01L2221/6834 ,  H01L2221/68381 ,  H01L2223/5446 ,  H01L2224/0239 ,  H01L2224/03002 ,  H01L2224/06181 ,  H01L2224/13111 ,  H01L2224/13116 ,  H01L2224/13147 ,  H01L2224/16146 ,  H01L2224/16227 ,  H01L2224/17181 ,  H01L2224/2919 ,  H01L2224/32145 ,  H01L2224/73204 ,  H01L2224/73253 ,  H01L2224/73265 ,  H01L2224/92 ,  H01L2224/92125 ,  H01L2224/94 ,  H01L2224/97 ,  H01L2225/06513 ,  H01L2225/06544 ,  H01L2225/06582 ,  H01L2924/15311 ,  H01L2924/18161 ,  H01L2924/00014 ,  H01L2924/01029 ,  H01L2224/81 ,  H01L2224/83 ,  H01L2224/11 ,  H01L21/304 ,  H01L2221/68363 ,  H01L2224/81005 ,  H01L2224/83005 ,  H01L2224/03 ,  H01L2224/85

Abstract: Provided are methods of fabricating a semiconductor device. According to the method, a first glue layer, a first release layer, a second glue layer, and a second release layer may be sequentially interposed between a carrier and a device wafer. All of the first glue layer, the first release layer, the second glue layer, and the second release layer may be formed of thermosetting resin.

Abstract translation: 提供制造半导体器件的方法。 根据该方法，第一胶合层，第一剥离层，第二胶层和第二剥离层可以顺序插入载体和器件晶片之间。 所有第一胶合层，第一释放层，第二胶层和第二剥离层可以由热固性树脂形成。