公开(公告)号：US20080292882A1

公开(公告)日：2008-11-27

申请号：US12182361

申请日：2008-07-30

申请人： Noriyuki AGATA ,  Masaaki TAKATA ,  Tomonori OGAWA ,  Kei IWATA

发明人： Noriyuki AGATA ,  Masaaki TAKATA ,  Tomonori OGAWA ,  Kei IWATA

IPC分类号： C03C12/00 ,  C03B37/005

CPC分类号： C03B19/1453 ,  C03B2201/02 ,  C03B2201/04 ,  C03C3/06 ,  C03C4/0071 ,  C03C4/0085 ,  C03C2201/23 ,  C03C2203/44 ,  Y02P40/57 ,  Y10T428/2982

摘要： The present invention provides a synthetic quartz glass having a diameter of 100 mm or more for using in an optical apparatus comprising a light source emitting a light having a wavelength of 250 nm or less, the synthetic quartz glass having, in a region located inward from the periphery thereof by 10 mm or more in a plane perpendicular to the optical axis of the synthetic quartz glass: a birefringence of 0.5 nm or less per thickness of 1 cm with respect to a light having a wavelength of 193 nm; an OH group concentration of 60 ppm or less; an averaged differential OH group concentration from the center of the synthetic quartz glass toward a peripheral direction thereof, normalized with respect to the radius of the synthetic quartz glass, of −8 to +60 ppm; and an unbiased standard deviation a of a differential OH group concentration from the center of the synthetic quartz glass toward a peripheral direction thereof, normalized with respect to the radius of the synthetic quartz glass, of 10 ppm or less, the unbiased standard deviation a being determined with the following formula (1): σ = ∑ i = 1 n  ( X i - X _ ) 2 n - 1   providing  ;   X i = Δ   n _ OH   i Δ   r i * = n _ OH   i - n _ OH   i + 1  r i * -  r i + 1 * ( 1 ) : differential OH group concentration at measurement point i normalized with respect to the radius R of the synthetic quartz glass; n _ OH   i = n OH   i - 1 + n OH   i + n OH   i + 1 3 : OH group concentration at measurement point i in terms of moving average for three points including the two points before and after the measurement point i;  r i * = r i R : radius at measurement point i normarized with respect to the radius R of the synthetic quartz glass; X : average of OH group concentrations Xi in the whole evaluation region; and n : number of measurement points in the evaluation region (integer of 2 or more).

公开(公告)号：US20080292881A1

公开(公告)日：2008-11-27

申请号：US12182327

申请日：2008-07-30

申请人： Masaaki TAKATA ,  Noriyuki AGATA ,  Tomonori OGAWA ,  Kei IWATA

发明人： Masaaki TAKATA ,  Noriyuki AGATA ,  Tomonori OGAWA ,  Kei IWATA

IPC分类号： C03C3/06 ,  C03B37/00

CPC分类号： C03C3/06 ,  C03B19/1453 ,  C03B2201/075 ,  C03B2201/23 ,  C03C2201/23 ,  Y02P40/57 ,  Y10T428/2982

摘要： The present invention provides a synthetic quartz glass having a diameter of 100 mm or more for using in an optical apparatus comprising a light source emitting a light having a wavelength of 250 nm or less, the synthetic quartz glass having, in a region located inward from the periphery thereof by 10 mm or more in a plane perpendicular to the optical axis of the synthetic quartz glass: a birefringence of 0.5 nm or less per thickness of 1 cm with respect to a light having a wavelength of 193 nm; an OH group concentration of 60 ppm or less; an averaged differential OH group concentration from the center of the synthetic quartz glass toward a peripheral direction thereof, normalized with respect to the radius of the synthetic quartz glass, of not less than −60 ppm and less than −8 ppm; and an unbiased standard deviation σ of a differential OH group concentration from the center of the synthetic quartz glass toward a peripheral direction thereof, normalized with respect to the radius of the synthetic quartz glass, of 10 ppm or less, the unbiased standard deviation σ being determined with the following formula (1): σ = ∑ i = 1 n  ( X i - X _ ) 2 n - 1   providing ;   X i = Δ   n _ OHi Δ   r i * = n _ OHi - n _ OHi + 1 r i * - r i + 1 * : ( 1 ) differential OH group concentration at measurement point i normalized with respect to the radius R of the synthetic quartz glass; n _ OHi = n OHi - 1 + n OHi + n OHi + 1 3 : OH group concentration at measurement point i in terms of moving average for three points including the two points before and after the measurement point i; r i * = r i R : radius at measurement point i normarized with respect to the radius R of the synthetic quartz glass; X: average of OH group concentrations Xi in the whole evaluation region; and n: number of measurement points in the evaluation region (integer of 2 or more).

公开(公告)号：US20090104103A1

公开(公告)日：2009-04-23

申请号：US12336017

申请日：2008-12-16

申请人： Noriyuki AGATA ,  Shinya KIKUGAWA ,  Yutaka SHIMIZU ,  Kazumi YOSHIDA ,  Masatoshi NISHIMOTO

发明人： Noriyuki AGATA ,  Shinya KIKUGAWA ,  Yutaka SHIMIZU ,  Kazumi YOSHIDA ,  Masatoshi NISHIMOTO

IPC分类号： C01B33/12

CPC分类号： C03C3/06 ,  C03C2201/02 ,  C03C2201/32 ,  C03C2201/50 ,  C30B7/10 ,  C30B29/18 ,  Y10T117/1008

摘要： An object of the present invention is to provide an artificial quartz member inhibited from suffering the decrease in transmittance in a laser light wavelength region which is caused by long-term irradiation with a laser light having a wavelength of 200 nm or shorter; and a process for producing the artificial quartz member. The invention provides an artificial quartz member for use as an optical element to be irradiated with a laser light having a wavelength of 200 nm or shorter, having an aluminum content of 200 ppb or lower.

摘要翻译： 本发明的目的在于提供一种人造石英部件，该人造石英部件由于长时间照射波长为200nm以下的激光而导致的激光波长区域的透射率降低; 以及人造石英部件的制造方法。 本发明提供一种人造石英部件，其用作要用200ppm或更低的铝含量的波长为200nm或更短的激光照射的光学元件。