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1.发明申请Dense fluid compositions and processes using same for article treatment and residue removal 审中-公开密集流体组合物和使用它们的方法用于制品处理和残留物去除公开(公告)号：US20060081273A1
公开(公告)日：2006-04-20
申请号：US10969595
申请日：2004-10-20
Applicant: Wayne McDermott , Hoshang Subawalla , Madhukar Rao , Dean Roth , Keith Fabregas
Inventor： Wayne McDermott , Hoshang Subawalla , Madhukar Rao , Dean Roth , Keith Fabregas
IPC: B08B3/00
CPC classification number: B08B7/0021 , G03F7/422 , H01L21/02057 , H01L21/02063 , H01L21/02101 , H05K3/26
Abstract: A method for removing contaminants from an article is described herein. In one embodiment, there is provided a method comprising loosening at least a portion of the contaminants by treating the article with a treatment method involving a processing fluid and/or dense processing fluid to provide a partially treated article comprising loosened contaminants; contacting the partially treated article with a dense rinse fluid comprising a dense fluid, optionally a co-solvent, and optionally an entrainer to remove liquid-based contaminants; and removing at least a portion of the loosened contaminants by exposing the partially treated article with at least one exposure method to provide a treated article wherein the selection of the at least one exposure method depends upon whether the loosened contaminants are wet or dry.
Abstract translation: 本文描述了从制品中除去污染物的方法。 在一个实施方案中，提供了一种方法，包括通过用涉及加工流体和/或致密加工流体的处理方法处理制品来松散至少一部分污染物，以提供包含松散的污染物的部分处理的制品; 使部分处理的制品与致密的流体，任选的助溶剂和任选的夹带剂一起使用，以除去液体基的污染物; 以及通过用至少一种曝光方法暴露所述部分处理的制品来除去所述松散的污染物的至少一部分，以提供经处理的制品，其中所述至少一种曝光方法的选择取决于松散的污染物是湿的还是干的。
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2.发明申请Processing of substrates with dense fluids comprising acetylenic diols and/or alcohols 失效加工包含炔属二醇和/或醇的致密流体的基材公开(公告)号：US20050029490A1
公开(公告)日：2005-02-10
申请号：US10737203
申请日：2003-12-16
Applicant: Hoshang Subawalla , Gene Parris , Christopher Mammarella , Bridget O'Brien , Keith Fabregas , Madhukar Rao , Christine Kretz
Inventor： Hoshang Subawalla , Gene Parris , Christopher Mammarella , Bridget O'Brien , Keith Fabregas , Madhukar Rao , Christine Kretz
CPC classification number: C11D3/2031 , C11D1/72 , C11D3/164 , C11D3/2027
Abstract: A dense cleaning fluid for removing contaminants from a substrate and a method comprising same is disclosed herein. In one embodiment of the present invention, the dense cleaning fluid comprises a dense fluid and at least one acetylenic diol or acetylenic alcohol surfactant.
Abstract translation: 用于从基底去除污染物的致密清洁流体及其包含方法在此公开。 在本发明的一个实施方案中，致密清洁流体包含致密流体和至少一种炔属二醇或炔属醇表面活性剂。
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3.发明申请Processing of semiconductor substrates with dense fluids comprising acetylenic diols and/or alcohols 审中-公开包含炔属二醇和/或醇的致密流体的半导体衬底的加工公开(公告)号：US20050029492A1
公开(公告)日：2005-02-10
申请号：US10635046
申请日：2003-08-05
Applicant: Hoshang Subawalla , Gene Parris , Christopher Mammarella , Bridget O'Brien , Keith Fabregas , Madhukar Rao , Christine Kretz
Inventor： Hoshang Subawalla , Gene Parris , Christopher Mammarella , Bridget O'Brien , Keith Fabregas , Madhukar Rao , Christine Kretz
CPC classification number: C11D3/2031 , C11D1/72 , C11D3/164 , C11D3/2027
Abstract: A dense cleaning fluid for removing contaminants from an substrate and a method comprising same is disclosed herein. In one embodiment of the present invention, the dense cleaning fluid comprises a dense fluid and at least one acetylenic diol or acetylenic alcohol surfactant.
Abstract translation: 本文公开了用于从基底去除污染物的致密清洁流体和包含其的方法。 在本发明的一个实施方案中，致密清洁流体包含致密流体和至少一种炔属二醇或炔属醇表面活性剂。
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