公开(公告)号：US08018574B2

公开(公告)日：2011-09-13

申请号：US11170788

申请日：2005-06-30

申请人： Robert Rafilevitch Gayazov ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Evgenii Dmitreevitch Korob ,  Konstantin Nikolaevitch Koshelev ,  Givi Georgievitch Zukavishvili ,  Yurii Victorovitch Sidelnikov

发明人： Robert Rafilevitch Gayazov ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Evgenii Dmitreevitch Korob ,  Konstantin Nikolaevitch Koshelev ,  Givi Georgievitch Zukavishvili ,  Yurii Victorovitch Sidelnikov

IPC分类号： G03B27/42

CPC分类号： G03F7/70916

摘要： A foil trap is located in a path of a radiation beam. The foil trap includes an array of conductive strips. A voltage application circuit is coupled to the strips to apply voltage differences between pairs of adjacent ones of the strips. The voltage application circuit includes a current limiting circuit arranged to limit currents to the strips to values below a threshold value above which self-sustained arc discharge may arise in the foil trap.

摘要翻译： 箔陷阱位于辐射束的路径中。 箔阱包括导电条的阵列。 电压施加电路耦合到条带以在相邻条带之间施加电压差。 电压施加电路包括限流电路，其被布置为将电流限制到条带以下的值到低于阈值的值，在该阈值以上可能在箔阱中产生自持电弧放电。

公开(公告)号：USRE41362E1

公开(公告)日：2010-06-01

申请号：US11600340

申请日：2006-11-16

申请人： Konstantin Nikolaevitch Koshelev ,  Frederik Bijkerk ,  Givi Georgievitch Zukavishvili ,  Evgenii Dmitreevitch Korop ,  Vladimir Vital'evitch Ivanov

发明人： Konstantin Nikolaevitch Koshelev ,  Frederik Bijkerk ,  Givi Georgievitch Zukavishvili ,  Evgenii Dmitreevitch Korop ,  Vladimir Vital'evitch Ivanov

IPC分类号： A61N5/00 ,  G21G5/00

CPC分类号： H05G2/003 ,  B82Y10/00 ,  G03F7/70033 ,  H05G2/005

摘要： A radiation source includes an anode and a cathode for creating a discharge in a vapor in a space between anode and cathode and to form a plasma of a working vapor so as to generate electromagnetic radiation. The cathode defines a hollow cavity in communication with the discharge region through an aperture that has a substantially annular configuration around a central axis of said radiation source so as to initiate said discharge. A driver vapor is supplied to the cathode cavity and the working vapor is supplied in a region around the central axis in between anode and cathode.

摘要翻译： 辐射源包括阳极和阴极，用于在阳极和阴极之间的空间中的蒸气中产生放电，并形成工作蒸气的等离子体，以产生电磁辐射。 阴极限定了通过孔径与放电区域连通的中空腔体，该孔口具有围绕所述辐射源的中心轴线的基本上环形的形状，以便启动所述放电。 驱动器蒸气被供应到阴极腔，并且工作蒸气在阳极和阴极之间的中心轴线周围的区域中供应。

公开(公告)号：US07061574B2

公开(公告)日：2006-06-13

申请号：US10985037

申请日：2004-11-10

申请人： Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Vladimir Mihailovitch Krivtsun

发明人： Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Vladimir Mihailovitch Krivtsun

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70908 ,  G03F7/70916

摘要： A lithographic projection apparatus is provided. The apparatus includes a radiation system for providing a beam of radiation, and a support for supporting a patterning device. The patterning device serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam of radiation onto a target portion of the substrate, and a particle supply unit for supplying getter particles into the beam of radiation in order to act as a getter for contamination particles in the beam of radiation. The getter particles have a diameter of at least about 1 nm.

摘要翻译： 提供光刻投影装置。 该装置包括用于提供辐射束的辐射系统和用于支撑图案形成装置的支撑件。 图案形成装置用于根据期望的图案对辐射束进行图案化。 该装置还包括用于保持基板的基板台，用于将图案化的辐射束投射到基板的目标部分上的投影系统，以及用于将吸气剂颗粒供应到辐射束中的颗粒供应单元，以用作 吸收剂用于辐射束中的污染颗粒。 吸气剂颗粒具有至少约1nm的直径。

公开(公告)号：US08362444B2

公开(公告)日：2013-01-29

申请号：US12907135

申请日：2010-10-19

申请人： Vladimir Vitalevitch Ivanov ,  Vadim Yevgenyevich Banine ,  Konstantin Nikolaevitch Koshelev

发明人： Vladimir Vitalevitch Ivanov ,  Vadim Yevgenyevich Banine ,  Konstantin Nikolaevitch Koshelev

IPC分类号： G21K5/00

CPC分类号： H05G2/003 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/005

摘要： A patterned beam of radiation is projected onto a substrate. A reflective optical element is used to help form the radiation beam from radiation emitted from a plasma region of a plasma source. In the plasma source, a plasma current is generated in the plasma region. To reduce damage to the reflective optical element, a magnetic field is applied in the plasma region with at least a component directed along a direction of the plasma current. This axial magnetic field helps limit the collapse of the Z-pinch region of the plasma. By limiting the collapse, the number of fast ions emitted may be reduced.

摘要翻译： 将图案化的辐射束投影到基底上。 反射光学元件用于帮助从等离子体源的等离子体区域发射的辐射形成辐射束。 在等离子体源中，在等离子体区域中产生等离子体电流。 为了减少对反射光学元件的损伤，在等离子体区域中施加至少一个沿着等离子体电流的方向指向的分量的磁场。 该轴向磁场有助于限制等离子体的Z夹点区域的塌陷。 通过限制塌陷，可以减少发射的快速离子的数量。

公开(公告)号：US20110043777A1

公开(公告)日：2011-02-24

申请号：US12933668

申请日：2009-03-20

申请人： Vladimir Mihailovitc Krivtsun ,  Vadim Yevgenyevich Banine ,  Arno Jan Bleeker ,  Vladimir Vitalevitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Johannes Hubertus Josephina Moors ,  Sergey Churilov ,  Denis Glushkov

发明人： Vladimir Mihailovitc Krivtsun ,  Vadim Yevgenyevich Banine ,  Arno Jan Bleeker ,  Vladimir Vitalevitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Johannes Hubertus Josephina Moors ,  Sergey Churilov ,  Denis Glushkov

IPC分类号： G03B27/54 ,  G03F7/20 ,  C22C28/00

CPC分类号： H05G2/003 ,  H05G2/005 ,  H05G2/008

摘要： A target material is configured to be used in a source constructed and arranged to generate a radiation beam having a wavelength in an extreme ultraviolet range. The target material includes a Gd-based composition configured to modify a melting temperature of Gd.

摘要翻译： 目标材料被配置为用于构造和布置成产生具有极紫外范围波长的辐射束的源。 目标材料包括配置成改变Gd的熔融温度的Gd基组合物。

公开(公告)号：US07528395B2

公开(公告)日：2009-05-05

申请号：US10664065

申请日：2003-09-17

申请人： Konstantin Nikolaevitch Koshelev ,  Vadim Yevgenyevich Banine ,  Vladimir Vital'Evitch Ivanov ,  Erik René Kieft ,  Erik Roelof Loopstra ,  Lucas Henricus Johannes Stevens ,  Yurii Victorovitch Sidelkov ,  Vsevolod Grigorevitch Koloshnikov ,  Vladimir Mihailovitch Krivtsun ,  Robert Rafilevitch Gayazov ,  Olav Waldemar Vladimir Frijns

发明人： Konstantin Nikolaevitch Koshelev ,  Vadim Yevgenyevich Banine ,  Vladimir Vital'Evitch Ivanov ,  Erik René Kieft ,  Erik Roelof Loopstra ,  Lucas Henricus Johannes Stevens ,  Yurii Victorovitch Sidelkov ,  Vsevolod Grigorevitch Koloshnikov ,  Vladimir Mihailovitch Krivtsun ,  Robert Rafilevitch Gayazov ,  Olav Waldemar Vladimir Frijns

IPC分类号： G03B27/42 ,  G21K5/10 ,  H01J37/08

CPC分类号： H05G2/003 ,  B82Y10/00 ,  F28D15/0266 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70916 ,  H05G2/005

摘要： A radiation source comprises an anode and a cathode that are configured and arranged to create a discharge in a gas or vapor in a space between anode and cathode and to form a plasma pinch so as to generate electromagnetic radiation. The gas or vapor may comprise xenon, indium, lithium and/or tin. The radiation source may comprise a plurality of discharge elements, each of which is only used for short intervals, after which another discharge element is selected. The radiation source may also comprise a triggering device, which device can facilitate improving the exact timing of the pinch formation and thus the pulse of EUV radiation. The radiation source may also be constructed to have a low inductance, and operated in a self-triggering regime.

摘要翻译： 辐射源包括阳极和阴极，其被构造和布置成在阳极和阴极之间的空间中的气体或蒸气中产生放电并且形成等离子体夹点以产生电磁辐射。 气体或蒸汽可以包括氙，铟，锂和/或锡。 辐射源可以包括多个放电元件，每个放电元件仅用于短间隔，之后选择另一个放电元件。 辐射源还可以包括触发装置，该装置可以有助于改善夹紧形成的精确定时并因此改善EUV辐射的脉冲。 辐射源也可以被构造为具有低电感，并以自触发方式操作。

公开(公告)号：US20080137050A1

公开(公告)日：2008-06-12

申请号：US11634386

申请日：2006-12-06

申请人： Vladimir Vitalevitch Ivanov ,  Vadim Yevgenyevich Banine ,  Konstantin Nikolaevitch Koshelev ,  Vladimir Mihailovitch Krivtsun

发明人： Vladimir Vitalevitch Ivanov ,  Vadim Yevgenyevich Banine ,  Konstantin Nikolaevitch Koshelev ,  Vladimir Mihailovitch Krivtsun

IPC分类号： G03B27/42 ,  G21K5/00

CPC分类号： H05G2/003 ,  H05G2/005

摘要： A radiation source is disclosed that includes an anode and a cathode that are configured and arranged to create a discharge in a substance in a discharge space between the anode and the cathode and to form a plasma so as to generate electromagnetic radiation, the anode and the cathode being rotatably mounted around an axis of rotation, the cathode being arranged to hold a liquid metal. The radiation source further includes an activation source arranged to direct an energy beam onto the liquid metal so as to vaporize part of the liquid metal and a liquid metal provider arranged to supply additional liquid metal so as to compensate for the vaporized part of the liquid metal.

摘要翻译： 公开了一种辐射源，其包括阳极和阴极，其构造和布置成在阳极和阴极之间的放电空间中的物质中产生放电并形成等离子体以产生电磁辐射，阳极和 阴极围绕旋转轴线可旋转地安装，阴极被布置成保持液态金属。 辐射源还包括激活源，其被布置成将能量束引导到液态金属上，以便使部分液态金属蒸发，并且液态金属提供器被布置成提供附加的液态金属，以便补偿液态金属的汽化部分 。

公开(公告)号：US07135692B2

公开(公告)日：2006-11-14

申请号：US10727035

申请日：2003-12-04

申请人： Vladimir Vitalevitch Ivanov ,  Vadim Yevgenyevich Banine ,  Konstantin Nikolaevitch Koshelev

发明人： Vladimir Vitalevitch Ivanov ,  Vadim Yevgenyevich Banine ,  Konstantin Nikolaevitch Koshelev

IPC分类号： A61N5/00

CPC分类号： G03F7/70858 ,  G03F7/70916

摘要： A lithographic apparatus is disclosed. The lithographic apparatus includes an illumination system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The illumination system includes a radiation-production system that produces extreme ultra-violet radiation, and a radiation-collection system that collects extreme ultra-violet radiation. Particles that are produced as a by-product of extreme ultra-violet radiation production move substantially in a particle-movement direction. The radiation-collection system is arranged to collect extreme ultra-violet radiation which radiates in a collection-direction, which is substantially different from the particle-movement direction.

摘要翻译： 公开了一种光刻设备。 光刻设备包括提供辐射束的照明系统和支撑图形结构的支撑结构。 图案形成结构被配置为在其横截面中赋予辐射束图案。 该装置还包括支撑基板的基板支撑件和将图案化的光束投影到基板的目标部分上的投影系统。 照明系统包括产生极紫外辐射的辐射生产系统和收集极紫外辐射的辐射收集系统。 作为极紫外线辐射产物的副产物产生的颗粒基本上沿颗粒移动方向移动。 辐射采集系统被布置成收集与收集方向辐射的极微紫外辐射，其与颗粒运动方向基本上不同。

公开(公告)号：US06818912B2

公开(公告)日：2004-11-16

申请号：US10700445

申请日：2003-11-05

申请人： Konstantin Nikolaevitch Koshelev ,  Frederik Bijkerk ,  Givi Georgievitch Zukavishvili ,  Evgenii Dmitreevitch Korop ,  Vladimir Vital'evitch Ivanov

发明人： Konstantin Nikolaevitch Koshelev ,  Frederik Bijkerk ,  Givi Georgievitch Zukavishvili ,  Evgenii Dmitreevitch Korop ,  Vladimir Vital'evitch Ivanov

IPC分类号： G03B4200

CPC分类号： H05G2/003 ,  B82Y10/00 ,  G03F7/70033 ,  H05G2/005

摘要： A radiation source includes an anode and a cathode for creating a discharge in a vapor in a space between anode and cathode and to form a plasma of a working vapor so as to generate electromagnetic radiation. The cathode defines a hollow cavity in communication with the discharge region through an aperture that has a substantially annular configuration around a central axis of said radiation source so as to initiate said discharge. A driver vapor is supplied to the cathode cavity and the working vapor is supplied in a region around the central axis in between anode and cathode.

公开(公告)号：US06667484B2

公开(公告)日：2003-12-23

申请号：US09893347

申请日：2001-06-28

申请人： Konstantin Nikolaevitch Koshelev ,  Frederik Bijkerk ,  Givi Georgievitch Zukavishvili ,  Evgenii Dmitreevitch Korop ,  Vladimir Vital'evitch Ivanov

发明人： Konstantin Nikolaevitch Koshelev ,  Frederik Bijkerk ,  Givi Georgievitch Zukavishvili ,  Evgenii Dmitreevitch Korop ,  Vladimir Vital'evitch Ivanov

IPC分类号： G03B4116

CPC分类号： H05G2/003 ,  B82Y10/00 ,  G03F7/70033 ,  H05G2/005

摘要： A radiation source includes an anode and a cathode for creating a discharge in a vapor in a space between anode and cathode and to form a plasma of a working vapor so as to generate electromagnetic radiation. The cathode defines a hollow cavity in communication with the discharge region through an aperture that has a substantially annular configuration around a central axis of said radiation source so as to initiate said discharge. A driver vapor is supplied to the cathode cavity and the working vapor is supplied in a region around the central axis in between anode and cathode.

摘要翻译： 辐射源包括阳极和阴极，用于在阳极和阴极之间的空间中的蒸气中产生放电，并形成工作蒸气的等离子体，以产生电磁辐射。 阴极限定了通过孔径与放电区域连通的中空腔体，该孔口具有围绕所述辐射源的中心轴线的基本上环形的形状，以便启动所述放电。 驱动器蒸气被供应到阴极腔，并且工作蒸气在阳极和阴极之间的中心轴线周围的区域中供应。