摘要:
A projection exposure apparatus has a light source for emitting illumination light, an illumination optical system for illuminating a mask, on which a predetermined pattern is formed, with the illumination light, and a projection optical system for forming an image of the pattern on a photosensitive substrate, and images the image of the pattern on the photosensitive substrate in a predetermined imaging state. The apparatus also includes a temperature measurement sensor for measuring a change in temperature of the mask, a control system for calculating the change amount of the imaging state caused by the change in temperature, and a correction system for correcting the change in imaging state.
摘要:
A focusing operation is performed so that the center of an exposure region on a photosensitive substrate coincides with a focal point of a projection optical system, based on setting information of a variable field stop, which sets the exposure region. Even in a case where only a portion of an exposable region of the projection optical system PL is set as the exposure region using the variable field stop, and only the set portion is subjected to exposure, exposure is performed while the set exposure region is brought into accurate focus, thereby improving resolution. Accordingly, an appropriate focusing operation can be always performed so as to achieve high accuracy exposure, irrespective of variations in the shape of the exposure region.
摘要:
Disclosed is an exposure apparatus comprising a substrate holder washing unit and a substrate holder storing unit. While a substrate holder exported from an exposure stage is washed in the washing unit, a clean holder previously stored in the storing unit is transported to an X stage by using a robot hand and a transport arm, and it is installed to the X stage by using an attaching/detaching mechanism. The holder can be always maintained in a clean state without stopping the apparatus for a long period of time, resulting in improvement in throughput. Also disclosed is an exposure apparatus comprising a mechanism for cleaning a substrate holder by transporting a whetstone onto the holder, engaging the whetstone with an engaging member, and rotating the whetstone by using a rotary driving unit. The exposure apparatus is provided with a unit for drawing dust emerged upon cleaning with the whetstone.
摘要:
A projection exposing apparatus for detecting a state of focus at two or more places in exposure region of a projection optical system by a focus state detection device. In accordance with the result of the detection of the focus state at the two or more places, the image forming characteristics of the projection optical system are measured by an image forming characteristics measuring device. A first pattern extending in the sagittal direction and a second pattern extending in the meridional direction are formed so that the focus state is measured by light beams transmitted these patterns and therefore the astigmatism, eccentricity or the spherical aberration is obtained so as to be corrected.
摘要:
A light source apparatus that includes a light emitting diode and a fluorescent material film. The fluorescent material film converts ultraviolet or blue light emitted from the light emitting diode into white light. The film is formed by coating, on at least one side of a glass substrate, a liquid mixture of fluorescent material, an organic binder, and a solvent, followed by drying and firing, and another thin film is further formed by coating, on the fluorescent material film, a coating material that contains a metallic alkoxide and/or metallic alkoxide oligomer, followed by drying and firing.
摘要:
A light source apparatus that comprises a blue light emitting diode and a fluorescent material film capable of converting the blue light emitted from the blue light emitting diode into white light, wherein the fluorescent material film is formed by coating, on a glass substrate, a dispersion prepared by dispersing a composition containing metallic oxide fine particles and a yellow fluorescent material capable of absorbing part of the blue light, thereby emitting yellow light, in a metallic alkoxide and/or metallic alkoxide oligomer, followed by firing.
摘要:
A virtual system control apparatus includes a configuration information storage device that stores configuration information for operational systems of virtual systems; a first virtual machine image storage device that stores virtual machine images for the operational systems of the virtual systems; a configuration change information storage device that stores configuration change information that represents configuration information concerning difference between the operational system and a test system of the virtual system; a second virtual machine image storage device that stores virtual machine images for the virtual machine relating to the difference; and a controller. Thus, by adopting data configuration of the operational system and the test system, it becomes possible to easily and smoothly switch the virtual system between the operational system and the test system.
摘要:
There is provided a medium storing a Web service control program, a Web service control apparatus, and a Web service control method, capable of controlling, based on a request reservation procedure, the amount of Web service requests to be received.A Web service control apparatus comprises: a CM 21 that sets the upper limit of a Web service processing amount for a plurality of servers 23 capable of executing a Web service, and accepts or rejects the Web service reservation based on the upper limit of a Web service request processing amount of the servers 23, state of the servers 23, and Web service reservation request; a grid management server 25 that sets any of the plurality of servers 23 as a node for executing the Web service based on the Web service reservation accepted by the CM 21; and a CK 22 that receives a Web service request and transfers the Web service request to the node, the Web service request complying with the Web service reservation accepted by the CM 21.
摘要:
A device control service providing system includes a service request receiving unit that receives, via a network, a device control service request for controlling a group of electronic devices, and a process execution requesting unit that requests respective device control servers to execute device control processes for controlling an operation of the electronic devices in the group based on the request received, where one of the device control servers executes the device control processes corresponding to one group of the electronic devices.
摘要:
An electronic image pickup apparatus comprises a photographic optical system; solid state image pickup devices disposed on a plant where a subject image formed by subject beams which have passed through the photographic optical system is formed; a main mirror disposed between the photographic optical system and the solid state image pickup devices, wherein a part of the main mirror is formed of a half mirror to divide the subject beams which have passed through the photographic optical system into an observing beam and a focus detecting beam; a sub-mirror for reflecting the subject beam which has passed through the part of the main mirror; a focus detecting optical system for forming an image of the subject beam reflected by the sub-mirror on a partial area of the solid image pickup devices; and an electrical circuit for outputting focus detecting information based on image signals of the partial areas of the solid image pickup devices. The structure provides an electronic image pickup apparatus which contributes to the down-sizing of the apparatus and to the reduction of production cost by eliminating an image pickup device which is dedicated for focus detection.