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    Pattern forming method
    2.
    发明授权
    Pattern forming method 失效
    图案形成方法

    公开(公告)号：US08411255B2

    公开(公告)日：2013-04-02

    申请号：US12769926

    申请日：2010-04-29

    申请人： Kyota Nozu ,  Ryoji Kondo

    发明人： Kyota Nozu ,  Ryoji Kondo

    IPC分类号： G03B27/32 ,  G03B27/54

    CPC分类号： G03B27/32

    摘要： A method of forming a pattern with dots or holes arranged in a two-dimensional period by illuminating, with illumination light, a mask having a light-shielding portion pattern on a translucent substrate, and performing projection and exposure of an object to be exposed through a projection optical system. The illumination light is an effective light source of multipole illumination. A first exposure process is performed with the mask placed at a first position relative to the object to be exposed, and a second exposure process is performed with the mask placed at a second position. The mask has line patterns having lines with a line width a [m] arranged in parallel at a pitch of P. The line patterns are arranged in a mesh such that the line patterns intersect one another at 60° in three directions, and the illumination light is an effective light source of hexapole illumination. The second exposure process is performed, after the first exposure process, with the mask placed at a second position displaced from the first position by 2P/3 [m] in a direction perpendicular to any line of the line patterns. A third exposure process is performed, after the second exposure process, with the mask placed at a third position further displaced from the second position by 2P/3 [m] in the direction, to thereby form a dot pattern in a two-dimensional period having a pitch of P/3 [m].

    摘要翻译： 通过照明光照射在半透明基板上具有遮光部分图案的掩模，并且通过在半透明基板上照射曝光对象的投影和曝光来形成具有以二维周期布置的点或孔的图案的方法 投影光学系统。 照明光是多极照明的有效光源。 在掩模放置在相对于要曝光的物体的第一位置处进行第一曝光处理，并且在将掩模放置在第二位置的情况下执行第二曝光处理。 掩模具有具有以P的间距平行布置的线宽a [m]的线的线图案。线图案布置成网格，使得线图案在三个方向上以60°彼此相交，并且照明 光是六极照明的有效光源。 在第一曝光处理之后，在垂直于线条图案的任何一行的方向上，将掩模放置在从第一位置移位2P / 3 [m]的第二位置处进行第二曝光处理。 在第二曝光处理之后，进行第三曝光处理，将掩模放置在沿第二位置进一步从第二位置移位2P / 3 [m]的第三位置，从而在二维周期中形成点图案 具有P / 3 [m]的间距。

    PATTERN FORMING METHOD
    3.
    发明申请
    PATTERN FORMING METHOD 失效
    图案形成方法

    公开(公告)号：US20100283987A1

    公开(公告)日：2010-11-11

    申请号：US12769926

    申请日：2010-04-29

    申请人： Kyota Nozu ,  Ryoji Kondo

    发明人： Kyota Nozu ,  Ryoji Kondo

    IPC分类号： G03B27/32

    CPC分类号： G03B27/32

    摘要： Using a mask in which line patterns are arranged in X and Y directions each at a pitch of P, first exposure is performed at a first position, and then the position of the mask is shifted in the X and Y directions by P/2 and second exposure is performed.

    摘要翻译： 使用在X和Y方向上以P的间距排列线图案的掩模，在第一位置进行第一曝光，然后掩模的位置在X和Y方向上移位P / 2， 进行第二曝光。