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1.发明授权Method of manufacturing a template matching template, as well as a device for manufacturing a template 有权制造模板匹配模板的方法以及用于制造模板的装置公开(公告)号：US08929665B2
公开(公告)日：2015-01-06
申请号：US13375131
申请日：2010-05-21
申请人： Yukari Yamada , Kyoungmo Yang , Junichi Kakuta
发明人： Yukari Yamada , Kyoungmo Yang , Junichi Kakuta
CPC分类号： G06T7/0044 , G06K9/6255 , G06T7/74 , G06T2207/10056 , G06T2207/20216 , G06T2207/30148
摘要： Provided is a method of manufacturing a template matching template, as well as a device for manufacturing a template, by both of which high matching accuracy can be stably ensured without being affected by factors such as process variations. As an embodiment of the above, a method of manufacturing a template matching template, as well as a relevant device, is proposed by both of which a template memorized in advance and an image acquired by a microscope are compared, thereby identifying a desired position, and by which a plurality of images at the identified location are acquired by template matching, and the aforementioned plurality of images are added and averaged, thereby manufacturing a new template.
摘要翻译： 提供了一种制造模板匹配模板的方法，以及用于制造模板的装置，通过两者都可以稳定地确保高匹配精度，而不受诸如工艺变化的因素的影响。 作为上述的实施例，提出了一种制造模板匹配模板的方法以及相关装置，其中比较预先存储的模板和通过显微镜获取的图像，从而识别期望的位置， 并通过模板匹配获取识别位置处的多个图像，并且对上述多个图像进行相加和平均，从而制造新的模板。
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公开(公告)号：US08180140B2
公开(公告)日：2012-05-15
申请号：US12399367
申请日：2009-03-06
IPC分类号： G06K9/00
CPC分类号： G01N21/95607 , G01N2021/95615
摘要： To create a template for use in image recognition based on design data, luminance information is set for each area in the template based on the information regarding the region defined by the template. The luminance information may be set based on material information, pattern size information of a pattern arranged in the region defined by the template, and layer information of the region defined by the template. Alternatively, luminance information may be set based on material information, setup conditions of the scanning electron microscope, and pattern outline information of a pattern arranged in the region defined by the template.
摘要翻译： 为了基于设计数据创建用于图像识别的模板，基于关于由模板定义的区域的信息，为模板中的每个区域设置亮度信息。 亮度信息可以基于材料信息，布局在由模板定义的区域中的图案的图案尺寸信息以及由模板定义的区域的层信息来设置。 或者，可以基于材料信息，扫描电子显微镜的设置条件和布置在由模板限定的区域中的图案的图案轮廓信息来设置亮度信息。
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3.发明授权公开(公告)号：US07834316B2
公开(公告)日：2010-11-16
申请号：US12043942
申请日：2008-03-06
IPC分类号： G06K9/48
CPC分类号： H01J37/28 , H01J37/265 , H01J2237/221 , H01J2237/2817 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： There is provided a method for setting a suitable imaging magnification for each of a plurality of measurement places in a charged particle beam apparatus which images a semiconductor pattern.For a given measuring point coordinate, a line segment or a vertex representing a change in concavity and convexity near the measuring point coordinate is searched, and an imaging magnification is set so that coordinates on a sample corresponding to both ends which gives a length that serves as a reference falls in a field of view of the charged particle beam apparatus by letting a minimum distance be the reference, of distances between line segments representing a change in concavity and convexity from the measuring point coordinate or a distance between neighboring vertexes.
摘要翻译： 提供了一种用于为对半导体图案进行成像的带电粒子束装置中的多个测量位置中的每一个设置合适的成像倍率的方法。 对于给定的测量点坐标，搜索表示测量点坐标附近的凹凸的变化的线段或顶点，并且设置成像倍率，使得对应于给出服务的长度的两端的样本上的坐标 作为参考，通过使最小距离作为参考，在距离表示距离测量点坐标的凹凸变化的线段之间的距离或相邻顶点之间的距离处落在带电粒子束装置的视野中。
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4.发明授权公开(公告)号：US08552371B2
公开(公告)日：2013-10-08
申请号：US12917703
申请日：2010-11-02
IPC分类号： G01N23/04
CPC分类号： H01J37/28 , H01J37/265 , H01J2237/221 , H01J2237/2817 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： There is provided a method for setting a suitable imaging magnification for each of a plurality of measurement places in a charged particle beam apparatus which images a semiconductor pattern.For a given measuring point coordinate, a line segment or a vertex representing a change in concavity and convexity near the measuring point coordinate is searched, and an imaging magnification is set so that coordinates on a sample corresponding to both ends which gives a length that serves as a reference falls in a field of view of the charged particle beam apparatus by letting a minimum distance be the reference, of distances between line segments representing a change in concavity and convexity from the measuring point coordinate or a distance between neighboring vertexes.
摘要翻译： 提供了一种用于为对半导体图案进行成像的带电粒子束装置中的多个测量位置中的每一个设置合适的成像倍率的方法。 对于给定的测量点坐标，搜索表示测量点坐标附近的凹凸的变化的线段或顶点，并且设置成像倍率，使得对应于给出服务的长度的两端的样本上的坐标 作为参考，通过使最小距离作为参考，在距离表示距离测量点坐标的凹凸变化的线段之间的距离或相邻顶点之间的距离处落在带电粒子束装置的视野中。
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公开(公告)号：US20110286685A1
公开(公告)日：2011-11-24
申请号：US13131750
申请日：2009-10-15
申请人： Makoto Nishihara , Kyoungmo Yang , Yoshihiro Oyabu
发明人： Makoto Nishihara , Kyoungmo Yang , Yoshihiro Oyabu
IPC分类号： G06K9/36
CPC分类号： G01B15/00 , H01J37/28 , H01J2237/221 , H01J2237/2817
摘要： Provided are an image formation method and a charged particle beam device which can accurately measure a plurality of objects to be measured and contained in an image by executing a small number of scans. For this, a scan line is set in a direction other than the edge direction of a plurality of objects to be measured and contained in the image view field and the charged particle beam is scanned according to the setting. Provided also are a method and a device for setting a scan line direction in an appropriate direction not affected by the pattern deformation or the like. For this, a direction of disconnection between two patterns to be connected is obtained according to the deformation of the two patterns and a scan line is set in the direction determined according to the one of more directions of disconnection.
摘要翻译： 提供了一种图像形成方法和带电粒子束装置，其可以通过执行少量扫描来精确地测量待测量的多个物体并包含在图像中。 为此，将扫描线设置在多个被测量物体的边缘方向以外的方向上，并将其包含在图像视野中，并根据该设定对带电粒子束进行扫描。 还提供了用于在不受图案变形等影响的适当方向上设置扫描线方向的方法和装置。 为此，根据两个图案的变形获得要连接的两个图案之间的断开方向，并且根据多个断开方向确定的方向设置扫描线。
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6.发明申请METHOD FOR ADJUSTING IMAGING MAGNIFICATION AND CHARGED PARTICLE BEAM APPARATUS 失效调整成像放大和充电颗粒光束装置的方法公开(公告)号：US20110042568A1
公开(公告)日：2011-02-24
申请号：US12917703
申请日：2010-11-02
IPC分类号： G01N23/00
CPC分类号： H01J37/28 , H01J37/265 , H01J2237/221 , H01J2237/2817 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： There is provided a method for setting a suitable imaging magnification for each of a plurality of measurement places in a charged particle beam apparatus which images a semiconductor pattern.For a given measuring point coordinate, a line segment or a vertex representing a change in concavity and convexity near the measuring point coordinate is searched, and an imaging magnification is set so that coordinates on a sample corresponding to both ends which gives a length that serves as a reference falls in a field of view of the charged particle beam apparatus by letting a minimum distance be the reference, of distances between line segments representing a change in concavity and convexity from the measuring point coordinate or a distance between neighboring vertexes.
摘要翻译： 提供了一种用于为对半导体图案进行成像的带电粒子束装置中的多个测量位置中的每一个设置合适的成像倍率的方法。 对于给定的测量点坐标，搜索表示测量点坐标附近的凹凸的变化的线段或顶点，并且设置成像倍率，使得对应于给出服务的长度的两端的样本上的坐标 作为参考，通过使最小距离作为参考，在距离表示距离测量点坐标的凹凸变化的线段之间的距离或相邻顶点之间的距离处落在带电粒子束装置的视野中。
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7.发明授权Method of OPC model building, information-processing apparatus, and method of determining process conditions of semiconductor device 有权OPC模型建立方法，信息处理设备及确定半导体器件工艺条件的方法公开(公告)号：US08788981B2
公开(公告)日：2014-07-22
申请号：US12062133
申请日：2008-04-03
IPC分类号： G06F17/50
CPC分类号： G03F7/70625 , G03F1/36 , G03F1/68
摘要： In a method and apparatus for quantitatively evaluating two-dimensional patterns, a reference coordinate system is set in order to convert pattern edge information (one-dimensional data) acquired by measurement using an existing critical dimension machine into coordinate data. Thus, a pattern is converted into coordinate information. Next, a function formula is determined from this coordinate information by approximate calculation and a pattern is represented by the mathematical expression y=f(x). Integrating y=f(x) in the reference coordinate used when calculating the coordinate data gives the area of the pattern, whereby it is possible to convert the coordinate data to two-dimensional data.
摘要翻译： 在用于定量评估二维图案的方法和装置中，设置参考坐标系以将通过使用现有关键维度机器的测量获得的图案边缘信息（一维数据）转换为坐标数据。 因此，将图案转换为坐标信息。 接下来，通过近似计算从该坐标信息确定函数式，并且通过数学表达式y = f（x）表示图案。 在计算坐标数据时使用的参考坐标中集合y = f（x）给出了图案的面积，由此可以将坐标数据转换为二维数据。
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公开(公告)号：US08774493B2
公开(公告)日：2014-07-08
申请号：US13575531
申请日：2011-01-28
申请人： Kyoungmo Yang , Yuichi Abe
发明人： Kyoungmo Yang , Yuichi Abe
IPC分类号： G06K9/00
CPC分类号： G06T11/00
摘要： The present invention is a device that creates a template based on design data without performing an exposure simulation, etc., and an object thereof is to provide a pattern matching image forming device capable of forming an image that is commensurate with the size of the actual pattern. As one mode for achieving the object above, there is proposed a pattern matching image forming device that, in forming a matching image, shrinks or enlarges design data based on a desired pattern size, and that forms a matching image based on a pattern thus shrunk or enlarged.
摘要翻译： 本发明是一种在不进行曝光模拟等的情况下基于设计数据创建模板的装置，其目的在于提供一种能够形成与实际尺寸相符的图像的图案匹配图像形成装置 模式。 作为实现上述目的的一种模式，提出了一种图案匹配图像形成装置，其在形成匹配图像时，根据期望的图案尺寸缩小或扩大设计数据，并且基于如此缩小的图案形成匹配图像 或放大。
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公开(公告)号：US20090304286A1
公开(公告)日：2009-12-10
申请号：US12399367
申请日：2009-03-06
IPC分类号： G06K9/62
CPC分类号： G01N21/95607 , G01N2021/95615
摘要： An object of the present invention is to maintain the ease with which a template is created based on design data without acquiring an actual image, which is achieved by providing the template with equivalent information contained by a template used for image recognition that involves same-type image comparison, and to improve image recognition performance by increasing the matching rate between a template and an actual image.To achieve the above object, the present invention provides a method, apparatus, and program for creating based on design data a template that is used for image recognition, wherein luminance information is set for each area in the template based on the material information of the region defined by the template. Specifically, the luminance information is set based on at least one of information from among the above material information, the pattern size information of a pattern arranged in the region defined by the template, the setup conditions of an imaging apparatus, the layer information of the region defined by the template, and the outline information of a pattern.
摘要翻译： 本发明的目的是基于设计数据来保持创建模板的容易性，而不获取实际图像，该实际图像通过向模板提供包含用于图像识别的模板所包含的相同信息而实现，该模板涉及相同类型 图像比较，并通过增加模板和实际图像之间的匹配率来提高图像识别性能。 为了实现上述目的，本发明提供了一种用于基于设计数据创建用于图像识别的模板的方法，装置和程序，其中基于模板的材料信息为模板中的每个区域设置亮度信息 区域由模板定义。 具体地说，根据上述材料信息中的至少一个信息，布置在由模板定义的区域中的图案的图案尺寸信息，成像装置的设置条件， 由模板定义的区域，以及模式的轮廓信息。
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10.发明申请Method of OPC Model Building, Information-Processing Apparatus, and Method of Determining Process Conditions of Semiconductor Device 有权OPC模型构建方法，信息处理设备及确定半导体器件工艺条件的方法公开(公告)号：US20080250380A1
公开(公告)日：2008-10-09
申请号：US12062133
申请日：2008-04-03
IPC分类号： G06F17/50
CPC分类号： G03F7/70625 , G03F1/36 , G03F1/68
摘要： A method capable of quantitatively evaluating two-dimensional patterns and a system to which the method is applied are provided. In the present invention, a reference coordinate system is set in order to convert pattern edge information (one-dimensional data) acquired by measurement using an existing critical dimension machine into coordinate data. Thus, a pattern is converted into coordinate information. Next, a function formula is determined from this coordinate information by approximate calculation and a pattern is represented by the mathematical expression y=f(x). Integrating y=f(x) in the reference coordinate used when calculating the coordinate data gives the area of the pattern, whereby it is possible to convert the coordinate data to two-dimensional data.
摘要翻译： 提供了能够定量评估二维图案的方法和应用该方法的系统。 在本发明中，设定基准坐标系，以便通过使用现有的关键尺寸的机器将测量获得的图案边缘信息（一维数据）转换为坐标数据。 因此，将图案转换为坐标信息。 接下来，通过近似计算从该坐标信息确定函数式，并且通过数学表达式y = f（x）表示图案。 在计算坐标数据时使用的参考坐标中集合y = f（x）给出了图案的面积，由此可以将坐标数据转换为二维数据。
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