IMAGE PROCESSING METHOD
    1.
    发明公开

    公开(公告)号:US20240320802A1

    公开(公告)日:2024-09-26

    申请号:US18187650

    申请日:2023-03-21

    摘要: The present application discloses an image processing method for deriving an edge-guided motion vector of a first pixel of a current frame. The image processing method includes: calculating similarity metrics of the first pixel according to a reference frame, wherein the similarity metrics are associated with candidate motion vectors of the first pixel, respectively; obtaining a reference motion vector of a reference pixel of the current frame; calculating penalties caused by the reference pixel according to an edge strength of the reference pixel and an edge strength of the first pixel, wherein the greater the edge strength of the reference pixel, the greater the penalties; and selecting the edge-guided motion vector from the candidate motion vectors according to the similarity metrics, the candidate motion vectors, and the penalties.

    DIRECTIONAL SCALING SYSTEMS AND METHODS
    5.
    发明公开

    公开(公告)号:US20240233094A1

    公开(公告)日:2024-07-11

    申请号:US18416654

    申请日:2024-01-18

    申请人: Apple Inc.

    发明人: Jim C. Chou Yun Gong

    IPC分类号: G06T5/70 G06T3/4007 G06T5/50

    摘要: An electronic device may include scaling circuitry to scale input pixel data to a greater resolution. The directional scaling circuitry may include first interpolation circuitry to receive best mode data, including one or more angles corresponding to content of the image and interpolate first pixel values at first pixel positions diagonally offset from input pixel positions of the input pixel data based on the best mode data and input pixel values corresponding to the input pixel positions. The directional scaling circuitry may also include second interpolation circuitry to receive the best mode data and the input pixel values and interpolate second pixel values at second pixel positions horizontally or vertically offset from the input pixel positions based at least in part on the best mode data and the input pixel values.

    Semiconductor Observation System and Overlay Measurement Method

    公开(公告)号:US20240112322A1

    公开(公告)日:2024-04-04

    申请号:US18237975

    申请日:2023-08-25

    摘要: An image to be measured of a sample that is captured by a microscope is acquired, a first degree that indicates a degree in which the second layer (upper layer) of the sample transmits the first layer (lower layer) is acquired, a first layer template image and a second layer template image indicating pattern shapes of the first layer and the second layer are acquired, pattern matching processing of the second layer is performed based on the second layer template image and the image to be measured to acquire a second position deviation amount related to the second layer and an area recognized as the second layer on the image to be measured, a consideration range of the image to be measured in pattern matching processing of the first layer is determined based on the first degree and the area recognized as the second layer, pattern matching processing of the first layer is performed based on the first layer consideration range, the first layer template image, and the image to be measured to acquire a first position deviation amount related to the first layer and an area recognized as the first layer on the image to be measured, and an overlay is measured based on the second position deviation amount and the first position deviation amount.