IMAGE PROCESSING APPARATUS, INSPECTION APPARATUS, IMAGE PROCESSING METHOD, AND INSPECTION METHOD

    公开(公告)号:US20250117895A1

    公开(公告)日:2025-04-10

    申请号:US18904333

    申请日:2024-10-02

    Abstract: An image processing apparatus according to this embodiment includes: a specifying unit configured to specify, when parameter values of illumination parameters at a plurality of points corresponding to pixels of a photographed image obtained by photographing an object at a predetermined sampling time are compared with each other, a plurality of peak points each of which is a peak with respect to surrounding parameter values; a generation unit configured to generate, based on respective peak values of the parameter values at the specified plurality of peak points, the parameter values at a plurality of points between the peak points, and thereby generate a distribution of the parameter values; and a correction unit configured to correct the photographed image obtained at the predetermined sampling time by correcting the parameter values of at least one pixel of the photographed image.

    INSPECTION APPARATUS AND INSPECTION METHOD

    公开(公告)号:US20250012726A1

    公开(公告)日:2025-01-09

    申请号:US18765608

    申请日:2024-07-08

    Abstract: An inspection apparatus according to an embodiment includes pulsed light generation means for generating pulsed light having a wavelength longer than a wavelength of light corresponding to a bandgap of a sample, the pulsed light subjecting the sample to multiphoton excitation, light focusing means including an objective lens, for focusing the pulsed light on the sample through the objective lens, and for passing, through the objective lens, light including photoluminescence light and Raman scattered light produced from the sample by irradiation with the pulsed light, first detection means for detecting the photoluminescence light passed through the objective lens, and second detection means for detecting the Raman scattered light passed through the objective lens.

    Mask inspection method and mask inspection apparatus

    公开(公告)号:US12050184B2

    公开(公告)日:2024-07-30

    申请号:US17643151

    申请日:2021-12-07

    CPC classification number: G01N21/956 G01N2021/95676

    Abstract: Resolution is improved in a required direction while maintaining contrast in inspection of an anamorphic mask. A method for inspecting a mask with a reduction rate at the time of exposure in a longitudinal direction different from a reduction rate at the time of exposure in a lateral direction according to the present disclosure includes capturing an image of the mask using a photodetector including a rectangular pixel, a ratio of a dimension of the rectangular pixel in the longitudinal direction to a dimension of the rectangular pixel in the lateral direction being equal to an inverse ratio of the reduction rate in the longitudinal direction to the reduction rate in the lateral direction.

    CALCULATION METHOD, IMAGING-CAPTURING METHOD, AND IMAGE-CAPTURING APPARATUS

    公开(公告)号:US20230375816A1

    公开(公告)日:2023-11-23

    申请号:US18319266

    申请日:2023-05-17

    CPC classification number: G02B21/0056 G01N21/9501 G02B21/0072 G01N21/8851

    Abstract: A calculation method, an image-capturing method, and an image-capturing apparatus are provided which can easily calculate a shear amount produced by an optical element arranged on an optical path of an interference optical system. A calculation method according to the present disclosure is a calculation method of calculating a shear amount produced by a predetermined optical element which is arranged on an optical path of an image-capturing optical system. The calculation method includes a step of capturing an interference contrast image of a quadric surface included in an object surface by the image-capturing optical system, a step of measuring a fringe interval of interference fringes included in the interference contrast image, and a step of calculating the shear amount based on a constant in a formula expressing the quadric surface and the fringe interval.

    Measurement apparatus and measurement method

    公开(公告)号:US11486693B2

    公开(公告)日:2022-11-01

    申请号:US16528509

    申请日:2019-07-31

    Abstract: A measurement apparatus and a measurement method capable of speedily and accurately measuring an edge shape are provided. A measurement apparatus according to an aspect of the present disclosure includes an objective lens positioned so that its focal plane cuts across an edge part of a substrate, a detector including a plurality of pixels and configured to detect a reflected light from the edge part of the substrate through a confocal optical system, an optical head in which the objective lens and the detector are disposed, a moving mechanism configured to change a relative position of the optical head with respect to the substrate so that an inclination of the focal plane with respect to the substrate is changed, and a processing unit configured to measure a shape of the edge part.

    Confocal microscope and method for taking image using the same

    公开(公告)号:US11372222B2

    公开(公告)日:2022-06-28

    申请号:US16722823

    申请日:2019-12-20

    Inventor: Ko Gondaira

    Abstract: A confocal microscope includes a data acquisition unit configured to acquire a rough-shape data indicating a rough shape of a sample, an illumination light source configured to generate illumination light for illuminating the sample, an objective lens configured to concentrate the illumination light on the sample, an optical scanner configured to scan an illuminated place on the sample in a field of view of the objective lens, a stage configured to scan the illuminated place along the rough shape of the sample by changing a position of the objective lens relative to the sample, and an optical detector configured to detect reflected light through a confocal optical system, the reflected light being light that has been reflected on the sample and has passed through the objective lens.

    Wavelength conversion apparatus and wavelength conversion method

    公开(公告)号:US10761400B2

    公开(公告)日:2020-09-01

    申请号:US16575122

    申请日:2019-09-18

    Abstract: A wavelength conversion apparatus and a wavelength conversion method that can stably output wavelength converted light for a long time are provided. A wavelength conversion apparatus 100 according to an aspect of the present disclosure includes a casing 10, a wavelength conversion element 25 disposed inside the casing 10 and configured to convert a wavelength of incident light and output light with the converted wavelength, a first port 11 that introduces a first gas containing 99.9% or more of a nitrogen gas inside the casing 10, and a second port 12 that introduces a second gas containing 1% or more of an oxygen gas.

    INSPECTION DEVICE AND INSPECTION METHOD
    9.
    发明申请

    公开(公告)号:US20190277772A1

    公开(公告)日:2019-09-12

    申请号:US16295870

    申请日:2019-03-07

    Abstract: An inspection device according to the present disclosure includes a detector for inspection that includes a plurality of pixels arranged on a light receiving surface and acquires image data by transferring charge produced by light received by the plurality of pixels in a transfer direction at a specified transfer timing, a light source that emits illumination light including pulsed light, a pulse enable circuit that controls emission timing for the light source to emit the illumination light based on the transfer timing, an illumination optical system that illuminates an object to be inspected with the illumination light, a condensing optical system that condenses, on the detector for inspection, light from the object to be inspected illuminated with the illumination light, and a processing unit that inspects the object to be inspected by using the image data of the object to be inspected.

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