公开(公告)号：US20240302670A1

公开(公告)日：2024-09-12

申请号：US18599566

申请日：2024-03-08

申请人： Lasertec Corporation

发明人： Keitaro HAYASHIDA ,  Shinji TANAKA ,  Masaki KOICHI ,  Haruhiko KUSUNOSE

IPC分类号： G02B27/09 ,  G02B5/08 ,  G02B26/08 ,  G02B26/10 ,  H04N23/72 ,  H04N23/74 ,  H04N23/75 ,  H04N25/71 ,  H05G2/00

CPC分类号： G02B27/0933 ,  G02B26/0816 ,  G02B26/10 ,  G02B27/0927 ,  G02B27/0977 ,  H04N23/72 ,  H04N23/74 ,  H04N23/75 ,  H04N25/71 ,  H05G2/008 ,  G02B5/0891

摘要： Provided are an illumination apparatus and an illumination method capable of uniformly illuminating a visual field region detected by a detector. The present disclosure provides an illumination apparatus including: a drive unit configured to drive an optical member such that illumination light scans, in one direction, a visual field region that is a region extending in the one direction on a sample; and a control unit configured to control the drive unit to cause the illumination light to scan in synchronization with a transfer of a sensor that receives light from the visual field region illuminated by the illumination light.

公开(公告)号：US20190277772A1

公开(公告)日：2019-09-12

申请号：US16295870

申请日：2019-03-07

申请人： Lasertec Corporation

发明人： Masayasu NISHIZAWA ,  Haruhiko KUSUNOSE ,  Tomohiro SUZUKI

IPC分类号： G01N21/88 ,  G01N21/956 ,  H05G2/00 ,  G03F7/20

摘要： An inspection device according to the present disclosure includes a detector for inspection that includes a plurality of pixels arranged on a light receiving surface and acquires image data by transferring charge produced by light received by the plurality of pixels in a transfer direction at a specified transfer timing, a light source that emits illumination light including pulsed light, a pulse enable circuit that controls emission timing for the light source to emit the illumination light based on the transfer timing, an illumination optical system that illuminates an object to be inspected with the illumination light, a condensing optical system that condenses, on the detector for inspection, light from the object to be inspected illuminated with the illumination light, and a processing unit that inspects the object to be inspected by using the image data of the object to be inspected.

公开(公告)号：US20150204729A1

公开(公告)日：2015-07-23

申请号：US14565703

申请日：2014-12-10

申请人： Lasertec Corporation

发明人： Haruhiko KUSUNOSE ,  Kiwamu TAKEHISA

IPC分类号： G01J9/02 ,  G01B9/02

CPC分类号： G01J9/02 ,  G01B9/02041 ,  G01B9/02049 ,  G01B9/02098 ,  G01B2290/30 ,  G01J9/0215 ,  G01J2009/0219 ,  G01N21/45 ,  G03F1/26 ,  G03F1/84

摘要： The present invention is directed to the provision of an interferometer and a phase shift amount measuring apparatus that can precisely operate in the EUV region. The interferometer according to the invention comprises an illumination source for generating an illumination beam, an illumination system for projecting the illumination beam emitted from the illumination source onto a sample, and an imaging system for directing the reflected beam by the sample onto a detector. The illumination system includes a first diffraction grating for producing a first and second diffraction beams which respectively illuminate two areas on the sample where are shifted from each other by a given distance, and the imaging system includes a second grating for diffracting the first and second diffraction beams reflected by the sample to produce a third and fourth diffraction beams which are shifted from each other by a given distance.

摘要翻译： 本发明涉及提供一种能够在EUV区域中精确地工作的干涉仪和相移量测量装置。 根据本发明的干涉仪包括用于产生照明光束的照明源，用于将从照明源发射的照射光束投射到样本上的照明系统，以及用于将由样品引导到检测器的反射光束的成像系统。 照明系统包括：第一衍射光栅，用于产生第一和第二衍射光束，其分别照射样品上彼此偏移给定距离的两个区域，并且成像系统包括用于衍射第一和第二衍射的第二光栅 由样品反射的光束以产生彼此偏移给定距离的第三和第四衍射光束。

公开(公告)号：US20180276812A1

公开(公告)日：2018-09-27

申请号：US15933408

申请日：2018-03-23

申请人： LASERTEC CORPORATION

发明人： Tsunehito KOHYAMA ,  Haruhiko KUSUNOSE ,  Kiwamu TAKEHISA ,  Hiroki MIYAI ,  Itaru MATSUGU

IPC分类号： G06T7/00 ,  G06T5/00 ,  G01N21/956 ,  H04N5/225 ,  H04N5/372

CPC分类号： G06T7/0008 ,  G01N21/956 ,  G01N2021/95676 ,  G01N2201/061 ,  G01N2201/12 ,  G03F1/84 ,  G06T5/001 ,  G06T2207/10152 ,  H04N5/2256 ,  H04N5/372

摘要： A correction method according to an embodiment includes illuminating an object to be inspected by using critical illumination by illumination light L11 generated by a light source 11, concentrating light from the object to be inspected illuminated by the illumination light L11 and acquiring image data of the object to be inspected by detecting the concentrated light by a first detector 23, concentrating part of the illumination light L11, and acquiring image data of a brightness distribution of the illumination light L11 by detecting the concentrated illumination light L11 by a second detector 33, and correcting the image data of the object to be inspected based on the image data of the brightness distribution.

公开(公告)号：US20180191958A1

公开(公告)日：2018-07-05

申请号：US15813998

申请日：2017-11-15

申请人： Lasertec Corporation

发明人： Haruhiko KUSUNOSE

IPC分类号： H04N5/232 ,  G02B27/64 ,  G03F7/20

CPC分类号： H04N5/23264 ,  G02B27/646 ,  G03F7/70008 ,  G03F7/70033 ,  G03F7/70141 ,  G03F7/70191 ,  G03F7/70833 ,  G03F7/70841 ,  G03F7/709 ,  H04N5/23296

摘要： An optical apparatus and its vibration removing method capable of stabilizing a place where light is applied are provided. An optical apparatus according to an aspect of the present disclosure includes a light source chamber, an EUV light source, an optical system chamber, an optical system configured to guide light entering the optical system chamber to an object through a bellows, an optical sensor configured to detect EUV light L2 emitted from the EUV light source, a position sensor disposed to detect a relative position of the optical system chamber with respect to the light source chamber, and a second vibration removal unit configured to remove vibrations from the light source chamber based on detection results of the optical sensor and the position sensor.

公开(公告)号：US20240361590A1

公开(公告)日：2024-10-31

申请号：US18645681

申请日：2024-04-25

申请人： Lasertec Corporation

发明人： Ko GONDAIRA ,  Masaki INOUE ,  Haruhiko KUSUNOSE

IPC分类号： G02B27/00 ,  G03F1/82

CPC分类号： G02B27/0006 ,  G03F1/82

摘要： To provide an optical apparatus and a method of preventing contamination of the optical apparatus that can more effectively prevent contamination. An optical apparatus according to an embodiment includes a light source configured to generate irradiation light including EUV light, an optical system chamber in which a target object to be irradiated with the irradiation light is disposed, a drop-in mirror provided in the optical system chamber in order to guide the irradiation light, an introducing unit configured to introduce argon into the optical system chamber, a power supply configured to apply a negative voltage to the drop-in mirror in the optical system chamber, an ammeter configured to measure an ion current flowing to the drop-in mirror, and a control unit configured to control an introduction amount of the argon according to a measurement result of the ammeter.

公开(公告)号：US20220178847A1

公开(公告)日：2022-06-09

申请号：US17643151

申请日：2021-12-07

申请人： Lasertec Corporation

发明人： Keita SAITO ,  Haruhiko KUSUNOSE ,  Tsunehito KOHYAMA

IPC分类号： G01N21/956

摘要： Resolution is improved in a required direction while maintaining contrast in inspection of an anamorphic mask. A method for inspecting a mask with a reduction rate at the time of exposure in a longitudinal direction different from a reduction rate at the time of exposure in a lateral direction according to the present disclosure includes capturing an image of the mask using a photodetector including a rectangular pixel, a ratio of a dimension of the rectangular pixel in the longitudinal direction to a dimension of the rectangular pixel in the lateral direction being equal to an inverse ratio of the reduction rate in the longitudinal direction to the reduction rate in the lateral direction.

公开(公告)号：US20140189998A1

公开(公告)日：2014-07-10

申请号：US14148475

申请日：2014-01-06

申请人： Lasertec Corporation

发明人： Haruhiko KUSUNOSE

IPC分类号： H01L21/683 ,  B23B31/30

CPC分类号： H01L21/6838 ,  Y10T29/49998 ,  Y10T279/11

摘要： Provided are a chucking device having low dusting characteristics and high detergent properties and capable of vacuum-sucking even a substrate having a large warpage, and a chucking method using the same. A chucking device according to an aspect of the present invention vacuum-sucks and holds a wafer. The chucking device includes: a perforated plate having a plurality of through-holes and being mounted with a wafer, the through-holes penetrating through both sides of the perforated plate; a porous plate that supports a surface other than a mounting surface of the perforated plate, on which the wafer is mounted, transmits a vacuum state to the wafer through the plurality of through-holes, and has a pore to limit a flow rate; and a vacuum pump that exhausts an air through the pore of the porous plate.

摘要翻译： 提供一种具有低除尘特性和高洗涤性能的吸盘装置，并且即使是具有大翘曲的基板也能进行真空吸附，以及使用该夹紧装置的夹紧方法。 根据本发明的一个方面的夹持装置对晶片进行真空吸附和保持。 夹持装置包括：多孔板，具有多个通孔并且安装有晶片，所述通孔穿过多孔板的两侧; 支撑除了安装有晶片的多孔板的安装面以外的表面的多孔板通过多个通孔将真空状态传递到晶片，并且具有限制流量的孔; 以及通过多孔板的孔排出空气的真空泵。

公开(公告)号：US20130234597A1

公开(公告)日：2013-09-12

申请号：US13788005

申请日：2013-03-07

申请人： LASERTEC CORPORATION

发明人： Haruhiko KUSUNOSE ,  Kiwamu TAKEHISA ,  Tomohiro SUZUKI ,  Hiroki MIYAI

IPC分类号： H01J1/52 ,  H05H1/24

CPC分类号： H01J1/52 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/003 ,  H05G2/005 ,  H05H1/24

摘要： The plasma shield device (13) comprises a hollow structure (40) made of monocrystal body of silicon carbide and having an inside space (40a) and a first and second openings (40b,40c) which are opposed to each other across the inside space. During operation of the plasma generation apparatus, the internal space of the hollow structure forms a discharge zone in which the plasma is generated. Discharge gas is supplied to the internal space of the hollow structure through the first opening and the EUV radiation is mainly emitted through the second opening.

摘要翻译： 等离子体屏蔽装置（13）包括由碳化硅单晶体制成的具有内部空间（40a）和第一和第二开口（40b，40c）的中空结构（40），所述内部空间（40a）和第二开口（40b，40c） 。 在等离子体产生装置的操作期间，中空结构的内部空间形成其中产生等离子体的放电区。 排出气体通过第一开口供应到中空结构的内部空间，并且EUV辐射主要通过第二开口排出。

公开(公告)号：US20130188251A1

公开(公告)日：2013-07-25

申请号：US13744890

申请日：2013-01-18

申请人： LASERTEC CORPORATION

发明人： Haruhiko KUSUNOSE ,  Takao TSUBOUCHI

IPC分类号： G02B21/06

CPC分类号： G02B21/06 ,  G01N21/9501 ,  G01N21/9505 ,  G02B6/0008 ,  G02B21/0092 ,  G02B21/10

摘要： A system including a microscope and an inspection apparatus in which an objective lens having a large numerical aperture is used for detecting a defect existing inside a sample. A light source apparatus produces linearly polarized light. The polarization maintaining fibers optically coupled to the light source apparatus project the linearly polarized light onto the sample surface as an illumination beam of P-polarized light at an incidence angle substantially equal to the Brewster's angle of the sample. The scattered light generated by the defect existing in the sample is emitted from the sample and is collected by the objective lens whose optical axis is perpendicular to the sample surface. Since the illumination beam of P-polarized light is projected at the incidence angle equal to the Brewster's angle of the sample, no surface reflection occurs and it is possible to use the objective lens having a large numerical aperture.

摘要翻译： 一种包括显微镜和检查装置的系统，其中使用具有大数值孔径的物镜来检测样品内存在的缺陷。 光源装置产生线偏振光。 与光源装置光学耦合的偏振保持光纤将线偏振光投射到样品表面上，作为基本上等于样品的布鲁斯特角的入射角的P偏振光的照明光束。 由样品中存在的缺陷产生的散射光从样品发射，并由其光轴垂直于样品表面的物镜收集。 由于P偏振光的照明光束以等于样品的布鲁斯特角的入射角投影，所以不会发生表面反射，并且可以使用具有大数值孔径的物镜。