Abstract:
Various exemplary photoreactions can be provided, including reactions generally based on triplet-triplet annihilation upconversion. Representative photosensitizers include PdPc(OBu)8 and PtTPTNP. Representative annihilators include FDPP and TTBP. Such exemplary photoreactions, systems and methods may be used in a variety of applications, including various biological or physical applications. Exemplary methods can also be provided for making or using such systems, photoreactions, kits including such systems, or the like.
Abstract:
A method for patterning metal oxides or ceramics on surfaces, and more particularly, a method of forming photonic crystals. The patterning is done using a solution coating process and a polymer-based template made by nano-imprint lithography. The methodology to pattern a sol-gel can be used to make features without the undesired scum layer. Furthermore, the patterned photonic crystals were demonstrated to efficiently increase the light extraction efficiency of solid state devices based on GaN.
Abstract:
An article and method of using spacer layer regions is provided, containing a gas compound, to reduce gas permeation through barrier films overlying a substrate comprising creating a spacer layer between one or more of the barrier films, wherein the spacer layer comprises at least one inert gaseous compound. In another embodiment, an article and method is provided comprising creating alternating thin films of hybridized sol-gel spin-on glass and PDMS based and olefin based elastomers.
Abstract:
An article and method of using spacer layer regions is provided, containing a gas compound, to reduce gas permeation through barrier films overlying a substrate comprising creating a spacer layer between one or more of the barrier films, wherein the spacer layer comprises at least one inert gaseous compound. In another embodiment, an article and method is provided comprising creating alternating thin films of hybridized sol-gel spin-on glass and PDMS based and olefin based elastomers.
Abstract:
A stamp is comprised of a thiol-ene polymer, wherein the thiol-ene polymer allows for creation of micro-scale or nano-scale patterns useful in soft or imprint lithography. A patterned thiol-ene polymer is fabricated by casting a thiol-ene mixture onto a patterned mold, curing the thiol-ene mixture to form the patterned thiol-ene polymer, and peeling off the patterned thiol-ene polymer from the silicon mold. A stamp comprised of a thiol-ene polymer may be replicated by exposing the to oxygen plasma to form a hydrophilic mold, exposing the hydrophilic mold to a fluorinating agent under vacuum conditions to form a functionalized surface of the hydrophilic mold, casting a thiol-ene mixture on top of the functionalized surface, photocuring the thiolene mixture to form a replica thiol-ene polymer, and peeling off the replica thiol-ene polymer.