公开(公告)号：US20090179084A1

公开(公告)日：2009-07-16

申请号：US12351572

申请日：2009-01-09

申请人： Jurgen Hofmann ,  Markus Bickel ,  Lutz Seyfarth

发明人： Jurgen Hofmann ,  Markus Bickel ,  Lutz Seyfarth

IPC分类号： B05B1/10

CPC分类号： B60S1/488 ,  B60S1/52 ,  F16L53/38

摘要： A wash system for window glasses and/or headlamps of a vehicle, with a fluid line through which a fluid is conducted from a fluid reservoir into a nozzle and with a heating cable which is laid in the fluid line is disclosed. The heating cable is laid so as to enter the nozzle or to pass through the nozzle and to heat not only the fluid line but also the nozzle. One obtains a wash system that can be manufactured at low cost and ensures freeze protection at reduced energy expense by the fact that the heating cable is laid in a meander pattern in the nozzle.

摘要翻译： 公开了一种用于车窗玻璃和/或前照灯的洗涤系统，其具有流体管线，通过该流体管线将流体从流体储存器传导到喷嘴中以及铺设在流体管线中的加热电缆。 加热电缆被放置成进入喷嘴或通过喷嘴，并且不仅加热流体管线而且加热喷嘴。 获得可以以低成本制造的洗涤系统，并且通过加热电缆以喷嘴中的曲折形式铺设的事实，以降低的能量消耗确保防冻保护。

公开(公告)号：US07878421B2

公开(公告)日：2011-02-01

申请号：US12351572

申请日：2009-01-09

申请人： Jurgen Hofmann ,  Markus Bickel ,  Lutz Seyfarth

发明人： Jurgen Hofmann ,  Markus Bickel ,  Lutz Seyfarth

IPC分类号： B05B1/24 ,  B05B1/10 ,  B60S1/46

CPC分类号： B60S1/488 ,  B60S1/52 ,  F16L53/38

摘要： A wash system for window glasses and/or headlamps of a vehicle, with a fluid line through which a fluid is conducted from a fluid reservoir into a nozzle and with a heating cable which is laid in the fluid line is disclosed. The heating cable is laid so as to enter the nozzle or to pass through the nozzle and to heat not only the fluid line but also the nozzle. One obtains a wash system that can be manufactured at low cost and ensures freeze protection at reduced energy expense by the fact that the heating cable is laid in a meander pattern in the nozzle.

摘要翻译： 公开了一种用于车窗玻璃和/或前照灯的洗涤系统，其具有流体管线，通过该流体管线将流体从流体储存器传导到喷嘴中以及铺设在流体管线中的加热电缆。 加热电缆被放置成进入喷嘴或通过喷嘴，并且不仅加热流体管线而且加热喷嘴。 获得可以以低成本制造的洗涤系统，并且通过加热电缆以喷嘴中的曲折形式铺设的事实，以降低的能量消耗确保防冻保护。

公开(公告)号：US20050239259A1

公开(公告)日：2005-10-27

申请号：US11112408

申请日：2005-04-22

申请人： Markus Bickel ,  Ulrich Kelberlau

发明人： Markus Bickel ,  Ulrich Kelberlau

IPC分类号： H01L21/329 ,  H01L21/331 ,  H01L21/332 ,  H01L21/336 ,  H01L23/48 ,  H01L23/58 ,  H01L29/06 ,  H01L29/08 ,  H01L29/417 ,  H01L29/74

CPC分类号： H01L29/66272 ,  H01L23/481 ,  H01L23/585 ,  H01L24/48 ,  H01L29/0834 ,  H01L29/417 ,  H01L29/66128 ,  H01L29/66333 ,  H01L29/66363 ,  H01L29/66393 ,  H01L29/74 ,  H01L2224/0401 ,  H01L2224/04042 ,  H01L2224/16227 ,  H01L2224/48227 ,  H01L2224/73265 ,  H01L2924/00014 ,  H01L2924/10253 ,  H01L2924/1301 ,  H01L2924/13055 ,  H01L2924/13091 ,  H01L2924/00 ,  H01L2224/45099 ,  H01L2224/45015 ,  H01L2924/207

摘要： A method for forming a high voltage semiconductor power device comprises providing a first dopant source of first conductivity on an upper surface of a substrate of second conductivity. A second dopant source of first conductivity is provided on a lower surface of the substrate. The substrate is annealed for a first given time to drive the dopants from the first and second dopants sources into the substrate. The first and second dopant sources are removed from the upper and lower surfaces of the substrate. The substrate is annealed for a second given time to homogenize dopant concentration within the substrate after the first and second dopant sources have been removed, where the annealing the substrate for the second given time results in out-diffusion of dopants proximate the upper and lower surfaces of the substrate. Compensation dopants are provided into the substrate after annealing the substrate for the second given time to compensate the out-diffusion of the dopants proximate the upper and lower surfaces. The dopants driven into the substrate define an isolation diffusion structure that extends from the upper surface to the lower surface.

摘要翻译： 一种用于形成高电压半导体功率器件的方法包括在第二导电性的衬底的上表面上提供第一导电性的第一掺杂源。 第一导电性的第二掺杂剂源提供在衬底的下表面上。 将衬底退火第一给定时间以将掺杂剂从第一和第二掺杂剂源驱动到衬底中。 从衬底的上表面和下表面去除第一和第二掺杂剂源。 在去除第一和第二掺杂剂源之后，将衬底退火第二给定时间以均匀化衬底内的掺杂剂浓度，其中在第二给定时间退火衬底导致靠近上表面和下表面的掺杂剂的扩散 的基底。 在第二给定时间退火衬底之后，将补偿掺杂物提供到衬底中，以补偿靠近上表面和下表面的掺杂剂的扩散。 驱动到衬底中的掺杂剂限定了从上表面延伸到下表面的隔离扩散结构。

公开(公告)号：US20080196917A1

公开(公告)日：2008-08-21

申请号：US12032239

申请日：2008-02-15

申请人： Jurgen Hofmann ,  Lutz Seyfarth ,  Markus Bickel

发明人： Jurgen Hofmann ,  Lutz Seyfarth ,  Markus Bickel

IPC分类号： F16L11/12 ,  H01B7/00

CPC分类号： B60S1/488 ,  F16L11/127 ,  F16L53/38 ,  H05B3/56

摘要： A fluid supply hose for a windscreen or headlamp washer system of a vehicle having an electric heating element, said heating element comprising a coaxial cable (2, 12) with an inner current conductor (3, 13) and an outer current conductor (5, 15) surrounding said inner conductor (3, 13), an insulator (4, 14) being provided between said inner (3, 13) and said outer conductor (5, 15). To provide a fluid supply hose of the type mentioned herein above the heating element of which is of a small and flow-enhancing design so that the fluid supply hose may have a smaller cross section, the inner current conductor (3, 13) is given a higher electric resistance than the outer current conductor (5, 15).

摘要翻译： 一种用于具有电加热元件的车辆的挡风玻璃或前照灯清洗系统的流体供应软管，所述加热元件包括具有内部电流导体（3,13）和外部电流导体（5）的同轴电缆（2,12） 15）围绕所述内部导体（3,13），在所述内部（3,13）和所述外部导体（5,15）之间设置绝缘体（4,14）。 为了提供上述类型的流体供应软管，其加热元件具有小且流动增强的设计，使得流体供应软管可以具有较小的横截面，给出内部电流导体（3,13） 比外部电流导体（5,15）具有更高的电阻。

公开(公告)号：US07326596B2

公开(公告)日：2008-02-05

申请号：US11112408

申请日：2005-04-22

申请人： Markus Bickel ,  Ulrich Kelberlau

发明人： Markus Bickel ,  Ulrich Kelberlau

IPC分类号： H01L21/332

CPC分类号： H01L29/66272 ,  H01L23/481 ,  H01L23/585 ,  H01L24/48 ,  H01L29/0834 ,  H01L29/417 ,  H01L29/66128 ,  H01L29/66333 ,  H01L29/66363 ,  H01L29/66393 ,  H01L29/74 ,  H01L2224/0401 ,  H01L2224/04042 ,  H01L2224/16227 ,  H01L2224/48227 ,  H01L2224/73265 ,  H01L2924/00014 ,  H01L2924/10253 ,  H01L2924/1301 ,  H01L2924/13055 ,  H01L2924/13091 ,  H01L2924/00 ,  H01L2224/45099 ,  H01L2224/45015 ,  H01L2924/207

摘要： A method for forming a high voltage semiconductor power device comprises providing a first dopant source of first conductivity on an upper surface of a substrate of second conductivity. A second dopant source of first conductivity is provided on a lower surface of the substrate. The substrate is annealed for a first given time to drive the dopants from the first and second dopants sources into the substrate. The first and second dopant sources are removed from the upper and lower surfaces of the substrate. The substrate is annealed for a second given time to homogenize dopant concentration within the substrate after the first and second dopant sources have been removed, where the annealing the substrate for the second given time results in out-diffusion of dopants proximate the upper and lower surfaces of the substrate. Compensation dopants are provided into the substrate after annealing the substrate for the second given time to compensate the out-diffusion of the dopants proximate the upper and lower surfaces. The dopants driven into the substrate define an isolation diffusion structure that extends from the upper surface to the lower surface.

摘要翻译： 一种用于形成高电压半导体功率器件的方法包括在第二导电性的衬底的上表面上提供第一导电性的第一掺杂源。 第一导电性的第二掺杂剂源提供在衬底的下表面上。 将衬底退火第一给定时间以将掺杂剂从第一和第二掺杂剂源驱动到衬底中。 从衬底的上表面和下表面去除第一和第二掺杂剂源。 在去除第一和第二掺杂剂源之后，将衬底退火第二给定时间以均匀化衬底内的掺杂剂浓度，其中在第二给定时间退火衬底导致靠近上表面和下表面的掺杂剂的扩散 的基底。 在第二给定时间退火衬底之后，将补偿掺杂物提供到衬底中，以补偿靠近上表面和下表面的掺杂剂的扩散。 驱动到衬底中的掺杂剂限定了从上表面延伸到下表面的隔离扩散结构。