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    Method and system for dynamically selecting wafer lots for metrology processing
    2.
    发明授权
    Method and system for dynamically selecting wafer lots for metrology processing 有权
    用于动态选择用于计量处理的晶圆批次的方法和系统

    公开(公告)号：US07296103B1

    公开(公告)日：2007-11-13

    申请号：US10958834

    申请日：2004-10-05

    申请人： Matthew A. Purdy ,  Cabe W. Nicksic

    发明人： Matthew A. Purdy ,  Cabe W. Nicksic

    IPC分类号： G06F19/00 ,  G05B21/02 ,  G05B13/04 ,  G05B17/02

    CPC分类号： G05B19/41865 ,  G05B2219/32247 ,  G05B2219/32306 ,  G05B2219/45031 ,  Y02P90/20 ,  Y02P90/86

    摘要： The present invention is generally directed to various methods and systems for dynamically controlling metrology work in progress. In one illustrative embodiment, the method comprises providing a metrology control unit that is adapted to control metrology work flow to at least one metrology tool, identifying a plurality of wafer lots that are in a metrology queue wherein the wafer lots are intended to be processed in at least one metrology tool, and wherein the metrology control unit selects at least one of the wafer lots for metrology processing in the at least one metrology tool and selects at least one other of the plurality of wafer lots to be removed from the metrology queue based upon the metrology processing of the selected at least one wafer lot in the at least one metrology tool.

    摘要翻译： 本发明一般涉及用于动态控制进行中的计量工作的各种方法和系统。 在一个说明性实施例中，该方法包括提供一个度量控制单元，其适于将测量工作流程控制到至少一个计量工具，识别处于计量队列中的多个晶片批次，其中晶片批次旨在被处理 至少一个计量工具，并且其中所述计量控制单元在所述至少一个计量工具中选择所述晶片批次中的至少一个用于度量处理，并且从所述计量学队列中选择所述多个晶片批次中的至少另一个待移除 在所述至少一个计量工具中对所选择的至少一个晶片批次进行计量处理。

    Method and apparatus for integrating dispatch and process control actions
    3.
    发明授权
    Method and apparatus for integrating dispatch and process control actions 有权
    集成调度和过程控制动作的方法和装置

    公开(公告)号：US06790686B1

    公开(公告)日：2004-09-14

    申请号：US10323562

    申请日：2002-12-18

    申请人： Matthew A. Purdy ,  Cabe W. Nicksic

    发明人： Matthew A. Purdy ,  Cabe W. Nicksic

    IPC分类号： H01L2166

    CPC分类号： G05B19/41865 ,  G05B2219/32266 ,  G05B2219/45031 ,  Y02P90/20

    摘要： A method includes scheduling a plurality of workpieces for processing by a plurality of tools. Each workpiece has an associated priority. The processing in at least one of the tools is controlled in accordance with a process control model. A process control request associated with the controlling of the tool is generated. The priorities of at least a subset of the workpieces are determined based on the process control request. A manufacturing system includes a plurality of tools for processing workpieces, a dispatch unit, and a process control unit. The dispatch unit is configured to schedule a plurality of workpieces for processing by the tools. Each workpiece has an associated priority. The process control unit is configured to control the processing in at least one of the tools in accordance with a process control model and generate a process control request associated with the controlling of the tool. The dispatch unit is further configured to receive the process control request and determine the priorities of at least a subset of the workpieces based on the process control request.

    摘要翻译： 一种方法包括调度多个工件以供多个工具进行处理。 每个工件都有一个相关的优先级。 根据过程控制模型控制至少一个工具中的处理。 产生与控制工具相关联的过程控制请求。 基于过程控制请求确定工件的至少一个子集的优先级。 制造系统包括用于处理工件的多个工具，调度单元和过程控制单元。 调度单元被配置为安排用于由工具进行处理的多个工件。 每个工件都有一个相关的优先级。 过程控制单元被配置为根据过程控制模型控制至少一个工具中的处理，并且生成与该工具的控制相关联的过程控制请求。 调度单元还被配置为基于过程控制请求接收过程控制请求并确定工件的至少一个子集的优先级。