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1.发明授权公开(公告)号：US06912436B1
公开(公告)日：2005-06-28
申请号：US10261156
申请日：2002-09-30
CPC分类号： G05B13/042
摘要： A method and an apparatus for selectively applying correction to a process control. Manufacturing data relating to the processing of a workpiece is acquired. The manufacturing data includes metrology data relating to the processed workpiece. An adjustment for at least a first or a second control input parameter is determined based upon the manufacturing data. The first and second control input parameters are organized to isolate the first control input parameter from the second control input parameter for adjusting at least one of the first and the second control input parameters, using a controller.
摘要翻译： 一种用于选择性地对过程控制应用校正的方法和装置。 获取与工件的处理有关的制造数据。 制造数据包括与加工的工件相关的计量数据。 基于制造数据确定至少第一或第二控制输入参数的调整。 组织第一和第二控制输入参数以将第一控制输入参数与第二控制输入参数隔离，以使用控制器调整第一和第二控制输入参数中的至少一个。
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2.发明授权Method of using critical dimension measurements to control stepper process parameters 失效使用关键尺寸测量来控制步进过程参数的方法公开(公告)号：US06808946B1
公开(公告)日：2004-10-26
申请号：US10195934
申请日：2002-07-16
IPC分类号： H01L2166
CPC分类号： G03F7/70625
摘要： A method of using critical dimension measurements to control stepper process parameters is disclosed. In one illustrative embodiment, the method comprises forming a masking layer above a process layer, the masking layer having a plurality of features formed therein, measuring at least one critical dimension of a plurality of features positioned within at least one exposure field of a stepper exposure process used in forming the features, and determining a tilt of the masking layer within at least one exposure field based upon the measured critical dimensions of the plurality of features. In one illustrative embodiment, the system comprises a metrology tool adapted to measure at least one critical dimension of a plurality of features in a masking layer and a controller for determining a tilt of the masking layer based upon the measured critical dimensions of said plurality of features.
摘要翻译： 公开了一种使用关键尺寸测量来控制步进过程参数的方法。 在一个说明性实施例中，该方法包括在处理层上形成掩模层，掩模层具有形成在其中的多个特征，测量位于步进曝光的至少一个曝光区域内的多个特征的至少一个临界尺寸 用于形成特征的方法，以及基于所测量的多个特征的临界尺寸，确定至少一个曝光区域内的掩蔽层的倾斜度。 在一个说明性实施例中，该系统包括适于测量掩模层中的多个特征的至少一个关键尺寸的计量工具和用于基于所测量的所述多个特征的临界尺寸来确定掩蔽层的倾斜度的控制器 。
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3.发明授权Method of using scatterometry measurements to control stepper process parameters 失效使用散射测量法控制步进过程参数的方法公开(公告)号：US06790570B1
公开(公告)日：2004-09-14
申请号：US10005486
申请日：2001-11-08
IPC分类号： G03F900
CPC分类号： G03F7/70616
摘要： A method of using scatterometric techniques to control stepper process is disclosed. In one illustrative embodiment, the method comprises providing a library of optical characteristic traces, each of which corresponds to a grating structure comprised of a plurality of features having a known profile, and forming a plurality of grating structures in a layer of photoresist, each of said formed grating structures being comprised of a plurality of features having an unknown profile. The method further comprises illuminating the formed grating structures, measuring light reflected off of each of the formed grating structures to generate an optical characteristic trace for each of the formed grating structures, comparing each of said generated optical characteristic traces to at least one optical characteristic trace from the library, and modifying at least one parameter of a stepper exposure process to be performed on at least one subsequently processed wafer based upon the comparison of the generated optical characteristic traces and the optical characteristic trace from the library. In another embodiment, the generated optical characteristic traces for the grating structures are compared to a target optical characteristic trace for the grating structures, and at least one parameter of an exposure process to be performed on a layer of photoresist formed on a subsequently processed wafer may be determined or modified based upon this comparison.
摘要翻译： 公开了使用散射测量技术来控制步进过程的方法。 在一个说明性实施例中，该方法包括提供一个光学特性曲线库，每个光学特征曲线对应于由具有已知轮廓的多个特征组成的光栅结构，并且在光刻胶层中形成多个光栅结构 所述形成的光栅结构由具有未知轮廓的多个特征组成。 该方法还包括照亮形成的光栅结构，测量从每个形成的光栅结构反射的光，以产生每个形成的光栅结构的光学特征迹线，将所述所生成的光学特征迹线中的每一个与至少一个光学特性曲线 并且根据所生成的光学特性曲线和来自图书馆的光学特性曲线的比较，修改要在至少一个随后处理的晶片上执行的步进曝光过程的至少一个参数。 在另一个实施例中，将所生成的光栅结构的光学特性曲线与光栅结构的目标光学特性曲线进行比较，并且对在随后处理的晶片上形成的光致抗蚀剂层上执行的曝光工艺的至少一个参数可以 基于此比较确定或修改。
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公开(公告)号：US06622061B1
公开(公告)日：2003-09-16
申请号：US10160963
申请日：2002-05-31
IPC分类号： G06F1900
CPC分类号： G03F7/70633 , H01L22/20
摘要： The present invention provides for a method and apparatus for correction of overlay control errors. Semiconductor devices are processed based upon control input parameters. The processed semiconductor devices are examined in a review station. The control input parameters are modified in response to the examination of the processed semiconductor devices. New control input parameters are implemented for a subsequent run of the semiconductor device processing step based upon the modification of the control input parameters.
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公开(公告)号：US06405096B1
公开(公告)日：2002-06-11
申请号：US09371550
申请日：1999-08-10
IPC分类号： G06F1900
CPC分类号： G03F7/70633 , H01L22/20
摘要： The present invention provides for a method and apparatus for correction of overlay control errors. Semiconductor devices are processed based upon control input parameters. The processed semiconductor devices are examined in a review station. The control input parameters are modified in response to the examination of the processed semiconductor devices. New control input parameters are implemented for a subsequent run of the semiconductor device processing step based upon the modification of the control input parameters.
摘要翻译： 本发明提供了一种用于校正重叠控制误差的方法和装置。 基于控制输入参数来处理半导体器件。 处理的半导体器件在检查站中进行检查。 响应于对被处理的半导体器件的检查，修改控制输入参数。 基于控制输入参数的修改，实现新的控制输入参数用于随后的半导体器件处理步骤的运行。
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公开(公告)号：US07377082B1
公开(公告)日：2008-05-27
申请号：US10990730
申请日：2004-11-17
申请人： Richard D. Edwards
发明人： Richard D. Edwards
CPC分类号： E04C2/292
摘要： A panel for constructing patio rooms, and the like, has a reinforcing offset I-beam extending along a first edge of the insulative board. A second lateral edge of the board has a reduced thickness portion which fits into the open side of the I-beam and forms two pockets which accommodate the engagement of two sets of spring fingers which positionally locate and secure adjacent panels together.
摘要翻译： 用于构造露台室等的面板具有沿着绝缘板的第一边缘延伸的加强偏移I型梁。 板的第二横向边缘具有减小的厚度部分，该部分装配到工字梁的开口侧，并形成两个凹穴，其容纳两组弹簧夹的接合，这两个弹簧指位置定位并将相邻的面板固定在一起。
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公开(公告)号：US20120250302A1
公开(公告)日：2012-10-04
申请号：US13479704
申请日：2012-05-24
CPC分类号： F21S8/06 , F21S8/046 , F21V15/015 , F21V31/005 , F21Y2103/00 , F21Y2113/00 , Y10T29/4973
摘要： This invention provides a vapor-tight luminaire with a housing that defines a continuous and unbroken sealed tubular lens extending in a longitudinal direction. The housing includes a pair of end cap structures removably and sealably mounted on each of opposing respective housing ends. The housing removably supports a lamp assembly that can include various reflector arrangements. The lamp assembly can include fluorescent tubular lamps and can include electronics, such as a ballast circuit. Illustratively, a supporting rail suspended from each of the opposing housing ends by respective posts slidably supports the lamp assembly. In this manner each of the housing and the lamp assembly are constructed and arranged to allow the lamp assembly to be passed into and out of the housing along the supporting rail when at least one of the end cap structures is removed from the respective one of the housing ends.
摘要翻译： 本发明提供了一种具有壳体的气密灯具，其限定了沿纵向方向延伸的连续且不间断的密封管状透镜。 壳体包括可拆卸地且可密封地安装在每个相对的相应壳体端部上的一对端盖结构。 壳体可拆卸地支撑可以包括各种反射器布置的灯组件。 灯组件可以包括荧光管灯，并且可以包括电子器件，例如镇流器电路。 说明性地，通过相应的柱从每个相对的壳体端部悬挂的支撑轨可滑动地支撑灯组件。 以这种方式，壳体和灯组件中的每一个被构造和布置成允许灯组件沿着支撑轨道进入和离开壳体，当至少一个端盖结构从相应的一个 住房结束。
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公开(公告)号：US07033288B1
公开(公告)日：2006-04-25
申请号：US10785245
申请日：2004-02-23
申请人： Richard D. Edwards , Terry Wiens
发明人： Richard D. Edwards , Terry Wiens
IPC分类号： A63B57/00
CPC分类号： A63B57/50 , A63B2225/30
摘要： A multipurpose tool assembly to perform a divot repair operation, a coring operation and/or a green surface smoothing operation on a golf green. There is an elongate operating section having on one end a divot repair tool portion and on the other end a coring tool portion. The operating section can be connected to the handle in either of two configurations to perform either the divot repair operation or the coring operation.
摘要翻译： 一种多用途工具组件，用于对高尔夫球绿色执行纹理修复操作，取芯操作和/或绿色表面平滑操作。 有一个细长的操作部分，其一端具有一个修边工具部分，另一端有一个取芯工具部分。 操作部分可以以两种配置中的任意一种方式连接到手柄，以执行皮卡修复操作或取芯操作。
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公开(公告)号：US06207966B1
公开(公告)日：2001-03-27
申请号：US09205010
申请日：1998-12-04
IPC分类号： G01B1100
CPC分类号： G03F9/7076 , H01L23/544 , H01L2223/54426 , H01L2223/54453 , H01L2924/0002 , H01L2924/00
摘要： An alignment mark protection structure (95) is disclosed which is used to ensure an integrity of an alignment scheme for a substrate (50) which is to be subjected to lithographic processing. The alignment mark protection structure (95) comprises the substrate (50) and an alignment mark (52) associated with the substrate (50). The alignment mark (52) reflects an alignment light (208) which is then used to determine an optimum alignment between the substrate (50) and a lithographic mask (214). A cap (100) overlies the alignment mark (52) and is substantially transparent with respect to the alignment light (208). The cap (100) protects the underlying alignment mark (52) from lithographic process-induced damage during processing and thus reduces alignment light noise, thereby improving the alignment between a mask (214) and the substrate (50) and minimizing the registration error associated with overlying layers formed on the substrate (50).
摘要翻译： 公开了一种对准标记保护结构（95），其用于确保待经受光刻处理的基板（50）的对准方案的完整性。 对准标记保护结构（95）包括衬底（50）和与衬底（50）相关联的对准标记（52）。 对准标记（52）反射对准光（208），然后将对准光（208）用于确定基板（50）和光刻掩模（214）之间的最佳对准。 盖（100）覆盖对准标记（52），并且相对于对准光（208）基本上是透明的。 盖（100）在处理期间保护下面的对准标记（52）免受光刻处理引起的损坏，从而减少对准光噪声，从而改善掩模（214）和基板（50）之间的对准并使与之相关联的注册误差最小化 其中覆盖层形成在基底（50）上。
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公开(公告)号：US07731609B2
公开(公告)日：2010-06-08
申请号：US11740191
申请日：2007-04-25
申请人： Terry G. Wiens , Richard D. Edwards
发明人： Terry G. Wiens , Richard D. Edwards
IPC分类号： A63B57/00
CPC分类号： A63B57/50
摘要： A golf green repair tool with a depth limiting feature that has an earth engagement surface that has a forward slant to reposition the raised portion around a crater to the center region of the crater. A prong portion is adapted to be thrusted toward the center region of the crater and the repair tool is adapted to do minimal damage to the turf mat and provides a desirable method to repair craters left by impacting golf balls by properly repositioning of the displaced portions.
摘要翻译： 一种具有深度限制特征的高尔夫绿色修复工具，其具有接地接合表面，该接地表面具有向前倾斜以将突出部分围绕火山口重新定位到火山口的中心区域。 尖头部分适于被推向火山口的中心区域，并且修理工具适于对草坪垫做出最小的损伤，并且通过适当地重新定位移位部分来提供通过冲击高尔夫球来修复留下的凹坑的期望方法。
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