公开(公告)号：US20050197772A1

公开(公告)日：2005-09-08

申请号：US11062668

申请日：2005-02-22

申请人： Charles Archie ,  G. Banke ,  Matthew Sendelbach

发明人： Charles Archie ,  G. Banke ,  Matthew Sendelbach

IPC分类号： G03F7/20 ,  G06F15/00 ,  G06F19/00

CPC分类号： G01B21/045 ,  G03F7/70483 ,  G03F7/70616 ,  H01L22/12

摘要： Methods and related program product for assessing and optimizing metrology instruments by determining a total measurement uncertainty (TMU) based on precision and accuracy. The TMU is calculated based on a linear regression analysis and removing a reference measuring system uncertainty (URMS) from a net residual error. The TMU provides an objective and more accurate representation of whether a measurement system under test has an ability to sense true product variation. The invention also includes a method for determining an uncertainty of the TMU.

摘要翻译： 通过基于精度和精度确定总测量不确定度（TMU）来评估和优化计量仪器的方法和相关程序产品。 TMU是基于线性回归分析计算的，并从净残差中去除参考测量系统不确定度（U RMS）。 TMU提供了客观和更准确的表示，测试中的测量系统是否具有感测真实产品变化的能力。 本发明还包括一种用于确定TMU的不确定性的方法。

公开(公告)号：US06361402B1

公开(公告)日：2002-03-26

申请号：US09427492

申请日：1999-10-26

申请人： Donald F. Canaperi ,  Rangarajan Jagannathan ,  Mahadevaiyer Krishnan ,  Max G. Levy ,  Uma Satyendra ,  Matthew Sendelbach ,  James A. Tornello ,  William Wille

发明人： Donald F. Canaperi ,  Rangarajan Jagannathan ,  Mahadevaiyer Krishnan ,  Max G. Levy ,  Uma Satyendra ,  Matthew Sendelbach ,  James A. Tornello ,  William Wille

IPC分类号： B24B100

CPC分类号： B24B37/0056 ,  B24B37/044 ,  H01L21/31053 ,  H01L21/76819

摘要： A method for polishing an object having a layer of photoresist, the method, employing the following steps: a) applying a layer of slurry on an a layer of photoresist on an object having a first and a second side, the layer of photoresist on one of the first and second side, the object having a center axis perpendicular to the first and second side; b) contacting the layer of slurry with a pad having a first and second side, the first side of the pad exerting a force on the slurry.

摘要翻译： 一种用于抛光具有光致抗蚀剂层的物体的方法，该方法采用以下步骤：a）在具有第一和第二侧的物体上的一层光致抗蚀剂上施加一层浆料，一层光致抗蚀剂 所述第一和第二侧的物体具有垂直于第一和第二侧的中心轴; b）使浆料层与具有第一和第二侧的垫接触，垫的第一侧在浆料上施加力 。

公开(公告)号：US20050089775A1

公开(公告)日：2005-04-28

申请号：US10605751

申请日：2003-10-23

申请人： Charles Archie ,  Matthew Sendelbach

发明人： Charles Archie ,  Matthew Sendelbach

IPC分类号： G03F7/20 ,  H01L23/544 ,  G03C5/00 ,  G01B11/00 ,  H01L23/58 ,  H01L29/10

CPC分类号： G03F7/70641 ,  G03F7/70683 ,  H01L22/34

摘要： A scatterometry target is provided in which a plurality of parallel elongated features are placed, each having a length in a lengthwise direction. A plurality of stress-relief features are disposed at a plurality of positions along the length of each elongated feature.

摘要翻译： 提供散射测量目标，其中放置多个平行的细长特征，每个具有沿长度方向的长度。 多个应力消除特征被布置在沿着每个细长特征的长度的多个位置处。

公开(公告)号：US5880007A

公开(公告)日：1999-03-09

申请号：US940650

申请日：1997-09-30

申请人： Kathryn H. Varian ,  Dirk Tobben ,  Matthew Sendelbach

发明人： Kathryn H. Varian ,  Dirk Tobben ,  Matthew Sendelbach

IPC分类号： H01L21/302 ,  H01L21/3065 ,  H01L21/3105 ,  H01L21/3205 ,  H01L21/762 ,  H01L21/768 ,  H01L23/522 ,  H01L21/76

CPC分类号： H01L21/76229 ,  H01L21/31053

摘要： A substantially planar surface is produced from a non-conformal device layer formed over a complex topography, which includes narrow features with narrow gaps and wide features and wide gaps. A conformal layer is deposited over the non-conformal layer. The surface is then polished to expose the non-conformal layer over the wide features. An etch selective to the non-conformal layer is then used to substantially remove the non-conformal layer over the wide features. The conformal layer is then removed, exposing the non-conformal layer. The thickness of the non-conformal layer is now more uniform as compared to before. This enables the polish to produce a planar surface with reduced dishing in the wide spaces.

公开(公告)号：US20060184334A1

公开(公告)日：2006-08-17

申请号：US10906310

申请日：2005-02-14

申请人： Matthew Sendelbach

发明人： Matthew Sendelbach

IPC分类号： G01D1/00

CPC分类号： G01D1/02

摘要： Combining of reference measurement collections (RMCs) of at least three reference measurement systems into a weighted reference measurement collection (wRMC) is disclosed. Each RMC includes a plurality of corresponding sample measurements, each of which has a measurement value of the same sample. The invention plots corresponding measurement values to generate a plurality of data pairs for each possible RMC pairing. A best-fit line of the plurality of data pairs for each RMC pairing is then generated, and a residual for each data pair is calculated. A weight is then assigned to each sample measurement for each RMC based on the residuals associated with a respective RMC to which the sample measurement belongs, favoring a smaller residual more than a larger residual. A weighted reference measurement is then generated based on the weights, and the measurement value for the respective sample measurement for each RMC.

摘要翻译： 公开了将至少三个参考测量系统的参考测量集合（RMC）组合到加权参考测量集合（wRMC）中。 每个RMC包括多个对应的样本测量值，每个测量值具有相同样本的测量值。 本发明绘出相应的测量值以产生用于每个可能的RMC配对的多个数据对。 然后生成用于每个RMC配对的多个数据对的最佳拟合线，并且计算每个数据对的残差。 然后根据与样本测量所属的相应RMC相关联的残差，将权重分配给每个RMC的每个样本测量，有利于比较大残差更小的残差。 然后基于权重和每个RMC的各个样本测量的测量值生成加权参考测量。

公开(公告)号：US6001740A

公开(公告)日：1999-12-14

申请号：US187165

申请日：1998-11-06

申请人： Kathryn H. Varian ,  Dirk Tobben ,  Matthew Sendelbach

发明人： Kathryn H. Varian ,  Dirk Tobben ,  Matthew Sendelbach

IPC分类号： H01L21/302 ,  H01L21/3065 ,  H01L21/3105 ,  H01L21/3205 ,  H01L21/762 ,  H01L21/768 ,  H01L23/522 ,  H01L21/00

CPC分类号： H01L21/76229 ,  H01L21/31053

摘要： A substantially planar surface is produced from a non-conformal device layer formed over a complex topography, which includes narrow features with narrow gaps and wide features and wide gaps. A conformal layer is deposited over the non-conformal layer. The surface is then polished to expose the non-conformal layer over the wide features. An etch selective to the non-conformal layer is then used to substantially remove the non-conformal layer over the wide features. The conformal layer is then removed, exposing the non-conformal layer. The thickness of the non-conformal layer is now more uniform as compared to before. This enables the polish to produce a planar surface with reduced dishing in the wide spaces.

摘要翻译： 基本平坦的表面由复杂形貌上形成的非保形装置层产生，其包括具有窄间隙和宽特征以及宽间隙的窄特征。 保形层沉积在非保形层上。 然后抛光表面以在宽的特征上露出非共形层。 然后对非共形层进行选择性蚀刻，以便在宽的特征上基本上去除非共形层。 然后去除保形层，暴露非保形层。 与以前相比，非保形层的厚度现在更均匀。 这使得抛光剂能够在宽的空间中产生具有减小的凹陷的平坦表面。