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14 条记录 (耗时 0.016 秒)

    Apparatus and method for reducing contamination in a wafer transfer chamber
    2.
    发明授权
    Apparatus and method for reducing contamination in a wafer transfer chamber 有权

    公开(公告)号：US06595370B2

    公开(公告)日：2003-07-22

    申请号：US09727284

    申请日：2000-11-29

    申请人： Mu-Tsang Lin ,  Yu-Lun Lin ,  Yao-Fey Chuang

    发明人： Mu-Tsang Lin ,  Yu-Lun Lin ,  Yao-Fey Chuang

    IPC分类号： B07B100

    CPC分类号： B01D46/12 ,  C23C14/566 ,  C23C16/4401 ,  H01L21/67017

    摘要： A wafer transfer chamber, such as a load-lock chamber used in a cluster processing tool for semiconductor devices that has reduced particle contamination problem is provided. In the wafer transfer chamber, a particle filter is provided to shield or isolate a wafer cassette during a chamber pumping and venting process such that not only particle contamination on the wafers situated in the wafer cassette can be drastically reduced, but also the cycle time or time for pumping and venting the load-lock chamber can be significantly reduced since turbulent flow in the chamber interior can be tolerated when the wafers are isolated from such flow which carries contaminating particles.

    Temperature-sensing wafer position detection system and method
    4.
    发明申请
    Temperature-sensing wafer position detection system and method 失效
    温度感测晶片位置检测系统及方法

    公开(公告)号：US20050192699A1

    公开(公告)日：2005-09-01

    申请号：US10789969

    申请日：2004-02-26

    申请人： Mu-Tsang Lin ,  Kong-Hsin Teng ,  Tien-Wen Wang ,  Jen-Hom Chen

    发明人： Mu-Tsang Lin ,  Kong-Hsin Teng ,  Tien-Wen Wang ,  Jen-Hom Chen

    IPC分类号： G06F19/00 ,  H01L21/00

    CPC分类号： H01L21/67259

    摘要： A temperature-sensing wafer position detection system and method which uses temperature to determine whether a wafer is properly positioned on a bake plate prior to commencement of a photolithography baking process, for example. The system includes a bake plate and a temperature-sensing apparatus which engages the bake plate and measures the change in temperature (ΔT) of the bake plate over a specified time interval to determine whether the wafer is properly or improperly positioned on the support. In the event that the ΔT of the bake plate is at least as great as a given temperature change threshold value over a specified time interval, this indicates that the wafer is properly positioned for processing.

    摘要翻译： 一种温度感测晶片位置检测系统和方法，其例如使用温度来确定在光刻烘焙工艺开始之前晶片是否适当地定位在烘烤板上。 该系统包括烘烤板和温度感测装置，其接合烘烤板并且在指定的时间间隔内测量烘烤板的温度变化（DeltaT），以确定晶片是否适当地或不恰当地定位在支撑件上。 在烘烤板的DeltaT至少与指定时间间隔内的给定温度变化阈值一样大的情况下，这表明晶片被适当地定位用于处理。

    Exhaust adaptor and method for chamber de-gassing
    5.
    发明授权
    Exhaust adaptor and method for chamber de-gassing 失效
    排气适配器和室内除气方法

    公开(公告)号：US06920891B2

    公开(公告)日：2005-07-26

    申请号：US10264519

    申请日：2002-10-05

    申请人： Mu-Tsang Lin ,  Wie-Liang Tsai ,  Cherng-Chang Lee ,  Yen-Chan Lee ,  Chia-Hsin Liu

    发明人： Mu-Tsang Lin ,  Wie-Liang Tsai ,  Cherng-Chang Lee ,  Yen-Chan Lee ,  Chia-Hsin Liu

    IPC分类号： F16K43/00 ,  F16K51/02 ,  F16K51/00 ,  B08B9/08

    CPC分类号： F16K51/02 ,  F16K43/001 ,  Y10S438/905 ,  Y10T137/0419 ,  Y10T137/4245

    摘要： An exhaust adaptor and method which includes attachment of an exhaust bellow or conduit to a process chamber to facilitate vacuum-induced evacuation of residual toxic gases from the chamber during cleaning and/or maintenance of the chamber. A throttle valve of the chamber is first removed from a throttle valve housing, and one end of the exhaust adaptor is next attached to the throttle valve housing. An exhaust bellow or conduit is attached to the opposite end of the adaptor. As a down flow of air is directed into the open chamber, vacuum pressure is induced in the chamber interior through the exhaust bellow or conduit, the adaptor and the valve housing, respectively. Air disturbances in the chamber interior are thus eliminated, and toxic residual gases generated in the chamber interior are therefore incapable of diffusing to the exterior of the chamber.

    摘要翻译： 排气适配器和方法，其包括将排气波纹管或管道附接到处理室以便于在室的清洁和/或维护期间真空吸引来自腔室的残余有毒气体。 首先从节气门壳体移除腔室的节流阀，然后将排气适配器的一端连接到节流阀壳体。 排气波纹管或管道连接到适配器的相对端。 当空气的向下流动被引导到开放室中时，腔室内部通过排气波纹管或导管，适配器和阀壳体分别诱导真空压力。 因此，室内的空气干扰因此被消除，因此在室内产生的有毒残留气体不能扩散到室的外部。

    Virtual assistant for semiconductor tool maintenance
    6.
    发明申请
    Virtual assistant for semiconductor tool maintenance 审中-公开
    虚拟助手半导体工具维护

    公开(公告)号：US20050004780A1

    公开(公告)日：2005-01-06

    申请号：US10613139

    申请日：2003-07-03

    申请人： Mu-Tsang Lin ,  Wen-Chang Kuo ,  Tien-Der Chiang ,  Chih-Chung Chiang

    发明人： Mu-Tsang Lin ,  Wen-Chang Kuo ,  Tien-Der Chiang ,  Chih-Chung Chiang

    IPC分类号： G05B19/418 ,  G06F19/00 ,  G06N5/04

    CPC分类号： G06N5/04 ,  G05B19/4184 ,  G05B2219/32007 ,  G05B2219/32214 ,  G05B2219/32226 ,  G05B2219/32408 ,  G05B2219/45031 ,  Y02P90/14 ,  Y02P90/86

    摘要： The present disclosure provides a smart virtual assistant system to assist in the repair and maintenance of semiconductor tools The virtual assistant system includes an interface for receiving a tool alarm from a specified semiconductor tool and a database including a table for providing information as to what can and cannot be done to the specified semiconductor tool. The virtual assistant system also includes two processing subsystems, one including instructions for deducting tool alarm information from the tool alarm and the other for receiving the tool alarm information, perusing the database, and identifying one or more causes associated with the tool alarm information.

    摘要翻译： 本公开提供了一种智能虚拟助理系统，用于辅助半导体工具的维修和维护。虚拟辅助系统包括用于从指定的半导体工具接收工具报警的接口和包括用于提供关于什么能够和 不能对指定的半导体工具进行操作。 虚拟助理系统还包括两个处理子系统，一个包括用于从工具报警中扣除工具报警信息的指令，另一个用于接收工具报警信息，查看数据库，以及识别与工具报警信息相关联的一个或多个原因。

    Noise filter for backside helium signal
    7.
    发明授权
    Noise filter for backside helium signal 失效

    公开(公告)号：US06778875B2

    公开(公告)日：2004-08-17

    申请号：US10224754

    申请日：2002-08-21

    申请人： Mu-Tsang Lin ,  Zhih-Lu Juang ,  Tung-Mao Lee

    发明人： Mu-Tsang Lin ,  Zhih-Lu Juang ,  Tung-Mao Lee

    IPC分类号： G06F1900

    CPC分类号： G05B23/027 ,  G05B11/42 ,  G05B23/0235

    摘要： A system using backside helium in the processing of wafers in the manufacturing of semiconductor products can cause alarms that can interrupt the manufacturing of the wafers and create damaged wafers. A PID controller responds to the flow of helium gas to generate control signals for operating several algorithms. A filter connected to the output of the PID controller removes unwanted and dangerous noise spikes that have in the past caused a condition called backside alarm. Noise spikes on the dc voltages, the helium supply pressure, the pressure set point, the pressure reading and the non-optimization of the PID controller can cause the alarm.

    METHODS OF DETECTING AN ABNORMAL OPERATION OF PROCESSING APPARATUS AND SYSTEMS THEREOF
    10.
    发明申请
    METHODS OF DETECTING AN ABNORMAL OPERATION OF PROCESSING APPARATUS AND SYSTEMS THEREOF 审中-公开
    检测加工装置及其系统异常运行的方法

    公开(公告)号：US20080002832A1

    公开(公告)日：2008-01-03

    申请号：US11470469

    申请日：2006-09-06

    申请人： Jain-Hong Chen ,  Mu-Tsang Lin ,  W. L. Huang

    发明人： Jain-Hong Chen ,  Mu-Tsang Lin ,  W. L. Huang

    IPC分类号： H04R29/00

    CPC分类号： H01L21/67288 ,  G01H3/08 ,  H04R29/001

    摘要： A method for detecting abnormal operation of a manufacturing process, comprising the steps of: (a) detecting at least one acoustic signal created from a processing apparatus; (b) transforming the acoustic signal into a frequency spectrum; (c) comparing the frequency spectrum with a pre-determined frequency spectrum, and (d) generating a signal indicating an abnormal operation of the processing apparatus, if an amplitude of at least one first frequency of the frequency spectrum is substantially different from an amplitude of the same frequency of the pre-determined frequency spectrum.

    摘要翻译： 一种用于检测制造过程的异常操作的方法，包括以下步骤：（a）检测从处理设备产生的至少一个声信号; （b）将声信号变换成频谱; （c）将所述频谱与预定频谱进行比较，以及（d）产生指示所述处理装置的异常操作的信号，如果所述频谱的至少一个第一频率的振幅与振幅 具有相同频率的预定频谱。