公开(公告)号：US6104471A

公开(公告)日：2000-08-15

申请号：US933949

申请日：1997-09-19

Applicant: Toshinobu Morioka ,  Muneyasu Yokota

Inventor： Toshinobu Morioka ,  Muneyasu Yokota

IPC: H01L21/027 ,  G03F7/20 ,  G03B27/42 ,  G01B11/00

CPC classification number: G03F7/70216 ,  G03F7/70425

Abstract: When alignment marks, which have been previously formed on a substrate corresponding to each of two orthogonal axial directions, are detected by a microscope, a main control unit detects positions and numbers of the respective marks, and calculates stretching degrees of the substrate in the two orthogonal axial directions respectively on the basis of information on the detected positions of specified marks and information on designed positions of the specified marks. The main control unit determines a mean value of the stretching degrees by weighting each of the calculated stretching degrees in the two orthogonal axial directions in accordance with the detected numbers of the marks corresponding to each of the two orthogonal axial directions so that the determined weighted mean value of the stretching degrees is set as a magnification correction value. A magnification controller corrects, through a magnification-adjusting mechanism, a magnification of a projection optical system on the basis of the set magnification correction value. When stretching of the substrate takes place, the pattern continuity and the overlay accuracy in an intended privileged direction can be improved.

Abstract translation: 当通过显微镜检测预先形成在对应于两个正交的轴向方向上的基板上的对准标记时，主控制单元检测各个标记的位置和数量，并且计算两个基板中的基板的拉伸度 基于关于指定标记的检测位置的信息和关于指定标记的设计位置的信息，分别进行正交轴向。 主控制单元根据检测到的与两个正交轴方向中的每一个相对应的标记的数量，对两个正交轴方向上的计算出的拉伸度进行加权，来确定拉伸度的平均值，使得确定的加权平均 将拉伸度的值设定为倍率校正值。 放大率控制器根据设定的倍率校正值，通过放大调整机构校正投影光学系统的放大率。 当发生基板的拉伸时，可以提高在预期的特权方向上的图案连续性和覆盖精度。

公开(公告)号：US5617211A

公开(公告)日：1997-04-01

申请号：US515783

申请日：1995-08-16

Applicant: Kei Nara ,  Toshio Matsuura ,  Muneyasu Yokota ,  Yukio Kakizaki ,  Yoshio Fukami ,  Seiji Miyazaki ,  Tsuyoshi Narabe

Inventor： Kei Nara ,  Toshio Matsuura ,  Muneyasu Yokota ,  Yukio Kakizaki ,  Yoshio Fukami ,  Seiji Miyazaki ,  Tsuyoshi Narabe

IPC: G03F7/20 ,  G03F9/00 ,  G01B11/00 ,  G01U21/86 ,  G06K7/015 ,  G03B27/52

CPC classification number: G03F7/70241 ,  G03F7/70275 ,  G03F7/70358 ,  G03F9/70

Abstract: This invention relates to an exposure apparatus for synchronously scanning a mask and a photosensitive substrate with respect to a plurality of projection optical systems, thereby properly transferring an entire pattern area on the mask onto the photosensitive substrate. A plurality of sets of mask-side reference marks and substrate-side reference marks are arranged at positions corresponding to each other on the mask surface and the photosensitive substrate surface and at least at two positions conjugate with the plurality of projection optical systems. The displacement amount between an image of a mask-side reference mark or a substrate-side reference mark formed on the corresponding substrate-side reference mark or mask-side reference mark through the projection optical system and the position of the substrate-side reference mark and the mask-side reference mark is measured. The imaging characteristics of the plurality of projection optical systems are corrected in accordance with the displacement amount.

Abstract translation: 本发明涉及一种用于相对于多个投影光学系统同时扫描掩模和感光基板的曝光装置，从而将掩模上的整个图案区域适当地转印到感光基板上。 多个掩模侧参考标记和基板侧参考标记组被布置在掩模表面和感光基板表面上并且至少在与多个投影光学系统共轭的两个位置处彼此对应的位置处。 掩模侧基准标记的图像或通过投影光学系统形成在相应的基板侧参考标记或掩模侧参考标记上的基板侧参考标记之间的位移量和基板侧参考标记的位置 并且测量掩模侧参考标记。 根据位移量校正多个投影光学系统的成像特性。

公开(公告)号：US5777722A

公开(公告)日：1998-07-07

申请号：US654382

申请日：1996-05-28

Applicant: Seiji Miyazaki ,  Tsuyoshi Narabe ,  Kei Nara ,  Tomohide Hamada ,  Kazuaki Saiki ,  Hideji Goto ,  Muneyasu Yokota

Inventor： Seiji Miyazaki ,  Tsuyoshi Narabe ,  Kei Nara ,  Tomohide Hamada ,  Kazuaki Saiki ,  Hideji Goto ,  Muneyasu Yokota

IPC: G03F7/20 ,  G03F9/00 ,  G03B27/42 ,  G03B27/32 ,  G01B11/00

CPC classification number: G03F7/70275 ,  G03F7/70358 ,  G03F9/70

Abstract: A scanning exposure apparatus is arranged to illuminate a mask, to project an image of the mask through a projection optical system onto a photosensitive substrate, and to move the mask and the photosensitive substrate relative to the projection optical system, thereby effecting exposure of an entire surface of the mask on the photosensitive substrate, and the exposure apparatus comprises a position detector which detects a relative positional relation between the mask and the photosensitive substrate; a memory which stores positional information obtained by the position detector; a position correcting device which corrects the relative positional relation between the mask and the photosensitive substrate, based on the positional information read out from the memory device; and a controller which makes the position detector detect the relative positional relation between the mask and the photosensitive substrate while the mask and the photosensitive substrate are carried past a projection region of the projection optical system to an exposure start position, and makes the position correcting device correct the relative positional relation between the mask and the photosensitive substrate, based on the positional information read out from the memory, while the mask and the photosensitive substrate are stopped at the exposure start position and/or during the exposure.

Abstract translation: 扫描曝光装置被布置为照亮掩模，通过投影光学系统将光掩模的图像投射到感光基板上，并且使掩模和感光基板相对于投影光学系统移动，从而实现整个曝光 感光基板上的掩模表面，曝光装置包括检测掩模和感光基板之间的相对位置关系的位置检测器; 存储器，其存储由所述位置检测器获取的位置信息; 基于从存储装置读出的位置信息来校正掩模和感光基板之间的相对位置关系的位置校正装置; 以及控制器，其使得位置检测器在将掩模和感光基板通过投影光学系统的投影区域到曝光开始位置时检测掩模和感光基板之间的相对位置关系，并使位置校正装置 基于从存储器读出的位置信息，掩模和感光基板在曝光开始位置和/或曝光期间停止时，校正掩模和感光基板之间的相对位置关系。

公开(公告)号：US5442418A

公开(公告)日：1995-08-15

申请号：US318521

申请日：1994-10-05

Applicant: Masaichi Murakami ,  Muneyasu Yokota ,  Toshio Matsuura ,  Atsuyuki Aoki

Inventor： Masaichi Murakami ,  Muneyasu Yokota ,  Toshio Matsuura ,  Atsuyuki Aoki

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  G03B27/42

CPC classification number: G03F7/70475 ,  G03F7/70241 ,  G03F7/706 ,  G03F9/70

Abstract: Prior to exposures, the imaging characteristics of a projection optical system to be used are determined by measuring the positions of plural projection points (evaluation points) within the projection area, on a photosensitive substrate, of the projection optical system. Then the positional aberrations between the evaluation points are determined in the area of image superposition or jointing, and correcting parameters are determined so as to minimize at least the component of the aberrations in a direction, perpendicular to an extending direction patterns of a reticle. The reticle or the photosensitive substrate is rotated or shifted according to thus determined correcting parameters. This exposure method achieves the superposition or jointing of patterns, or the superposition of the jointed parts thereof, in optimum manner, according to the structure (directionality) of the patterns or the imaging characteristics of the projection optical system employed.

Abstract translation: 在曝光之前，通过测量投影光学系统的感光基板上的投影区域内的多个投影点（评价点）的位置来确定投影光学系统的成像特性。 然后，在图像叠加或接合的区域中确定评估点之间的位置像差，并且确定校正参数，使得至少垂直于光罩的延伸方向图案的方向上的像差的分量至少最小化。 掩模版或感光基片根据如此确定的校正参数旋转或移动。 根据所使用的投影光学系统的图案的结构（方向性）或成像特性，该曝光方法以最佳方式实现图案的叠合或连接，或其连接部分的叠合。

公开(公告)号：US5298761A

公开(公告)日：1994-03-29

申请号：US899549

申请日：1992-06-16

Applicant: Atsuyuki Aoki ,  Muneyasu Yokota

Inventor： Atsuyuki Aoki ,  Muneyasu Yokota

IPC: G02F1/1362 ,  G03F7/20 ,  G03F9/00 ,  G01N21/86 ,  G01B11/00

CPC classification number: G03F7/708 ,  G03F7/70475 ,  G03F9/70 ,  G02F2001/13625

Abstract: In the manufacture of a device having a relatively large area, e.g., a liquid crystal device by a lithographic technique, using at least one of a plurality of original images and defining an exposed pattern by each original image as an individual subdivision area, the position of a substrate is changed relatively upon exposure of every subdivision area to expose on the substrate a composite exposed pattern of a relatively large area composed of the plurality of abutting and combined subdivision areas. When aligning each of the original images with the substrate in accordance with predetermined target position information, the amounts of relative deviation at the abutting portions of the subdivision areas (i.e., stitching errors) are preliminarily determined and compensating values tending to reduce each of the stitching errors to less than a given tolerance value are added to the target position information, thereby effecting the alignment. Thus, the stitching accuracy is improved for the composite pattern on the whole.

Abstract translation: 在通过光刻技术制造具有相对较大面积的装置（例如液晶装置）时，使用多个原始图像中的至少一个并且通过每个原始图像将曝光图案定义为单独的细分区域，该位置 在每个细分区域的曝光时相对地改变基板，以在基板上露出由多个邻接和组合的细分区域组成的相对较大面积的复合曝光图案。 当根据预定的目标位置信息将每个原始图像与基板对准时，预先确定细分区域的邻接部分处的相对偏差量（即，拼接误差），并且趋向于减少每个缝合的补偿值 将小于给定公差值的误差加到目标位置信息中，从而实现对准。 因此，整体上复合图案的缝合精度得到改善。