公开(公告)号：US5777722A

公开(公告)日：1998-07-07

申请号：US654382

申请日：1996-05-28

申请人： Seiji Miyazaki ,  Tsuyoshi Narabe ,  Kei Nara ,  Tomohide Hamada ,  Kazuaki Saiki ,  Hideji Goto ,  Muneyasu Yokota

发明人： Seiji Miyazaki ,  Tsuyoshi Narabe ,  Kei Nara ,  Tomohide Hamada ,  Kazuaki Saiki ,  Hideji Goto ,  Muneyasu Yokota

IPC分类号： G03F7/20 ,  G03F9/00 ,  G03B27/42 ,  G03B27/32 ,  G01B11/00

CPC分类号： G03F7/70275 ,  G03F7/70358 ,  G03F9/70

摘要： A scanning exposure apparatus is arranged to illuminate a mask, to project an image of the mask through a projection optical system onto a photosensitive substrate, and to move the mask and the photosensitive substrate relative to the projection optical system, thereby effecting exposure of an entire surface of the mask on the photosensitive substrate, and the exposure apparatus comprises a position detector which detects a relative positional relation between the mask and the photosensitive substrate; a memory which stores positional information obtained by the position detector; a position correcting device which corrects the relative positional relation between the mask and the photosensitive substrate, based on the positional information read out from the memory device; and a controller which makes the position detector detect the relative positional relation between the mask and the photosensitive substrate while the mask and the photosensitive substrate are carried past a projection region of the projection optical system to an exposure start position, and makes the position correcting device correct the relative positional relation between the mask and the photosensitive substrate, based on the positional information read out from the memory, while the mask and the photosensitive substrate are stopped at the exposure start position and/or during the exposure.

摘要翻译： 扫描曝光装置被布置为照亮掩模，通过投影光学系统将光掩模的图像投射到感光基板上，并且使掩模和感光基板相对于投影光学系统移动，从而实现整个曝光 感光基板上的掩模表面，曝光装置包括检测掩模和感光基板之间的相对位置关系的位置检测器; 存储器，其存储由所述位置检测器获取的位置信息; 基于从存储装置读出的位置信息来校正掩模和感光基板之间的相对位置关系的位置校正装置; 以及控制器，其使得位置检测器在将掩模和感光基板通过投影光学系统的投影区域到曝光开始位置时检测掩模和感光基板之间的相对位置关系，并使位置校正装置 基于从存储器读出的位置信息，掩模和感光基板在曝光开始位置和/或曝光期间停止时，校正掩模和感光基板之间的相对位置关系。

公开(公告)号：US5617211A

公开(公告)日：1997-04-01

申请号：US515783

申请日：1995-08-16

申请人： Kei Nara ,  Toshio Matsuura ,  Muneyasu Yokota ,  Yukio Kakizaki ,  Yoshio Fukami ,  Seiji Miyazaki ,  Tsuyoshi Narabe

发明人： Kei Nara ,  Toshio Matsuura ,  Muneyasu Yokota ,  Yukio Kakizaki ,  Yoshio Fukami ,  Seiji Miyazaki ,  Tsuyoshi Narabe

IPC分类号： G03F7/20 ,  G03F9/00 ,  G01B11/00 ,  G01U21/86 ,  G06K7/015 ,  G03B27/52

CPC分类号： G03F7/70241 ,  G03F7/70275 ,  G03F7/70358 ,  G03F9/70

摘要： This invention relates to an exposure apparatus for synchronously scanning a mask and a photosensitive substrate with respect to a plurality of projection optical systems, thereby properly transferring an entire pattern area on the mask onto the photosensitive substrate. A plurality of sets of mask-side reference marks and substrate-side reference marks are arranged at positions corresponding to each other on the mask surface and the photosensitive substrate surface and at least at two positions conjugate with the plurality of projection optical systems. The displacement amount between an image of a mask-side reference mark or a substrate-side reference mark formed on the corresponding substrate-side reference mark or mask-side reference mark through the projection optical system and the position of the substrate-side reference mark and the mask-side reference mark is measured. The imaging characteristics of the plurality of projection optical systems are corrected in accordance with the displacement amount.

摘要翻译： 本发明涉及一种用于相对于多个投影光学系统同时扫描掩模和感光基板的曝光装置，从而将掩模上的整个图案区域适当地转印到感光基板上。 多个掩模侧参考标记和基板侧参考标记组被布置在掩模表面和感光基板表面上并且至少在与多个投影光学系统共轭的两个位置处彼此对应的位置处。 掩模侧基准标记的图像或通过投影光学系统形成在相应的基板侧参考标记或掩模侧参考标记上的基板侧参考标记之间的位移量和基板侧参考标记的位置 并且测量掩模侧参考标记。 根据位移量校正多个投影光学系统的成像特性。

公开(公告)号：US5798822A

公开(公告)日：1998-08-25

申请号：US950964

申请日：1997-10-15

申请人： Seiji Miyazaki ,  Hiroshi Shirasu ,  Kazuaki Saiki ,  Tsuyoshi Narabe

发明人： Seiji Miyazaki ,  Hiroshi Shirasu ,  Kazuaki Saiki ,  Tsuyoshi Narabe

IPC分类号： G03F7/207 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G03B27/42 ,  G01B11/00

CPC分类号： G03F7/70691 ,  G03F7/70358 ,  G03F9/7026

摘要： A pair of reference plates is so arranged as to have a predetermined positional relationship on a carriage that integrally holds a mask and a photosensitive substrate such that the mask and the photosensitive substrate oppose each other on two sides of a projecting optical system. By periodically detecting the positional relationship between the reference plates in the optical axis direction, a variation with time occurring in the detection characteristics of position detecting devices is detected. Both stable image formation characteristics and a high throughput are realized by correcting a driving signal to be supplied to a driving device in accordance with the detected variation.

摘要翻译： 一对参考板被布置为在一体地保持掩模和感光基板的托架上具有预定的位置关系，使得掩模和感光基板在投影光学系统的两侧彼此相对。 通过周期性地检测基准板在光轴方向上的位置关系，检测位置检测装置的检测特性中随时间的变化。 通过根据检测到的变化来校正要提供给驱动装置的驱动信号，实现稳定的图像形成特性和高吞吐量。

公开(公告)号：US5760881A

公开(公告)日：1998-06-02

申请号：US540458

申请日：1995-10-10

申请人： Seiji Miyazaki ,  Kei Nara ,  Hiroshi Shirasu ,  Tsuyoshi Narabe

发明人： Seiji Miyazaki ,  Kei Nara ,  Hiroshi Shirasu ,  Tsuyoshi Narabe

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G03B27/72

CPC分类号： G03F7/70066 ,  G03F7/70216 ,  G03F7/70358 ,  G03F9/70

摘要： An exposure apparatus, having an illumination optical system for radiating a light beam from a light source to a pattern area of a mask for transferring the image of the pattern area onto a photosensitive substrate by the light beam passing through the mask, is provided with plural sets of a first reference mark and a second reference mark arranged on the mask and the photosensitive substrate at positions corresponding to each other, and a light-shielding device for shielding the light beams radiated toward the second reference marks, whereby it is possible to re-use the second reference marks in a post-process by preventing the first reference marks on the mask from being superposed on the second reference marks on the photosensitive substrate or from being transferred onto a part near the second reference marks.

摘要翻译： 一种曝光装置，具有照明光学系统，用于将来自光源的光束照射到掩模的图案区域，用于通过通过掩模的光束将图案区域的图像转印到感光基板上，具有多个 设置在彼此对应的位置处的掩模和感光基板上的第一参考标记和第二参考标记的集合，以及用于屏蔽朝向第二参考标记辐射的光束的遮光装置，由此可以重新 - 通过防止掩模上的第一参考标记叠加在感光基板上的第二参考标记上或者被转印到靠近第二参考标记的部分上，从而在后处理中使用第二参考标记。

公开(公告)号：USRE37762E1

公开(公告)日：2002-06-25

申请号：US09247857

申请日：1999-02-11

申请人： Seiji Miyazaki ,  Kei Nara ,  Masami Seki ,  Masamitsu Yanagihara ,  Tomohide Hamada

发明人： Seiji Miyazaki ,  Kei Nara ,  Masami Seki ,  Masamitsu Yanagihara ,  Tomohide Hamada

IPC分类号： G03B2742

CPC分类号： G03F9/7003 ,  G03F7/70275 ,  G03F7/70358 ,  G03F7/70475 ,  G03F7/70791

摘要： The present invention is directed to scanning exposure apparatus and exposure method to achieve simultaneous projection of images of plural regions on a mask onto a photosensitive substrate with correcting an orthogonality error of a pattern on the mask or photosensitive substrate. If the pattern on the mask or photosensitive substrate has an orthogonality error causing a deviation of a certain angle in a first direction perpendicular to a scanning direction as it goes in the scanning direction, the mask and the photosensitive substrate are rotated relative to each other in the plane thereof to align one coordinate axis in a coordinate system of each pattern with the first direction. Then a relative displacement is given by an amount of the orthogonality error between positions of images projected through a first optical system and positions of images projected through a second optical system, and relative positions of the mask and the photosensitive substrate are continuously changed by the amount of the orthogonality error in the first direction in accordance with the position of the mask or photosensitive substrate in the scanning direction.

摘要翻译： 本发明涉及扫描曝光装置和曝光方法，以通过校正掩模或感光基底上的图案的正交性误差来将掩模上的多个区域的图像同时投影到感光基板上。 如果掩模或感光基板上的图案具有在沿着扫描方向进入垂直于扫描方向的第一方向上产生一定角度的偏差的正交性误差，则掩模和感光基板相对于彼此旋转 其平面将每个图案的坐标系中的一个坐标轴与第一方向对齐。 然后通过第一光学系统投影的图像的位置和通过第二光学系统投影的图像的位置之间的正交性误差的量给出相对位移，并且掩模和感光基板的相对位置连续地改变量 根据掩模或感光基板在扫描方向上的位置，在第一方向上的正交性误差。

公开(公告)号：US5625436A

公开(公告)日：1997-04-29

申请号：US689691

申请日：1996-08-13

申请人： Masamitsu Yanagihara ,  Susumu Mori ,  Tsuyoshi Naraki ,  Masami Seki ,  Seiji Miyazaki ,  Tsuyoshi Narabe ,  Hiroshi Chiba

发明人： Masamitsu Yanagihara ,  Susumu Mori ,  Tsuyoshi Naraki ,  Masami Seki ,  Seiji Miyazaki ,  Tsuyoshi Narabe ,  Hiroshi Chiba

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC分类号： G03F7/70275 ,  G03F7/70241 ,  G03F7/70258 ,  G03F7/70358 ,  G03F7/70858 ,  G03F7/70883 ,  G03F9/70

摘要： In a scanning type exposure apparatus for exposing an entire surface of a pattern region on a mask to a substrate by scanning the mask and the substrate with respect to a projection optical system in a predetermined direction with a speed ratio in accordance with a magnification of the projection optical system, there are provided a plurality of illumination optical systems for illuminating respective areas of the pattern region on the mask with respective light fluxes from respective light source; a plurality of projection optical systems arranged so as to correspond to the respective illumination optical systems, the projection optical systems projecting respective images of the areas illuminated by the respective illumination optical systems onto respective projection areas on the substrate; a memory device for obtaining and storing a change of shape of the substrate; a magnification changing device for changing a magnification of at least one of the projection optical systems in accordance with the change of shape of the substrate; and an imaging position changing device for changing the position of said image projected via the at least one projection optical systems in accordance with the change in magnification.

摘要翻译： 在扫描型曝光装置中，通过以与所述掩模和所述基板相对于所述投影光学系统的倍率相对于投影光学系统沿预定方向扫描所述掩模上的图案区域的整个表面， 提供了多个照明光学系统，用于利用来自各个光源的各个光束照射掩模上的图案区域的各个区域; 多个投影光学系统被布置为对应于各个照明光学系统，所述投影光学系统将由各个照明光学系统照射的区域的各个图像投射到所述基板上的相应的投影区域上; 用于获取和存储基板的形状变化的存储装置; 放大率改变装置，用于根据基板的形状变化来改变至少一个投影光学系统的放大率; 以及成像位置改变装置，用于根据放大率的变化改变经由至少一个投影光学系统投影的所述图像的位置。

公开(公告)号：US5623343A

公开(公告)日：1997-04-22

申请号：US548402

申请日：1995-10-26

申请人： Kei Nara ,  Masamitsu Yanagihara ,  Seiji Miyazaki

发明人： Kei Nara ,  Masamitsu Yanagihara ,  Seiji Miyazaki

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G01B11/00

CPC分类号： G03F7/70225 ,  G03F7/70275 ,  G03F7/70358 ,  G03F9/70

摘要： In the first step of an exposure method of the present invention, an alignment optical system is arranged to oppose one of a first mask mark on a photomask and a first substrate mark on a photosensitive substrate, thereby detecting a first deviation amount between the position of the first mask mark and that of the first substrate mark. In the second step, the alignment optical system is arranged to oppose one of a second mask mark on the photomask and a second substrate mark on the photosensitive substrate, thereby detecting a second deviation mark between the position of the second mask mark and that of the second substrate mark. In the third step, correction values for minimizing the first and second deviation amounts are calculated. In the fourth step, the relative positional relationship between the image of an original pattern on the photomask and a shot area on the photosensitive substrate is adjusted on the basis of a correction value. In the fifth step, at least one of the first and second steps is executed subsequent to the fourth step to newly detect the first or second deviation amount. In the sixth step, the first to fifth steps are repeatedly executed until one of the first and second deviation amounts detected in the fifth step falls within a predetermined allowance.

摘要翻译： 在本发明的曝光方法的第一步骤中，对准光学系统被布置为与光掩模上的第一掩模标记和感光基板上的第一基板标记中的一个相对，从而检测在光敏基板的位置之间的第一偏移量 第一个掩码标记和第一个掩码标记。 在第二步骤中，对准光学系统布置成与光掩模上的第二掩码标记和感光基板上的第二基板标记之一相对，从而检测第二掩模标记的位置与第二掩模标记的位置之间的第二偏移标记 第二基板标记。 在第三步骤中，计算用于使第一和第二偏移量最小化的校正值。 在第四步骤中，基于校正值来调整光掩模上的原始图案的图像与感光基板上的照射区域之间的相对位置关系。 在第五步骤中，在第四步骤之后执行第一和第二步骤中的至少一个，以重新检测第一或第二偏差量。 在第六步骤中，重复执行第一至第五步骤，直到在第五步骤中检测到的第一和第二偏移量之一落入预定余量之内。

公开(公告)号：US6141082A

公开(公告)日：2000-10-31

申请号：US172144

申请日：1998-10-14

申请人： Kei Nara ,  Seiji Miyazaki ,  Hideki Koitabashi

发明人： Kei Nara ,  Seiji Miyazaki ,  Hideki Koitabashi

IPC分类号： G03F9/00 ,  G03B27/52

CPC分类号： G03F9/7011 ,  G03F9/00 ,  G03F9/7003 ,  G03F9/7076 ,  G03F9/7088 ,  Y10S438/975

摘要： In order to provide a search alignment method capable of high-speed alignment without a relative movement between an alignment system and a substrate, an alignment mark is constituted by a plurality of element marks having shapes different from each other, the plurality of element marks are provided in such a manner that each two of them has a gap a little shorter than the size of the field of view of the alignment system therebetween, and if even one of the element marks constituting the alignment mark comes into the field of view of the alignment system, said element mark is identified out of all of said element marks, whereby the position of the entire alignment is measured from the position of said one element mark. Therefore, if the alignment mark is moved in a range wider than the field of view of the alignment system, it is possible to detect the position of the alignment mark by one measurement.

摘要翻译： 为了提供能够在对准系统和基板之间没有相对移动的情况下进行高速对准的搜索对准方法，由具有彼此不同的形状的多个元素标记构成对准标记，多个元素标记 设置成使得它们中的每一个具有比它们之间的对准系统的视场尺寸稍短的间隙，并且如果构成对准标记的元件标记中的一个进入到 对准系统中，从所有元件标记中识别所述元件标记，由此从所述一个元件标记的位置测量整个对准的位置。 因此，如果对准标记在比对准系统的视野宽的范围内移动，则可以通过一次测量来检测对准标记的位置。

公开(公告)号：US5657130A

公开(公告)日：1997-08-12

申请号：US408714

申请日：1995-03-22

申请人： Hiroshi Shirasu ,  Kazuaki Saiki ,  Seiji Miyazaki ,  Susumu Mori

发明人： Hiroshi Shirasu ,  Kazuaki Saiki ,  Seiji Miyazaki ,  Susumu Mori

IPC分类号： G03F7/20 ,  G03F7/207 ,  G03F9/00 ,  H01L21/027 ,  G01B11/00

CPC分类号： G03F7/70216 ,  G03F7/70275 ,  G03F7/70358 ,  G03F7/70791 ,  G03F9/70

摘要： In an exposure apparatus and method, a mask and a substrate are scanned in synchronism with each other so that the pattern of the mask may be transferred onto the substrate through a projection optical system. First beams of light are irradiated to least two locations on the mask spaced apart in a direction intersecting the scanning direction of the mask. The reflected light thereof is received, and the positions of the points on the mask to which the beam of light has been irradiated are detected in the direction of the optical axis of the projection optical system. In addition, second beams of light are irradiated to at least two locations on the substrate spaced apart in the scanning direction, and the reflected light thereof is received. The positions of the points on the substrate to which the second beam of light has been irradiated are also detected in the direction of the optical axis of the projection optical system are detected. The posture of at least one of the mask and the substrate is adjusted on the basis of the positions detected with the first and second beams.

摘要翻译： 在曝光装置和方法中，掩模和基板彼此同步地扫描，使得掩模的图案可以通过投影光学系统被转印到基板上。 第一光束照射在与掩模的扫描方向相交的方向间隔开的掩模上的至少两个位置。 在投影光学系统的光轴的方向上检测其反射光，并且在光束照射的掩模上的点的位置被检测。 此外，第二光束照射到沿扫描方向间隔开的基板上的至少两个位置，并且其反射光被接收。 检测到在投影光学系统的光轴的方向上检测到已经照射第二光束的基板上的点的位置。 基于由第一和第二光束检测到的位置来调整掩模和基板中的至少一个的姿势。

公开(公告)号：US20080266539A1

公开(公告)日：2008-10-30

申请号：US12213730

申请日：2008-06-24

申请人： Kei Nara ,  Seiji Miyazaki ,  Yasuo Aoki

发明人： Kei Nara ,  Seiji Miyazaki ,  Yasuo Aoki

IPC分类号： G03B27/42 ,  G03B27/58

CPC分类号： G03F7/70991 ,  G03F7/70525

摘要： A device production system includes a substrate transport section which transports a substrate; a plurality of exposure sections each of which is capable of exposing the substrate; and a controller which cooperatively controls the substrate transport section and the plurality of exposure sections so that operation states of the plurality of exposure sections are in desired states. Accordingly, it is possible to improve the efficiency both in using the substrate and in the device production.

摘要翻译： 一种装置生产系统，包括：基板输送部，其输送基板; 多个曝光部，其能够使基板曝光; 以及控制器，其协作地控制所述基板输送部和所述多个曝光部，使得所述多个曝光部的操作状态处于期望状态。 因此，可以提高使用基板和装置制造中的效率。