公开(公告)号：US5617211A

公开(公告)日：1997-04-01

申请号：US515783

申请日：1995-08-16

申请人： Kei Nara ,  Toshio Matsuura ,  Muneyasu Yokota ,  Yukio Kakizaki ,  Yoshio Fukami ,  Seiji Miyazaki ,  Tsuyoshi Narabe

发明人： Kei Nara ,  Toshio Matsuura ,  Muneyasu Yokota ,  Yukio Kakizaki ,  Yoshio Fukami ,  Seiji Miyazaki ,  Tsuyoshi Narabe

IPC分类号： G03F7/20 ,  G03F9/00 ,  G01B11/00 ,  G01U21/86 ,  G06K7/015 ,  G03B27/52

CPC分类号： G03F7/70241 ,  G03F7/70275 ,  G03F7/70358 ,  G03F9/70

摘要： This invention relates to an exposure apparatus for synchronously scanning a mask and a photosensitive substrate with respect to a plurality of projection optical systems, thereby properly transferring an entire pattern area on the mask onto the photosensitive substrate. A plurality of sets of mask-side reference marks and substrate-side reference marks are arranged at positions corresponding to each other on the mask surface and the photosensitive substrate surface and at least at two positions conjugate with the plurality of projection optical systems. The displacement amount between an image of a mask-side reference mark or a substrate-side reference mark formed on the corresponding substrate-side reference mark or mask-side reference mark through the projection optical system and the position of the substrate-side reference mark and the mask-side reference mark is measured. The imaging characteristics of the plurality of projection optical systems are corrected in accordance with the displacement amount.

摘要翻译： 本发明涉及一种用于相对于多个投影光学系统同时扫描掩模和感光基板的曝光装置，从而将掩模上的整个图案区域适当地转印到感光基板上。 多个掩模侧参考标记和基板侧参考标记组被布置在掩模表面和感光基板表面上并且至少在与多个投影光学系统共轭的两个位置处彼此对应的位置处。 掩模侧基准标记的图像或通过投影光学系统形成在相应的基板侧参考标记或掩模侧参考标记上的基板侧参考标记之间的位移量和基板侧参考标记的位置 并且测量掩模侧参考标记。 根据位移量校正多个投影光学系统的成像特性。

公开(公告)号：US5777722A

公开(公告)日：1998-07-07

申请号：US654382

申请日：1996-05-28

申请人： Seiji Miyazaki ,  Tsuyoshi Narabe ,  Kei Nara ,  Tomohide Hamada ,  Kazuaki Saiki ,  Hideji Goto ,  Muneyasu Yokota

发明人： Seiji Miyazaki ,  Tsuyoshi Narabe ,  Kei Nara ,  Tomohide Hamada ,  Kazuaki Saiki ,  Hideji Goto ,  Muneyasu Yokota

IPC分类号： G03F7/20 ,  G03F9/00 ,  G03B27/42 ,  G03B27/32 ,  G01B11/00

CPC分类号： G03F7/70275 ,  G03F7/70358 ,  G03F9/70

摘要： A scanning exposure apparatus is arranged to illuminate a mask, to project an image of the mask through a projection optical system onto a photosensitive substrate, and to move the mask and the photosensitive substrate relative to the projection optical system, thereby effecting exposure of an entire surface of the mask on the photosensitive substrate, and the exposure apparatus comprises a position detector which detects a relative positional relation between the mask and the photosensitive substrate; a memory which stores positional information obtained by the position detector; a position correcting device which corrects the relative positional relation between the mask and the photosensitive substrate, based on the positional information read out from the memory device; and a controller which makes the position detector detect the relative positional relation between the mask and the photosensitive substrate while the mask and the photosensitive substrate are carried past a projection region of the projection optical system to an exposure start position, and makes the position correcting device correct the relative positional relation between the mask and the photosensitive substrate, based on the positional information read out from the memory, while the mask and the photosensitive substrate are stopped at the exposure start position and/or during the exposure.

摘要翻译： 扫描曝光装置被布置为照亮掩模，通过投影光学系统将光掩模的图像投射到感光基板上，并且使掩模和感光基板相对于投影光学系统移动，从而实现整个曝光 感光基板上的掩模表面，曝光装置包括检测掩模和感光基板之间的相对位置关系的位置检测器; 存储器，其存储由所述位置检测器获取的位置信息; 基于从存储装置读出的位置信息来校正掩模和感光基板之间的相对位置关系的位置校正装置; 以及控制器，其使得位置检测器在将掩模和感光基板通过投影光学系统的投影区域到曝光开始位置时检测掩模和感光基板之间的相对位置关系，并使位置校正装置 基于从存储器读出的位置信息，掩模和感光基板在曝光开始位置和/或曝光期间停止时，校正掩模和感光基板之间的相对位置关系。

公开(公告)号：US5760881A

公开(公告)日：1998-06-02

申请号：US540458

申请日：1995-10-10

申请人： Seiji Miyazaki ,  Kei Nara ,  Hiroshi Shirasu ,  Tsuyoshi Narabe

发明人： Seiji Miyazaki ,  Kei Nara ,  Hiroshi Shirasu ,  Tsuyoshi Narabe

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G03B27/72

CPC分类号： G03F7/70066 ,  G03F7/70216 ,  G03F7/70358 ,  G03F9/70

摘要： An exposure apparatus, having an illumination optical system for radiating a light beam from a light source to a pattern area of a mask for transferring the image of the pattern area onto a photosensitive substrate by the light beam passing through the mask, is provided with plural sets of a first reference mark and a second reference mark arranged on the mask and the photosensitive substrate at positions corresponding to each other, and a light-shielding device for shielding the light beams radiated toward the second reference marks, whereby it is possible to re-use the second reference marks in a post-process by preventing the first reference marks on the mask from being superposed on the second reference marks on the photosensitive substrate or from being transferred onto a part near the second reference marks.

摘要翻译： 一种曝光装置，具有照明光学系统，用于将来自光源的光束照射到掩模的图案区域，用于通过通过掩模的光束将图案区域的图像转印到感光基板上，具有多个 设置在彼此对应的位置处的掩模和感光基板上的第一参考标记和第二参考标记的集合，以及用于屏蔽朝向第二参考标记辐射的光束的遮光装置，由此可以重新 - 通过防止掩模上的第一参考标记叠加在感光基板上的第二参考标记上或者被转印到靠近第二参考标记的部分上，从而在后处理中使用第二参考标记。

公开(公告)号：US5978094A

公开(公告)日：1999-11-02

申请号：US940289

申请日：1997-09-30

申请人： Tsuyoshi Narabe ,  Kei Nara ,  Masamitsu Yanagihara

发明人： Tsuyoshi Narabe ,  Kei Nara ,  Masamitsu Yanagihara

IPC分类号： G01B11/27 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G01B11/00

CPC分类号： G03F7/70358 ,  G01B11/27 ,  G03F9/70

摘要： An alignment device includes an image pickup optical system for picking up an image of a first reference mark disposed on a mask and an image of a second reference mark disposed on a photosensitive substrate through an image pickup optical system, a memory for storing information associated with the imaging characteristics of the image pickup optical system, and a correction system for correcting the positions of the first and second reference marks, detected using image information from the image pickup system, on the basis of the information associated with the imaging characteristics of the image pickup optical system.

摘要翻译： 对准装置包括：图像拾取光学系统，用于拾取设置在掩模上的第一参考标记的图像和通过图像拾取光学系统设置在感光基板上的第二参考标记的图像;存储器，用于存储与 图像拾取光学系统的成像特性，以及用于校正使用来自图像拾取系统的图像信息检测的第一和第二参考标记的位置的校正系统，其基于与图像的成像特性相关联的信息 拾取光学系统。

公开(公告)号：US5850279A

公开(公告)日：1998-12-15

申请号：US619981

申请日：1996-03-20

申请人： Kei Nara ,  Masaki Kato ,  Kinya Kato ,  Tsuyoshi Narabe

发明人： Kei Nara ,  Masaki Kato ,  Kinya Kato ,  Tsuyoshi Narabe

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G03B27/42 ,  G01B11/00

CPC分类号： G03F7/70275 ,  G03F7/70358 ,  G03F9/70

摘要： Disclosed is a projection exposure method for transferring a pattern formed on a mask onto a photosensitive substrate through a projection optical system. A light beam having a first wavelength for exposure is radiated through the projection optical system onto a first mark area including a fiducial mark on a fiducial plate installed on a substrate stage, reflected light from the first mark area is detected to obtain a position of the fiducial mark. A light beam having a second wavelength to which the photosensitive substrate is not photosensitive is radiated through the projection optical system onto the first mark area, reflected light from the first mark area is detected to obtain a position of the fiducial mark. A positional discrepancy of the fiducial mark caused by the difference in wavelength between the first and second wavelengths is previously calculated on the basis of results of the detection. The light beam having the second wavelength is radiated through the projection optical system onto an alignment mark on the photosensitive substrate, reflected light therefrom is detected to obtain a position of the photosensitive substrate under the light beam having the second wavelength. A positional discrepancy of the photosensitive substrate is corrected on the basis of a result of the detection and the calculation, and thus positional alignment for the photosensitive substrate is performed, followed by actual exposure.

摘要翻译： 公开了一种投影曝光方法，用于通过投影光学系统将形成在掩模上的图案转印到感光基板上。 将具有用于曝光的第一波长的光束通过投影光学系统辐射到安装在基板台上的基准板上的包括基准标记的第一标记区域上，检测来自第一标记区域的反射光， 基准标记。 具有感光基片不感光的第二波长的光束通过投影光学系统辐射到第一标记区域上，检测来自第一标记区域的反射光以获得基准标记的位置。 基于检测结果预先计算由第一和第二波长之间的波长差导致的基准标记的位置偏差。 具有第二波长的光束通过投影光学系统辐射到感光基板上的对准标记上，检测其反射光，以获得具有第二波长的光束下的感光基板的位置。 基于检测和计算的结果校正感光性基板的位置偏差，由此进行感光性基板的位置对准，然后实际曝光。

公开(公告)号：US6049372A

公开(公告)日：2000-04-11

申请号：US881902

申请日：1997-06-23

申请人： Kinya Kato ,  Hiroshi Shirasu ,  Yukio Kakizaki ,  Kei Nara

发明人： Kinya Kato ,  Hiroshi Shirasu ,  Yukio Kakizaki ,  Kei Nara

IPC分类号： G03F7/20 ,  G03F9/00 ,  G03B27/42

CPC分类号： G03F7/70358 ,  G03F7/70716 ,  G03F7/70775 ,  G03F9/70

摘要： Apparatus and methods are disclosed for transferring a pattern defined by a mask onto a surface of a substrate. The apparatus includes an illumination optical system for illuminating the pattern on the mask. A projection optical system forms an erect image of the pattern on the substrate. For exposure, the mask and substrate are movable together in a scanning direction relative to the projection optical system. First and second relative-displacement measuring systems, the first being separated from the second by a predetermined distance perpendicular to the scanning direction, measure displacement of the mask relative to the substrate in the scanning direction. First and second detection systems detect displacement of the mask and substrate, respectively, in the direction perpendicular to the scanning direction. A position-adjusting system adjusts the position of at least one of the mask and substrate. A calculation system calculates a position-adjusting amount based on outputs from the first and second relative-displacement measuring systems and from the first and second detection systems. A control system controls the position-adjusting system based on an output from the calculation system.

摘要翻译： 公开了用于将由掩模限定的图案转印到基板的表面上的装置和方法。 该装置包括用于照亮掩模上的图案的照明光学系统。 投影光学系统在基板上形成图案的直立图像。 为了曝光，掩模和基板可相对于投影光学系统沿扫描方向一起移动。 第一和第二相对位移测量系统，第一和第二相对位移测量系统，其中第一相对位移测量系统从垂直于扫描方向的预定距离与第二相对位移测量系统分离，测量掩模相对于基板在扫描方向 第一和第二检测系统分别在与扫描方向垂直的方向上检测掩模和基板的位移。 位置调整系统调整至少一个掩模和基底的位置。 计算系统基于来自第一和第二相对位移测量系统以及第一和第二检测系统的输出来计算位置调整量。 控制系统根据计算系统的输出控制位置调整系统。

公开(公告)号：US5912726A

公开(公告)日：1999-06-15

申请号：US922598

申请日：1997-09-03

申请人： Manabu Toguchi ,  Kei Nara ,  Masaichi Murakami ,  Nobutaka Fujimori ,  Toshio Matsuura

发明人： Manabu Toguchi ,  Kei Nara ,  Masaichi Murakami ,  Nobutaka Fujimori ,  Toshio Matsuura

IPC分类号： G03B27/32 ,  G03F7/20 ,  G03F9/00 ,  G03F9/02 ,  H01L21/027 ,  G03B27/42 ,  G03B27/54

CPC分类号： G03F9/7026 ,  G03F7/70241 ,  G03F7/70275

摘要： A projection exposure apparatus includes an illumination optical system for illuminating a plurality of partial areas on a mask. A plurality of projection optical systems each project images of the partial areas thus illuminated onto a photosensitive substrate. A mask table holds the mask. A position detector detects a position of the mask table. A substrate table holds the photosensitive substrate. A plurality of first reference marks are provided on the mask table; each of the plurality of first reference marks are disposed at a position corresponding to each of the plurality of projection optical systems. A plurality of second reference marks are provided on the substrate table; the second reference marks are substantially conjugate with the first reference marks with respect to the projection optical systems and are in a predetermined positional relation with the first reference marks in in-plane directions of the mask and the photosensitive substrate. A positional deviation detector detects positional deviations between the first reference marks and second reference marks when light beams from the illumination optical system are radiated onto the plurality of first reference marks to project the plurality of first reference marks through the projection optical systems onto the plurality of second reference marks. A correcting device corrects imaging characteristics of the projection optical systems, based on the positional deviations. The first reference marks can comprise a single aperture of a plurality of apertures. A reverse-type aperture may be employed. The positional deviation detector may include a single photodetector or a plurality of photodetectors.

摘要翻译： 投影曝光装置包括用于照亮掩模上的多个部分区域的照明光学系统。 多个投影光学系统各自投影如此照射到感光基片上的部分区域的图像。 掩模台保持面具。 位置检测器检测掩模台的位置。 基板台保持感光基板。 多个第一参考标记设置在掩模台上; 多个第一参考标记中的每一个被布置在与多个投影光学系统中的每一个对应的位置处。 多个第二参考标记设置在衬底台上; 第二参考标记与第一参考标记相对于投影光学系统基本共轭，并且与掩模和感光基板的面内方向上的第一参考标记处于预定的位置关系。 当将来自照明光学系统的光束照射到多个第一参考标记上时，位置偏差检测器检测第一参考标记和第二参考标记之间的位置偏差，以将多个第一参考标记通过投影光学系统突出到多个 第二个参考标记。 校正装置基于位置偏差校正投影光学系统的成像特性。 第一参考标记可以包括多个孔的单个孔。 可以采用反向孔径。 位置偏差检测器可以包括单个光电检测器或多个光电检测器。

公开(公告)号：US5973766A

公开(公告)日：1999-10-26

申请号：US856029

申请日：1997-05-14

申请人： Toshio Matsuura ,  Nobutaka Fujimori ,  Toshinobu Morioka ,  Kei Nara

发明人： Toshio Matsuura ,  Nobutaka Fujimori ,  Toshinobu Morioka ,  Kei Nara

IPC分类号： G03F7/20 ,  G03F9/00 ,  G03B27/68 ,  G03B27/42

CPC分类号： G03F7/70691 ,  G03F7/70241 ,  G03F7/70258 ,  G03F7/70425 ,  G03F7/70475 ,  G03F7/70883 ,  G03F9/70

摘要： An exposure device sequentially transfers a pattern formed in a mask onto connected multiple regions present consecutively on a substrate through a projection optical system. The device includes a substrate stage moving in two dimensions and carrying the substrate in a movement coordinate system determined by a first axis and a mutually perpendicular second axis. A mark detecting sensor detects positions of alignment marks formed on the substrate. A magnification adjustment device corrects the magnification of the projection optical system. At least one calculating device is used to separately calculate extension amounts of the substrate in the direction of the first axis and in the direction of the second axis based on information relating to the positions of the alignment marks detected by the mark detecting sensor. An amount of magnification correction provided by the magnification adjustment device is set based on the extension amounts calculated, and scales of the first and second axes of the movement coordinate system specifying movement of the substrate stage are changed by identical amounts.

摘要翻译： 曝光装置通过投影光学系统将形成在掩模中的图案顺序地传送到在基板上连续存在的连续的多个区域上。 该装置包括在两个维度上移动的衬底台，并且以由第一轴线和相互垂直的第二轴线确定的运动坐标系承载衬底。 标记检测传感器检测在基板上形成的对准标记的位置。 放大调整装置校正投影光学系统的放大率。 基于与由标记检测传感器检测到的对准标记的位置有关的信息，使用至少一个计算装置来分别计算基板在第一轴方向和第二轴方向上的延伸量。 基于所计算的扩展量来设定由倍率调整装置提供的倍率校正量，并且指定基准载台的移动坐标系的第一和第二轴的尺寸相等量的变化。

公开(公告)号：US5523841A

公开(公告)日：1996-06-04

申请号：US357090

申请日：1994-12-15

申请人： Kei Nara ,  Toshio Matsuura

发明人： Kei Nara ,  Toshio Matsuura

IPC分类号： G03F9/00 ,  G01B11/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  G01B9/02

CPC分类号： G03F7/70716 ,  G01B11/002

摘要： A plurality of interference length (distance) measuring means which are opposed to a movable mirror are aligned in the direction in which said movable mirror moves at an interval narrower than the length of the mirror surface. These interference length measuring means are switched according to movement of the movable mirror. Thus, the range within which distances from the mirror surface are measured can be made wider than the length of the mirror surface of the movable mirror.

摘要翻译： 与可动镜相对的多个干涉长度（距离）测量装置在所述可移动镜以比镜面的长度窄的间隔移动的方向上对准。 这些干涉长度测量装置根据可移动镜的移动而被切换。 因此，可以使与测量镜面距离的范围比可动镜的镜面的长度更宽。

公开(公告)号：US5623343A

公开(公告)日：1997-04-22

申请号：US548402

申请日：1995-10-26

申请人： Kei Nara ,  Masamitsu Yanagihara ,  Seiji Miyazaki

发明人： Kei Nara ,  Masamitsu Yanagihara ,  Seiji Miyazaki

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G01B11/00

CPC分类号： G03F7/70225 ,  G03F7/70275 ,  G03F7/70358 ,  G03F9/70

摘要： In the first step of an exposure method of the present invention, an alignment optical system is arranged to oppose one of a first mask mark on a photomask and a first substrate mark on a photosensitive substrate, thereby detecting a first deviation amount between the position of the first mask mark and that of the first substrate mark. In the second step, the alignment optical system is arranged to oppose one of a second mask mark on the photomask and a second substrate mark on the photosensitive substrate, thereby detecting a second deviation mark between the position of the second mask mark and that of the second substrate mark. In the third step, correction values for minimizing the first and second deviation amounts are calculated. In the fourth step, the relative positional relationship between the image of an original pattern on the photomask and a shot area on the photosensitive substrate is adjusted on the basis of a correction value. In the fifth step, at least one of the first and second steps is executed subsequent to the fourth step to newly detect the first or second deviation amount. In the sixth step, the first to fifth steps are repeatedly executed until one of the first and second deviation amounts detected in the fifth step falls within a predetermined allowance.

摘要翻译： 在本发明的曝光方法的第一步骤中，对准光学系统被布置为与光掩模上的第一掩模标记和感光基板上的第一基板标记中的一个相对，从而检测在光敏基板的位置之间的第一偏移量 第一个掩码标记和第一个掩码标记。 在第二步骤中，对准光学系统布置成与光掩模上的第二掩码标记和感光基板上的第二基板标记之一相对，从而检测第二掩模标记的位置与第二掩模标记的位置之间的第二偏移标记 第二基板标记。 在第三步骤中，计算用于使第一和第二偏移量最小化的校正值。 在第四步骤中，基于校正值来调整光掩模上的原始图案的图像与感光基板上的照射区域之间的相对位置关系。 在第五步骤中，在第四步骤之后执行第一和第二步骤中的至少一个，以重新检测第一或第二偏差量。 在第六步骤中，重复执行第一至第五步骤，直到在第五步骤中检测到的第一和第二偏移量之一落入预定余量之内。