摘要:
An illumination optical system illuminates an irradiated surface with light supplied from a light source. The illumination optical system includes a diffractive optical element disposed in an optical path of linearly polarized light supplied from the light source. The diffractive optical element forms a multipole illumination field. including a plurality of illumination fields. The illumination optical system also includes an optical integrator that forms a multipole light source including a plurality of planar light sources with light that has passed through the multipole illumination field. The illumination optical system also includes a polarization optical member disposed in an illumination optical path and that sets a polarization direction of light that has passed through the multipole light source to a predetermined polarization direction.
摘要:
An illumination optical system for, when installed in an exposure system, realizing a suitable illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of the light. The illumination optical system has a light source unit for supplying a linearly polarized light for illuminating surfaces to be illuminated therewith, and a polarized state changing device for changing the polarized state of the illuminating light from a predetermined polarized state to a nonpolarized state and vice versa. The polarized state changing device is arranged in the optical path between the light source unit and the surfaces to be illuminated. The polarized state changing device can be removed from the illumination optical path and has a depolarizer for selectively depolarizing the incident linearly polarized light.
摘要:
An optical member made of silica glass manufactured by the direct method where a material gas comprising an organosilicon compound is allowed to react in an oxidizing flame, said optical member having a 2×1014 molecules/cm3 or less concentration of formyl radical generated by X-ray irradiation whose dose is 0.01 Mrad or more and 1 Mrad or less.
摘要翻译:通过直接法制造的由石英玻璃制成的光学构件,其中包含有机硅化合物的材料气体在氧化火焰中反应,所述光学构件具有2×10 14分子/ cm 3 通过X射线照射产生的或更少浓度的甲酰基,其剂量为0.01Mrad以上且1Mrad以下。
摘要:
In a method for producing a quartz glass member, an F2 laser is radiated onto a sample obtained from a quartz glass base material under a predetermined condition to judge whether or not a peak intensity of H2 Raman scattering light is decreased by not less than 80% as compared with a peak intensity of H2 Raman scattering light obtained for a sample not irradiated with the F2 laser. If the peak intensity of H2 Raman scattering light is decreased by less than 80%, then it is judged that the laser resistance of the quartz glass base material is sufficient, and the synthetic quartz glass member is processed from the base material. The compaction of the sample is also measured.
摘要:
This invention provides a synthetic silica glass optical member used together with light having a specific wavelength of 250 nm or less, in which the difference between the maximum value and the minimum value of transmittance [%/cm] per cm in thickness for the light in a predetermined direction within a plane perpendicular to the optical axis is 2.0%/cm or less.
摘要翻译:本发明提供一种与特定波长为250nm以下的光一起使用的合成石英玻璃光学构件,其中,光的最大值和透射率的最小值(cm / cm)/ cm 垂直于光轴的平面内的预定方向为2.0%/ cm以下。
摘要:
A silica glass forming method is a method of pressing a synthetic silica bulk having at least a set of opposed surfaces, on the surfaces under a high temperature condition by a presser, wherein an elastic member with permeability is placed between the presser and the surfaces of the synthetic silica bulk pressed by the presser and wherein the synthetic silica bulk is pressed through the elastic member by the presser. This method is able to reduce bubbles remaining inside the synthetic glass formed product after the forming to a sufficiently small amount. Therefore, it becomes feasible to provide the method that permits high-yield production of silica glasses with excellent optical characteristics.
摘要:
A silica glass is provided for use in an optical system processing an excimer laser beam. The silica glass has a molecular hydrogen concentration of about 5×1018 molecules/cm3 or less and is substantially free from defects which become precursors susceptible to an one-photon absorption process and a two-photon absorption process upon irradiation of the excimer laser beam to the silica glass.
摘要翻译:提供石英玻璃用于处理准分子激光束的光学系统中。 二氧化硅玻璃的分子氢浓度约为5×1018分/ cm 3或更低,并且基本上没有成为对单光子吸收过程敏感的前体的缺陷和在将准分子激光束照射到二氧化硅上时的双光子吸收过程 玻璃。
摘要:
A silica glass has a structure determination temperature of 1200 K or lower and an OH group concentration of at least 1,000 ppm. The silica glass is used for photolithography together with light in a wavelength region of 400 nm or shorter.
摘要:
A silica glass has a structure determination temperature of 1200 K or lower and a hydrogen molecule concentration of 1.times.10.sup.17 molecules/cm.sup.3 or more. The silica glass is used together with light in a wavelength region of 400 nm or shorter.
摘要翻译:石英玻璃的结构测定温度为1200K以下,氢分子浓度为1×10 17分子/ cm 3以上。 石英玻璃与波长400nm以下的光一起使用。
摘要:
An illumination optical system illuminates an irradiated surface with light supplied from a light source. The illumination optical system includes a diffractive optical element disposed in an optical path of linearly polarized light supplied from the light source. The diffractive optical element forms a multipole illumination field including a plurality of illumination fields. The illumination optical system also includes an optical integrator that forms a multipole light source including a plurality of planar light sources with light that has passed through the multipole illumination field. The illumination optical system also includes a polarization optical member disposed in an illumination optical path and that sets a polarization direction of light that has passed through the multipole light source to a predetermined polarization direction.