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公开(公告)号：US06749688B2
公开(公告)日：2004-06-15
申请号：US09270781
申请日：1999-03-17
申请人： Kiyohisa Tateyama , Kimio Motoda , Noriyuki Anai
发明人： Kiyohisa Tateyama , Kimio Motoda , Noriyuki Anai
IPC分类号： B05B716
摘要： A coating apparatus has a spin chuck for attracting and holding a semiconductor wafer in a horizontal state by means of vacuum. A movable beam is arranged above the spin chuck. The movable beam includes first and second nozzles integrally formed. The first nozzle is used for supplying a photo-resist liquid while the second nozzle is used for supplying a solvent for the photo-resist liquid. When a coating process is performed, the movable beam above the wafer is horizontally moved in one direction. The solvent is first supplied onto the wafer from the second nozzle, and the coating or photo-resist liquid is then supplied from the first nozzle, following the solvent. Wettability of the wafer relative to the photo-resist is increased by the solvent, prior to supply of the photo-resist liquid.
摘要翻译： 涂布装置具有用于通过真空吸引并保持水平状态的半导体晶片的旋转卡盘。 可移动光束布置在旋转卡盘上方。 可动梁包括一体形成的第一和第二喷嘴。 第一喷嘴用于供应光致抗蚀剂液体，而第二喷嘴用于供应用于光致抗蚀剂液体的溶剂。 当执行涂覆处理时，晶片上方的可移动光束在一个方向上水平移动。 首先从第二喷嘴将溶剂供应到晶片上，然后在溶剂之后从第一喷嘴提供涂层或光致抗蚀剂液体。 在提供光致抗蚀剂液体之前，晶片相对于光致抗蚀剂的润湿性由溶剂增加。
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公开(公告)号：US06168665A
公开(公告)日：2001-01-02
申请号：US09185503
申请日：1998-11-04
申请人： Mitsuhiro Sakai , Kiyohisa Tateyama , Kimio Motoda
发明人： Mitsuhiro Sakai , Kiyohisa Tateyama , Kimio Motoda
IPC分类号： B05C2100
CPC分类号： H01L21/67017 , B05C11/08
摘要： A substrate processing apparatus comprising a substrate mounting table, a cup having an upper opening and surrounding the substrate mounting table, a lid for opening/closing the upper opening of the cup, a support arm for supporting the lid, a first lifting mechanism having a first piston for supporting the support arm directly or indirectly and a first cylinder for guiding the first piston in an up-and-down motion, a second lifting mechanism having a second piston for supporting the support arm directly or indirectly and a second cylinder for guiding the second piston in up-and -down motion, a driving circuit for supplying the pressurized fluid to the first and second cylinders, independently and exhausting the pressurized fluid from the first and second cylinders, independently, and a control mechanism for controlling operations of the driving circuit.
摘要翻译： 一种基板处理装置，包括基板安装台，具有上开口并围绕基板安装台的杯，用于打开/关闭杯的上开口的盖，用于支撑盖的支撑臂，具有第一提升机构， 用于直接或间接地支撑支撑臂的第一活塞和用于上下运动地引导第一活塞的第一气缸，具有用于直接或间接地支撑支撑臂的第二活塞的第二提升机构和用于引导的第二气缸 所述第二活塞是上下运动的驱动电路，用于独立地将加压流体供应到第一和第二气缸的驱动电路独立地从第一和第二气缸排出加压流体;以及控制机构，用于控制 驱动电路。
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公开(公告)号：US5919520A
公开(公告)日：1999-07-06
申请号：US919503
申请日：1997-08-28
申请人： Kiyohisa Tateyama , Kimio Motoda , Noriyuki Anai
发明人： Kiyohisa Tateyama , Kimio Motoda , Noriyuki Anai
摘要： A coating apparatus has a spin chuck for attracting and holding a semiconductor wafer in a horizontal state by means of vacuum. A movable beam is arranged above the spin chuck. The movable beam includes first and second nozzles integrally formed. The first nozzle is used for supplying a photo-resist liquid while the second nozzle is used for supplying a solvent for the photo-resist liquid. When a coating process is performed, the movable beam above the wafer is horizontally moved in one direction. The solvent is first supplied onto the wafer from the second nozzle, and the coating or photo-resist liquid is then supplied from the first nozzle, following the solvent. Wettability of the wafer relative to the photo-resist is increased by the solvent, prior to supply of the photo-resist liquid.
摘要翻译： 涂布装置具有用于通过真空吸引并保持水平状态的半导体晶片的旋转卡盘。 可移动光束布置在旋转卡盘上方。 可动梁包括一体形成的第一和第二喷嘴。 第一喷嘴用于供应光致抗蚀剂液体，而第二喷嘴用于供应用于光致抗蚀剂液体的溶剂。 当执行涂覆处理时，晶片上方的可移动光束在一个方向上水平移动。 首先从第二喷嘴将溶剂供应到晶片上，然后在溶剂之后从第一喷嘴提供涂层或光致抗蚀剂液体。 在提供光致抗蚀剂液体之前，晶片相对于光致抗蚀剂的润湿性由溶剂增加。
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公开(公告)号：US5695817A
公开(公告)日：1997-12-09
申请号：US512018
申请日：1995-08-07
申请人： Kiyohisa Tateyama , Kimio Motoda , Kenji Sekiguchi , Tsutae Omori
发明人： Kiyohisa Tateyama , Kimio Motoda , Kenji Sekiguchi , Tsutae Omori
摘要： A method of forming a coating film, in which the coating film is formed by supplying a coating liquid onto a surface of a substrate, while the substrate housed in a processing vessel is rotated together with the processing vessel, includes the steps of coating the surface of the substrate with a solvent, supplying the coating liquid to the substrate, rotating the substrate and the processing vessel at a first rotation speed to diffuse the coating liquid on the surface of the substrate, closing the processing vessel with a lid to seal the substrate in the processing vessel, and rotating the processing vessel with the lid and the substrate at a second rotation speed to uniform a film thickness of the coating film.
摘要翻译： 一种形成涂膜的方法，其中通过将涂覆液体供给到基材的表面上形成涂膜，同时容纳在处理容器中的基材与处理容器一起旋转，包括以下步骤：将表面 的溶剂，将涂布液供给到基板，以第一旋转速度旋转基板和处理容器，以将涂布液扩散到基板的表面上，用盖子封闭处理容器以密封基板 在处理容器中，并且以第二转速旋转具有盖和基板的处理容器以使涂膜的膜厚均匀。
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公开(公告)号：US20070017442A1
公开(公告)日：2007-01-25
申请号：US11486005
申请日：2006-07-14
IPC分类号： B05C11/00
CPC分类号： H01L21/6715 , B05C5/0208 , H01L21/6776 , H01L21/67784
摘要： The present invention provides a floating-type substrate conveying and processing apparatus that floats a substrate to be processed. The device includes a floating stage that floats the substrate, a liquid supplier placed above the floating stage via the substrate to supply a process liquid to a surface of the substrate, and a moving mechanism for holding the substrate as detachable at opposite ends of the substrate, at a floating height of the substrate, and for moving the substrate on the floating stage. The floating stage is formed of a porous member and has a plurality of suction apertures airtightly defined in a porous portion of the porous member. The floating stage injects gas through the porous portion and sucks gas through the suction apertures to float the substrate placed on the porous portion.
摘要翻译： 本发明提供了浮动要处理的基板的浮动式基板输送和处理装置。 该装置包括浮置基板的浮动台，经由基板放置在浮动台上方的液体供应器，以将处理液体供应到基板的表面;以及移动机构，用于将基板保持为可分离于基板的相对端 ，在衬底的浮动高度处，并且用于在浮动平台上移动衬底。 浮动台由多孔构件形成，并且具有气密地限定在多孔构件的多孔部分中的多个抽吸孔。 浮动阶段通过多孔部分注入气体，并通过抽吸孔抽吸气体，使放置在多孔部分上的基板浮起。
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公开(公告)号：US5803970A
公开(公告)日：1998-09-08
申请号：US753768
申请日：1996-11-29
申请人： Kiyohisa Tateyama , Kimio Motoda , Kenji Sekiguchi , Tsutae Omori
发明人： Kiyohisa Tateyama , Kimio Motoda , Kenji Sekiguchi , Tsutae Omori
摘要： A method of forming a coating film, in which the coating film is formed by supplying a coating liquid onto a surface of a substrate, while the substrate housed in a processing vessel is rotated together with the processing vessel, includes the steps of coating the surface of the substrate with a solvent, supplying the coating liquid to the substrate, rotating the substrate and the processing vessel at a first rotation speed to diffuse the coating liquid on the surface of the substrate, closing the processing vessel with a lid to seal the substrate in the processing vessel, and rotating the processing vessel with the lid and the substrate at a second rotation speed to uniform a film thickness of the coating film.
摘要翻译： 一种形成涂膜的方法，其中通过将涂覆液体供给到基材的表面上形成涂膜，同时容纳在处理容器中的基材与处理容器一起旋转，包括以下步骤：将表面 的溶剂，将涂布液供给到基板，以第一旋转速度旋转基板和处理容器，以将涂布液扩散到基板的表面上，用盖子封闭处理容器以密封基板 在处理容器中，并且以第二转速旋转具有盖和基板的处理容器以使涂膜的膜厚均匀。
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公开(公告)号：US07905195B2
公开(公告)日：2011-03-15
申请号：US11486005
申请日：2006-07-14
IPC分类号： B05C5/02
CPC分类号： H01L21/6715 , B05C5/0208 , H01L21/6776 , H01L21/67784
摘要： The present invention provides a floating-type substrate conveying and processing apparatus that floats a substrate to be processed. The device includes a floating stage that floats the substrate, a liquid supplier placed above the floating stage via the substrate to supply a process liquid to a surface of the substrate, and a moving mechanism for holding the substrate as detachable at opposite ends of the substrate, at a floating height of the substrate, and for moving the substrate on the floating stage. The floating stage is formed of a porous member and has a plurality of suction apertures airtightly defined in a porous portion of the porous member. The floating stage injects gas through the porous portion and sucks gas through the suction apertures to float the substrate placed on the porous portion.
摘要翻译： 本发明提供了浮动要处理的基板的浮动式基板输送和处理装置。 该装置包括浮置基板的浮动台，经由基板放置在浮动台上方的液体供应器，以将处理液体供应到基板的表面;以及移动机构，用于将基板保持为可分离于基板的相对端 ，在衬底的浮动高度处，并且用于在浮动平台上移动衬底。 浮动台由多孔构件形成，并且具有气密地限定在多孔构件的多孔部分中的多个抽吸孔。 浮动阶段通过多孔部分注入气体，并通过抽吸孔抽吸气体，使放置在多孔部分上的基板浮起。
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公开(公告)号：US6058544A
公开(公告)日：2000-05-09
申请号：US25344
申请日：1998-02-18
申请人： Kimio Motoda , Yoshiharu Ota , Norio Uchihira , Kiyohisa Tateyama
发明人： Kimio Motoda , Yoshiharu Ota , Norio Uchihira , Kiyohisa Tateyama
IPC分类号： G02F1/13 , B08B1/00 , B08B1/04 , B08B3/04 , B08B11/02 , G11B23/50 , H01L21/00 , H01L21/304 , B08B3/10
CPC分类号： H01L21/67051 , B08B1/007 , B08B1/04 , B08B11/02 , H01L21/67046 , G11B23/505
摘要： A scrubbing apparatus comprises a holding member, which holds the outer circumference of the substrate from its back surface and has an opening to expose the back surface of the held substrate toward the bottom side; a supporting member, which supports substantially the center between two opposed sides of the holding member; a scrubbing brush, which comes in contact with the exposed back surface of the substrate from the bottom side; a brush drive mechanism, which transfers the scrubbing brush along the two opposed sides of the holding member; and a rotation drive mechanism, which drives to rotate the holding member together with the supporting member. Thus, a space can be saved, and the back surface of the substrate can be scrubbed.
摘要翻译： 洗涤装置包括保持构件，该保持构件从其后表面保持衬底的外周，并具有用于将保持的衬底的后表面朝向底侧露出的开口; 支撑构件，其基本上支撑在所述保持构件的两个相对侧之间的中心; 洗涤刷，其从底侧与衬底的暴露的背面接触; 刷驱动机构，其沿着保持构件的两个相对侧传送洗刷刷; 以及旋转驱动机构，其驱动以使支撑构件与支撑构件一起旋转。 因此，可以节省空间，并且可以擦洗衬底的背面。
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公开(公告)号：US5718763A
公开(公告)日：1998-02-17
申请号：US416369
申请日：1995-04-04
申请人： Kiyohisa Tateyama , Kimio Motoda , Tatsuya Iwasaki , Takenobu Matsuo , Kazuki Denpoh , Eiji Yamaguchi
发明人： Kiyohisa Tateyama , Kimio Motoda , Tatsuya Iwasaki , Takenobu Matsuo , Kazuki Denpoh , Eiji Yamaguchi
IPC分类号： B05C11/08 , G03F7/16 , H01L21/00 , H01L21/687 , D05C5/00
CPC分类号： H01L21/67173 , B05C11/08 , G03F7/162 , G03F7/168 , H01L21/6715 , H01L21/68707 , Y10S134/902
摘要： A apparatus of resist-processing a rectangular substrate including a resist coating step of supplying resist solution to the substrate, while rotating it, to form resist film at least on one surface of it and a resist removing step of jetting removing liquid, which can solve resist, to both surfaces of it at its side peripheral portions to remove the resist film from them.
摘要翻译： 一种对矩形基板进行抗蚀处理的装置，包括在将抗蚀剂溶液旋转的同时将抗蚀剂溶液供给到基板的抗蚀剂涂布步骤，至少在其一个表面上形成抗蚀剂膜，以及除去液体的抗蚀剂去除步骤，其可以解决 在其侧边缘处抵抗其两个表面以从它们去除抗蚀剂膜。
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公开(公告)号：US5688322A
公开(公告)日：1997-11-18
申请号：US653341
申请日：1996-05-24
申请人： Kimio Motoda , Kiyohisa Tateyama , Noriyuki Anai
发明人： Kimio Motoda , Kiyohisa Tateyama , Noriyuki Anai
摘要： Disclosed is an apparatus for coating resist comprising a spin-chuck capable of moving vertically, holding a substrate received and rotating together with the substrate, resist solution supplying mean for supplying a resist solution onto a substrate held on the spin-chuck, a rotating cup surrounding the substrate held on the spin-chuck and rotated in synchronism with the spin-chuck, for receiving the resist solution centrifugally separated from the substrate, a drain cup provided around the rotating cup, for receiving a waste material discharged from the rotating cup, the drain cup having a collecting space for collecting the waste material received, a drainage passage having a drainage port opening into the collecting space for discharging a liquid component of the waste material collected in the collecting space therefrom, an exhaust passage having an exhaust port communicating with the collecting space, for discharging a gas component of the waste material collected in the collecting space therefrom, an exhaust gas guiding passage provided at a level higher than at least the drainage port, for guiding the gas component from the collecting space to the exhaust passage, and a gas-liquid separating member provided in the exhaust gas guiding passage, for condensing a liquid component contained in air containing the gas component by striking it against the gas-liquid separating member, thereby preventing the liquid component from going around the exhaust passage.
摘要翻译： 公开了一种涂覆抗蚀剂的装置，包括能够垂直移动的旋转卡盘，保持与基板一起容纳和旋转的基板，用于将抗蚀剂溶液供应到保持在旋转卡盘上的基板上的抗蚀剂溶液供应装置，旋转杯 围绕保持在旋转卡盘上的基板并与旋转卡盘同步旋转，用于接收从基板离心分离的抗蚀剂溶液;设置在旋转杯周围的用于接收从旋转杯排出的废料的排液杯， 所述排水杯具有用于收集所接收的废料的收集空间，排水通道，具有通向所述收集空间的排出口，用于排出收集在所述收集空间中的废料的液体成分;排气通道， 具有收集空间，用于排出收集在集合体中的废料的气体成分 g的空气引导通道，排气导引通道，其设置在比至少所述排水口高的位置，用于将气体成分从收集空间引导到排气通道;以及气体分离部件，设置在排气引导通道中， 用于通过将包含在气体成分的空气中的液体成分撞击气液分离部件而冷凝，从而防止液体成分绕排气通路。
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