Film deposition using a finger type shadow frame
    1.
    发明授权
    Film deposition using a finger type shadow frame 有权
    使用手指型阴影框的胶片沉积

    公开(公告)号:US06355108B1

    公开(公告)日:2002-03-12

    申请号:US09338245

    申请日:1999-06-22

    IPC分类号: C23C1600

    摘要: The present invention relates generally to a clamping and alignment assembly for a substrate processing system. The clamping and aligning assembly generally includes a shadow frame, a floating plasma shield and a plurality of insulating alignment pins. The shadow frame comprises a plurality of tabs extending inwardly therefrom and is shaped to accommodate a substrate. The tabs comprise protruding contact surfaces for stabilizing a substrate on a support member during processing. The insulating alignment pins are disposed at a perimeter of a movable support member and cooperate with an alignment recess formed in the shadow frame to urge the shadow frame into a desired position. Preferably, the floating plasma shield is disposed on the insulating alignment pins in spaced relationship between the support member and the shadow frame to shield the perimeter of the support member during processing.

    摘要翻译: 本发明一般涉及用于衬底处理系统的夹紧和对准组件。 夹持和对准组件通常包括阴影框架,浮动等离子体屏蔽件和多个绝缘对准销钉。 阴影框架包括从其向内延伸的多个突片,并且成形为容纳衬底。 突片包括用于在加工期间稳定支撑构件上的基板的突出接触表面。 绝缘对准销布置在可移动支撑构件的周边处,并与形成在阴影框架中的对准凹槽配合,以将阴影框架推动到期望的位置。 优选地,浮动等离子体屏蔽以间隔开的关系设置在绝缘对准销上,在支撑构件和阴影框架之间,以在加工期间屏蔽支撑构件的周边。

    Dual frequency excitation of plasma for film deposition
    2.
    发明授权
    Dual frequency excitation of plasma for film deposition 失效
    用于膜沉积的等离子体的双频激发

    公开(公告)号:US06024044A

    公开(公告)日:2000-02-15

    申请号:US948279

    申请日:1997-10-09

    摘要: An apparatus deposits a high quality film onto a transparent substrate in a reactor. The transparent substrate may be made of glass, quartz or a polymer such as plastic. The transparent substrate is heated in a process chamber and a process gas stream is introduced into the process chamber. The apparatus generates a high frequency power output and a low frequency power output from a high frequency power supply and a low frequency power supply, respectively. The high frequency power output is generated at a frequency of about thirteen megahertz or more, and at a power from about one to five kilowatts, while the low frequency power output is generated at a frequency of about two megahertz or less, and at a power from about 300 to two kilowatts. The high frequency power output and the low frequency power output are superimposed and used to excite a plasma from the process gas stream at a pressure between about 0.4 Torr and 3 Torr, and at a temperature between about 250.degree. C. and 450.degree. C. to deposit a smooth thin film onto the transparent substrate.

    摘要翻译: 一种装置将高质量的膜沉积在反应器中的透明基板上。 透明基材可以由玻璃,石英或聚合物如塑料制成。 将透明基板在处理室中加热并将工艺气体流引入处理室。 该装置分别从高频电源和低频电源产生高频功率输出和低频功率输出。 高频功率输出以大约十三兆赫或更高的频率和大约一到五千瓦的功率产生,而低频功率输出是以大约2兆赫或更小的频率产生的 约300至2千瓦。 高频功率输出和低频功率输出被叠加并用于在约0.4托和3托之间的压力下以及在约250℃至450℃之间的温度下从工艺气流中激发等离子体。 以将平滑的薄膜沉积在透明基板上。

    Method of depositing amorphous silicon based films having controlled conductivity
    3.
    发明授权
    Method of depositing amorphous silicon based films having controlled conductivity 失效
    沉积具有受控导电性的非晶硅基膜的方法

    公开(公告)号:US06352910B1

    公开(公告)日:2002-03-05

    申请号:US09249041

    申请日:1999-02-12

    IPC分类号: H01L2120

    CPC分类号: C23C16/24

    摘要: Deposition methods for preparing amorphous silicon based films with controlled resistivity and low stress are described. Such films can be used as the interlayer in FED manufacturing. They can also be used in other electronic devices which require films with controlled resistivity in the range between those of an insulator and of a conductor. The deposition methods described in the present invention employ the method of chemical vapor deposition or plasma-enhanced chemical vapor deposition; other film deposition techniques, such as physical vapor deposition, also may be used. In one embodiment, an amorphous silicon-based film is formed by introducing into a deposition chamber a silicon-based volatile, a conductivity-increasing volatile including one or more components for increasing the conductivity of the amorphous silicon-based film, and a conductivity-decreasing volatile including one or more components for decreasing the conductivity of the amorphous silicon-based film.

    摘要翻译: 描述了制备具有受控电阻率和低应力的非晶硅基膜的沉积方法。 这种膜可用作FED制造中的中间层。 它们也可用于需要具有在绝缘体和导体之间的范围内的受控电阻率的膜的其它电子器件。 本发明中描述的沉积方法采用化学气相沉积或等离子体增强化学气相沉积的方法; 也可以使用其它成膜技术,例如物理气相沉积。 在一个实施方案中,通过向沉积室中引入硅基挥发物,包含一种或多种用于增加非晶硅基膜的导电性的组分的增加电导率的挥发性,并且导电性 - 降低挥发性,包括一种或多种用于降低非晶硅基膜的导电性的组分。

    Fiber optic sensor
    4.
    发明授权
    Fiber optic sensor 失效
    光纤传感器

    公开(公告)号:US5359445A

    公开(公告)日:1994-10-25

    申请号:US114963

    申请日:1987-10-30

    摘要: A fiber optic sensor includes a generally cylindrical housing including a fiber optic transmitter in one end connected to a source of light, a sensor within the housing attached to the cylindrical wall of the housing exposed to the transmitted light and responsive to a sensed condition such as acoustic pressure waves to modulate the light, and a fiber optic receiver for receiving the modulated light and supplying it to an external circuit. The sensor may be a thin film fastened to the wall or it may include a diffraction pattern on a reflective inside surface of the wall which will produce a modulated light output with movement of the wall. The thin film may be fastened to the wall directly or suspended by means of Euler struts. The thin film may include a reflective spot and/or a moire pattern for modulating the light. Another embodiment includes a resiliently mounted mass fastened to a thin film which may have quadrature or other patterns which would alter the light modulation pattern depending upon the direction of a sensed acceleration.

    摘要翻译: 光纤传感器包括大致圆柱形的壳体,其包括连接到光源的一端中的光纤发射器,壳体内的传感器附接到暴露于透射光的壳体的圆柱形壁并且响应于感测到的状态,例如 用于调制光的声压波,以及用于接收调制光并将其提供给外部电路的光纤接收器。 传感器可以是紧固在壁上的薄膜,或者它可以包括在壁的反射内表面上的衍射图案,该衍射图形将随着壁的运动产生调制的光输出。 薄膜可以通过欧拉支架直接固定到墙上或悬挂。 薄膜可以包括用于调制光的反射点和/或莫尔图案。 另一个实施例包括紧固到薄膜上的弹性安装的物体,其可以具有正交或其它图案,这些图案将根据感测的加速度的方向改变光调制图案。