公开(公告)号：US08795793B2

公开(公告)日：2014-08-05

申请号：US12254742

申请日：2008-10-20

申请人： Soo Young Choi ,  John M. White ,  Robert I. Greene

发明人： Soo Young Choi ,  John M. White ,  Robert I. Greene

IPC分类号： H05H1/24 ,  C23C16/00 ,  C23C16/455

CPC分类号： C23C16/45559 ,  B05B1/005 ,  C23C16/4405 ,  C23C16/45565 ,  H01J37/3244

摘要： Embodiments of a gas distribution plate for distributing gas in a processing chamber are provided. In one embodiment, a gas distribution plate includes a diffuser plate having an upstream side and a downstream side, and a plurality of gas passages passing between the upstream and downstream sides of the diffuser plate. At least one of the gas passages has a right cylindrical shape for a portion of its length extending from the upstream side and a coaxial conical shape for the remainder length of the diffuser plate, the upstream end of the conical portion having substantially the same diameter as the right cylindrical portion and the downstream end of the conical portion having a larger diameter. The gas distribution plate is relatively easy to manufacture and provides good chamber cleaning rate, good thin film deposition uniformity and good thin film deposition rate. The gas distribution plate also has the advantage of reduced chamber cleaning residues on the diffuser surface and reduced incorporation of the cleaning residues in the thin film being deposited.

摘要翻译： 提供了用于在处理室中分配气体的气体分配板的实施例。 在一个实施例中，气体分配板包括具有上游侧和下游侧的扩散板和通过扩散板的上游侧和下游侧之间的多个气体通道。 气体通道中的至少一个具有从上游侧延伸的一部分长度的右圆柱形状，并且对于扩散板的剩余长度为同轴圆锥形，锥形部分的上游端具有与 锥形部分的右圆柱形部分和下游端具有较大的直径。 气体分配板相对容易制造，提供良好的室清洁率，良好的薄膜沉积均匀性和良好的薄膜沉积速率。 气体分配板还具有减小扩散器表面上的室清洁残留物的优点，并且减少了沉积在薄膜中的清洁残余物的结合。

公开(公告)号：US20090104376A1

公开(公告)日：2009-04-23

申请号：US12254742

申请日：2008-10-20

申请人： SOO YOUNG CHOI ,  John M. White ,  Robert I. Greene

发明人： SOO YOUNG CHOI ,  John M. White ,  Robert I. Greene

IPC分类号： C23C16/513 ,  B08B6/00

CPC分类号： C23C16/45559 ,  B05B1/005 ,  C23C16/4405 ,  C23C16/45565 ,  H01J37/3244

摘要： Embodiments of a gas distribution plate for distributing gas in a processing chamber are provided. In one embodiment, a gas distribution plate includes a diffuser plate having an upstream side and a downstream side, and a plurality of gas passages passing between the upstream and downstream sides of the diffuser plate. At least one of the gas passages has a right cylindrical shape for a portion of its length extending from the upstream side and a coaxial conical shape for the remainder length of the diffuser plate, the upstream end of the conical portion having substantially the same diameter as the right cylindrical portion and the downstream end of the conical portion having a larger diameter. The gas distribution plate is relatively easy to manufacture and provides good chamber cleaning rate, good thin film deposition uniformity and good thin film deposition rate. The gas distribution plate also has the advantage of reduced chamber cleaning residues on the diffuser surface and reduced incorporation of the cleaning residues in the thin film being deposited.

摘要翻译： 提供了用于在处理室中分配气体的气体分配板的实施例。 在一个实施例中，气体分配板包括具有上游侧和下游侧的扩散板和通过扩散板的上游侧和下游侧之间的多个气体通道。 气体通道中的至少一个具有从上游侧延伸的一部分长度的右圆柱形状，并且对于扩散板的剩余长度为同轴圆锥形，锥形部分的上游端具有与 锥形部分的右圆柱形部分和下游端具有较大的直径。 气体分配板相对容易制造，提供良好的室清洁率，良好的薄膜沉积均匀性和良好的薄膜沉积速率。 气体分配板还具有减小扩散器表面上的室清洁残留物的优点，并且减少了沉积在薄膜中的清洁残余物的结合。

公开(公告)号：US06432255B1

公开(公告)日：2002-08-13

申请号：US09494581

申请日：2000-01-31

申请人： Sheng Sun ,  Quanyuan Shang ,  William R. Harshbarger ,  Robert I. Greene

发明人： Sheng Sun ,  Quanyuan Shang ,  William R. Harshbarger ,  Robert I. Greene

IPC分类号： H05H100

CPC分类号： H01L21/67063 ,  H01L21/67069

摘要： A system for processing substrates within a chamber and for cleaning accumulated material from chamber components is provided. The system includes a reactive species generator adapted to generate a reactive gas species for chemically etching accumulated material from chamber components, and a processing chamber having at least one component with a mirror polished surface which is exposed to the reactive species. Preferably to have the greatest impact on chamber cleaning efficiency, the mirror polished surface is a surface of a component such as a gas distribution plate or a backing plate, and/or is a surface of a plurality of smaller components (e.g., chamber wall liners, a gas conductance line, etc.) so as to constitute a large percentage of the surface area exposed to the reactive species. Most preferably all bare aluminum surfaces which the reactive species contacts are mirror polished.

摘要翻译： 提供了一种用于在室内处理基板并且用于从腔室部件清洗积聚的材料的系统。 该系统包括适于产生反应性气体种类的反应物种发生器，用于从腔室部件化学蚀刻积聚的材料，以及处理室，其具有至少一个具有暴露于反应性物质的镜面抛光表面的部件。 优选地，对室清洁效率具有最大的影响，镜面抛光表面是诸如气体分配板或背板的部件的表面，和/或是多个较小部件的表面（例如，室壁衬套 ，气体导电线等），以便构成暴露于反应性物质的大部分表面积。 最优选地，反应性物质接触的所有裸铝表面被镜面抛光。

公开(公告)号：US5621763A

公开(公告)日：1997-04-15

申请号：US440854

申请日：1995-05-15

申请人： Thomas J. Walczak ,  Robert I. Greene ,  Stephen V. Cahill ,  John W. Diehl

发明人： Thomas J. Walczak ,  Robert I. Greene ,  Stephen V. Cahill ,  John W. Diehl

IPC分类号： H04L27/20 ,  H03G3/20 ,  H03G3/30 ,  H04B7/005 ,  H04L27/04

CPC分类号： H04W52/04 ,  H03G3/3047

摘要： An apparatus and method generates a shaped transition between the minimum and maximum output power levels of a transmitter (500). When the transmitter is turned on a stepped transition (415) is generated at the beginning (3) of the transition region (409) followed by a shaped transition (417) to the end (6) of the transition region (409). When the transmitter (500) is turned off a shaped transition region (417') is generated at the beginning (162) of the transition region (411) followed by a stepped transition (415') at the end (3) of the transition region (411). The stepped transition (415 or 415') is generated by adjusting a voltage controlled attenuator (545) and the bias of a power amplifier (545) in the transmitter (500). The shaped transition (417 or 417') is generated by processing transmitted information through finite impulse response filters (507 or 509) before or after the time slot permitted for transmitting information.

摘要翻译： 一种装置和方法产生在发射器（500）的最小和最大输出功率电平之间的形状转换。 当发射机接通时，在过渡区域（409）的开始处（3）产生阶跃转变（415），随后是到过渡区域（409）的端部（6）的成形过渡（417）。 当发射机（500）关闭时，在过渡区域（411）的开始处（162）产生形状的过渡区域（417'），随后在转变的端部（3）处形成阶梯式转换（415'） 区域（411）。 通过调节压控衰减器（545）和发射器（500）中的功率放大器（545）的偏置来产生阶跃转换（415或415'）。 通过在允许发送信息的时隙之前或之后通过有限脉冲响应滤波器（507或509）处理发送的信息来生成形状转换（417或417'）。

公开(公告)号：US07732010B2

公开(公告)日：2010-06-08

申请号：US11406136

申请日：2006-04-18

申请人： Soo Young Choi ,  Beom Soo Park ,  Quanyuan Shang ,  Robert I. Greene ,  John M. White ,  Dong-Kil Yim ,  Chung-Hee Park ,  Kam Law

发明人： Soo Young Choi ,  Beom Soo Park ,  Quanyuan Shang ,  Robert I. Greene ,  John M. White ,  Dong-Kil Yim ,  Chung-Hee Park ,  Kam Law

IPC分类号： C23C16/00

CPC分类号： H01J37/32082 ,  C23C16/4581 ,  C25D11/04 ,  C25D11/16 ,  C25D11/18

摘要： A method for supporting a glass substrate comprising providing a substrate support having an aluminum body, a substrate contact area formed on the surface of the substrate support, wherein the process of forming the substrate contact area comprises forming an anodization layer on a surface region of the aluminum body, the coating having a thickness of between about 0.3 mils and about 2.16 mils, wherein the surface region substantially corresponds to the substrate contact area, and preparing the anodization layer disposed over the surface region to a surface roughness between about 88 micro-inches and about 230 micro-inches, followed by anodizing the substrate surface to said thickness, positioning the substrate support adjacent a substrate processing region in a substrate processing chamber, wherein the substrate contact area is adjacent the substrate processing region, positioning the glass substrate on the substrate contact area.

摘要翻译： 一种用于支撑玻璃基板的方法，包括提供具有铝体的基板支撑件，形成在所述基板支撑件的表面上的基板接触区域，其中形成所述基板接触区域的工艺包括在所述基板支撑件的表面区域上形成阳极氧化层 铝体，所述涂层具有在约0.3密耳和约2.16密耳之间的厚度，其中所述表面区域基本上对应于所述基底接触面积，以及将所述阳极氧化层设置在所述表面区域上方的表面粗糙度在约88微英寸 约230微英寸，然后将基板表面阳极化至所述厚度，将基板支撑件邻近基板处理区域定位在基板处理室中，其中基板接触区域与基板处理区域相邻，将玻璃基板定位在基板处理区域上 基板接触面积。

公开(公告)号：US06863077B2

公开(公告)日：2005-03-08

申请号：US10195718

申请日：2002-07-15

申请人： Sheng Sun ,  Quanyuan Shang ,  William R. Harshbarger ,  Robert I. Greene

发明人： Sheng Sun ,  Quanyuan Shang ,  William R. Harshbarger ,  Robert I. Greene

IPC分类号： B08B7/00 ,  B08B9/08 ,  C23C16/44 ,  H01L21/00 ,  H01L21/205 ,  H01L21/302 ,  H01L21/304 ,  H01L21/3065 ,  C25F3/00

CPC分类号： H01L21/67063 ,  H01L21/67069

摘要： A system for processing substrates within a chamber and for cleaning accumulated material from chamber components is provided. The system includes a reactive species generator adapted to generate a reactive gas species for chemically etching accumulated material from chamber components, and a processing chamber having at least one component with a mirror polished surface which is exposed to the reactive species. Preferably to have the greatest impact on chamber cleaning efficiency, the mirror polished surface is a surface of a component such as a gas distribution plate or a backing plate, and/or is a surface of a plurality of smaller components (e.g., chamber wall liners, a gas conductance line, etc.) so as to constitute a large percentage of the surface area exposed to the reactive species. Most preferably all bare aluminum surfaces which the reactive species contacts are mirror polished.

摘要翻译： 提供了一种用于在室内处理基板并且用于从腔室部件清洗积聚的材料的系统。 该系统包括适于产生反应性气体种类的反应物种发生器，用于从腔室部件化学蚀刻积聚的材料，以及处理室，其具有至少一个具有暴露于反应物质的镜面抛光表面的部件。 优选地，为了对室清洁效率具有最大的影响，镜面抛光表面是诸如气体分配板或背板的部件的表面，和/或是多个较小部件的表面（例如，室壁衬套 ，气体导电线等），以便构成暴露于反应性物质的大部分表面积。 最优选地，反应性物质接触的所有裸铝表面被镜面抛光。

公开(公告)号：US3954261A

公开(公告)日：1976-05-04

申请号：US538485

申请日：1975-01-03

申请人： Robert I. Greene ,  Thomas M. Madigan

发明人： Robert I. Greene ,  Thomas M. Madigan

IPC分类号： B41F21/00 ,  B41J13/076 ,  B65H29/20 ,  B65H29/70

CPC分类号： B65H29/20 ,  B41F21/00 ,  B41J13/076 ,  B65H29/70

摘要： A transport mechanism is disclosed for driving inked paper emerging from the printing station of a duplicating machine into a stacking station, the transport mechanism employing a first pair of beveled drive rollers and a second pair of rounded rollers biased against the beveled drive rollers by gravity which prevents ink buildup upon the second pair of drive rollers where bleed edge inked paper is being transported through the system.

摘要翻译： 公开了一种用于将从复印机的印刷站出现的着墨纸驱动到堆垛台的输送机构，所述输送机构采用第一对斜面驱动辊和通过重力偏置在斜面驱动辊上的第二对圆形辊 防止墨水积聚在第二对驱动辊上，其中渗色墨水被输送通过系统。

公开(公告)号：US06942753B2

公开(公告)日：2005-09-13

申请号：US10417592

申请日：2003-04-16

申请人： Soo Young Choi ,  Quanyuan Shang ,  Robert I. Greene ,  Li Hou

发明人： Soo Young Choi ,  Quanyuan Shang ,  Robert I. Greene ,  Li Hou

IPC分类号： C23C16/44 ,  C23C16/455 ,  C23C16/509 ,  C23C16/00 ,  C23C16/452 ,  C23F1/00 ,  H01L21/00

CPC分类号： C23C16/45565 ,  C23C16/5096

摘要： Embodiments of a gas distribution plate for distributing gas in a processing chamber are provided. In one embodiment, a gas distribution plate includes a diffuser plate having a plurality of gas passages passing between an upstream side and a downstream side of the diffuser plate. At least one of the gas passages includes a first hole and a second hole coupled by an orifice hole. The first hole extends from the upstream side of the diffuser plate while the second hole extends from the downstream side. The orifice hole has a diameter less than the respective diameters of the first and second holes.

摘要翻译： 提供了用于在处理室中分配气体的气体分配板的实施例。 在一个实施例中，气体分配板包括具有通过扩散板的上游侧和下游侧之间的多个气体通道的扩散板。 至少一个气体通道包括第一孔和通过孔口联接的第二孔。 第一孔从扩散板的上游侧延伸，而第二孔从下游侧延伸。 孔口的直径小于第一孔和第二孔的直径。

公开(公告)号：US4077715A

公开(公告)日：1978-03-07

申请号：US769998

申请日：1977-02-18

申请人： Robert I. Greene

发明人： Robert I. Greene

IPC分类号： G03B27/36 ,  G03B27/38 ,  G03B27/70

CPC分类号： G03B27/36

摘要： An automatically focusing optical system for copiers, duplicators and other reproduction equipment having a variable magnification capability. The auto-focusing mechanism comprises a camming means for moving a mirror or other component of the optical system to maintain focus throughout the magnification range of the system. The camming means is additionally designed to be adjustable in such a way that it can accommodate imaging lens systems which differ in focal length within the normal manufacturing tolerance band, and thus replace the family of cams utilized in the prior art to accommodate lenses of different focal length.

摘要翻译： 一种具有可变放大能力的复印机，复印机和其他再现设备的自动聚焦光学系统。 自动聚焦机构包括用于移动光学系统的反射镜或其他部件以在整个系统的整个放大范围内保持焦点的凸轮装置。 凸轮装置被额外地设计成可调节的，使得其可以容纳在正常制造公差带内的焦距不同的成像透镜系统，并且因此替换现有技术中使用的凸轮系列以适应不同焦点的透镜 长度。

公开(公告)号：US06355108B1

公开(公告)日：2002-03-12

申请号：US09338245

申请日：1999-06-22

申请人： Tae Kyung Won ,  Quanyuan Shang ,  Robert M. Robertson ,  Soo Young Choi ,  Kam S. Law ,  Robert I. Greene ,  John M. White

发明人： Tae Kyung Won ,  Quanyuan Shang ,  Robert M. Robertson ,  Soo Young Choi ,  Kam S. Law ,  Robert I. Greene ,  John M. White

IPC分类号： C23C1600

CPC分类号： C23C16/24 ,  C23C16/345 ,  C23C16/4583 ,  C23C16/4585 ,  H01J37/32623

摘要： The present invention relates generally to a clamping and alignment assembly for a substrate processing system. The clamping and aligning assembly generally includes a shadow frame, a floating plasma shield and a plurality of insulating alignment pins. The shadow frame comprises a plurality of tabs extending inwardly therefrom and is shaped to accommodate a substrate. The tabs comprise protruding contact surfaces for stabilizing a substrate on a support member during processing. The insulating alignment pins are disposed at a perimeter of a movable support member and cooperate with an alignment recess formed in the shadow frame to urge the shadow frame into a desired position. Preferably, the floating plasma shield is disposed on the insulating alignment pins in spaced relationship between the support member and the shadow frame to shield the perimeter of the support member during processing.

摘要翻译： 本发明一般涉及用于衬底处理系统的夹紧和对准组件。 夹持和对准组件通常包括阴影框架，浮动等离子体屏蔽件和多个绝缘对准销钉。 阴影框架包括从其向内延伸的多个突片，并且成形为容纳衬底。 突片包括用于在加工期间稳定支撑构件上的基板的突出接触表面。 绝缘对准销布置在可移动支撑构件的周边处，并与形成在阴影框架中的对准凹槽配合，以将阴影框架推动到期望的位置。 优选地，浮动等离子体屏蔽以间隔开的关系设置在绝缘对准销上，在支撑构件和阴影框架之间，以在加工期间屏蔽支撑构件的周边。