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公开(公告)号：US08749178B2
公开(公告)日：2014-06-10
申请号：US13503394
申请日：2010-09-29
IPC分类号： H01B5/00
摘要： The present invention relates to an electrode system, in particular of a gas discharge device for generating EUV radiation and/or soft X-rays. The electrode system comprises at least two electrodes (1, 2) formed of an electrode material which contains Mo or W or an alloy of Mo or W as a main component. The electrode material has a fine grained structure with fine grains having a mean size of
摘要翻译： 本发明涉及一种电极系统，特别涉及用于产生EUV辐射和/或软X射线的气体放电装置。 电极系统包括由含有Mo或W的电极材料形成的至少两个电极（1,2）或以Mo或W为主要成分的合金。 电极材料具有细颗粒结构，其具有平均尺寸小于500nm的细晶粒。 利用所提出的电极系统，实现了电极的高热机械和耐热化学性。 因此，电极系统可以在使用液体Sn的已知的EUV光源中使用并且在高温下操作。
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2.发明申请OPTICAL DEVICE AND METHOD OF IN SITU TREATING AN EUV OPTICAL COMPONENT TO ENHANCE A REDUCED REFLECTIVITY 有权光学装置和处理EUV光学部件以增强降低反射率的方法公开(公告)号：US20100238422A1
公开(公告)日：2010-09-23
申请号：US12602798
申请日：2007-06-12
CPC分类号： G02B5/0816 , B82Y10/00 , C23C14/34 , C23C14/3492 , C23C16/52 , G02B5/0891 , G03F7/70033 , G03F7/70916 , G03F7/70925 , G21K1/06
摘要： The present invention relates to an optical device and a method of in situ treating an optical component (2, 6, 13) reflecting EUV and/or soft X-ray radiation in said optical device, said optical component (2, 6, 13) being arranged in a vacuum chamber (14) of said optical device and comprising one or several reflecting surfaces (3) having a top layer of one or several surface materials. In the method, a source (1, 5) of said one or several surface materials is provided in said chamber (14) of said optical device and surface material from said source (1, 5) is deposited on said one or several reflecting surfaces (3) during operation and/or during operation-pauses of said optical device in order to cover or substitute deposited contaminant material and/or to compensate for ablated surface material.
摘要翻译： 本发明涉及一种在所述光学装置中反射EUV和/或软X射线辐射的光学部件（2,6,13）原位处理的光学装置和方法，所述光学部件（2,6,13） 被布置在所述光学装置的真空室（14）中并且包括具有一个或多个表面材料的顶层的一个或多个反射表面（3）。 在该方法中，所述一个或多个表面材料的源（1,5）设置在所述光学装置的所述室（14）中，并且来自所述源（1,5）的表面材料沉积在所述一个或多个反射表面 （3）在操作期间和/或在所述光学装置的操作暂停期间，以覆盖或替代沉积的污染物质和/或补偿烧蚀的表面材料。
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3.发明授权Method of cleaning at least one surface of an optical device disposed in a vacuum chamber 有权清洁设置在真空室中的光学装置的至少一个表面的方法公开(公告)号：US07799136B2
公开(公告)日：2010-09-21
申请号：US10566963
申请日：2004-07-19
IPC分类号： B08B7/00
CPC分类号： G02B27/0006 , G03F7/70891 , G03F7/70925 , G03F7/70958
摘要： A method of cleaning at least one surface of an optical device disposed in a vacuum chamber, which is at least partially contaminated by atoms and/or ions of metalloid and/or metal introduced by a radiation source generating, such as extreme ultraviolet radiation and/or soft X-rays is described. In order to achieve a longer service life for the optical device, the method is designed such that a temperature prevailing on the surface and/or a pressure in the vacuum chamber is adjusted in such a way that the atoms and/or ions hitting the surface are removed.
摘要翻译： 一种清洁设置在真空室中的光学装置的至少一个表面的方法，所述至少一个表面至少部分地受到由辐射源引入的准金属和/或金属的原子和/或离子的污染，所述辐射源产生例如极紫外辐射和/ 或软X射线。 为了实现光学装置的更长的使用寿命，该方法被设计成使得表面上存在的温度和/或真空室中的压力被调节成使得原子和/或离子撞击表面 被删除。
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4.发明授权Optical device and method of in situ treating an EUV optical component to enhance a reduced reflectivity 有权用于原位处理EUV光学元件以提高降低的反射率的光学装置和方法公开(公告)号：US09110390B2
公开(公告)日：2015-08-18
申请号：US12602798
申请日：2007-06-12
CPC分类号： G02B5/0816 , B82Y10/00 , C23C14/34 , C23C14/3492 , C23C16/52 , G02B5/0891 , G03F7/70033 , G03F7/70916 , G03F7/70925 , G21K1/06
摘要： A method of in situ treating an optical component reflecting EUV and/or soft X-ray radiation in an optical device includes providing at least one source of one or several surface materials in a vacuum chamber of the optical device where the optical component is arranged. The optical component includes one or several reflecting surfaces having a top layer of one or several surface materials. The method includes providing a source of the one or several surface materials in the chamber, and depositing surface material from the source on the one or several reflecting surfaces during operation and/or during operation-pauses of the optical device in order to cover or substitute deposited contaminant material and/or to compensate for ablated surface material.
摘要翻译： 在光学装置中原位处理反射EUV和/或软X射线辐射的光学部件的方法包括在配置光学部件的光学装置的真空室中提供一个或多个表面材料的至少一个源。 光学部件包括具有一层或几层表面材料的顶层的一个或多个反射表面。 该方法包括在腔室中提供一个或几个表面材料的源，以及在操作期间和/或在光学装置的操作暂停期间从源上的表面材料沉积在一个或多个反射表面上以覆盖或替代 沉积的污染物质和/或补偿烧蚀表面材料。
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5.发明授权Method and device for generating EUV radiation and/or soft X-ray radiation 有权用于产生EUV辐射和/或软X射线辐射的方法和装置公开(公告)号：US07809112B2
公开(公告)日：2010-10-05
申请号：US10596441
申请日：2004-12-13
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70916
摘要： A method of generating in particular EUV radiation (12) and/or soft X-ray radiation (12a) emitted by a plasma (26) is described. The plasma (26) is formed by an operating gas (22) in a discharge space (14) which comprises at least one radiation emission window (16) and an electrode system with at least one anode (18) and at least one cathode (20). This electrode system transmits electrical energy to the plasma (26) by means of charge carriers (24) introduced into the discharge space (14). It is suggested for obtaining a reliable ignition of the plasma (26) at high repetition frequencies that a radiation (30) generated by at least one radiation source (28) is introduced into the discharge space (14) for making available the discharge carriers (24).
摘要翻译： 描述了由等离子体（26）发射的产生特别是EUV辐射（12）和/或软X射线辐射（12a）的方法。 等离子体（26）由放电空间（14）中的工作气体（22）形成，其包括至少一个辐射发射窗（16）和具有至少一个阳极（18）和至少一个阴极（18）的电极系统 20）。 该电极系统通过引入放电空间（14）的电荷载体（24）将电能传递到等离子体（26）。 建议以高重复频率获得等离子体（26）的可靠点燃，即由至少一个辐射源（28）产生的辐射（30）被引入放电空间（14）中以使得放电载体（ 24）。
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6.发明申请Method and Device for Generating in Particular Euv Radiation And/or Soft X-Ray Radiation 有权在特定的Euv辐射和/或软X射线辐射中产生的方法和装置公开(公告)号：US20080298552A1
公开(公告)日：2008-12-04
申请号：US10596441
申请日：2004-12-13
IPC分类号： H01J35/06
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70916
摘要： A method of generating in particular EUV radiation (12) and/or soft X-ray radiation (12a) emitted by a plasma (26) is described. The plasma (26) is formed by an operating gas (22) in a discharge space (14) which comprises at least one radiation emission window (16) and an electrode system with at least one anode (18) and at least one cathode (20). This electrode system transmits electrical energy to the plasma (26) by means of charge carriers (24) introduced into the discharge space (14). It is suggested for obtaining a reliable ignition of the plasma (26) at high repetition frequencies that a radiation (30) generated by at least one radiation source (28) is introduced into the discharge space (14) for making available the discharge carriers (24).
摘要翻译： 描述了由等离子体（26）发射的产生特别是EUV辐射（12）和/或软X射线辐射（12a）的方法。 等离子体（26）由放电空间（14）中的工作气体（22）形成，其包括至少一个辐射发射窗（16）和具有至少一个阳极（18）和至少一个阴极（18）的电极系统 20）。 该电极系统通过引入放电空间（14）的电荷载体（24）将电能传递到等离子体（26）。 建议以高重复频率获得等离子体（26）的可靠点燃，使得由至少一个辐射源（28）产生的辐射（30）被引入放电空间（14）中以使得放电载体（ 24）。
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公开(公告)号：US07396792B2
公开(公告)日：2008-07-08
申请号：US10520315
申请日：2003-07-02
申请人： Michel Paul Barbara Van Bruggen , Rolf Theo Anton Apetz , Theo Arnold Kop , Andreas Krell , Thomas Hutzler
发明人： Michel Paul Barbara Van Bruggen , Rolf Theo Anton Apetz , Theo Arnold Kop , Andreas Krell , Thomas Hutzler
IPC分类号： C04B35/115
CPC分类号： H01J61/302 , C04B35/115 , C04B35/6455
摘要： The present invention relates to highly dense translucent and transparent aluminium oxide components for applications, e.g. in the lighting industry, where a fine crystal size has to be obtained and stabilized for use at temperatures of 800° C. or more. Disclosed are high-strength polycrystalline alumina products which include 0.001-0.5 weight-% ZrO2 stabilizing a fine crystal size 30% measured over an angular aperture of at most 0.5° at a sample thickness of 0.8 mm and with a monochromatic wavelength of light λ, preferably, of 645 nm.
摘要翻译： 本发明涉及用于应用的高密度半透明和透明氧化铝组分，例如。 在照明工业中，必须获得微细的晶体尺寸并在800℃或更高的温度下使用。 公开了高强度多晶氧化铝产品，其包括稳定精细晶体尺寸<2μm的0.001-0.5重量％的ZrO 2，或者如果在800℃的温度下使用，优选<1μm，或者 更多。 微结构显示出非常高的相对密度，使得能够在0.8mm的样品厚度和最佳为645nm的单色波长下在0.5mm以下的角度孔径上测量高达30％的高真实在线透射率 。
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公开(公告)号：US20120212158A1
公开(公告)日：2012-08-23
申请号：US13503394
申请日：2010-09-29
摘要： The present invention relates to an electrode system, in particular of a gas discharge device for generating EUV radiation and/or soft X-rays. The electrode system comprises at least two electrodes (1, 2) formed of an electrode material which contains Mo or W or an alloy of Mo or W as a main component. The electrode material has a fine grained structure with fine grains having a mean size of
摘要翻译： 本发明涉及一种电极系统，特别涉及用于产生EUV辐射和/或软X射线的气体放电装置。 电极系统包括由含有Mo或W的电极材料形成的至少两个电极（1,2）或以Mo或W为主要成分的合金。 电极材料具有细颗粒结构，其具有平均尺寸小于500nm的细晶粒。 利用所提出的电极系统，实现了电极的高热机械和耐热化学性。 因此，电极系统可以在使用液体Sn的已知的EUV光源中使用并且在高温下操作。
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