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1.发明授权Method and device for generating EUV radiation and/or soft X-ray radiation 有权用于产生EUV辐射和/或软X射线辐射的方法和装置公开(公告)号：US07809112B2
公开(公告)日：2010-10-05
申请号：US10596441
申请日：2004-12-13
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70916
摘要： A method of generating in particular EUV radiation (12) and/or soft X-ray radiation (12a) emitted by a plasma (26) is described. The plasma (26) is formed by an operating gas (22) in a discharge space (14) which comprises at least one radiation emission window (16) and an electrode system with at least one anode (18) and at least one cathode (20). This electrode system transmits electrical energy to the plasma (26) by means of charge carriers (24) introduced into the discharge space (14). It is suggested for obtaining a reliable ignition of the plasma (26) at high repetition frequencies that a radiation (30) generated by at least one radiation source (28) is introduced into the discharge space (14) for making available the discharge carriers (24).
摘要翻译： 描述了由等离子体（26）发射的产生特别是EUV辐射（12）和/或软X射线辐射（12a）的方法。 等离子体（26）由放电空间（14）中的工作气体（22）形成，其包括至少一个辐射发射窗（16）和具有至少一个阳极（18）和至少一个阴极（18）的电极系统 20）。 该电极系统通过引入放电空间（14）的电荷载体（24）将电能传递到等离子体（26）。 建议以高重复频率获得等离子体（26）的可靠点燃，即由至少一个辐射源（28）产生的辐射（30）被引入放电空间（14）中以使得放电载体（ 24）。
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2.发明申请Method and Device for Generating in Particular Euv Radiation And/or Soft X-Ray Radiation 有权在特定的Euv辐射和/或软X射线辐射中产生的方法和装置公开(公告)号：US20080298552A1
公开(公告)日：2008-12-04
申请号：US10596441
申请日：2004-12-13
IPC分类号： H01J35/06
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70916
摘要： A method of generating in particular EUV radiation (12) and/or soft X-ray radiation (12a) emitted by a plasma (26) is described. The plasma (26) is formed by an operating gas (22) in a discharge space (14) which comprises at least one radiation emission window (16) and an electrode system with at least one anode (18) and at least one cathode (20). This electrode system transmits electrical energy to the plasma (26) by means of charge carriers (24) introduced into the discharge space (14). It is suggested for obtaining a reliable ignition of the plasma (26) at high repetition frequencies that a radiation (30) generated by at least one radiation source (28) is introduced into the discharge space (14) for making available the discharge carriers (24).
摘要翻译： 描述了由等离子体（26）发射的产生特别是EUV辐射（12）和/或软X射线辐射（12a）的方法。 等离子体（26）由放电空间（14）中的工作气体（22）形成，其包括至少一个辐射发射窗（16）和具有至少一个阳极（18）和至少一个阴极（18）的电极系统 20）。 该电极系统通过引入放电空间（14）的电荷载体（24）将电能传递到等离子体（26）。 建议以高重复频率获得等离子体（26）的可靠点燃，使得由至少一个辐射源（28）产生的辐射（30）被引入放电空间（14）中以使得放电载体（ 24）。
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3.发明申请OPTICAL DEVICE AND METHOD OF IN SITU TREATING AN EUV OPTICAL COMPONENT TO ENHANCE A REDUCED REFLECTIVITY 有权光学装置和处理EUV光学部件以增强降低反射率的方法公开(公告)号：US20100238422A1
公开(公告)日：2010-09-23
申请号：US12602798
申请日：2007-06-12
CPC分类号： G02B5/0816 , B82Y10/00 , C23C14/34 , C23C14/3492 , C23C16/52 , G02B5/0891 , G03F7/70033 , G03F7/70916 , G03F7/70925 , G21K1/06
摘要： The present invention relates to an optical device and a method of in situ treating an optical component (2, 6, 13) reflecting EUV and/or soft X-ray radiation in said optical device, said optical component (2, 6, 13) being arranged in a vacuum chamber (14) of said optical device and comprising one or several reflecting surfaces (3) having a top layer of one or several surface materials. In the method, a source (1, 5) of said one or several surface materials is provided in said chamber (14) of said optical device and surface material from said source (1, 5) is deposited on said one or several reflecting surfaces (3) during operation and/or during operation-pauses of said optical device in order to cover or substitute deposited contaminant material and/or to compensate for ablated surface material.
摘要翻译： 本发明涉及一种在所述光学装置中反射EUV和/或软X射线辐射的光学部件（2,6,13）原位处理的光学装置和方法，所述光学部件（2,6,13） 被布置在所述光学装置的真空室（14）中并且包括具有一个或多个表面材料的顶层的一个或多个反射表面（3）。 在该方法中，所述一个或多个表面材料的源（1,5）设置在所述光学装置的所述室（14）中，并且来自所述源（1,5）的表面材料沉积在所述一个或多个反射表面 （3）在操作期间和/或在所述光学装置的操作暂停期间，以覆盖或替代沉积的污染物质和/或补偿烧蚀的表面材料。
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4.发明授权Optical device and method of in situ treating an EUV optical component to enhance a reduced reflectivity 有权用于原位处理EUV光学元件以提高降低的反射率的光学装置和方法公开(公告)号：US09110390B2
公开(公告)日：2015-08-18
申请号：US12602798
申请日：2007-06-12
CPC分类号： G02B5/0816 , B82Y10/00 , C23C14/34 , C23C14/3492 , C23C16/52 , G02B5/0891 , G03F7/70033 , G03F7/70916 , G03F7/70925 , G21K1/06
摘要： A method of in situ treating an optical component reflecting EUV and/or soft X-ray radiation in an optical device includes providing at least one source of one or several surface materials in a vacuum chamber of the optical device where the optical component is arranged. The optical component includes one or several reflecting surfaces having a top layer of one or several surface materials. The method includes providing a source of the one or several surface materials in the chamber, and depositing surface material from the source on the one or several reflecting surfaces during operation and/or during operation-pauses of the optical device in order to cover or substitute deposited contaminant material and/or to compensate for ablated surface material.
摘要翻译： 在光学装置中原位处理反射EUV和/或软X射线辐射的光学部件的方法包括在配置光学部件的光学装置的真空室中提供一个或多个表面材料的至少一个源。 光学部件包括具有一层或几层表面材料的顶层的一个或多个反射表面。 该方法包括在腔室中提供一个或几个表面材料的源，以及在操作期间和/或在光学装置的操作暂停期间从源上的表面材料沉积在一个或多个反射表面上以覆盖或替代 沉积的污染物质和/或补偿烧蚀表面材料。
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公开(公告)号：US08519368B2
公开(公告)日：2013-08-27
申请号：US13054807
申请日：2009-07-21
IPC分类号： H05G2/00
摘要： The present invention relates to a method and device for generating optical radiation, in particular EUV radiation or soft x-rays, by means of an electrically operated discharge. A plasma (15) is ignited in a gaseous medium between at least two electrodes (1, 2), wherein said gaseous medium is produced at least partly from a liquid material (6) which is applied to a surface moving in the discharge space and is at least partially evaporated by one or several pulsed energy beams. In the proposed method and device the pulses (9) of said pulsed energy beams are directed to at least two different lateral locations with respect to a moving direction of said surface. With this measure, the radiation emission volume is expanded, less sensitive to spatial fluctuations and can be adapted better to the requirements of optical systems of any applications. Furthermore, the optical output power can be increased by this measure.
摘要翻译： 本发明涉及通过电动放电产生光辐射，特别是EUV辐射或软X射线的方法和装置。 等离子体（15）在至少两个电极（1,2）之间的气态介质中点燃，其中所述气体介质至少部分地由施加到在放电空间中移动的表面的液体材料（6）产生， 至少部分被一个或几个脉冲能量束蒸发。 在所提出的方法和装置中，所述脉冲能量束的脉冲（9）相对于所述表面的移动方向指向至少两个不同的横向位置。 通过这种措施，辐射发射体积扩大，对空间波动的敏感性较低，可以更好地适应任何应用的光学系统的要求。 此外，可以通过该措施来增加光输出功率。
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公开(公告)号：US20110127442A1
公开(公告)日：2011-06-02
申请号：US13054807
申请日：2009-07-21
摘要： The present invention relates to a method and device for generating optical radiation, in particular EUV radiation or soft x-rays, by means of an electrically operated discharge. A plasma (15) is ignited in a gaseous medium between at least two electrodes (1, 2), wherein said gaseous medium is produced at least partly from a liquid material (6) which is applied to a surface moving in the discharge space and is at least partially evaporated by one or several pulsed energy beams. In the proposed method and device the pulses (9) of said pulsed energy beams are directed to at least two different lateral locations with respect to a moving direction of said surface. With this measure, the radiation emission volume is expanded, less sensitive to spatial fluctuations and can be adapted better to the requirements of optical systems of any applications. Furthermore, the optical output power can be increased by this measure.
摘要翻译： 本发明涉及通过电动放电产生光辐射，特别是EUV辐射或软X射线的方法和装置。 等离子体（15）在至少两个电极（1,2）之间的气体介质中点燃，其中所述气态介质至少部分地由施加到在放电空间中移动的表面的液体材料（6）产生， 至少部分被一个或几个脉冲能量束蒸发。 在所提出的方法和装置中，所述脉冲能量束的脉冲（9）相对于所述表面的移动方向指向至少两个不同的横向位置。 通过这种措施，辐射发射体积扩大，对空间波动的敏感性较低，可以更好地适应任何应用的光学系统的要求。 此外，可以通过该措施来增加光输出功率。
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7.发明申请公开(公告)号：US20100051064A1
公开(公告)日：2010-03-04
申请号：US11993040
申请日：2006-06-20
IPC分类号： B08B3/00
CPC分类号： G03F7/70925 , B08B7/00 , B08B7/0035
摘要： The present invention relates to a method of cleaning and after treatment of optical surfaces in an irradiation unit, said irradiation unit comprising a radiation source (1, 31) emitting EUV-radiation and/or soft X-rays, a first volume (40) following said radiation source (1, 31) and containing first optical components (3, 33) with said optical surfaces, and a second volume (41) following said first volume (40) and containing second optical components (38). The method comprises at least one cleaning step in which a first gas or gas mixture is brought into contact with said optical surfaces, thereby forming volatile compounds with contaminations deposited on said optical surfaces, wherein said compounds are pumped out of the first volume (40) together with the first gas or gas mixture. In an after treatment step following said cleaning step the radiation source (1, 3) is operated once or several times in order to release residues of the cleaning step from the optical surfaces by irradiating said optical surfaces with said EUV-radiation or soft X-rays while the first volume (40) is separated from the second volume (41), wherein said released residues are pumped out of the first volume (40). With this method an improved cleaning result is achieved.
摘要翻译： 本发明涉及一种在照射单元中清洁和处理光学表面的方法，所述照射单元包括发射EUV辐射和/或软X射线的辐射源（1,31），第一体积（40） 沿着所述辐射源（1,31）并且包含具有所述光学表面的第一光学部件（3,33）和跟随所述第一容积（40）并包含第二光学部件（38）的第二容积（41）。 该方法包括至少一个清洁步骤，其中第一气体或气体混合物与所述光学表面接触，从而形成具有沉积在所述光学表面上的污染物的挥发性化合物，其中所述化合物被泵出第一体积（40） 与第一种气体或气体混合物。 在所述清洁步骤之后的后处理步骤中，辐射源（1,3）操作一次或数次，以便通过用所述EUV辐射或软X-射线照射所述光学表面来从光学表面释放清洁步骤的残留物， 而所述第一体积（40）与所述第二容积（41）分离，其中所述释放的残余物从所述第一体积（40）中泵出。 利用该方法，可以实现改进的清洗结果。
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公开(公告)号：US20090014666A1
公开(公告)日：2009-01-15
申请号：US11572238
申请日：2005-07-18
申请人： Peter Zink , Gunther Hans Debra
发明人： Peter Zink , Gunther Hans Debra
CPC分类号： G03F7/70916 , G03F7/70925 , G03F7/70933
摘要： A cleaning arrangement for an optical system and in particular for an optical system designed for EUV radiation. The cleaning arrangement has a gas inlet (28) for a reactive gas (29). Contaminants (23) that have deposited on the surface of optical elements (110) are detached by the reactive gas. Also provided are getter surfaces (32) that are preferably arranged opposite the surfaces to be clean and by which the contaminants detached from these surfaces are absorbed. This absorption may take place as a result of condensation on the getter surface and also by chemical reaction.
摘要翻译： 用于光学系统的清洁装置，特别是为EUV辐射设计的光学系统。 清洁装置具有用于反应气体（29）的气体入口（28）。 沉积在光学元件（110）的表面上的污染物（23）被反应气体分离。 还提供了吸气表面（32），其优选地布置成与要清洁的表面相对，并且从这些表面分离的污染物被吸收。 这种吸收可能由于在吸气剂表面上的冷凝以及化学反应而发生。
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9.发明授权Device for filling and closing sacks, in particular paper side folding sacks 失效用于填充和关闭袋的装置，特别是纸侧折叠袋
公开(公告)号：US4914895A
公开(公告)日：1990-04-10
申请号：US192557
申请日：1988-05-11
申请人： Gustav Kuckhermann , Klaus Tolle , Eduard Turnwald , Peter Zink , Rainer Schafer , Josef Hodapp
发明人： Gustav Kuckhermann , Klaus Tolle , Eduard Turnwald , Peter Zink , Rainer Schafer , Josef Hodapp
IPC分类号： B65B43/46
CPC分类号： B65B43/465
摘要： An apparatus for filling and closing sacks or bags, in particular paper side folding sacks, has a plurality of processing stations including a filling station, stationary clamping elements for holding the sack in an open position and a slide cyclically movable between processing stations. Outside grippers are mounted on the slide which are designed to grasp an at least partially filled sack at its side folding by clamping the folding from the outside in said filling station and transporting the sack by means of the slide to the succeeding processing station.
摘要翻译： 用于填充和关闭袋或袋的设备，特别是纸侧折叠袋具有多个处理站，包括一个填充站，用于将袋保持在打开位置的固定夹紧元件和在处理站之间循环移动的滑块。 外侧夹持器安装在滑动件上，其被设计成通过夹紧来自所述加注站中的外部的折叠来将其折叠侧面的至少部分填充袋抓住，并通过滑块将袋输送到后续处理站。
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公开(公告)号：US07732789B2
公开(公告)日：2010-06-08
申请号：US11572238
申请日：2005-07-18
申请人： Peter Zink , Gunther Hans Derra
发明人： Peter Zink , Gunther Hans Derra
IPC分类号： G03F7/20
CPC分类号： G03F7/70916 , G03F7/70925 , G03F7/70933
摘要： A cleaning arrangement for an optical system and in particular for an optical system designed for EUV radiation. The cleaning arrangement has a gas inlet (28) for a reactive gas (29). Contaminants (23) that have deposited on the surface of optical elements (110) are detached by the reactive gas. Also provided are getter surfaces (32) that are preferably arranged opposite the surfaces to be clean and by which the contaminants detached from these surfaces are absorbed. This absorption may take place as a result of condensation on the getter surface and also by chemical reaction.
摘要翻译： 用于光学系统的清洁装置，特别是为EUV辐射设计的光学系统。 清洁装置具有用于反应气体（29）的气体入口（28）。 沉积在光学元件（110）的表面上的污染物（23）被反应气体分离。 还提供了吸气表面（32），其优选地布置成与要清洁的表面相对，并且从这些表面分离的污染物被吸收。 这种吸收可能由于在吸气剂表面上的冷凝以及化学反应而发生。
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