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    Information processing device, program developing device, program verifying method, and program product
    1.
    发明授权
    Information processing device, program developing device, program verifying method, and program product 失效
    信息处理装置，程序开发装置，程序验证方法和程序产品

    公开(公告)号：US08683208B2

    公开(公告)日：2014-03-25

    申请号：US13162955

    申请日：2011-06-17

    申请人： Ryotaro Hayashi ,  Mikio Hashimoto ,  Hiroyoshi Haruki ,  Yurie Fujimatsu

    发明人： Ryotaro Hayashi ,  Mikio Hashimoto ,  Hiroyoshi Haruki ,  Yurie Fujimatsu

    IPC分类号： G06F12/14 ,  G06F21/00 ,  G06F21/54 ,  G06F21/53

    CPC分类号： G06F21/54 ,  G06F12/1416 ,  G06F12/1441 ,  G06F21/53 ,  G06F21/6218

    摘要： According to one embodiment, an information processing device stores a program list and plural types of security functions each defining therein protection attributes for respective arguments related to input and output of data to be protected, and stores function argument protection attributes and dependency relations each of which is defined by a determinant set and a dependent attribute that satisfy a predetermined condition. The device detects a combination of first and second security functions in which integrity of variables included in a determinant set of one dependency relation in the first security function are verified by the second security function, generates a third security function which adds protection attributes that guarantee integrity to variables included in the dependent attribute of the dependency relation in the first security function when verification of the second security function is successful and which outputs the variables, and updates the function argument protection attribute and the dependency relation concomitantly with an addition of the third security function.

    摘要翻译： 根据一个实施例，信息处理装置存储节目列表和多种类型的安全功能，每个安全功能各自定义与要保护的数据的输入和输出相关的参数的保护属性，并且存储功能参数保护属性和依赖关系， 由确定集合和依赖属性来定义，该属性集合和满足预定条件的从属属性。 该设备检测第一和第二安全功能的组合，其中包括在第一安全功能中的一个依赖关系的行列式集合中的变量的完整性由第二安全功能验证，生成第三安全功能，其增加保证完整性的保护属性 对第二安全功能的验证成功并且输出变量的第一安全功能中的依赖关系的从属属性中包含的变量，并且随着第三安全性的添加而更新功能参数保护属性和依赖关系 功能。

    Resist Composition and Method for Forming Resist Pattern
    3.
    发明申请
    Resist Composition and Method for Forming Resist Pattern 有权
    抗蚀剂组合物和形成抗蚀剂图案的方法

    公开(公告)号：US20070275307A1

    公开(公告)日：2007-11-29

    申请号：US10576405

    申请日：2004-10-20

    申请人： Hideo Hada ,  Masaru Takeshita ,  Ryotaro Hayashi ,  Syogo Matsumaru ,  Taku Hirayama ,  Hiroaki Shimizu

    发明人： Hideo Hada ,  Masaru Takeshita ,  Ryotaro Hayashi ,  Syogo Matsumaru ,  Taku Hirayama ,  Hiroaki Shimizu

    IPC分类号： H01L21/027 ,  G03F7/039

    CPC分类号： G03F7/0045 ,  G03F7/0397 ,  Y10S430/122

    摘要： A resist composition is provided that yields fine resolution, and improved levels of line edge roughness and depth of focus. This composition includes a resin component (A) that undergoes a change in alkali solubility under the action of acid, and an acid generator component (B) that generates acid on exposure, wherein the component (A) is a resin with a weight average molecular weight of no more than 8,000 containing structural units (a) derived from a (meth)acrylate ester, and the component (B) includes at least one sulfonium compound represented by a general formula (b-1) or a general formula (b-2) shown below.

    摘要翻译： 提供了抗蚀剂组合物，其产生精细的分辨率，并且改善了线边缘粗糙度和聚焦深度的水平。 该组合物包含在酸作用下发生碱溶解性变化的树脂成分（A）和暴露时产生酸的酸发生剂成分（B），其中，成分（A）为重均分子量 由（甲基）丙烯酸酯衍生的含有结构单元（a）的重量不大于8,000，组分（B）包括至少一种由通式（b-1）或通式（b- 2）如下所示。

    INFORMATION PROCESSING DEVICE, PROGRAM DEVELOPING DEVICE, PROGRAM VERIFYING METHOD, AND PROGRAM PRODUCT
    8.
    发明申请
    INFORMATION PROCESSING DEVICE, PROGRAM DEVELOPING DEVICE, PROGRAM VERIFYING METHOD, AND PROGRAM PRODUCT 失效
    信息处理设备，程序开发设备，程序验证方法和程序产品

    公开(公告)号：US20110296192A1

    公开(公告)日：2011-12-01

    申请号：US13162955

    申请日：2011-06-17

    申请人： Ryotaro HAYASHI ,  Mikio Hashimoto ,  Hiroyoshi Haruki ,  Yurie Fujimatsu

    发明人： Ryotaro HAYASHI ,  Mikio Hashimoto ,  Hiroyoshi Haruki ,  Yurie Fujimatsu

    IPC分类号： H04L9/32 ,  G06F12/14

    CPC分类号： G06F21/54 ,  G06F12/1416 ,  G06F12/1441 ,  G06F21/53 ,  G06F21/6218

    摘要： According to one embodiment, an information processing device stores a program list and plural types of security functions each defining therein protection attributes for respective arguments related to input and output of data to be protected, and stores function argument protection attributes and dependency relations each of which is defined by a determinant set and a dependent attribute that satisfy a predetermined condition. The device detects a combination of first and second security functions in which integrity of variables included in a determinant set of one dependency relation in the first security function are verified by the second security function, generates a third security function which adds protection attributes that guarantee integrity to variables included in the dependent attribute of the dependency relation in the first security function when verification of the second security function is successful and which outputs the variables, and updates the function argument protection attribute and the dependency relation concomitantly with an addition of the third security function.

    摘要翻译： 根据一个实施例，信息处理装置存储节目列表和多种类型的安全功能，每个安全功能各自定义与要保护的数据的输入和输出相关的参数的保护属性，并且存储功能参数保护属性和依赖关系， 由确定集合和依赖属性来定义，该属性集合和满足预定条件的从属属性。 该设备检测第一和第二安全功能的组合，其中包括在第一安全功能中的一个依赖关系的行列式集合中的变量的完整性由第二安全功能验证，生成第三安全功能，其增加保证完整性的保护属性 对第二安全功能的验证成功并且输出变量的第一安全功能中的依赖关系的从属属性中包含的变量，并且随着第三安全性的添加而更新功能参数保护属性和依赖关系 功能。

    Positive resist composition and method for resist pattern formation
    9.
    发明授权
    Positive resist composition and method for resist pattern formation 有权
    抗蚀剂图案形成的正型抗蚀剂组成和方法

    公开(公告)号：US08029968B2

    公开(公告)日：2011-10-04

    申请号：US11570399

    申请日：2005-06-17

    申请人： Ryotaro Hayashi ,  Satoshi Yamada ,  Makiko Irie

    发明人： Ryotaro Hayashi ,  Satoshi Yamada ,  Makiko Irie

    IPC分类号： G03F7/004 ,  G03F7/30

    CPC分类号： G03F7/0397 ,  Y10S430/111

    摘要： A positive resist composition with a broad DOF and a method for resist pattern formation are provided. This composition is a positive resist composition which includes a resin component (A) that exhibits increased alkali solubility under the action of acid and an acid generator component (B) that generates acid upon exposure, wherein the component (A) is a copolymer that contains n [wherein, n is an integer from 4 to 6] structural units with mutually different structures, and the proportion of each structural unit within the copolymer is greater than 0 mol % but no higher than 100/(n−1) mol %.

    摘要翻译： 提供了具有宽DOF的正型抗蚀剂组合物和抗蚀剂图案形成方法。 该组合物是含有在酸的作用下表现出提高的碱溶性的树脂组分（A）和暴露时产生酸的酸产生剂组分（B）的正型抗蚀剂组合物，其中组分（A）是含有 n [其中，n为4〜6的整数]，结构相互不同的结构单元，共聚物中各结构单元的比例大于0摩尔％，但不高于100 /（n-1）摩尔％。