公开(公告)号：US20050220332A1

公开(公告)日：2005-10-06

申请号：US11093264

申请日：2005-03-30

申请人： Satoshi Akutagawa ,  Kazuhiko Takahashi

发明人： Satoshi Akutagawa ,  Kazuhiko Takahashi

IPC分类号： G01N21/956 ,  G03F1/36 ,  G03F1/84 ,  G06K9/00 ,  G06T1/00 ,  G06T7/00 ,  H01L21/027

CPC分类号： G03F1/84 ,  G06T7/001 ,  G06T2207/30148

摘要： An image of an inspection object pattern formed on a photomask is acquired, which is to be transformed into inspection object pattern data as input data of light intensity distribution simulation for finding light intensity distribution in which optical conditions of an exposure system used in pattern transfer are reflected. The light intensity distribution simulation is performed using the inspection object pattern data, and a difference between light intensity distribution of the inspection object pattern obtained by the light intensity distribution simulation and reference light intensity distribution is found. Inverse light intensity distribution simulation having reversibility to the light intensity distribution simulation is performed using the difference, to obtain difference pattern data determining a defect in the inspection object pattern. Consequently, the presence/absence of the defect in the inspection object pattern can be determined highly accurately and defect location in the inspection object pattern can be identified easily and certainly.

摘要翻译： 获取形成在光掩模上的检查对象图案的图像，其将被转换为检查对象图案数据作为用于找到其中图案转印中使用的曝光系统的光学条件的光强度分布的光强分布模拟的输入数据 反映。 使用检查对象图案数据进行光强分布模拟，并且发现通过光强分布模拟获得的检查对象图案的光强度分布与参考光强度分布之间的差异。 使用差异进行具有与光强度分布模拟的可逆性的逆光强度分布模拟，以获得确定检查对象图案中的缺陷的差异图案数据。 因此，可以高精确度地确定检查对象图案中的缺陷的存在/不存在，并且可以容易且确定地识别检查对象图案中的缺陷位置。

公开(公告)号：US06807654B2

公开(公告)日：2004-10-19

申请号：US10067827

申请日：2002-02-08

申请人： Satoshi Akutagawa ,  Yoshimasa Iiduka

发明人： Satoshi Akutagawa ,  Yoshimasa Iiduka

IPC分类号： G06F1750

CPC分类号： G03F1/84 ,  G03F1/36

摘要： From the region near the target pattern, patterns whose barycenter positions are not changed even if deformation is generated due to proximity effect or coarse-and-fine difference at the time of pattern forming are selected as alignment patterns, and the barycenter positions thereof are set as alignment reference coordinates. Rough alignment is carried out based on the reference position provided in a region other than the device forming region, thereby detecting the alignment pattern in the device forming region. Positioning is carried out such that the alignment reference coordinates of the alignment patterns and the center coordinates of the target pattern coincide with each other, and the target pattern is detected.

摘要翻译： 从目标图案附近的区域，即使由于邻近效应而产生变形也不会改变其重心位置的图案，或者图案形成时的粗细差异被选择为对准图案，并且其重心位置被设定 作为对齐参考坐标。 基于设置在器件形成区域以外的区域的基准位置进行粗略校准，从而检测器件形成区域中的取向图案。 执行定位，使得对准图案的对准基准坐标和目标图案的中心坐标彼此一致，并且检测目标图案。

公开(公告)号：US6008822A

公开(公告)日：1999-12-28

申请号：US316391

申请日：1999-05-21

申请人： Masahiro Yumoto ,  Kiyotaka Mochizuki ,  Satoshi Akutagawa ,  Yasufumi Ishihara

发明人： Masahiro Yumoto ,  Kiyotaka Mochizuki ,  Satoshi Akutagawa ,  Yasufumi Ishihara

IPC分类号： G06T1/20 ,  G06T1/60

CPC分类号： G06T1/20

摘要： A graphic processing system for accomplishing high-speed processing of data conversion processing by effectively utilizing file information of input graphic data to improve processing efficiency of data processing inside blocks, and by optimizing block division. This system includes a processing portion for dividing input graphic data in a block unit and executing conversion processing of the graphic data to mask production data, and a storage portion having an optimization condition file for storing the input data information, optimization information of the graphic data to be divided by the processing portion, processing result information, etc, capable of updating and registering the optimization information, and comprises the steps of executing graphic processing by utilizing file data when graphic data existing inside the block is approximate to the graphic data information registered to the optimization condition file; scanning the graphic data inside the block so as to judge whether or not the quantity of the graphic data inside the block exceeds a memory capacity in the processing portion for executing the conversion processing, and to judge the density and the property of the graphic data when the graphic data is not approximate to the graphic data information; and dividing the graphic data into optimum blocks so that the data quantity becomes the quantity that can be processed by the processing portion; and storing the divided information, the input graphic data information and the processing result information.

公开(公告)号：US5936642A

公开(公告)日：1999-08-10

申请号：US828166

申请日：1997-03-27

申请人： Masahiro Yumoto ,  Kiyotaka Mochizuki ,  Satoshi Akutagawa ,  Yasufumi Ishihara

发明人： Masahiro Yumoto ,  Kiyotaka Mochizuki ,  Satoshi Akutagawa ,  Yasufumi Ishihara

IPC分类号： G06T1/20 ,  G06F15/16

CPC分类号： G06T1/20

摘要： A graphic processing system for accomplishing high-speed processing of data conversion processing by effectively utilizing file information of input graphic data to improve processing efficiency of data processing inside blocks, and by optimizing block division. This system includes a processing portion for dividing input graphic data in a block unit and executing conversion processing of the graphic data to mask production data, and a storage portion having an optimization condition file for storing the input data information, optimization information of the graphic data to be divided by the processing portion, processing result information, etc, capable of updating and registering the optimization information, and comprises the steps of executing graphic processing by utilizing file data when graphic data existing inside the block is approximate to the graphic data information registered to the optimization condition file; scanning the graphic data inside the block so as to judge whether or not the quantity of the graphic data inside the block exceeds a memory capacity in the processing portion for executing the conversion processing, and to judge the density and the property of the graphic data when the graphic data is not approximate to the graphic data information; and dividing the graphic data into optimum blocks so that the data quantity becomes the quantity that can be processed by the processing portion; and storing the divided information, the input graphic data information and the processing result information.

摘要翻译： 一种用于通过有效地利用输入图形数据的文件信息来实现数据转换处理的高速处理的图形处理系统，以提高块内数据处理的处理效率，并优化块划分。 该系统包括用于以块为单位分割输入图形数据并执行图形数据的转换处理以掩蔽生产数据的处理部分，以及具有存储输入数据信息的优化条件文件的存储部分，图形数据的优化信息 由处理部分，处理结果信息等划分，能够更新和注册优化信息，并且包括以下步骤：当存在于块内的图形数据近似于注册的图形数据信息时，利用文件数据执行图形处理 到优化条件文件; 扫描块内的图形数据，以便判断块内的图形数据量是否超过用于执行转换处理的处理部分中的存储器容量，并且当图形数据的密度和属性当 图形数据不与图形数据信息近似; 并且将图形数据划分成最佳块，使得数据量成为可由处理部分处理的数量; 并存储分割信息，输入图形数据信息和处理结果信息。

公开(公告)号：US06413688B1

公开(公告)日：2002-07-02

申请号：US09750694

申请日：2001-01-02

申请人： Satoshi Akutagawa ,  Koujiro Suzuki

发明人： Satoshi Akutagawa ,  Koujiro Suzuki

IPC分类号： G03F900

摘要： In the method for inspecting plate patterns which are formed by exposure and development by use of exposure data patterns having a plurality of patterns, the method executes a fine pattern removal processing step, to a plurality of patterns included in the exposure data patterns, including a logical sum processing for changing a plurality of overlaid patterns into a sole pattern; a minus-sizing processing for fining a side of the patterns in a first width; and a plus-sizing processing for thickening the side of the patterns in the first width, thereby forming a reference data pattern. This fine pattern removal processing can remove the fine patterns acting as a cause of pseudo defect included in the exposure data patterns. In the following pattern inspection process, the plate pattern is compared with the reference data pattern, and the disagreement between both the patterns is detected as defective pattern. As the fine patterns acting as a cause of the pseudo defects are removed from the exposure data patterns, in the pattern inspection process, the disagreement between the plate patterns and the reference data patterns is limited to the intrinsic defective patterns, and it is possible to decrease fairly the number of steps of the pattern inspection process.

公开(公告)号：US5889531A

公开(公告)日：1999-03-30

申请号：US826065

申请日：1997-03-24

申请人： Kazuaki Koike ,  Satoshi Akutagawa ,  Yasufumi Ishihara

发明人： Kazuaki Koike ,  Satoshi Akutagawa ,  Yasufumi Ishihara

IPC分类号： H01L21/82 ,  G06F17/50 ,  G06T1/20 ,  G06F15/00

CPC分类号： G06T1/20

摘要： In a program storing unit (14), a dedicated processing program relating to at least one type of specific graphic data in the plurality of types of graphic data and a general purpose processing program which can deal with all of the plurality of types of graphic data are stored. A counting unit (16) counts the number of the specific graphic data included in the graphic data stored in the graphic storing unit. A processing unit (18) compares the counted number of the specific graphic data counted by the counting unit with a predetermined reference value. When the counted value is larger than or equal to the reference value, all of the graphic data are processed by the dedicated processing program, and the graphic data, which cannot be dealt with by the dedicated processing program, are processed by the general purpose processing program. When the count value is less than the reference value, all of the graphic data are processed by the general purpose processing program. Thus, the graphic processing time can be reduced.

摘要翻译： 在节目存储单元（14）中，与多种类型的图形数据中的至少一种类型的特定图形数据有关的专用处理程序和能够处理所有多种图形数据的通用处理程序 被存储。 计数单元（16）对存储在图形存储单元中的图形数据中包括的特定图形数据的数量进行计数。 处理单元（18）将由计数单元计数的特定图形数据的计数数与预定基准值进行比较。 当计数值大于或等于参考值时，所有图形数据由专用处理程序处理，并且由专用处理程序不能处理的图形数据通过通用处理 程序。 当计数值小于参考值时，所有图形数据都由通用处理程序处理。 因此，可以减少图形处理时间。

公开(公告)号：US20130250426A1

公开(公告)日：2013-09-26

申请号：US13880764

申请日：2011-10-24

申请人： Jiro Hattori ,  Shoichi Masuda ,  Satoshi Akutagawa ,  Yasuhiro Kinoshita

发明人： Jiro Hattori ,  Shoichi Masuda ,  Satoshi Akutagawa ,  Yasuhiro Kinoshita

IPC分类号： G02B3/00

CPC分类号： G02B3/005 ,  G02B3/0031 ,  G02B3/0075 ,  G02B27/2292 ,  G03B35/24

摘要： A microlens sheet that can be used as a floating image material is provided having a microlens array layer that can be produced by a more simple replication process, without requiring adjustment of the thickness. The microlens sheet has high scratch resistance and dust resistance. The microlens sheet has a microlens array layer including a first surface, and a second surface formed by replication, having a plurality of arranged convex lenses and one or more partition walls with a fixed height (Hw) that protrudes past the top of the convex lenses, a radiation sensitive layer which is disposed substantially at a focal position of the convex lenses on a side of the microlens array layer opposite the first surface, and which is substantially parallel to the second surface.

摘要翻译： 提供了可以用作浮动图像材料的微透镜片，其具有可以通过更简单的复制过程产生的微透镜阵列层，而不需要调整厚度。 微透镜片具有高耐刮擦性和防尘性。 微透镜片具有微透镜阵列层，其包括第一表面和通过复制形成的第二表面，具有多个布置的凸透镜和一个或多个具有突出超过凸透镜顶部的固定高度（Hw）的分隔壁 辐射敏感层，其基本上设置在所述微透镜阵列层的与所述第一表面相对的一侧上的所述凸透镜的聚焦位置处，并且基本上平行于所述第二表面。

公开(公告)号：US07466405B2

公开(公告)日：2008-12-16

申请号：US11093264

申请日：2005-03-30

申请人： Satoshi Akutagawa ,  Kazuhiko Takahashi

发明人： Satoshi Akutagawa ,  Kazuhiko Takahashi

IPC分类号： G01N21/00

CPC分类号： G03F1/84 ,  G06T7/001 ,  G06T2207/30148

摘要： An image of an inspection object pattern formed on a photomask is acquired, which is to be transformed into inspection object pattern data as input data of light intensity distribution simulation for finding light intensity distribution in which optical conditions of an exposure system used in pattern transfer are reflected. The light intensity distribution simulation is performed using the inspection object pattern data, and a difference between light intensity distribution of the inspection object pattern obtained by the light intensity distribution simulation and reference light intensity distribution is found. Inverse light intensity distribution simulation having reversibility to the light intensity distribution simulation is performed using the difference, to obtain difference pattern data determining a defect in the inspection object pattern. Consequently, the presence/absence of the defect in the inspection object pattern can be determined highly accurately and defect location in the inspection object pattern can be identified easily and certainly.

摘要翻译： 获取形成在光掩模上的检查对象图案的图像，其将被转换为检查对象图案数据作为用于找到其中图案转印中使用的曝光系统的光学条件的光强度分布的光强分布模拟的输入数据 反映。 使用检查对象图案数据进行光强分布模拟，并且发现通过光强分布模拟获得的检查对象图案的光强度分布与参考光强度分布之间的差异。 使用差异进行具有与光强度分布模拟的可逆性的逆光强度分布模拟，以获得确定检查对象图案中的缺陷的差异图案数据。 因此，可以高精确度地确定检查对象图案中的缺陷的存在/不存在，并且可以容易且确定地识别检查对象图案中的缺陷位置。

公开(公告)号：US5287290A

公开(公告)日：1994-02-15

申请号：US989459

申请日：1992-12-10

申请人： Katsuji Tabara ,  Satoshi Akutagawa

发明人： Katsuji Tabara ,  Satoshi Akutagawa

IPC分类号： G06F17/50 ,  G06T7/00 ,  G06F15/46

CPC分类号： G06T7/0006 ,  G06F17/5081 ,  G06T2207/30148

摘要： A method and an apparatus for checking a mask pattern including a plurality of mask pattern regions formed based on different design pattern rules. The method includes the steps of: defining each of the mask pattern regions as a check object region; setting a defect detection reference corresponding to a respective design pattern rule of the mask pattern regions for each of the check object regions; and detecting presence or absence of defects in the mask pattern based on the respective defect detection reference for each of the check object regions. By these steps, it is possible to realize reduction in check time of the mask pattern and improvement in throughput of the checking apparatus, without necessitating discrimination processing of pseudo defects in the mask pattern.

摘要翻译： 一种用于检查包括基于不同设计图案规则形成的多个掩模图案区域的掩模图案的方法和装置。 该方法包括以下步骤：将每个掩模图案区域定义为检查对象区域; 设置对应于每个检查对象区域的掩模图案区域的相应设计图案规则的缺陷检测基准; 并且基于每个检查对象区域的各个缺陷检测参考来检测掩模图案中的缺陷的存在或不存在。 通过这些步骤，可以实现掩模图案的检查时间的缩短和检查装置的吞吐量的提高，而不需要掩模图案中的伪缺陷的判别处理。

公开(公告)号：US4967229A

公开(公告)日：1990-10-30

申请号：US333414

申请日：1989-04-05

申请人： Satoshi Akutagawa

发明人： Satoshi Akutagawa

IPC分类号： G03F1/00 ,  G03F1/70 ,  H01L21/027 ,  H01L21/268 ,  H01L21/30 ,  H01L21/301

CPC分类号： H01L21/268

摘要： A process for forming dicing lines on a wafer which comprises: exposing a wafer region in which a dicing line pattern has not been formed to light irradiated through and patterned by a reticle for forming dicing lines; the reticle having a nonpatterned region of the same size as a device pattern region of a reticle for forming a device pattern on the wafer and a dicing zone which is in contact with the periphery of the nonpatterned region.