公开(公告)号：US20170121531A1

公开(公告)日：2017-05-04

申请号：US15129403

申请日：2015-03-25

Applicant: SEUNG-YEOL HAN ,  Paul C. Ahrens ,  John Arthur DeVos

Inventor： SEUNG-YEOL HAN ,  Paul C. Ahrens ,  John Arthur DeVos

IPC: C09D5/00 ,  H01L31/0216 ,  G02B1/111 ,  C03C17/02 ,  C09D183/02

CPC classification number: C09D5/006 ,  C03C17/007 ,  C03C17/009 ,  C03C2217/732 ,  C03C2217/78 ,  C03C2218/11 ,  C08G77/02 ,  C08G77/04 ,  C09D7/40 ,  C09D7/66 ,  C09D183/02 ,  F24S70/30 ,  G02B1/111 ,  H01L31/02168 ,  Y02E10/40 ,  C08K3/36 ,  C08L83/00

Abstract: Disclosed herein is an inventive low-temperature curable antireflective (AR) coating produced by a single layer sol gel deposition process comprising a low-temperature curing step, whereby temperatures well below 100° C. for under 8 hours result in highly robust AR coatings having excellent transmittance and abrasion resistance. Optical, mechanical and chemical properties may be tuned by adjustment of the formulation of the wet coating solution. In this way, the inventive AR coating is able to provide enhanced mechanical and moisture resistance, as well as superior optical performance that can be optimized to suit a particular environment. The innovation advantageously enables applying AR coatings to substrates installed in the field, allowing passive heating of the substrate by sun exposure to provide the heat for curing the inventive coatings outdoors.

公开(公告)号：US08553333B2

公开(公告)日：2013-10-08

申请号：US13189411

申请日：2011-07-22

Applicant: Chih-hung Chang ,  Seung-Yeol Han ,  Brian K. Paul

Inventor： Chih-hung Chang ,  Seung-Yeol Han ,  Brian K. Paul

IPC: G02B27/10 ,  B32B5/16

CPC classification number: G02B1/118 ,  B01F5/0256 ,  B01F13/0059 ,  B01F13/0066 ,  B01J19/0093 ,  B01J2219/00783 ,  B01J2219/00835 ,  B01J2219/00837 ,  B01J2219/00846 ,  B01J2219/00889 ,  B01J2219/00943 ,  B82Y20/00 ,  B82Y30/00 ,  C23C18/1212 ,  C23C18/1216 ,  C23C18/1225 ,  G02B1/14 ,  Y10T428/25

Abstract: Embodiments of the present system and method are useful for chemical deposition, particularly continuous deposition of anti-reflective films. Disclosed systems typically comprise a micromixer and a microchannel applicator. A deposition material or materials is applied to a substrate to form a nanostructured, anti-reflective coating. Uniform and highly oriented surface morphologies of films deposited using disclosed embodiments are clearly improved compared to films deposited by a conventional batch process. In some embodiments, a scratch-resistant, anti-reflective coating is applied to a polycarbonate substrate, such as a lens. In certain embodiments, an anti-reflective coating is applied to a surface of a solar catalytic microreactor suitable for performing endothermic reactions, where energy is provided to the reactor by absorption of solar radiation. The composition and morphology of the material deposited on a substrate can be tailored. The process can be used at low temperatures as a post-deposition, high-temperature annealing step is obviated.

Abstract translation: 本发明的系统和方法的实施例对于化学沉积，特别是抗反射膜的连续沉积是有用的。 公开的系统通常包括微混合器和微通道施加器。 将沉积材料或材料施加到基底以形成纳米结构的抗反射涂层。 使用所公开的实施例沉积的膜的均匀且高度取向的表面形态与通过常规间歇方法沉积的膜相比显然改善。 在一些实施例中，将防刮擦的抗反射涂层施加到聚碳酸酯基底，例如透镜。 在某些实施方案中，将抗反射涂层施加到适于进行吸热反应的太阳能催化微反应器的表面，其中通过吸收太阳辐射将能量提供给反应器。 沉积在基底上的材料的组成和形态可以被定制。 该方法可以在低温下使用，因为后期沉积，高温退火步骤被消除。

公开(公告)号：US20120176681A1

公开(公告)日：2012-07-12

申请号：US13189411

申请日：2011-07-22

Applicant: Chih-hung Chang ,  Seung-Yeol Han ,  Brian K. Paul

Inventor： Chih-hung Chang ,  Seung-Yeol Han ,  Brian K. Paul

IPC: G02B1/11 ,  B01J19/10 ,  B05D5/06 ,  C23C16/50 ,  B01J19/08 ,  B01J19/12 ,  B82Y20/00 ,  B82Y99/00

CPC classification number: G02B1/118 ,  B01F5/0256 ,  B01F13/0059 ,  B01F13/0066 ,  B01J19/0093 ,  B01J2219/00783 ,  B01J2219/00835 ,  B01J2219/00837 ,  B01J2219/00846 ,  B01J2219/00889 ,  B01J2219/00943 ,  B82Y20/00 ,  B82Y30/00 ,  C23C18/1212 ,  C23C18/1216 ,  C23C18/1225 ,  G02B1/14 ,  Y10T428/25

Abstract: Embodiments of the present system and method are useful for chemical deposition, particularly continuous deposition of anti-reflective films. Disclosed systems typically comprise a micromixer and a microchannel applicator. A deposition material or materials is applied to a substrate to form a nanostructured, anti-reflective coating. Uniform and highly oriented surface morphologies of films deposited using disclosed embodiments are clearly improved compared to films deposited by a conventional batch process. In some embodiments, a scratch-resistant, anti-reflective coating is applied to a polycarbonate substrate, such as a lens. In certain embodiments, an anti-reflective coating is applied to a surface of a solar catalytic microreactor suitable for performing endothermic reactions, where energy is provided to the reactor by absorption of solar radiation. The composition and morphology of the material deposited on a substrate can be tailored. The process can be used at low temperatures as a post-deposition, high-temperature annealing step is obviated.

Abstract translation: 本发明的系统和方法的实施例对于化学沉积，特别是抗反射膜的连续沉积是有用的。 公开的系统通常包括微混合器和微通道施加器。 将沉积材料或材料施加到基底以形成纳米结构的抗反射涂层。 使用所公开的实施例沉积的膜的均匀且高度取向的表面形态与通过常规间歇方法沉积的膜相比显然改善。 在一些实施例中，将防刮擦的抗反射涂层施加到聚碳酸酯基底，例如透镜。 在某些实施方案中，将抗反射涂层施加到适于进行吸热反应的太阳能催化微反应器的表面，其中通过吸收太阳辐射将能量提供给反应器。 沉积在基底上的材料的组成和形态可以被定制。 该方法可以在低温下使用，因为后期沉积，高温退火步骤被消除。

公开(公告)号：US20150276989A1

公开(公告)日：2015-10-01

申请号：US14668967

申请日：2015-03-25

Applicant: SEUNG-YEOL HAN ,  Paul C. Ahrens ,  John Arthur DeVos

Inventor： SEUNG-YEOL HAN ,  Paul C. Ahrens ,  John Arthur DeVos

IPC: G02B1/113 ,  G02B1/115 ,  C08K5/5415 ,  H01L31/0216 ,  C09D5/00 ,  C08K3/36

CPC classification number: B05C1/08 ,  B05B3/00 ,  B05B9/06 ,  B05B13/005 ,  B05C1/025 ,  B05C1/06 ,  B05C5/0258 ,  B05C11/1005 ,  B05C11/1015 ,  B05C13/02 ,  B05C17/0341 ,  B05C17/10 ,  B05D1/02 ,  B82Y20/00 ,  C03C17/001 ,  C08K3/34 ,  C08K3/36 ,  C08K5/5415 ,  C09D1/02 ,  C09D5/00 ,  C09D5/006 ,  C09D7/60 ,  C09D7/66 ,  G02B1/111 ,  G02B1/113 ,  G02B1/115 ,  H01L31/02168 ,  H01L31/18 ,  H02S40/22 ,  H02S50/10 ,  Y02B10/12 ,  Y02E10/52

Abstract: Disclosed herein is an inventive low-temperature curable antireflective (AR) coating produced by a single layer sol gel deposition process comprising a low-temperature curing step, whereby temperatures well below 100° C. for under 8 hours result in highly robust AR coatings having excellent transmittance and abrasion resistance. Optical, mechanical and chemical properties may be tuned by adjustment of the formulation of the wet coating solution. In this way, the inventive AR coating is able to provide enhanced mechanical and moisture resistance, as well as superior optical performance that can be optimized to suit a particular environment. The invention advantageously enables applying AR coatings to substrates installed in the field, allowing passive heating of the substrate by sun exposure to provide the heat for curing the inventive coatings outdoors.

Abstract translation: 本文公开了本发明的低温可固化抗反射（AR）涂层，其通过包含低温固化步骤的单层溶胶凝胶沉积方法制备，由此在低于100℃的温度下8小时以下的温度导致高度鲁棒的AR涂层，其具有 优异的透光率和耐磨性。 光学，机械和化学性质可以通过调整湿涂层溶液的配方来调节。 以这种方式，本发明的AR涂层能够提供增强的机械和防湿性，以及优化的光学性能，以适应特定环境。 本发明有利地将AR涂层应用于现场安装的基板，允许通过阳光曝晒来对基板进行被动加热，以提供用于固化本发明涂层的热量。