公开(公告)号：US20060102204A1

公开(公告)日：2006-05-18

申请号：US10987594

申请日：2004-11-12

Applicant: Gunilla Jacobson ,  Bentley Palmer ,  Shan Clark ,  Vijayakumar Ramachandrarao ,  Subramanyam Iyer ,  Robert Turkot

Inventor： Gunilla Jacobson ,  Bentley Palmer ,  Shan Clark ,  Vijayakumar Ramachandrarao ,  Subramanyam Iyer ,  Robert Turkot

IPC: C23G1/00 ,  B08B3/00

CPC classification number: B08B7/0021 ,  C23G5/00 ,  G03F7/427 ,  H01L21/02063 ,  H01L21/02101 ,  H01L21/31133

Abstract: A method for cleaning a substrate containing a micro-feature having a residue thereon. The method includes treating the substrate with a supercritical carbon dioxide cleaning solution containing a peroxide to remove the residue from the micro-feature, where the supercritical carbon dioxide cleaning solution is maintained at a temperature between about 35° C. and about 80° C. According an embodiment of the invention, the supercritical carbon dioxide cleaning solution can further contain ozone. According to another embodiment of the invention, the substrate can be pre-treated with an ozone processing environment.

Abstract translation: 一种清洗含有残留物的微特征的基材的方法。 该方法包括用含有过氧化物的超临界二氧化碳清洗溶液处理底物以从微特征中除去残余物，其中超临界二氧化碳清洗溶液保持在约35℃至约80℃的温度。 根据本发明的一个实施方案，超临界二氧化碳清洗溶液可以进一步含有臭氧。 根据本发明的另一个实施例，可以用臭氧处理环境预处理衬底。

公开(公告)号：US20220254271A1

公开(公告)日：2022-08-11

申请号：US17594695

申请日：2020-04-29

Applicant: Helen Shan Clark

Inventor： Helen Shan Clark

IPC: G09B17/04 ,  G09B17/02 ,  G09B21/00 ,  G02B27/01

Abstract: Exemplary visual processing devices and methods are disclosed. Example devices may include a visual processing aid having at least one anchoring element (76) that is attached to a housing (74) such that the anchoring element is positioned proximal to a line of sight, between an optic nerve of a user and a scene. The anchoring element has a predetermined, uniform change in the value of a property, to enable a user to assimilate visual information from a left visual field and a right visual field, quickly and accurately and produce an image of a scene. Other devices and methods are described and shown.

公开(公告)号：US20060183348A1

公开(公告)日：2006-08-17

申请号：US11060843

申请日：2005-02-17

Applicant: Robert Meagley ,  Michael Leeson ,  Michael Goodner ,  Bob Leet ,  Michael McSwiney ,  Shan Clark

Inventor： Robert Meagley ,  Michael Leeson ,  Michael Goodner ,  Bob Leet ,  Michael McSwiney ,  Shan Clark

IPC: H01L21/31

CPC classification number: H01L21/76808 ,  G03F7/091 ,  H01L21/0276 ,  H01L21/31144 ,  H01L21/76822 ,  H01L21/76829 ,  H01L21/76834 ,  H01L21/76835

Abstract: Multiple-layer films in integrated circuit processing may be formed by the phase segregation of a single composition formed above a semiconductor substrate. The composition is then induced to phase segregate into at least a first continuous phase and a second continuous phase. The composition may be formed of two or more components that phase segregate into different continuous layers. The composition may also be a single component that breaks down upon activation into two or more components that phase segregate into different continuous layers. Phase segregation may be used to form, for example, a sacrificial light absorbing material (SLAM) and a developer resistant skin, a dielectric layer and a hard mask, a photoresist and an anti-reflective coating (ARC), a stress buffer coating and a protective layer on a substrate package, and light interference layers.

Abstract translation: 集成电路处理中的多层膜可以通过在半导体衬底上形成的单一组合物的相分离来形成。 然后将组合物诱导相分离成至少第一连续相和第二连续相。 组合物可以由相分离成不同连续层的两种或多种组分形成。 组合物还可以是单一组分，其在活化时分解成两个或多个相分离成不同连续层的组分。 相分离可用于形成例如牺牲光吸收材料（SLAM）和显影剂抗性皮肤，介电层和硬掩模，光致抗蚀剂和抗反射涂层（ARC），应力缓冲涂层和 衬底封装上的保护层，以及光干涉层。

公开(公告)号：US06982022B2

公开(公告)日：2006-01-03

申请号：US10442543

申请日：2003-05-21

Applicant: Shan Clark ,  Gary Kneezel ,  Ram Narang ,  Bidan Zhang ,  Almon Fisher

Inventor： Shan Clark ,  Gary Kneezel ,  Ram Narang ,  Bidan Zhang ,  Almon Fisher

IPC: B32B31/00 ,  B41J2/16 ,  G03C5/00

CPC classification number: B41J2/1631 ,  B41J2/1433 ,  B41J2/162 ,  B41J2/1645

Abstract: Disclosed is a process for forming a novel ink jet printhead which comprises: (a) providing a lower substrate in which one surface thereof has an array of drop generating elements and addressing electrodes formed thereon; (b) depositing onto the release surface of an intermediate film support a photopatternable layer comprising a precursor polymer which is a phenolic novolac resin having glycidyl ether functional groups; (c) prebaking the photopatternable layer to dry, semi-solid condition; (d) laminating the dry, semi-solid layer to the surface of the lower substrate under heat and pressure and separating it from the release surface of the intermediate film support; (e) exposing the photopatternable layer to actinic radiation in an imagewise pattern corresponding to ink nozzles and developing to form a nozzle plate section, and (f) removing the precursor polymer from the unexposed areas, thereby forming ink nozzle recesses which are aligned to communicate with the drop generating elements and terminal ends of the electrodes of the lower substrate laminated thereto. Step (e) may be carried out either before or after step (d).

Abstract translation: 公开了一种用于形成新颖的喷墨打印头的方法，其包括：（a）提供下基板，其中一个表面具有形成在其上的液滴产生元件阵列和寻址电极; （b）在中间膜的释放表面上沉积载体，该光可图案化层包括具有缩水甘油醚官能团的酚醛清漆树脂的前体聚合物; （c）将光图案层预烘烤成干燥，半固态; （d）在加热和加压下将干燥半固体层层压到下基板的表面，并将其从中间膜载体的释放表面分离; （e）以与油墨喷嘴相对应的成像图案将光图案层暴露于光化辐射并显影以形成喷嘴板部分，以及（f）从未曝光区域移除前体聚合物，由此形成对齐以连通的墨喷嘴凹部 其中下层发生元件和下基板的电极的末端层压在其上。 步骤（e）可以在步骤（d）之前或之后进行。

公开(公告)号：US20050214673A1

公开(公告)日：2005-09-29

申请号：US11134662

申请日：2005-05-20

Applicant: Shan Clark ,  Gary Kneezel ,  Ram Narang ,  Bidan Zhang ,  Almon Fisher

Inventor： Shan Clark ,  Gary Kneezel ,  Ram Narang ,  Bidan Zhang ,  Almon Fisher

IPC: B41J2/16 ,  B41J2/175 ,  B41J2/05

CPC classification number: B41J2/17563 ,  B41J2/16 ,  B41J2/1623 ,  B41J2/1628 ,  B41J2/1631 ,  B41J2/1632 ,  B41J2/1635 ,  B41J2/1645

Abstract: Disclosed is a process for forming a channel wafer for a novel ink jet printhead, having an ink particle-filter layer over the ink-inlet surface thereof. The process comprises the steps of applying a thin coating of a heat-curable, photopatternable polymer composition to an intermediate substrate having a release surface and drying the coating to form a semi-solid adhesive layer. The layer and supporting substrate are pressed against the ink-inlet surface of a channel wafer with an optional adhesive layer to bond the layer to the ink inlet surface. The substrate is separated to transfer the contacting area of the semi-solid layer to the ink-inlet surface as a laminate, and the semi-solid layer is exposed through a filter-forming mask and ink particle-filter openings are developed therethrough, either before or after transfer of the semi-solid adhesive layer from the intermediate substrate to the ink-inlet surface of the channel wafer, and the filter layer is cured.

Abstract translation: 公开了一种用于形成用于新型喷墨打印头的通道晶片的方法，在其墨入口表面上具有墨颗粒过滤层。 该方法包括以下步骤：将具有可热固化的可光化图案化的聚合物组合物的薄涂层施加到具有剥离表面的中间基材上并干燥该涂层以形成半固体粘合剂层。 层和支撑衬底用可选的粘合剂层压在通道晶片的墨入口表面上，以将层粘合到墨入口表面。 分离衬底以将半固体层的接触面积作为层压体转移到油墨入口表面，并且半固体层通过过滤器形成掩模暴露，并且墨水颗粒过滤器开口通过其开展，或者 在将半固体粘合剂层从中间基材转移到通道晶片的墨入口表面之前或之后，并且过滤层被固化。

公开(公告)号：US20060024616A1

公开(公告)日：2006-02-02

申请号：US11143126

申请日：2005-06-01

Applicant: Shan Clark ,  Kim-Khanh Ho ,  James Clarke ,  Ernisse Putna ,  Wang Yueh ,  Robert Meagley

Inventor： Shan Clark ,  Kim-Khanh Ho ,  James Clarke ,  Ernisse Putna ,  Wang Yueh ,  Robert Meagley

IPC: G03C5/00

CPC classification number: G03F7/327

Abstract: A basic developer/quencher solution formulated to include at least one supercritical fluid or liquid solvent and a base may be used to quench a photo-generated acid within a photoresist as well as develop the photoresist. The supercritical fluid or liquid solvent may be carbon dioxide and the base may be quaternary ammonium salt that has side groups that increase the solubility of the quaternary ammonium salt in carbon dioxide.

Abstract translation: 配制成包括至少一种超临界流体或液体溶剂和碱的基本显影剂/猝灭剂溶液可用于淬灭光致抗蚀剂内的光生酸，以及显影光致抗蚀剂。 超临界流体或液体溶剂可以是二氧化碳，碱可以是具有增加季铵盐在二氧化碳中的溶解度的侧基的季铵盐。

公开(公告)号：US20050221218A1

公开(公告)日：2005-10-06

申请号：US10815528

申请日：2004-03-31

Applicant: Shan Clark ,  Ernisse Putna ,  Robert Meagley

Inventor： Shan Clark ,  Ernisse Putna ,  Robert Meagley

IPC: G03C1/492 ,  G03F7/09 ,  G03F7/40

CPC classification number: G03F7/091 ,  G03F7/40

Abstract: Anti-reflective materials such as bottom anti-reflective coatings (BARC's) and sacrificial light absorbing materials (SLAM) may be made more effective at preventing coherent light or electron beam reflection from a substrate by including in the anti-reflective material an additive to alter the radiation beam path of the reflected light or electrons. The radiation beam path altering additive may be a reflective material or a refractive material. The inclusion of such a radiation beam bath altering additive may reduce line width roughness and increase critical dimension (CD) control of interconnect lines and vias.

Abstract translation: 防反射材料如底部抗反射涂层（BARC）和牺牲光吸收材料（SLAM）可以更有效地通过在抗反射材料中包含添加剂来改变基底的相干光或电子束反射，从而改变 反射光或电子的辐射束路径。 辐射束路径改变添加剂可以是反射材料或折射材料。 包含这种辐射束浴改变添加剂可以减小线宽粗糙度并增加互连线和通孔的临界尺寸（CD）控制。

公开(公告)号：US07275817B2

公开(公告)日：2007-10-02

申请号：US11134662

申请日：2005-05-20

Applicant: Shan Clark ,  Gary Kneezel ,  Ram Narang ,  Bidan Zhang ,  Almon Fisher

Inventor： Shan Clark ,  Gary Kneezel ,  Ram Narang ,  Bidan Zhang ,  Almon Fisher

IPC: B41J2/175

CPC classification number: B41J2/17563 ,  B41J2/16 ,  B41J2/1623 ,  B41J2/1628 ,  B41J2/1631 ,  B41J2/1632 ,  B41J2/1635 ,  B41J2/1645

Abstract: Disclosed is a process for forming a channel wafer for a novel ink jet printhead, having an ink particle-filter layer over the ink-inlet surface thereof. The process includes the steps of applying a thin coating of a heat-curable, photopatternable polymer composition to an intermediate substrate having a release surface and drying the coating to form a semi-solid adhesive layer. The layer and supporting substrate are pressed against the ink-inlet surface of a channel wafer with an optional adhesive layer to bond the layer to the ink inlet surface. The substrate is separated to transfer the contacting area of the semi-solid layer to the ink-inlet surface as a laminate, and the semi-solid layer is exposed through a filter-forming mask and ink particle-filter openings are developed therethrough, either before or after transfer of the semi-solid adhesive layer from the intermediate substrate to the ink-inlet surface of the channel wafer, and the filter layer is cured.

Abstract translation: 公开了一种用于形成用于新型喷墨打印头的通道晶片的方法，在其墨入口表面上具有墨颗粒过滤层。 该方法包括以下步骤：将具有可热固化的可光化图案化的聚合物组合物的薄涂层施加到具有剥离表面的中间基材上，并干燥该涂层以形成半固体粘合剂层。 层和支撑衬底用可选的粘合剂层压在通道晶片的墨入口表面上，以将层粘合到墨入口表面。 分离衬底以将半固体层的接触面积作为层压体转移到油墨入口表面，并且半固体层通过过滤器形成掩模暴露，并且墨水颗粒过滤器开口通过其开展，或者 在将半固体粘合剂层从中间基材转移到通道晶片的墨入口表面之前或之后，并且过滤层被固化。

公开(公告)号：US07101030B2

公开(公告)日：2006-09-05

申请号：US10442569

申请日：2003-05-21

Applicant: Shan Clark ,  Gary Kneezel ,  Ram Narang ,  Bidan Zhang ,  Almon Fisher

Inventor： Shan Clark ,  Gary Kneezel ,  Ram Narang ,  Bidan Zhang ,  Almon Fisher

IPC: B41J2/175

CPC classification number: B41J2/17563 ,  B41J2/16 ,  B41J2/1623 ,  B41J2/1628 ,  B41J2/1631 ,  B41J2/1632 ,  B41J2/1635 ,  B41J2/1645

Abstract: Disclosed is a process for forming a channel wafer for a novel ink jet printhead, having an ink particle-filter layer over the ink-inlet surface thereof. The process comprises the steps of applying a thin coating of a heat-curable, photopatternable polymer composition to an intermediate substrate having a release surface and drying the coating to form a semi-solid adhesive layer. The layer and supporting substrate are pressed against the ink-inlet surface of a channel wafer with an optional adhesive layer to bond the layer to the ink inlet surface. The substrate is separated to transfer the contacting area of the semi-solid layer to the ink-inlet surface as a laminate, and the semi-solid layer is exposed through a filter-forming mask and ink particle-filter openings are developed therethrough, either before or after transfer of the semi-solid adhesive layer from the intermediate substrate to the ink-inlet surface of the channel wafer, and the filter layer is cured.

Abstract translation: 公开了一种用于形成用于新型喷墨打印头的通道晶片的方法，在其墨入口表面上具有墨颗粒过滤层。 该方法包括以下步骤：将具有可热固化的可光化图案化的聚合物组合物的薄涂层施加到具有剥离表面的中间基材上并干燥该涂层以形成半固体粘合剂层。 层和支撑衬底用可选的粘合剂层压在通道晶片的墨入口表面上，以将层粘合到墨入口表面。 分离衬底以将半固体层的接触面积作为层压体转移到油墨入口表面，并且半固体层通过过滤器形成掩模暴露，并且墨水颗粒过滤器开口通过其开展，或者 在将半固体粘合剂层从中间基材转移到通道晶片的墨入口表面之前或之后，并且过滤层被固化。

公开(公告)号：US20090241988A1

公开(公告)日：2009-10-01

申请号：US12058797

申请日：2008-03-31

Applicant: Vijayakumar S. RAMACHANDRARAO ,  Melanie S. Reyes ,  Shan Clark ,  John O'Sullivan

Inventor： Vijayakumar S. RAMACHANDRARAO ,  Melanie S. Reyes ,  Shan Clark ,  John O'Sullivan

IPC: G03F7/42 ,  B08B7/00

CPC classification number: G03F7/425 ,  G03F7/423 ,  H01L21/02063 ,  H01L21/31133

Abstract: An aqueous solution composition may include an organic base hydroxide, potassium hydroxide, a compound selected from the group of compounds consisting of 2-mercaptobenzimidazole, 1-Phenyl-1H-tetrazole-5-thiol and 2-MerCaptoBenzoThiazole, hydrogen peroxide and deionized water. A method for removing photoresist and anti-reflective coating from a wafer using such a solution is also disclosed.

Abstract translation: 水溶液组合物可以包括有机碱氢氧化物，氢氧化钾，选自由2-巯基苯并咪唑，1-苯基-1H-四唑-5-硫醇和2-巯基苯并噻唑组成的化合物的化合物，过氧化氢和去离子水。 还公开了使用这种溶液从晶片去除光致抗蚀剂和抗反射涂层的方法。