Defect inspection device and defect inspection method
    2.
    发明授权
    Defect inspection device and defect inspection method 有权
    缺陷检查装置和缺陷检查方法

    公开(公告)号:US09019492B2

    公开(公告)日:2015-04-28

    申请号:US13989835

    申请日:2011-11-10

    摘要: To prevent overlooking of a defect due to reduction in a defect signal, a defect inspection device is configured such that: light is irradiated onto an object to be inspected on which a pattern is formed; reflected, diffracted, and scattered light generated from the object by the irradiation of the light is collected, such that a first optical image resulting from the light passed through a first spatial filter having a first shading pattern is received by a first detector, whereby a first image is obtained; the reflected, diffracted, and scattered light generated from the object is collected, such that a second optical image resulting from the light passed through a second spatial filter having a second shading pattern is received by a second detector, whereby a second image is obtained; and the first and second images thus obtained are processed integrally to detect a defect candidate(s).

    摘要翻译: 为了防止由于缺陷信号的减少而忽视缺陷,缺陷检查装置被配置为使得光被照射到形成有图案的待检查对象上; 收集通过照射光从物体产生的反射,衍射和散射光,使得由通过具有第一阴影图案的第一空间滤光器的光产生的第一光学图像由第一检测器接收,由此 获得第一幅图像; 从物体产生的反射,衍射和散射光被收集,使得由通过具有第二阴影图案的第二空间滤光器的光产生的第二光学图像由第二检测器接收,由此获得第二图像; 并且由此获得的第一和第二图像被整体地处理以检测缺陷候选。

    DEFECT INSPECTING APPARATUS AND DEFECT INSPECTING METHOD
    3.
    发明申请
    DEFECT INSPECTING APPARATUS AND DEFECT INSPECTING METHOD 有权
    缺陷检查装置和缺陷检查方法

    公开(公告)号:US20130188184A1

    公开(公告)日:2013-07-25

    申请号:US13700150

    申请日:2011-06-17

    IPC分类号: G01N21/956

    摘要: A defect inspecting apparatus includes an irradiation optical system having a light source that emits illumination light and a polarization generation part that adjusts polarization state of the illumination light emitted from the light source, a detection optical system having a polarization analysis part that adjusts polarization state of scattered light from a sample irradiated by the irradiation optical system and a detection part that detects the scattered light adjusted by the polarization analysis part, and a signal processing system that processes the scattered light detected by the detection optical system to detect a defect presenting in the sample. The polarization generation part adjusts the polarization state of the illumination light emitted from the light source on the basis of predetermined illumination conditions and the polarization analysis part adjusts the polarization state of the illumination light emitted from the light source on the basis of predetermined detection conditions.

    摘要翻译: 缺陷检查装置包括具有发出照明光的光源的照射光学系统和调整从光源发出的照明光的偏振状态的偏振光产生部,具有调整偏振状态的偏振光分析部的检测光学系统 由照射光学系统照射的样本的散射光和检测由偏振分析部调节的散射光的检测部,以及处理由检测光学系统检测出的散射光的信号处理系统, 样品。 偏光产生部根据规定的照明条件来调整从光源发出的照明光的偏光状态,偏光分析部基于规定的检测条件来调整从光源发出的照明光的偏振状态。

    Method of measuring pattern shape, method of manufacturing semiconductor device, and process control system
    4.
    发明授权
    Method of measuring pattern shape, method of manufacturing semiconductor device, and process control system 有权
    测量图案形状的方法,制造半导体器件的方法以及过程控制系统

    公开(公告)号:US08227265B2

    公开(公告)日:2012-07-24

    申请号:US12823024

    申请日:2010-06-24

    IPC分类号: H01L21/66

    摘要: A method of measuring a pattern shape of performing a shape measurement of a semiconductor pattern at a high accuracy even when a process margin is narrow with respect to miniaturization of a semiconductor device is provided. In the method of measuring a pattern shape, when a best-match calculated waveform cannot be selected, at least one parameter among shape parameters is set as a fixed value based on information obtained by another measurement apparatus that uses a measurement method independent to the pattern shape measurement, a matching of a library and a detected waveform is performed again, a best-match calculated waveform is selected, and shape information of an object pattern is obtained from the best-match calculated waveform.

    摘要翻译: 提供了即使当相对于半导体器件的小型化而处理裕度窄时,也可以高精度地测量执行半导体图案的形状测量的图案形状的方法。 在测定图案形状的方法中,当不能选择最佳匹配计算波形时,基于使用独立于图案的测量方法的另一测量装置获得的信息,将形状参数中的至少一个参数设置为固定值 形状测量,再次执行库和检测波形的匹配,选择最佳匹配计算波形,并根据最佳匹配计算波形获得目标图形的形状信息。

    HEAT TREATMENT METHOD AND HEAT TREATMENT APPARATUS
    5.
    发明申请
    HEAT TREATMENT METHOD AND HEAT TREATMENT APPARATUS 有权
    热处理方法和热处理装置

    公开(公告)号:US20110162633A1

    公开(公告)日:2011-07-07

    申请号:US12987406

    申请日:2011-01-10

    IPC分类号: F24C1/00

    摘要: A heat treatment apparatus has a substrate holder with two holder constituting bodies that each have a plurality of columns and substrate holding sections. One of the holder constituting bodies holds substrates so that their front surfaces face upward, while the other holds the substrates so that their back surfaces face upward. At least one of the holder constituting bodies moves vertically to change the positions of the holder constituting bodies relative to each other. A distance between one of a first pair of vertically-adjacent substrates with respective front surfaces facing each other and the other of the first pair of substrates is set to ensure treatment uniformity and to be larger than a distance between one of a second pair of vertically-adjacent substrates with their respective back surfaces facing each other and the other of the second pair of substrates.

    摘要翻译: 热处理设备具有一个具有两个保持器构成体的衬底保持器,每个保持器构成体具有多个列和衬底保持部。 保持器构造体中的一个保持基板,使得它们的前表面朝上,而另一个保持基板,使得它们的后表面朝上。 保持器构造体中的至少一个垂直移动以改变保持器构造体相对于彼此的位置。 第一对垂直相邻基板中的一个彼此相对的前表面和第一对基板之间的距离设定为确保处理均匀性并且大于第二对垂直方向之间的距离 相邻的基板,其各自的后表面彼此相对,另一个是第二对基板。

    Negative photosensitive polyimide composition and method for forming image the same
    7.
    发明授权
    Negative photosensitive polyimide composition and method for forming image the same 有权
    负光敏聚酰亚胺组合物和形成图像的方法相同

    公开(公告)号:US07648815B2

    公开(公告)日:2010-01-19

    申请号:US10380221

    申请日:2001-09-11

    IPC分类号: G03F7/00 G03F7/004

    摘要: Disclosed is a composition of a negative-type photosensitive polyimide which is solvent soluble, which is excellent in adhesiveness, heat resistance, mechanical properties and in flexibility, which shows characteristics of alkali-soluble highly sensitive negative-type photoresist upon irradiation with light, The composition according to the present invention comprises a photo radical initiator and a solvent-soluble polyimide which shows negative-type photosensitivity in the presence of the photo radical initiator.

    摘要翻译: 公开了一种溶剂可溶性的组合物,其具有优异的粘合性,耐热性,机械性能和柔软性,其显示了在照射光时碱溶性高敏感性负型光致抗蚀剂的特性。 根据本发明的组合物包含光自由基引发剂和在光自由基引发剂存在下显示负型光敏性的溶剂可溶性聚酰亚胺。

    Pesticidal composition
    8.
    发明申请
    Pesticidal composition 审中-公开
    杀虫剂组成

    公开(公告)号:US20090326064A1

    公开(公告)日:2009-12-31

    申请号:US12308899

    申请日:2007-06-28

    IPC分类号: A01N53/06 A01P7/04

    摘要: A pesticidal composition comprising at. least an ester compound represented by the formula (1): wherein R1 represents a hydrogen atom or a methyl group, R2 represents a methyl group or a group represented by the formula —CH═CR21R22 (wherein R21 and R22 independently represent a hydrogen atom, a methyl group or a chlorine atom), and R3 represents a hydrogen atom, a methyl group or a methoxymethyl group, supported on a carrier having an oil absorbency of not more than 10 ml/100 g is useful for controlling various pests.

    摘要翻译: 一种杀虫组合物,其包含: 至少一种由式(1)表示的酯化合物:其中R1表示氢原子或甲基,R2表示甲基或由式-CH-CR21R22表示的基团(其中R21和R22独立地表示氢原子, 甲基或氯原子),R 3表示负载在油吸收不大于10ml / 100g的载体上的氢原子,甲基或甲氧基甲基,可用于防治各种害虫。