中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

9 records (took 0.009 seconds)

    RF plasma-enhanced deposition of fluorinated films
    2.
    发明申请
    RF plasma-enhanced deposition of fluorinated films 审中-公开
    RF等离子体增强的氟化膜沉积

    公开(公告)号：US20070172666A1

    公开(公告)日：2007-07-26

    申请号：US11338437

    申请日：2006-01-24

    Applicant: Ferencz Denes ,  Sorin Manolache ,  Luis Cruz-Barba ,  Max Lagally

    Inventor： Ferencz Denes ,  Sorin Manolache ,  Luis Cruz-Barba ,  Max Lagally

    IPC: H05H1/24 ,  B32B27/00

    CPC classification number: C23C16/26 ,  B05D1/62 ,  B05D3/0453 ,  B05D5/083 ,  Y10T428/3154

    Abstract: Low- or atmospheric pressure RF plasma-enhanced thin film deposition methods are provided for the deposition of hydrophobic fluorinated thin films onto various substrates. The methods include at least two steps. In the first step, RF plasma-mediated deposition is used to deposit a fluorinated film onto a substrate surface. In a second step, plasma-generated active sites on the fluorinated film are quenched by reacting them with stable fluorinated gas-phase molecules in situ, in the absence of plasma, to provide a hydrophobic fluorinated thin film having a very low oxygen content. In some instances the hydrophobic fluorinated thin films have an atomic oxygen concentration of no more than about 3%.

    Abstract translation: 提供低或大气压的RF等离子体增强薄膜沉积方法用于将疏水性氟化薄膜沉积到各种基底上。 该方法至少包括两个步骤。 在第一步骤中，使用RF等离子体介导的沉积将氟化膜沉积到衬底表面上。 在第二步中，通过在不存在等离子体的情况下将它们与原位稳定的氟化气相分子进行反应来猝灭氟化膜上的等离子体产生的活性位点，以提供具有非常低氧含量的疏水性氟化薄膜。 在一些情况下，疏水性氟化薄膜的原子氧浓度不超过约3％。

    Colloidal nanoparticles and apparatus for producing colloidal nanoparticles in a dense medium plasma
    4.
    发明申请
    Colloidal nanoparticles and apparatus for producing colloidal nanoparticles in a dense medium plasma 有权
    胶体纳米粒子和在致密介质等离子体中制备胶体纳米粒子的装置

    公开(公告)号：US20070013317A1

    公开(公告)日：2007-01-18

    申请号：US11525773

    申请日：2006-09-22

    Applicant: Ferencz Denes ,  Sorin Manolache ,  Noah Hershkowitz

    Inventor： Ferencz Denes ,  Sorin Manolache ,  Noah Hershkowitz

    IPC: H05B31/26 ,  H01J7/24 ,  B01F3/12 ,  B01F17/00

    CPC classification number: B01J13/0043 ,  A01N1/02 ,  A01N1/0215 ,  A01N1/0242

    Abstract: An apparatus is utilized for producing colloidal dispersions of nanoparticles of electrically conducting materials. The colloidal dispersions are produced in a dense media plasma reactor comprising at least one static electrode and at least one rotating electrode. The plasma reaction sputters off minute particles of the electrically conducting material from which the electrodes are made. Methods of using the colloidal dispersions thus made are also described. Colloidal dispersions of silver produced in this manner are highly effective for bactericidal purposes.

    Abstract translation: 用于制造导电材料的纳米颗粒的胶体分散体的装置。 胶体分散体在包含至少一个静电极和至少一个旋转电极的致密介质等离子体反应器中产生。 等离子体反应物从形成电极的导电材料的微小颗粒中喷出。 还描述了使用如此制备的胶体分散体的方法。 以这种方式生产的银的胶体分散体对于杀菌目的是非常有效的。

    Plasma treatment within dielectric fluids
    7.
    发明申请
    Plasma treatment within dielectric fluids 有权
    电介质液体内的等离子体处理

    公开(公告)号：US20060054489A1

    公开(公告)日：2006-03-16

    申请号：US10526798

    申请日：2003-09-04

    Applicant: Ferencz Denes ,  Sorin Manolache

    Inventor： Ferencz Denes ,  Sorin Manolache

    IPC: H05F3/00

    CPC classification number: B01J19/088 ,  B01J19/10 ,  B01J2219/0809 ,  B01J2219/0828 ,  B01J2219/083 ,  B01J2219/0871 ,  B01J2219/0877 ,  B01J2219/0884 ,  B01J2219/0886 ,  B01J2219/089 ,  B01J2219/0892 ,  B01J2219/0894 ,  B01J2219/0896 ,  C10G32/02 ,  F02M27/042

    Abstract: A dielectric liquid having entrained bubbles of gas or vapor is subjected to an electric field applied between spaced electrodes (112, 116) which generates microdischarges (and thus plasma) within the bubbles, allowing modification of the properties of the dielectric liquid. The invention is particularly useful for treating hydrocarbon liquids such as gasolines and other liquid hydrocarbon fuels, which have extremely low dielectric constants. Generating microdischarges within bubbles in such fuels can create compounds useful for higher combustion efficiency and/or lower emissions in internal combustion engines. The invention may be directly implemented in an engine's fuel line upstream from the combustion chamber (e.g., immediately prior to a fuel injector), thereby allowing the invention to be usefully implemented for fuel treatment prior to combustion.

    Abstract translation: 具有夹带气体或蒸汽的气泡的电介质液体被施加在间隔开的电极（112,116）之间的电场，该电极在气泡内产生微放电（从而产生等离子体），从而改变介电液体的性质。 本发明特别可用于处理具有极低介电常数的烃液体，例如汽油和其它液态烃燃料。 在这种燃料中产生气泡内的微放电可以产生用于内燃机中较高燃烧效率和/或较低排放物的化合物。 本发明可以直接实施在燃烧室上游的发动机的燃料管线（例如，在燃料喷射器之前），从而允许本发明在燃烧之前用于燃料处理。

    Cold-plasma treatment of seeds to remove surface materials
    9.
    发明授权
    Cold-plasma treatment of seeds to remove surface materials 失效
    冷等离子体处理种子去除表面材料

    公开(公告)号：US06543460B1

    公开(公告)日：2003-04-08

    申请号：US09602368

    申请日：2000-06-23

    Applicant: Ferencz S. Denes ,  Raymond A. Young ,  Sorin Manolache ,  John C. Volin

    Inventor： Ferencz S. Denes ,  Raymond A. Young ,  Sorin Manolache ,  John C. Volin

    IPC: B08B704

    CPC classification number: A01C1/08 ,  A01C1/00 ,  B08B7/0035

    Abstract: Seeds are treated in a cold plasma in a reaction chamber to etch the surface of the seeds to remove surface materials, such as fungicides and insecticides, or to disinfect the surfaces. The cold plasma process is carried out using etch gases which do not harm the seeds and for selected periods of time sufficient to remove surface materials without necessarily affecting the viability of live seeds after treatment. Tumbling the seeds while exposing the seeds to the plasma allows the surfaces of the seeds to be etched uniformly.

    Abstract translation: 将种子在反应室中的冷等离子体中处理以蚀刻种子的表面以除去表面材料，例如杀真菌剂和杀虫剂，或对表面进行消毒。 冷等离子体处理使用不损害种子的蚀刻气体，并且在选定的时间段内进行，足以除去表面材料，而不必影响处理后活粒的活力。 在将种子暴露于等离子体的同时翻滚种子允许种子的表面被均匀地蚀刻。

Patent Agency Ranking