公开(公告)号：US07709792B2

公开(公告)日：2010-05-04

申请号：US11622758

申请日：2007-01-12

申请人： Mehran Naser-Ghodsi ,  Tzu-Chin Chuang ,  Kenneth Krzeczowski ,  Matthew Lent ,  Chris Huang ,  Stanislaw Marek Borowicz

发明人： Mehran Naser-Ghodsi ,  Tzu-Chin Chuang ,  Kenneth Krzeczowski ,  Matthew Lent ,  Chris Huang ,  Stanislaw Marek Borowicz

IPC分类号： H01J37/28 ,  H01J37/305 ,  G01N23/225

CPC分类号： H01J37/28 ,  H01J2237/226 ,  H01J2237/2611 ,  H01J2237/3174

摘要： Methods and apparatus for imaging a structure and a related processor-readable medium are disclosed. A surface of a substrate (or a portion thereof) is exposed to a gas composition. The gas composition includes one or more components that etch the substrate upon activation by interaction with a beam of electrons. A beam of electrons is directed to one or more portions of the surface of the substrate that are exposed to the gas composition to etch the one or more portions. A plurality of images is obtained of the one or more portions at different instances of time as the one or more portions are etched. A three-dimensional model of one or more structures embedded within the one or more portions of the substrate is generated from the plurality of images.

摘要翻译： 公开了用于对结构进行成像和相关处理器可读介质的方法和装置。 将基材（或其一部分）的表面暴露于气体组合物。 气体组合物包括一种或多种在通过与电子束的相互作用激活时蚀刻衬底的组分。 电子束被引导到暴露于气体组合物的衬底的表面的一个或多个部分以蚀刻一个或多个部分。 当蚀刻一个或多个部分时，在不同的时间点获得一个或多个部分的多个图像。 从多个图像生成嵌入在基板的一个或多个部分内的一个或多个结构的三维模型。

公开(公告)号：US07838833B1

公开(公告)日：2010-11-23

申请号：US11998502

申请日：2007-11-30

申请人： Matthew Lent ,  Stanislaw Marek Borowicz ,  Mehran Nasser-Ghodsi ,  Niles Kenneth MacDonald ,  Ye Yang ,  Kenneth J. Krzeczowski

发明人： Matthew Lent ,  Stanislaw Marek Borowicz ,  Mehran Nasser-Ghodsi ,  Niles Kenneth MacDonald ,  Ye Yang ,  Kenneth J. Krzeczowski

IPC分类号： G01N23/00

CPC分类号： G01N23/2251 ,  H01J37/263 ,  H01J37/28 ,  H01J37/2955 ,  H01J2237/24475 ,  H01J2237/2804

摘要： A method of imaging using an electron beam. An incident electron beam is focused onto the specimen surface, a scattered electron beam is extracted from the specimen surface, and a plurality of dark field signals are detected using a detection system. An interpolated dark field signal is generated using the plurality of dark field signals. In addition, a bright field signal may be detected using the detection system, and a final interpolated signal may be generated using the interpolated dark field signal and the bright field signal. User input may be received which determines a degree of interpolation between two adjacent dark field signals so as to generate the interpolated dark field signal and which determines an amount of interpolation between the interpolated dark field signal and the bright field signal so as to generate a final interpolated signal. Other embodiments, aspects and features are also disclosed.

摘要翻译： 使用电子束成像的方法。 入射电子束被聚焦在样本表面上，从样本表面提取散射的电子束，并且使用检测系统检测多个暗场信号。 使用多个暗场信号产生内插暗场信号。 此外，可以使用检测系统检测亮场信号，并且可以使用内插的暗场信号和亮场信号来产生最终的内插信号。 可以接收确定两个相邻暗场信号之间的内插程度的用户输入，以产生内插的暗场信号，并确定内插暗场信号和亮场信号之间的内插量，以便产生最终的 内插信号。 还公开了其它实施例，方面和特征。

公开(公告)号：US08890066B1

公开(公告)日：2014-11-18

申请号：US11265811

申请日：2005-11-03

申请人： Yehiel Gotkis ,  Garrett Pickard ,  Stanislaw Marek Borowicz ,  Tzu-Chin Chuang ,  Mehran Nasser-Ghodsi

发明人： Yehiel Gotkis ,  Garrett Pickard ,  Stanislaw Marek Borowicz ,  Tzu-Chin Chuang ,  Mehran Nasser-Ghodsi

IPC分类号： G21K5/04

CPC分类号： H01J37/244 ,  H01J37/28 ,  H01J2237/028

摘要： One embodiment relates to an electron beam apparatus. The apparatus includes a source for generating an incident electron beam, an electron lens for focusing the incident electron beam so that the beam impinges upon a substrate surface and interacts with surface material so as to cause secondary emission of scattered electrons, and a detector configured to detect the scattered electrons. The apparatus further includes an advantageous device configured to trap the scattered electrons which are emitted at sharp angles relative to the sample surface plane of the substrate surface. Other embodiments are also disclosed.

摘要翻译： 一个实施例涉及电子束装置。 该装置包括用于产生入射电子束的源，用于聚焦入射电子束的电子透镜，使得光束撞击在衬底表面上并与表面材料相互作用以引起散射电子的二次发射;以及检测器，被配置为 检测散射的电子。 该装置还包括有利的装置，其被配置为捕获相对于衬底表面的样品表面平面以锐角发射的散射电子。 还公开了其他实施例。