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    Method of monitoring ion-implantation process using photothermal response from ion-implanted sample, and monitoring apparatus of ion-implantation process
    1.
    发明授权
    Method of monitoring ion-implantation process using photothermal response from ion-implanted sample, and monitoring apparatus of ion-implantation process 有权
    使用离子注入样品的光热响应监测离子注入工艺的方法以及离子注入工艺的监测装置

    公开(公告)号：US6157199A

    公开(公告)日：2000-12-05

    申请号：US184853

    申请日：1998-11-03

    申请人： Sun-jin Park

    发明人： Sun-jin Park

    IPC分类号： H01L21/265 ,  G01N21/17 ,  H01L21/66 ,  G01N21/00 ,  G01R31/308

    CPC分类号： H01L22/26 ,  B24B37/013 ,  G01N21/171 ,  H01L22/12

    摘要： A method and apparatus of monitoring an ion-implantation process include a precise analysis for the process conditions of the ion-implantation process by processing the detected signals by using frequency response characteristics of plasma and thermal waves generated by irradiating an ion-implanted surface with a laser beam. The monitoring includes: counting a complex conversion coefficient from the each result value measured for the photo-thermal response by irradiating a laser beam on the sample into which ions are implanted by changing a specific process condition of the ion-implantation process; linearizing a specific parameter of complex conversion coefficient for each value of the complex conversion coefficient according to the changes of the specific process condition; and monitoring a value of the specific process condition of the ion-implantation process based on a detected value of the specific parameter which is linearized according to the changes of the specific process condition.

    摘要翻译： 监测离子注入工艺的方法和装置包括通过使用等离子体的频率响应特性和通过用离子注入表面照射产生的热波来处理检测信号来对离子注入工艺的工艺条件进行精确分析 激光束。 该监测包括：通过对离子注入过程的特定工艺条件进行改变来对通过照射离子的样品照射激光束，从针对光热响应测量的每个结果值计数复数转换系数; 根据具体工艺条件的变化，对复数转换系数的每个值对复数转换系数的特定参数进行线性化; 并且根据特定参数的检测值，根据具体工艺条件的变化线性化，监测离子注入工艺的特定工艺条件的值。

    FLAT DISPLAY DEVICE AND METHOD FOR MANUFACTURING THE SAME
    2.
    发明申请
    FLAT DISPLAY DEVICE AND METHOD FOR MANUFACTURING THE SAME 有权
    平面显示装置及其制造方法

    公开(公告)号：US20120153290A1

    公开(公告)日：2012-06-21

    申请号：US13406072

    申请日：2012-02-27

    申请人： Sun Jin PARK ,  Jea Gu LEE

    发明人： Sun Jin PARK ,  Jea Gu LEE

    IPC分类号： H01L33/08

    CPC分类号： G02F1/136213 ,  B82Y20/00 ,  G02F1/1309 ,  G02F1/133553 ,  G02F1/136204 ,  G02F2001/133388 ,  G02F2001/13606 ,  G02F2001/136236 ,  G02F2001/1672 ,  G02F2201/50 ,  G02F2202/36 ,  H01L29/41733 ,  H01L29/42384

    摘要： A flat display device is provided. The flat display device a substrate divided into an active region for displaying an image and a peripheral region that does not display the image, and includes: a gate line that crosses a data line to define a pixel region in the active region; a thin film transistor in a region near a crossing of the gate line and the data line; a first common electrode in the pixel region; a storage electrode on the first common electrode to provide storage capacitance; a pixel electrode electrically connected with the storage electrode and overlapping the pixel region, the data line, and the gate line; and an ink film covering the active region and the peripheral region, and having microcapsules including charged particles.

    摘要翻译： 提供平面显示装置。 平面显示装置将分割为不显示图像的有源区域和不显示图像的周边区域的基板分离，并且包括：与有源区域中的像素区域形成的数据线交叉的栅极线; 在栅极线和数据线的交叉点附近的区域中的薄膜晶体管; 像素区域中的第一公共电极; 在所述第一公共电极上的存储电极，以提供存储电容; 与存储电极电连接并与像素区域，数据线和栅极线重叠的像素电极; 以及覆盖有源区域和周边区域的墨膜，并且具有包含带电粒子的微胶囊。