公开(公告)号：US5973332A

公开(公告)日：1999-10-26

申请号：US98432

申请日：1998-06-17

申请人： Masato Muraki ,  Susumu Gotoh

发明人： Masato Muraki ,  Susumu Gotoh

IPC分类号： G21K5/10 ,  H01J37/145 ,  H01J37/153 ,  H01J37/302 ,  H01J37/317

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/153 ,  H01J37/3026 ,  H01J37/3177 ,  H01J2237/1534

摘要： An electron beam exposure apparatus which minimizes the influence of the space charge effect and aberrations of a reduction electron optical system, and simultaneously, increases the exposure area which can be exposed at once, thereby increasing the throughput. An electron beam exposure apparatus having a source for emitting an electron beam and a reduction electron optical system for reducing and projecting, on a target exposure surface, an image of the source, includes a correction electron optical system which is arranged between the source and the reduction electron optical system to form a plurality of intermediate images of the source along a direction perpendicular to the optical axis of the reduction electron optical system, and corrects in advance aberrations generated when the intermediate images are reduced and projected on the target exposure surface by the reduction electron optical system.

摘要翻译： 减小电子光学系统的空间电荷效应和像差的影响最小化的电子束曝光装置，同时增加可以一次曝光的曝光面积，从而提高生产量。 具有用于发射电子束的电子束曝光装置和用于在目标曝光表面上减少和投影源的图像的还原电子光学系统包括校正电子光学系统，其布置在源和 还原电子光学系统，以沿着与还原电子光学系统的光轴垂直的方向形成源的多个中间图像，并且预先校正当中间图像被减少并投影在目标曝光表面上时的像差 还原电子光学系统。

公开(公告)号：US6166387A

公开(公告)日：2000-12-26

申请号：US313072

申请日：1999-05-17

申请人： Masato Muraki ,  Susumu Gotoh

发明人： Masato Muraki ,  Susumu Gotoh

IPC分类号： G21K5/10 ,  H01J37/145 ,  H01J37/153 ,  H01J37/302 ,  H01J37/317

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/153 ,  H01J37/3026 ,  H01J37/3177 ,  H01J2237/1534

摘要： An electron beam exposure apparatus which minimizes the influence of the space charge effect and aberrations of a reduction electron optical system, and simultaneously, increases the exposure area which can be exposed at once, thereby increasing the throughput. An electron beam exposure apparatus having a source for emitting an electron beam and a reduction electron optical system for reducing and projecting, on a target exposure surface, an image of the source, includes a correction electron optical system which is arranged between the source and the reduction electron optical system to form a plurality of intermediate images of the source along a direction perpendicular to the optical axis of the reduction electron optical system, and corrects in advance aberrations generated when the intermediate images are reduced and projected on the target exposure surface by the reduction electron optical system.

摘要翻译： 减小电子光学系统的空间电荷效应和像差的影响最小化的电子束曝光装置，同时增加可以一次曝光的曝光面积，从而提高生产量。 具有用于发射电子束的电子束曝光装置和用于在目标曝光表面上减少和投影源的图像的还原电子光学系统包括校正电子光学系统，其布置在源和 还原电子光学系统，以沿着与还原电子光学系统的光轴垂直的方向形成源的多个中间图像，并且预先校正当中间图像被减少并投影在目标曝光表面上时的像差 还原电子光学系统。

公开(公告)号：US06838682B2

公开(公告)日：2005-01-04

申请号：US10634878

申请日：2003-08-06

申请人： Yasunari Sohda ,  Osamu Kamimura ,  Hiroya Ohta ,  Susumu Gotoh

发明人： Yasunari Sohda ,  Osamu Kamimura ,  Hiroya Ohta ,  Susumu Gotoh

IPC分类号： G03F7/20 ,  G03F9/02 ,  H01J37/04 ,  H01J37/141 ,  H01J37/304 ,  H01J37/305 ,  H01J37/317 ,  H01L21/027

CPC分类号： H01J37/1471 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/304 ,  H01J37/3045 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/1501

摘要： There is provided an electron beam exposure technique which permits optical adjustment in an electron optics system using a doublet lens necessary for large field projection.Electron beam exposure equipment having a part forming one image by at least two electromagnetic lenses, has means measuring the position of an electron beam near an image plane with changing excitation of at least two lenses at the same time; and control means feeding back the measured result to aligners or the intensity of the lenses.

摘要翻译： 提供了一种使用电子光学系统进行光学调节的电子束曝光技术，该系统使用大场投影所需的双重透镜。具有通过至少两个电磁透镜形成一个图像的部分的电子束曝光设备具有测量位置 同时改变至少两个透镜的激发的图像平面附近的电子束; 并且控制装置将测量结果反馈到对准器或透镜的强度。

公开(公告)号：US5834783A

公开(公告)日：1998-11-10

申请号：US811602

申请日：1997-03-04

申请人： Masato Muraki ,  Susumu Gotoh

发明人： Masato Muraki ,  Susumu Gotoh

IPC分类号： G21K5/10 ,  H01J37/145 ,  H01J37/153 ,  H01J37/302 ,  H01J37/317 ,  H01J37/12

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/153 ,  H01J37/3026 ,  H01J37/3177 ,  H01J2237/1534

摘要： An electron beam exposure apparatus which minimizes the influence of the space charge effect and aberrations of a reduction electron optical system, and simultaneously, increases the exposure area which can be exposed at once, thereby increasing the throughput. An electron beam exposure apparatus having a source for emitting an electron beam and a reduction electron optical system for reducing and projecting, on a target exposure surface, an image of the source, includes a correction electron optical system which is arranged between the source and the reduction electron optical system to form a plurality of intermediate images of the source along a direction perpendicular to the optical axis of the reduction electron optical system, and corrects in advance aberrations generated when the intermediate images are reduced and projected on the target exposure surface by the reduction electron optical system.

摘要翻译： 减小电子光学系统的空间电荷效应和像差的影响最小化的电子束曝光装置，同时增加可以一次曝光的曝光面积，从而提高生产量。 具有用于发射电子束的电子束曝光装置和用于在目标曝光表面上减少和投影源的图像的还原电子光学系统包括校正电子光学系统，其布置在源和 还原电子光学系统，以沿着与还原电子光学系统的光轴垂直的方向形成源的多个中间图像，并且预先校正当中间图像被减少并投影在目标曝光表面上时的像差 还原电子光学系统。

公开(公告)号：US06323499B1

公开(公告)日：2001-11-27

申请号：US09596052

申请日：2000-06-16

申请人： Masato Muraki ,  Susumu Gotoh

发明人： Masato Muraki ,  Susumu Gotoh

IPC分类号： G21K510

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/153 ,  H01J37/3026 ,  H01J37/3177 ,  H01J2237/1534

摘要： An electron beam exposure apparatus which minimizes the influence of the space charge effect and aberrations of a reduction electron optical system, and simultaneously, increases the exposure area which can be exposed at once, thereby increasing the throughput. An electron beam exposure apparatus having a source for emitting an electron beam and a reduction electron optical system for reducing and projecting, on a target exposure surface, an image of the source, includes a correction electron optical system which is arranged between the source and the reduction electron optical system to form a plurality of intermediate images of the source along a direction perpendicular to the optical axis of the reduction electron optical system, and corrects in advance aberrations generated when the intermediate images are reduced and projected on the target exposure surface by the reduction electron optical system.

摘要翻译： 减小电子光学系统的空间电荷效应和像差的影响最小化的电子束曝光装置，同时增加可以一次曝光的曝光面积，从而提高生产量。 具有用于发射电子束的电子束曝光装置和用于在目标曝光表面上减少和投影源的图像的还原电子光学系统包括校正电子光学系统，其布置在源和 还原电子光学系统，以沿着与还原电子光学系统的光轴垂直的方向形成源的多个中间图像，并且预先校正当中间图像被减少并投影在目标曝光表面上时的像差 还原电子光学系统。

公开(公告)号：US07049607B2

公开(公告)日：2006-05-23

申请号：US10951769

申请日：2004-09-29

申请人： Yasunari Sohda ,  Hiroya Ohta ,  Osamu Kamimura ,  Susumu Gotoh

发明人： Yasunari Sohda ,  Hiroya Ohta ,  Osamu Kamimura ,  Susumu Gotoh

IPC分类号： G01N23/00

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3045 ,  H01J37/3177 ,  H01J2237/3045

摘要： Electron beam writing equipment has an electron source and an electron optics system for scanning an electron beam emitted from the electron source on a sample via deflection means having at least two different deflection speeds. An objective lens is used to form a desired pattern on the sample The electron beam is moved by high speed scanning with the deflection means to repeat formation of a patterned beam. The electron beam is moved on the mark for beam correction by low speed scanning with the deflection means in synchronization with one cycle of the repetition. The position or the deflection distance of the electron beam or blanking time is corrected using detectors for back scattered or secondary electrons.

摘要翻译： 电子束写入设备具有电子源和电子光学系统，用于通过具有至少两个不同偏转速度的偏转装置扫描从电子源在样品上发射的电子束。 使用物镜在样品上形成期望的图案电子束通过用偏转装置的高速扫描移动，以重复形成图案化的束。 电子束通过与偏转装置的低速扫描同步于重复的一个周期而在标记上移动以进行光束校正。 使用用于背散射或二次电子的检测器校正电子束的位置或偏转距离或消隐时间。

公开(公告)号：US20050040343A1

公开(公告)日：2005-02-24

申请号：US10951769

申请日：2004-09-29

申请人： Yasunari Sohda ,  Hiroya Ohta ,  Osamu Kamimura ,  Susumu Gotoh

发明人： Yasunari Sohda ,  Hiroya Ohta ,  Osamu Kamimura ,  Susumu Gotoh

IPC分类号： G03F7/20 ,  G01Q30/02 ,  H01J37/147 ,  H01J37/304 ,  H01J37/305 ,  H01J37/317 ,  H01L21/027 ,  G21G5/00

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3045 ,  H01J37/3177 ,  H01J2237/3045

摘要： Electron beam writing equipment has an electron source and an electron optics system for scanning an electron beam emitted from the electron source on a sample via deflection means having at least two different deflection speeds. An objective lens is used to form a desired pattern on the sample The electron beam is moved by high speed scanning with the deflection means to repeat formation of a patterned beam. The electron beam is moved on the mark for beam correction by low speed scanning with the deflection means in synchronization with one cycle of the repetition. The position or the deflection distance of the electron beam or blanking time is corrected using detectors for back scattered or secondary electrons.

摘要翻译： 电子束写入设备具有电子源和电子光学系统，用于通过具有至少两个不同偏转速度的偏转装置扫描从电子源在样品上发射的电子束。 使用物镜在样品上形成期望的图案电子束通过用偏转装置的高速扫描移动，以重复形成图案化的束。 电子束通过与偏转装置的低速扫描同步于重复的一个周期而在标记上移动以进行光束校正。 使用用于背散射或二次电子的检测器校正电子束的位置或偏转距离或消隐时间。

公开(公告)号：US06809319B2

公开(公告)日：2004-10-26

申请号：US10629567

申请日：2003-07-30

申请人： Yasunari Sohda ,  Hiroya Ohta ,  Osamu Kamimura ,  Susumu Gotoh

发明人： Yasunari Sohda ,  Hiroya Ohta ,  Osamu Kamimura ,  Susumu Gotoh

IPC分类号： H01J3728

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3045 ,  H01J37/3177 ,  H01J2237/3045

摘要： Electron beam writing equipment has an electron source and an electron optics system for scanning an electron beam emitted from the electron source on a sample via deflection means having at least two different deflection speeds. An objective lens is used to form a desired pattern on the sample. The electron beam is moved by high speed scanning with the deflection means to repeat formation of a patterned beam. The electron beam is moved on the mark for beam correction by low speed scanning with the deflection means in synchronization with one cycle of the repetition. The position or the deflection distance of the electron beam or blanking time is corrected using detectors for back scattered or secondary electrons.

摘要翻译： 电子束写入设备具有电子源和电子光学系统，用于通过具有至少两个不同偏转速度的偏转装置扫描从电子源在样品上发射的电子束。 物镜用于在样品上形成所需的图案。 用偏转装置通过高速扫描来移动电子束以重复形成图案化的束。 电子束通过与偏转装置的低速扫描同步于重复的一个周期而在标记上移动以进行光束校正。 使用用于背散射或二次电子的检测器校正电子束的位置或偏转距离或消隐时间。

公开(公告)号：US5164974A

公开(公告)日：1992-11-17

申请号：US714353

申请日：1991-06-12

申请人： Takao Kariya ,  Yasuo Kawai ,  Masahiko Okunuki ,  Susumu Gotoh

发明人： Takao Kariya ,  Yasuo Kawai ,  Masahiko Okunuki ,  Susumu Gotoh

IPC分类号： G03F7/20

CPC分类号： G03F7/70733 ,  G03F7/70358

摘要： An X-ray exposure apparatus wherein a member sensitive to X-ray is exposed to a pattern formed on a mask with the X-rays, includes an X-ray source for emitting X-rays, an irradiation chamber for accommodating the mask and the sensitive member and exposing them to the X-rays emitted by the X-ray source within the chamber and a vacuum pump for evacuating the chamber to effect the exposure operation in a vacuum.

摘要翻译： 一种X射线曝光装置，其中对X射线敏感的部件暴露于用X射线形成在掩模上的图案，包括用于发射X射线的X射线源，用于容纳掩模的照射室和 将其暴露于室内由X射线源发射的X射线，以及真空泵，用于抽真空室以在真空中进行曝光操作。