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    Vacuum processing apparatus
    2.
    发明授权
    Vacuum processing apparatus 有权
    真空加工设备

    公开(公告)号：US06207006B1

    公开(公告)日：2001-03-27

    申请号：US09156752

    申请日：1998-09-16

    申请人： Susumu Katoh

    发明人： Susumu Katoh

    IPC分类号： C23F102

    CPC分类号： C23C16/45565 ,  C23C16/4412 ,  C23C16/45589 ,  H01J37/3244 ,  H01J37/32834 ,  H01L21/67017 ,  H01L21/68785 ,  Y02C20/30 ,  Y02P70/605

    摘要： The vacuum processing apparatus of the present invention comprises a process chamber in which predetermined processing is performed on a target object in a predetermined vacuum condition, a mount stage provided in the process chamber, for mounting thereon the target object, a shower head provided so as to oppose to the mount stage, for supplying a process gas in the process chamber, an exhaust path provided in a housing forming the process chamber, and extending so as to surround the mount stage outside the mount stage, an exhaust port formed around the mount stage, for connecting the exhaust path with the process chamber, a porous member provided at the exhaust port so as to partition the exhaust path and the process chamber from each other, and having a plurality of ventilation holes for making the exhaust path communicating with the process chamber, branching means for branching a gas flowing from the process chamber through the ventilation holes of the porous member, into a plurality of directions, such that the gas flows to the exhaust path, a plurality of upper exhaust pipes extending in an upper side of the process chamber and communicating with the exhaust path, and a lower exhaust pipe extending toward a lower side of the process chamber and communicating with all the upper exhaust pipes.

    摘要翻译： 本发明的真空处理装置包括在预定的真空条件下对目标物体进行预定处理的处理室，设置在处理室中的安装台，用于安装目标物体;淋浴头，其设置为 与安装台相反，用于在处理室中提供处理气体，设置在形成处理室的壳体中并且围绕安装台围绕安装台延伸的排气路径，形成在安装台周围的排气口 用于将排气路径与处理室连接的多孔构件，设置在排气口处以将排气路径和处理室彼此分隔开的多孔构件，并且具有多个通气孔，用于使排气路径与排气路径连通 处理室，分支装置，用于将从处理室流出的气体通过多孔构件的通风孔分支成多个 方向的方向，使得气体流到排气路径，在处理室的上侧延伸并与排气路径连通的多个上排气管，以及朝向处理室的下侧延伸的下排气管 并与所有上排气管连通。

    Vacuum processing apparatus
    4.
    发明申请
    Vacuum processing apparatus 审中-公开
    真空加工设备

    公开(公告)号：US20060160359A1

    公开(公告)日：2006-07-20

    申请号：US10546803

    申请日：2004-02-12

    申请人： Shigeru Kasai ,  Susumu Katoh ,  Tomohito Komatsu ,  Tetsuya Saito ,  Sumi Tanaka

    发明人： Shigeru Kasai ,  Susumu Katoh ,  Tomohito Komatsu ,  Tetsuya Saito ,  Sumi Tanaka

    IPC分类号： H01L21/44 ,  C23C16/00

    CPC分类号： C23C16/45521 ,  C23C16/455

    摘要： A vacuum processing apparatus is constituted of the following portions: a processing container with the bottom, capable of drawing vacuum; a placement platform installed in the container; a heating portion for heating a substrate on the platform; a processing gas-feeding portion for feeding a processing gas into the container; a partitioning portion surrounding a space between the platform and the bottom of the container and partitioning off the space from a processing space in the container; a purge gas-feeding portion for feeding a purge gas into the space surrounded by the partitioning portion; a purge gas-discharging portion for discharging the purge gas from the space surrounded by the partitioning portion; a control portion for controlling the purge gas-feeding portion and/or the purge gas-discharging portion so as to regulate the pressure in the space surrounded by the partitioning portion; and a temperature-detecting portion penetrating the bottom of the container, inserted in the space surrounded by the partitioning portion, and having the top end in contact with the platform. The partitioning portion has the lower end in surface-contact with the bottom of the container. The control portion regulates the pressure in the space surrounded by the partitioning portion to a pressure higher than that in the processing space in the container.

    摘要翻译： 真空处理装置由以下部分构成：具有底部的能够抽真空的处理容器; 安装在容器中的放置平台; 用于加热所述平台上的基板的加热部分; 处理气体供给部，用于将处理气体供给到所述容器中; 围绕所述平台和所述容器的底部之间的空间并将所述空间与所述容器中的处理空间分隔开的分隔部分; 净化气体供给部分，用于将净化气体供给到由分隔部分包围的空间中; 净化气体排出部，用于从由分隔部包围的空间排出净化气体; 用于控制净化气体供给部分和/或净化气体排出部分以便调节由分隔部分包围的空间中的压力的​​控制部分; 以及穿过容器底部的温度检测部分，插入由分隔部分包围的空间中，并且顶端与平台接触。 分隔部分的下端与容器的底部表面接触。 控制部将由分隔部包围的空间内的压力调整为高于容器内的处理空间的压力。