公开(公告)号：US08334481B2

公开(公告)日：2012-12-18

申请号：US12505282

申请日：2009-07-17

申请人： Tomohito Komatsu ,  Hirohiko Yamamoto ,  Daisuke Toriya

发明人： Tomohito Komatsu ,  Hirohiko Yamamoto ,  Daisuke Toriya

IPC分类号： F27B5/14 ,  F27D11/02 ,  H05B3/03 ,  H05B3/08

CPC分类号： H01L21/67103 ,  C23C16/4586

摘要： A mounting table body made of ceramic includes power-receiving conductor portions and buried therein. A surface of mounting table body is formed with a recessed connection hole and a connection terminal electrically jointed to the power-receiving conductor portion and exposed into the connection hole, the connection terminal being made of a high-melting-point metal, an alloy thereof or a compound thereof. A power-feeding line member provided with a power-feeding connector portion is inserted at its leading end portion into the connection hole to feed electricity to the power-receiving conductor portion. A stress relaxing member is interposed between the connection terminal and the power-feeding connector portion. The stress relaxing member and the connection terminal are jointed together by a brazing material. The stress relaxing member is made of a metal free from cobalt and nickel or an alloy thereof.

摘要翻译： 由陶瓷制成的安装台体包括受电导体部分并埋入其中。 安装台体的表面形成有凹入的连接孔和电连接到受电导体部分并暴露于连接孔中的连接端子，连接端子由高熔点金属制成，其合金 或其化合物。 设置有供电连接器部分的馈电线构件在其前端部插入到连接孔中，以将电力馈送到电力接收导体部分。 在连接端子和供电连接器部分之间设置应力缓和部件。 应力缓和构件和连接端子通过钎焊材料接合在一起。 应力松弛部件由不含钴，镍或其合金的金属制成。

公开(公告)号：US20120247675A1

公开(公告)日：2012-10-04

申请号：US13435552

申请日：2012-03-30

申请人： Taro IKEDA ,  Tomohito KOMATSU ,  Shigeru KASAI

发明人： Taro IKEDA ,  Tomohito KOMATSU ,  Shigeru KASAI

IPC分类号： H01L21/3065 ,  H01Q13/10

CPC分类号： H01J37/3222 ,  C23C16/45565 ,  C23C16/511 ,  H01J37/32211 ,  H01J37/32229 ,  H01J37/3244 ,  H01J37/32449 ,  H05H1/46 ,  H05H2001/463

摘要： A plasma generation antenna and a plasma processing apparatus can supply a gas and an electromagnetic wave effectively. A plasma processing apparatus 10 includes a processing chamber 100 in which a plasma process is performed; a wavelength shortening plate 480 configured to transmit an electromagnetic wave; and a plasma generation antenna 200 having a shower head 210 provided adjacent to the wavelength shortening plate 480. The shower head 210 is made of a conductor, and has a multiple number of gas holes 215 and a multiple number of slots 220 through which the electromagnetic wave passes. The slots 220 are provided at positions isolated from the gas holes 215.

摘要翻译： 等离子体发生天线和等离子体处理装置可以有效地提供气体和电磁波。 等离子体处理装置10包括其中执行等离子体处理的处理室100; 构造成透射电磁波的波长缩短板480; 以及等离子体产生天线200，其具有与波长缩短板480相邻设置的淋浴喷头210.喷头210由导体制成，并具有多个气孔215和多个槽220，电磁 波通。 槽220设置在与气孔215隔开的位置处。

公开(公告)号：USD601521S1

公开(公告)日：2009-10-06

申请号：US29278403

申请日：2007-03-28

申请人： Tomohito Komatsu

设计人： Tomohito Komatsu

公开(公告)号：US20090095733A1

公开(公告)日：2009-04-16

申请号：US12336207

申请日：2008-12-16

申请人： Tomohito KOMATSU

发明人： Tomohito KOMATSU

IPC分类号： H05B3/06

CPC分类号： H01L21/67103 ,  C23C16/4581 ,  C23C16/48 ,  H01L21/324 ,  H05B3/143

摘要： Provided is a mounting table structure having a replaceable heating plate by removably arranging the heating plate in a heating plate accommodating chamber. A mounting table structure is provided with a mounting table, which is arranged inside a processing chamber and mounts thereon a target object, for performing specified heat treatment to the target object, and a hollow supporting column which supports the mounting table by making the mounting table stand on a bottom portion of the processing chamber. The mounting table is provided with a heating plate having a heater composed of an electric heat source embedded in a heat-resistant material, and a heating plate accommodating chamber composed of a heat-resistant and corrosion-resistant material for removably receiving the heating plate. The heating plate accommodating container includes a container body having an opening, and a cover portion attached to the container body. Thus, the heating plate is permitted to be replaced.

摘要翻译： 提供了一种安装台结构，其具有可更换的加热板，通过将加热板可拆卸地布置在加热板容纳室中。 安装台结构设置有安装台，该安装台布置在处理室内部并安装在其上的目标物体，用于对目标物体进行特定的热处理;以及中空支撑柱，其通过制造安装台来支撑安装台 站立在处理室的底部。 安装台设置有加热板，该加热板具有由嵌入耐热材料的电热源构成的加热器，以及由用于可拆卸地接收加热板的耐热耐腐蚀材料构成的加热板容纳室。 加热板容纳容器包括具有开口的容器主体和附接到容器主体的盖部。 因此，允许更换加热板。

公开(公告)号：USD589471S1

公开(公告)日：2009-03-31

申请号：US29278401

申请日：2007-03-28

申请人： Tomohito Komatsu

设计人： Tomohito Komatsu

公开(公告)号：US20060160359A1

公开(公告)日：2006-07-20

申请号：US10546803

申请日：2004-02-12

申请人： Shigeru Kasai ,  Susumu Katoh ,  Tomohito Komatsu ,  Tetsuya Saito ,  Sumi Tanaka

发明人： Shigeru Kasai ,  Susumu Katoh ,  Tomohito Komatsu ,  Tetsuya Saito ,  Sumi Tanaka

IPC分类号： H01L21/44 ,  C23C16/00

CPC分类号： C23C16/45521 ,  C23C16/455

摘要： A vacuum processing apparatus is constituted of the following portions: a processing container with the bottom, capable of drawing vacuum; a placement platform installed in the container; a heating portion for heating a substrate on the platform; a processing gas-feeding portion for feeding a processing gas into the container; a partitioning portion surrounding a space between the platform and the bottom of the container and partitioning off the space from a processing space in the container; a purge gas-feeding portion for feeding a purge gas into the space surrounded by the partitioning portion; a purge gas-discharging portion for discharging the purge gas from the space surrounded by the partitioning portion; a control portion for controlling the purge gas-feeding portion and/or the purge gas-discharging portion so as to regulate the pressure in the space surrounded by the partitioning portion; and a temperature-detecting portion penetrating the bottom of the container, inserted in the space surrounded by the partitioning portion, and having the top end in contact with the platform. The partitioning portion has the lower end in surface-contact with the bottom of the container. The control portion regulates the pressure in the space surrounded by the partitioning portion to a pressure higher than that in the processing space in the container.

摘要翻译： 真空处理装置由以下部分构成：具有底部的能够抽真空的处理容器; 安装在容器中的放置平台; 用于加热所述平台上的基板的加热部分; 处理气体供给部，用于将处理气体供给到所述容器中; 围绕所述平台和所述容器的底部之间的空间并将所述空间与所述容器中的处理空间分隔开的分隔部分; 净化气体供给部分，用于将净化气体供给到由分隔部分包围的空间中; 净化气体排出部，用于从由分隔部包围的空间排出净化气体; 用于控制净化气体供给部分和/或净化气体排出部分以便调节由分隔部分包围的空间中的压力的​​控制部分; 以及穿过容器底部的温度检测部分，插入由分隔部分包围的空间中，并且顶端与平台接触。 分隔部分的下端与容器的底部表面接触。 控制部将由分隔部包围的空间内的压力调整为高于容器内的处理空间的压力。

公开(公告)号：US08203104B2

公开(公告)日：2012-06-19

申请号：US12336207

申请日：2008-12-16

申请人： Tomohito Komatsu

发明人： Tomohito Komatsu

IPC分类号： H05B3/06 ,  H05B3/68

CPC分类号： H01L21/67103 ,  C23C16/4581 ,  C23C16/48 ,  H01L21/324 ,  H05B3/143

摘要： Provided is a mounting table structure having a replaceable heating plate by removably arranging the heating plate in a heating plate accommodating chamber. A mounting table structure is provided with a mounting table, which is arranged inside a processing chamber and mounts thereon a target object, for performing specified heat treatment to the target object, and a hollow supporting column which supports the mounting table by making the mounting table stand on a bottom portion of the processing chamber. The mounting table is provided with a heating plate having a heater composed of an electric heat source embedded in a heat-resistant material, and a heating plate accommodating chamber composed of a heat-resistant and corrosion-resistant material for removably receiving the heating plate. The heating plate accommodating container includes a container body having an opening, and a cover portion attached to the container body. Thus, the heating plate is permitted to be replaced.

摘要翻译： 提供了一种安装台结构，其具有可更换的加热板，通过将加热板可拆卸地布置在加热板容纳室中。 安装台结构设置有安装台，该安装台布置在处理室内部并安装在其上的目标物体，用于对目标物体进行特定的热处理;以及中空支撑柱，其通过制造安装台来支撑安装台 站立在处理室的底部。 安装台设置有加热板，该加热板具有由嵌入耐热材料的电热源构成的加热器，以及由用于可拆卸地接收加热板的耐热耐腐蚀材料构成的加热板容纳室。 加热板容纳容器包括具有开口的容器主体和附接到容器主体的盖部。 因此，允许更换加热板。

公开(公告)号：US20110005686A1

公开(公告)日：2011-01-13

申请号：US12877760

申请日：2010-09-08

申请人： Sumi TANAKA ,  Tomohito KOMATSU ,  Hiroo KAWASAKI

发明人： Sumi TANAKA ,  Tomohito KOMATSU ,  Hiroo KAWASAKI

IPC分类号： C23F1/08 ,  C23C16/00 ,  C23C16/46

CPC分类号： H01L21/68757 ,  H01L21/67248 ,  H01L21/68792

摘要： A loading table structure which is adapted, in order to prevent damage to the loading table, so that large thermal stress does not occur in the loading table and so that the amount of supply of a purge gas for corrosion prevention to the loading table is minimized. The loading table structure is formed in a processing container capable of discharging gas contained therein and is used to load thereon an object to be processed. The loading table structure is provided with a loading table on which the object to be processed is loaded and which consists of a dielectric, a heating means which is provided to the loading table and which heats the object to be processed loaded on the loading table, and protective strut tubes which are mounted so as to vertically rise from the bottom section of the processing container, which have upper ends joined to the lower surface of the loading table to support the loading table, and which consist of a dielectric. A functional bar extending up to the loading table is inserted into each protective strut tube.

摘要翻译： 一种装载台结构，其适于防止对装载台的损坏，使得在装载台中不会发生大的热应力，并且使得对装载台的防腐蚀净化气体的供应量最小化 。 装载台结构形成在能够排出容纳在其中的气体的处理容器中，并用于在其上装载要处理的物体。 装载台结构设置有装载台，加载对象被加载到该装载台，并由电介质构成，加热装置设置在装载台上并加热装载台上加工的被处理物体， 以及保护支柱管，其安装成从处理容器的底部部分垂直地升起，上游端连接到装载台的下表面以支撑装载台，并由电介质构成。 延伸到装载台的功能杆插入每个保护支柱管中。

公开(公告)号：US20100186673A1

公开(公告)日：2010-07-29

申请号：US12710890

申请日：2010-02-23

申请人： Sumi TANAKA ,  Tomohito KOMATSU ,  Munehisa FUTAMURA

发明人： Sumi TANAKA ,  Tomohito KOMATSU ,  Munehisa FUTAMURA

IPC分类号： H01L21/46

CPC分类号： B23K20/08 ,  C23C16/4486

摘要： A vaporizer having a simple structure with improved thermal efficiency is provided. A vaporizer includes a nozzle unit for jetting a liquid material in a mist state, a vaporizing unit having vaporizing paths which vaporize the material mist and form a material gas, and an ejection unit for sending the material gas to the subsequent stage. The vaporizing unit includes a vaporizing unit main body having the vaporizing paths, a main body container containing the vaporizing unit main body, a heater for heating the material mist passing through the vaporizing paths, and connecting members arranged on both end sections of the main body container. The vaporizing unit main body and the main body container are formed of a material having thermal conductivity higher than that of the material of the connecting members. The end sections of the main body container and the connecting members are bonded by explosion bonding.

摘要翻译： 提供了一种具有提高热效率的简单结构的蒸发器。 蒸发器包括用于喷射处于雾状的液体物质的喷嘴单元，具有使材料雾气化并形成原料气体的蒸发路径的蒸发单元，以及用于将原料气体送至后续阶段的喷射单元。 蒸发单元包括具有蒸发路径的蒸发单元主体，容纳蒸发单元主体的主体容器，用于加热通过蒸发路径的材料雾的加热器，以及布置在主体的两个端部上的连接构件 容器。 蒸发单元主体和主体容器由导热率高于连接构件材料的材料形成。 主体容器和连接构件的端部通过爆炸粘合结合。

公开(公告)号：US20090139979A1

公开(公告)日：2009-06-04

申请号：US12064160

申请日：2006-08-10

申请人： Tomohito Komatsu

发明人： Tomohito Komatsu

IPC分类号： H05B3/68 ,  H01L21/67 ,  B05D3/02 ,  B05D5/00

CPC分类号： C04B41/86 ,  C04B41/009 ,  C04B41/5022 ,  C23C16/4581 ,  C23C16/4586 ,  H01L21/68742 ,  H01L21/68757 ,  C04B41/4523 ,  C04B35/00 ,  C04B35/581

摘要： A mounting table structure capable of preventing cracks in a mounting table made of a ceramic material or at a joint portion between the mounting table and a column for supporting the mounting table. The mounting table structure includes a ceramic mounting table made of a ceramic material for mounting thereon a target object in order to perform a specific heat treatment on the target object in a processing chamber, and a supporting unit for supporting the mounting table. A quartz glass coating layer is formed on a surface of the mounting table while maintaining a compressive stress in a plane direction. As a result, cracks are prevented from occurring in a mounting table made of a ceramic material or at a joint portion between the mounting table and a column for supporting the mounting table.

摘要翻译： 一种安装台结构，其能够防止由陶瓷材料制成的安装台或安装台与用于支撑安装台的支柱之间的接合部分处的裂缝。 安装台结构包括陶瓷安装台，其由陶瓷材料制成，用于在其上安装目标物体，以便对处理室中的目标物体进行特定热处理;以及支撑单元，用于支撑安装台。 在安装台的表面上形成石英玻璃涂层，同时在平面方向上保持压缩应力。 结果，防止了在由陶瓷材料制成的安装台中或在安装台和用于支撑安装台的支柱之间的接合部处发生裂纹。