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    Plasma processing method
    2.
    发明授权
    Plasma processing method 有权
    等离子体处理方法

    公开(公告)号：US08591752B2

    公开(公告)日：2013-11-26

    申请号：US13399030

    申请日：2012-02-17

    申请人： Takahiro Abe ,  Takeshi Shimada ,  Atsushi Yoshida ,  Kentaro Yamada ,  Daisuke Fujita

    发明人： Takahiro Abe ,  Takeshi Shimada ,  Atsushi Yoshida ,  Kentaro Yamada ,  Daisuke Fujita

    IPC分类号： B44C1/22 ,  B08B9/00

    CPC分类号： H01J37/321 ,  C23F4/00 ,  C23G5/00 ,  H01J2237/334 ,  H01L43/12

    摘要： A method for plasma-etching a magnetic film and plasma-cleaning, in which deposits in an etching processing chamber are efficiently removed while corrosion of a wafer is suppressed, is provided. A plasma processing method for plasma-etching a to-be-processed substrate having a magnetic film in an etching processing chamber includes the steps of plasma-etching the magnetic film using a first gas not containing chlorine, transferring out the to-be-processed substrate from the etching processing chamber, first plasma-cleaning of the etching processing chamber using a second gas containing chlorine, and second plasma-cleaning using a third gas containing hydrogen after the first plasma cleaning.

    摘要翻译： 提供了一种用于等离子体蚀刻磁性膜和等离子体清洁的方法，其中在蚀刻处理室中的沉积物被有效地去除，同时腐蚀晶片被抑制。 在蚀刻处理室中对具有磁性膜的被处理基板进行等离子体蚀刻的等离子体处理方法包括使用不含氯的第一气体等离子体蚀刻磁性膜的步骤，将待处理的 来自蚀刻处理室的衬底，首先使用含氯的第二气体对蚀刻处理室进行等离子体清洁，以及在第一等离子体清洗之后使用含有氢的第三气体进行第二等离子体清洁。

    PLASMA PROCESSING METHOD
    3.
    发明申请
    PLASMA PROCESSING METHOD 有权
    等离子体处理方法

    公开(公告)号：US20130146563A1

    公开(公告)日：2013-06-13

    申请号：US13399030

    申请日：2012-02-17

    申请人： Takahiro ABE ,  Takeshi Shimada ,  Atsushi Yoshida ,  Kentaro Yamada ,  Daisuke Fujita

    发明人： Takahiro ABE ,  Takeshi Shimada ,  Atsushi Yoshida ,  Kentaro Yamada ,  Daisuke Fujita

    IPC分类号： H01F41/00

    CPC分类号： H01J37/321 ,  C23F4/00 ,  C23G5/00 ,  H01J2237/334 ,  H01L43/12

    摘要： A method for plasma-etching a magnetic film and plasma-cleaning, in which deposits in an etching processing chamber are efficiently removed while corrosion of a wafer is suppressed, is provided. A plasma processing method for plasma-etching a to-be-processed substrate having a magnetic film in an etching processing chamber includes the steps of plasma-etching the magnetic film using a first gas not containing chlorine, transferring out the to-be-processed substrate from the etching processing chamber, first plasma-cleaning of the etching processing chamber using a second gas containing chlorine, and second plasma-cleaning using a third gas containing hydrogen after the first plasma cleaning.

    摘要翻译： 提供了一种用于等离子体蚀刻磁性膜和等离子体清洁的方法，其中在蚀刻处理室中的沉积物被有效地去除，同时腐蚀晶片被抑制。 在蚀刻处理室中对具有磁性膜的被处理基板进行等离子体蚀刻的等离子体处理方法包括使用不含氯的第一气体等离子体蚀刻磁性膜的步骤，将待处理的 来自蚀刻处理室的衬底，首先使用含氯的第二气体对蚀刻处理室进行等离子体清洁，以及在第一等离子体清洗之后使用含有氢的第三气体进行第二等离子体清洁。

    Transportation apparatus for transporting transportation target medium, recording apparatus having the same, and control method for controlling the same
    4.
    发明授权
    Transportation apparatus for transporting transportation target medium, recording apparatus having the same, and control method for controlling the same 有权
    运送目标介质运送装置，具有该运送目标介质的记录装置及其控制方法

    公开(公告)号：US07905486B2

    公开(公告)日：2011-03-15

    申请号：US11939331

    申请日：2007-11-13

    申请人： Takahiro Abe

    发明人： Takahiro Abe

    IPC分类号： B65H5/02

    CPC分类号： B65H5/062 ,  B65H2404/1441 ,  B65H2511/224 ,  B65H2513/53 ,  B65H2801/06 ,  B65H2220/02 ,  B65H2220/01

    摘要： The invention provides a transportation apparatus for transporting a transportation target medium in a predetermined transportation direction. The transportation target medium transportation apparatus according to an aspect of the invention includes: a transport driving roller that is operated rotationally; a transport driven roller that is urged against the transport driving roller and follows the rotary movement of the transport driving roller; and a control unit that controls the movement of the transport driven roller between a contact position at which the transport driven roller is in contact with the transport driving roller and a non-contact position at which the transport driven roller is not in contact with the transport driving roller. In such a configuration of the transportation target medium transportation apparatus, the control unit moves the transport driven roller to the non-contact position at which the transport driven roller is not in contact with the transport driving roller when the thickness of the transportation target medium is at least a predetermined value, and then moves the transport driven roller to the contact position at which the transport driven roller is in contact with the transport driving roller when the length of time period in which the transport driven roller continues to be at the non-contact position exceeds a predetermined time period.

    摘要翻译： 本发明提供一种用于在预定的运输方向上运输运输目标介质的运输设备。 根据本发明的一个方面的输送目标介质输送装置包括：旋转地操作的输送驱动辊; 传送驱动辊，其被推靠在传送驱动辊上并跟随传送驱动辊的旋转运动; 以及控制单元，其控制所述输送从动辊在所述输送从动辊与所述输送驱动辊接触的接触位置与所述输送从动辊与所述输送驱动辊不接触的非接触位置之间的运动 驱动辊。 在这样的输送目标介质输送装置的结构中，当输送对象介质的厚度为运送对象介质输送装置的厚度时，控制单元将输送从动辊移动到与输送驱动辊不接触的非接触位置 至少一个预定值，然后当传送从动辊继续处于非传送驱动辊的时间长度时，将传送从动辊移动到传送从动辊与传送驱动辊接触的接触位置， 接触位置超过预定时间段。

    Process for producing high-purity erythritol crystal
    5.
    发明授权
    Process for producing high-purity erythritol crystal 有权
    生产高纯度赤藓糖醇晶体的方法

    公开(公告)号：US6030820A

    公开(公告)日：2000-02-29

    申请号：US165796

    申请日：1998-10-02

    申请人： Satoshi Morioka ,  Takahiro Abe ,  Toshihiro Maeda ,  Arihiro Taki ,  Katsuhiko Sawada ,  Hiroaki Ishitsuka

    发明人： Satoshi Morioka ,  Takahiro Abe ,  Toshihiro Maeda ,  Arihiro Taki ,  Katsuhiko Sawada ,  Hiroaki Ishitsuka

    IPC分类号： C07C29/76 ,  C07C29/78 ,  C07C31/24 ,  C12P7/18 ,  C12R1/645 ,  C07C27/26 ,  C07C31/18 ,  C12P1/02

    CPC分类号： C07C29/78 ,  C12P7/18 ,  Y10S435/911

    摘要： A process for producing a high-purity erythritol crystal comprising a crystallization step of subjecting an erythritol-containing aqueous solution as a raw solution to crystallization, wherein an erythritol concentration of said erythritol-containing aqueous solution is adjusted to 30 to 60% by weight at the beginning of the crystallization step; said erythritol-containing aqueous solution is cooled at a cooling rate of not more than 20.degree. C./hour; a seed crystal of erythritol is added to said erythritol-containing aqueous solution in the course of the cooling, and the solution is cooled to not more than 20.degree. C. Such a process for producing a high-purity erythritol crystal of the present invention has a still higher purity and is further improved in crystal shape as compared to those produced by conventional processes.

    摘要翻译： 一种高纯度赤藓糖醇晶体的制造方法，其特征在于，使含有赤藓糖醇的水溶液作为原料溶液进行结晶的结晶化步骤，其中所述含赤藓糖醇的水溶液的赤藓醇浓度在30〜60重量％ 结晶步骤的开始; 所述含赤藓糖醇的水溶液以不超过20℃/小时的冷却速度冷却; 在冷却过程中将赤藓糖醇晶种加入到所述含赤藓糖醇的水溶液中，并将溶液冷却至不超过20℃。本发明的高纯度赤藓糖醇晶体的制造方法具有 与通过常规方法制造的那些相比，纯度更高，并且晶体形状进一步提高。

    Apparatus for production of compression-solidified snow
    6.
    发明授权
    Apparatus for production of compression-solidified snow 失效
    用于生产压缩固化雪的装置

    公开(公告)号：US4770684A

    公开(公告)日：1988-09-13

    申请号：US26360

    申请日：1987-03-16

    申请人： Hisashi Tsukada ,  Takahiro Abe ,  Sugio Ishihara ,  Junichi Taira ,  Hiroo Akabane

    发明人： Hisashi Tsukada ,  Takahiro Abe ,  Sugio Ishihara ,  Junichi Taira ,  Hiroo Akabane

    IPC分类号： F25C5/14 ,  B29C3/00

    CPC分类号： F25C5/14

    摘要： An apparatus for production of compression-solidified snow comprises a pressure chamber with a rust preventive inner face, a pressure head for applying pressure to snow, a boost-typed pressure cylinder installed at one end of the pressure chamber and equipped with the pressure head, a hopper having an inner face which allows snow to slide thereon smoothly, and a pusher installed in a snow compression zone at the other end of the pressure chamber. A method of compressing snow into solidified snow lump is characterized in that snow having a temperature of 0.degree. to -30.degree. C. is compressed and formed with a pressure of 10 to 200 kg/cm.sup.2 at a head displacement velocity of 0.1 to 150 mm/sec for pressure holding time of 0.about.300 seconds into a solid having a density of 0.6 g/cm.sup.3 or more.

    摘要翻译： 用于生产压缩固化雪的设备包括具有防锈内表面的压力室，用于施加压力的压力的压力头，安装在压力室的一端并配备有压力头的升压型压力缸， 具有允许雪平滑地滑动的内表面的料斗，以及安装在压力室的另一端的雪压缩区域中的推动器。 将雪压入固化的雪块的方法的特征在于，将温度为0〜-30℃的雪压缩并以10〜200kg / cm 2的压力形成，头位移速度为0.1〜150mm 的压力保持时间为0分钟的密度为0.6g / cm 3以上的固体。

    Substrate transfer apparatus, substrate transfer method, and storage medium
    7.
    发明授权
    Substrate transfer apparatus, substrate transfer method, and storage medium 有权
    基板转印装置，基板转印方法和存储介质

    公开(公告)号：US08029224B2

    公开(公告)日：2011-10-04

    申请号：US12076648

    申请日：2008-03-20

    申请人： Yo Abe ,  Mitsuru Obara ,  Takahiro Abe

    发明人： Yo Abe ,  Mitsuru Obara ,  Takahiro Abe

    IPC分类号： H01L21/00 ,  G01N21/86

    CPC分类号： H01L21/67781 ,  H01L21/67265 ,  H01L21/67766 ,  Y10S414/138

    摘要： A substrate transfer apparatus 100 includes a substrate transport means 4 having a transport base 5 and a plurality of retention arms 41a-41e for retaining substrates W, an optical sensor 62 that is used to define a horizontal optical axis L, an elevator means 52 for moving the transport base 5 up and down, and a height detection means 54 for detecting the height of the transport base 5 relative to the optical axis L. In accordance with a light-reception/no-light-reception detection result fed from the optical sensor 62 and the height of the transport base 5, a judgment means 72a of a control section 7 judges whether the postures of the retention arms 41a-41e relative to the horizontal plane are normal. When the judgment means 72a judges that the postures of the retention arms 41a-41e relative to the horizontal plane are abnormal, the control section 7 exercises control to stop the substrate transport means 4.

    摘要翻译： 基板输送装置100具备：基板输送机构4，具有输送基座5和保持基板W的多个保持臂41a-41e，用于限定水平光轴L的光学传感器62;电梯装置52， 移动基座5上下移动的高度检测单元54，检测运送台5相对于光轴L的高度的高度检测单元54.根据来自光学系统的光接收/无光接收检测结果 传感器62和传送基座5的高度，控制部分7的判断装置72a判断保持臂41a-41e相对于水平面的姿势是否正常。 当判断装置72a判定保持臂41a-41e相对于水平面的姿势异常时，控制部分7进行控制以停止基板输送装置4。

    Substrate transfer apparatus, substrate transfer method, and storage medium
    9.
    发明申请
    Substrate transfer apparatus, substrate transfer method, and storage medium 有权
    基板转印装置，基板转印方法和存储介质

    公开(公告)号：US20080232937A1

    公开(公告)日：2008-09-25

    申请号：US12076648

    申请日：2008-03-20

    申请人： Yo Abe ,  Mitsuru Obara ,  Takahiro Abe

    发明人： Yo Abe ,  Mitsuru Obara ,  Takahiro Abe

    IPC分类号： H01L21/00

    CPC分类号： H01L21/67781 ,  H01L21/67265 ,  H01L21/67766 ,  Y10S414/138

    摘要： A substrate transfer apparatus 100 includes a substrate transport means 4 having a transport base 5 and a plurality of retention arms 41a-41e for retaining substrates W, an optical sensor 62 that is used to define a horizontal optical axis L, an elevator means 52 for moving the transport base 5 up and down, and a height detection means 54 for detecting the height of the transport base 5 relative to the optical axis L. In accordance with a light-reception/no-light-reception detection result fed from the optical sensor 62 and the height of the transport base 5, a judgment means 72a of a control section 7 judges whether the postures of the retention arms 41a-41e relative to the horizontal plane are normal. When the judgment means 72a judges that the postures of the retention arms 41a-41e relative to the horizontal plane are abnormal, the control section 7 exercises control to stop the substrate transport means 4.

    摘要翻译： 基片传送装置100包括具有传输基座5和用于保持基片W的多个保持臂41a-41e，用于限定水平光轴L的光学传感器62的基片传送装置4，电梯装置 52，用于检测传送基座5相对于光轴L的高度的高度检测单元54.根据从传送基座5的光接收检测结果 光学传感器62和传送基座5的高度，控制部7的判断装置72a判断保持臂41a-41e相对于水平面的姿势是否正常。 当判断装置72a判定保持臂41a-41e相对于水平面的姿势异常时，控制部分7进行控制以停止基板传送装置4。