摘要:
A reflecting device that enables to prevent infiltration of particles into a processing chamber. The reflecting device is disposed in a communicating pipe. The communicating pipe allows the processing chamber of a substrate processing apparatus and an exhaust pump to communicate with each other. The exhaust pump has at least one rotary blade. The reflecting device comprises at least one reflecting surface. The at least one reflecting surface is oriented to the exhausting pump.
摘要:
In a particle attachment preventing method in a substrate processing apparatus, an electron density control power supplied from the second power supply is adjusted such that an electron density above the substrate gets lower than during a plasma processing, for a preset short period of time after the plasma processing is ended, and a bias power supplied from the first power is maintained for the preset short period of time. The second power supply is a high frequency power supply for supplying a high frequency power having a frequency that is higher than that of the bias power, and in said adjusting of the electron density control power, the high frequency power supplied from the second power supply is lowered as compared with that during the plasma processing.
摘要:
A light guide member and a sensor that constitute a front light mechanism are bonded with a bonded sheet. A double-sided adhesive tape is provided on each surface of the bonded sheet. A repairing material is printed on a surface of the sensor so as to fill concave portions provided between the adjacent X-electrodes. This substantially increases the contact area with the double-sided adhesive tape, and increases the bonding strength between the light guide member and the sensor.
摘要:
A coordinate input unit is composed of a sensor as a means for detecting a manipulating state on a manipulation surface A manipulated by a coordinate indicator and a front light as an illumination means disposed on the sensor to illuminate the manipulation surface A. When the manipulation surface of the coordinate input device is illuminated, the light emitted from an LED is transmitted in a light introduction plate, emerged from a prism surface, changes its direction by being reflected on a reflection plate, and is directed to the manipulation surface. With this operation, the manipulation surface is illuminated.
摘要:
An envelope for e.g. FED has spacerless structure while increase of the mass due to increase of the thickness of glass is suppressed. Further, the handling of conductors connected to emitters can be easy. An envelope for a flat panel display comprising a glass envelope and a support member for preventing deformation, wherein the glass envelope comprises a front glass and a rear glass, and the support member comprises a rim, bridges and a rear plate. The front glass comprises a face portion for displaying an image and a skirt portion is extended to the rear glass so that a hermetical seal is kept by the contact of a seal edge portion at the end of the skirt portion to the rear glass, the rim supports outer peripheries of outer surfaces of the skirt portion and the face portion, the rear plate is fixed to the rear glass to support the rear glass, and the rim and the rear plate are connected via a plurality of bridges.
摘要:
A controller comprises means for transmitting to an interface device, when predetermined data for examination must be acquired from a communication and charge or discharge controller in a packed battery which is an examination object in the step of performing examination processing, a communication command for acquiring the data for examination, the interface device comprises means for converting, when it receives the communication command from the controller, the received communication command into protocol data corresponding to a communication protocol used for communication with the packed battery which is an examination object, means for transmitting the obtained protocol data to the communication and charge or discharge controller in the packed battery which is an examination object, and means for receiving the data for examination which has been fed from the communication and the charge or discharge controller in the packed battery and transmitting the data for examination to the controller.
摘要:
A push button switch comprises a housing having an opening at the top and provided with a fixed contact member at the inner bottom, a stem supported to be vertically movable in and with respect to the housing, and an elastic member being capable of buckling and having one end attached to near a lower end of the stem and the other end attached to near the inner bottom of the housing, the elastic member being positioned in the housing to extend diagonally and urging the stem upward by its own resilient force. A high degree of reliability is ensured with the simple structure and a good click feeling is provided.
摘要:
A method of making a thin film transistor is described incorporating the steps of forming a gate electrode, a layer of insulating material, a layer of buffer material, a layer of semiconductor material, a source electrode and drain electrode. The invention reduces the problem of variation in threshold voltage of thin film transistors due to external stress such as the gate voltage or temperature.
摘要:
At the time of plasma igniting or during plasma processing, only optimizing the distance between electrodes in each case caused a limitation to the prevention of charging damage. To resolve this, a novel plasma processing method employs a plasma processing apparatus which includes an upper electrode to which first high-frequency power is applied, a lower electrode to which second high-frequency power is applied, and a lift mechanism for controlling the spacing between the upper and lower electrodes. The first high-frequency power is applied to the upper electrode to cause plasma igniting. The method is adapted to make the spacing between the upper and lower electrodes larger at least at the time of plasma extinction than during plasma processing of a wafer on the lower electrode.
摘要:
In a plasma processing apparatus for performing a plasma process on a substrate, a damage on a surface of a mounting table can be suppressed without using a dummy wafer when cleaning an inside of the plasma processing apparatus. Upon the completion of a plasma etching process, a surface of the susceptor 3 is exposed, and an inside of a vacuum chamber 1 of the plasma etching apparatus is cleaned by plasma P. Thus, reaction products A adhering to the inside of the vacuum chamber 1 are removed. Here, a DC voltage is applied to the plasma P during the cleaning process. As a result, while obtaining high-density plasma P, the ion energy can be reduced, so that the cleaning process can be performed effectively while suppressing damage on the surface of the susceptor 3.