公开(公告)号：US07771850B2

公开(公告)日：2010-08-10

申请号：US12202953

申请日：2008-09-02

申请人： Tohru Yanagisawa ,  Tamotsu Morimoto

发明人： Tohru Yanagisawa ,  Tamotsu Morimoto

IPC分类号： B32B19/04

CPC分类号： H05K9/0096 ,  H01J2211/446

摘要： An electromagnetic wave shielding laminate comprising a transparent substrate and an electromagnetic wave shielding film formed thereon, characterized in that the electromagnetic wave shielding film has, sequentially from the substrate side, a first high refractive index layer made of a material having a refractive index of at least 2.0, a first oxide layer containing zinc oxide as the main component, an electroconductive layer containing silver as the main component, and a second high refractive index layer made of a material having a refractive index of at least 2.0.

摘要翻译： 一种电磁波屏蔽层叠体，其特征在于，具有透明基板和形成在其上的电磁波屏蔽膜，其特征在于，所述电磁波屏蔽膜从基板侧依次具有由折射率为a的材料构成的第一高折射率层 至少2.0，以氧化锌为主要成分的第一氧化物层，以银为主要成分的导电层和由折射率至少为2.0的材料制成的第二高折射率层。

公开(公告)号：US20100014163A1

公开(公告)日：2010-01-21

申请号：US12493262

申请日：2009-06-29

申请人： Tamotsu Morimoto ,  Michihisa Tomida

发明人： Tamotsu Morimoto ,  Michihisa Tomida

IPC分类号： G02B1/11 ,  B32B7/02

CPC分类号： G02B1/115 ,  G02B1/116 ,  Y10T428/24942

摘要： There are provided an antireflector having a simple layer structure, a high visible light transmittance, a low visible light reflectance and an excellent anti-fingerprint property, and a display device having an excellent viewability.An antireflector 1 including a substrate 10 and an antireflection film 20; the antireflection film 20 having a first high refractive index layer 22, a metal layer 24, a second high refractive index layer 26 and a low refractive index layer 28 disposed therein sequentially from a substrate side facing the substrate 1; the first high refractive index layer containing at least one member selected from the group consisting of tin, gallium and cerium in the form of an oxide, and indium in the form of an oxide; the metal layer containing silver and palladium and having a palladium content of from 3 to 20 mass % relative to the total amount of the metal layer (100 mass %); the second high refractive index layer containing at least one member selected from the group consisting of tin, gallium and cerium in the form of an oxide and indium in the form of an oxide. A display device including the antireflector 1 disposed on an observer' side of a display panel.

摘要翻译： 提供了具有简单的层结构，高可见光透射率，低可见光反射率和优异的抗指纹性的抗反射器，以及具有优异的可视性的显示装置。 包括基板10和抗反射膜20的抗反射器1; 具有从面向衬底1的衬底侧依次设置的第一高折射率层22，金属层24，第二高折射率层26和低折射率层28的抗反射膜20; 所述第一高折射率层含有选自氧化物形式的锡，镓和铈中的至少一种，氧化物形式的铟; 含有银和钯的金属层，相对于金属层的总量为100质量％，钯含量为3〜20质量％。 所述第二高折射率层含有选自氧化物形式的锡，镓和铈和氧化物形式的铟中的至少一种。 一种显示装置，包括设置在显示面板的观察者侧的防反射体1。

公开(公告)号：US06812151B1

公开(公告)日：2004-11-02

申请号：US09233073

申请日：1999-01-19

申请人： Kenichi Nanbu ,  Tamotsu Morimoto

发明人： Kenichi Nanbu ,  Tamotsu Morimoto

IPC分类号： H01L21302

CPC分类号： H01J37/321 ,  H01L21/3065

摘要： An etching method is carried out by an etching system comprising a gas supply port for supplying an etching gas, a plasma producing vessel defining a plasma producing chamber in which the etching gas is converted into a plasma to produce radicals, a reaction vessel connected to the plasma producing vessel and defining a reaction chamber of a diameter greater than that of the plasma producing chamber, a support table placed in the reaction chamber to support an object to be processed to be etched by the radicals flowing down thereto from the plasma producing chamber, and a vacuum exhaust system for evacuating the reaction chamber. The etching gas is supplied through the etching gas supply port at an etching gas supply rate of 8.4 sccm or above per a substantial volume of one liter of the reaction chamber.

摘要翻译： 通过蚀刻系统进行蚀刻方法，该蚀刻系统包括用于供给蚀刻气体的气体供给口，限定等离子体生成室的等离子体生成容器，其中蚀刻气体被转换成等离子体以产生自由基，反应容器连接到 等离子体产生容器并且限定直径大于等离子体产生室直径的反应室;支撑台，放置在反应室中，以支撑待处理对象被从等离子体产生室向下流动的自由基蚀刻， 以及用于抽空反应室的真空排气系统。 通过蚀刻气体供给口以相对于1升反应室的体积为8.4sccm以上的蚀刻气体供给量供给蚀刻气体。

公开(公告)号：US5567152A

公开(公告)日：1996-10-22

申请号：US420075

申请日：1995-04-11

申请人： Tamotsu Morimoto

发明人： Tamotsu Morimoto

IPC分类号： H01L21/22 ,  C23C16/48 ,  C30B25/10 ,  C30B31/12 ,  H01L21/00 ,  H01L21/205 ,  H01L21/31 ,  H01L21/324 ,  F27D3/12

CPC分类号： H01L21/67109 ,  C23C16/481 ,  C30B25/10 ,  C30B31/12

摘要： A heat processing apparatus for subjecting heat processing to a wafer by heating includes a reaction tube for containing the wafers, a heating element provided around the reaction tube, for heating an inside of the reaction tube, a plurality of heat radiating members provided concentrically around the heating element with an airtight space between the heating element and an innermost one of the heat radiating members and airtight spaces between the heat radiating members, and a pressure-reducing device for reducing the pressure of these airtight spaces. In this heat processing apparatus, the pressures of the airtight spaces are reduced by the pressure-reducing means at least when the temperature of the inside of the reaction tube is increased.

摘要翻译： 用于通过加热对晶片进行热处理的热处理装置包括：用于容纳晶片的反应管，设置在反应管周围的加热元件，用于加热反应管的内部;多个散热构件，其围绕 加热元件与加热元件之间的气密空间和散热构件中的最内侧之间以及散热构件之间的气密空间，以及用于降低这些气密空间的压力的减压装置。 在该热处理装置中，至少在反应管内部的温度升高时，通过减压装置降低气密空间的压力。

公开(公告)号：US20120250146A1

公开(公告)日：2012-10-04

申请号：US13526176

申请日：2012-06-18

申请人： Kazuhiro Tamai ,  Yuichi Hino ,  Tamotsu Morimoto ,  Takeomi Miyako ,  Koji Sasaki

发明人： Kazuhiro Tamai ,  Yuichi Hino ,  Tamotsu Morimoto ,  Takeomi Miyako ,  Koji Sasaki

IPC分类号： G02B5/22 ,  B82Y20/00

CPC分类号： B32B17/10761 ,  B32B17/10 ,  B32B17/10036 ,  B32B17/1011 ,  B32B17/10201 ,  B32B17/10633 ,  B32B17/10651 ,  B32B2367/00

摘要： The present invention relates to a laminated glass including: a pair of glass substrates facing with each other; a composite film arranged between the pair of glass substrates and including a resin film and an infrared reflective film which includes a high refractive index layer and a low refractive index layer and is formed on a light-incident-side main surface of the resin film; and a pair of adhesive sheets arranged between the pair of glass substrates and the composite film to bond the pair of glass substrates and the composite film, in which the laminated glass has the specific configuration.

摘要翻译： 夹层玻璃技术领域本发明涉及一种夹层玻璃，其包括：一对面对的玻璃基板; 该复合膜布置在该对玻璃基板之间，并且包括树脂膜和包括高折射率层和低折射率层并且形成在树脂膜的光入射侧主表面上的红外反射膜; 以及一对粘合片，其布置在所述一对玻璃基板和所述复合膜之间，以结合所述一对玻璃基板和所述复合膜，其中所述夹层玻璃具有特定构造。

公开(公告)号：US20100171406A1

公开(公告)日：2010-07-08

申请号：US12726905

申请日：2010-03-18

申请人： Masayuki Morino ,  Kazuya Takemoto ,  Hideaki Miyazawa ,  Michihisa Tomida ,  Tamotsu Morimoto ,  Yuichi Hino

发明人： Masayuki Morino ,  Kazuya Takemoto ,  Hideaki Miyazawa ,  Michihisa Tomida ,  Tamotsu Morimoto ,  Yuichi Hino

IPC分类号： H01K1/26 ,  B32B15/04 ,  B32B5/00 ,  B32B37/02 ,  H05K9/00

CPC分类号： H05K9/0088 ,  Y10T428/26 ,  Y10T428/31678

摘要： To provide an electroconductive laminate which has a broad transmission/reflection band and which is excellent in electrical conductivity (electromagnetic wave shielding properties), visible light transmittance, visible light antireflection properties, near infrared shielding properties and moisture resistance, and an electromagnetic wave shield for a plasma display employing such a laminate.An electroconductive laminate 20 comprising a substrate 21 and an electroconductive film 22 formed on the substrate 21, wherein the electroconductive film 22 has a multilayer structure having a high refractive index layer (23a to 23e) and a metal layer (24a to 24d) alternately laminated in this order from the substrate side in a total number of 2n+1 layers (wherein n is an integer of from 1 to 12) and further having a hydrogenated carbon layer 25 at a position most removed from the substrate 21; the refractive index of the high refractive index layer (23a to 23e) is from 1.5 to 2.7; the hydrogenated carbon layer 25 contains carbon atoms and hydrogen atoms; and the content of hydrogen atoms in the hydrogenated carbon layer is from 9 to 50 atomic %.

摘要翻译： 为了提供具有宽的透射/反射带并且导电性（电磁波屏蔽性），可见光透射率，可见光抗反射性，近红外屏蔽性和耐湿性优异的导电性层叠体，以及电磁波屏蔽 使用这种层压体的等离子体显示器。 一种导电层压体20，其包括基板21和形成在基板21上的导电膜22，其中导电膜22具有交替层叠的具有高折射率层（23a至23e）和金属层（24a至24d）的多层结构 从基板侧依次以2n + 1层的总数（其中n为1〜12的整数），并且在与基板21最相似的位置处还具有氢化碳层25; 高折射率层（23a〜23e）的折射率为1.5〜2.7; 氢化碳层25含有碳原子和氢原子; 氢化碳层中氢原子的含量为9〜50原子％。

公开(公告)号：US07740946B2

公开(公告)日：2010-06-22

申请号：US11839839

申请日：2007-08-16

申请人： Tamotsu Morimoto ,  Masato Kawasaki ,  Makoto Hiramoto ,  Koichi Kanda ,  Susumu Nakagama

发明人： Tamotsu Morimoto ,  Masato Kawasaki ,  Makoto Hiramoto ,  Koichi Kanda ,  Susumu Nakagama

IPC分类号： B32B9/00

CPC分类号： H05K9/0096 ,  B32B17/10018

摘要： To provide an electroconductive laminate excellent in electrical conductivity and visible light transparency, an electromagnetic wave shielding film for a plasma display, and a protective plate for a plasma display having excellent electromagnetic wave shielding properties, a broad transmission/reflection band and a high visible light transmittance.An electroconductive laminate 10 comprising a substrate 11, and an electroconductive film 12 having a three-layer structure having a first oxide layer 12a, a metal layer 12b and a second oxide layer 12c laminated sequentially from the substrate 11 side, or having a 3×n layer structure (wherein n is an integer of at least 2) having the above three-layer structure repeated, wherein the first oxide layer 12a contains “zinc oxide” and “titanium oxide or niobium oxide”, the metal layer 12b is a layer containing silver, and the second oxide layer 12c contains a mixture of zinc oxide and aluminum oxide, or the like.

摘要翻译： 为了提供导电性和可见光透明性优异的导电性层叠体，等离子体显示用电磁波屏蔽膜和具有优异的电磁波屏蔽性，宽透射/反射带和高可见光的等离子体显示用保护板 透光率。 包含基板11的导电性层叠体10和具有三层结构的导电性膜12，具有从基板11侧依次层叠的第一氧化物层12a，金属层12b和第二氧化物层12c，或者具有3× 重复上述三层结构的n层结构（其中n为至少为2的整数），其中第一氧化物层12a包含“氧化锌”和“氧化钛或氧化铌”，金属层12b是层 并且第二氧化物层12c含有氧化锌和氧化铝的混合物等。

公开(公告)号：US20080112051A1

公开(公告)日：2008-05-15

申请号：US11972761

申请日：2008-01-11

申请人： Tamotsu MORIMOTO ,  Masato Kawasaki ,  Hideaki Miyazawa

发明人： Tamotsu MORIMOTO ,  Masato Kawasaki ,  Hideaki Miyazawa

IPC分类号： B60R1/06

CPC分类号： G02B5/0808

摘要： To provide a reflection mirror having a high reflectance in the visible region and excellent in moisture resistance and sulfur resistance, and its production process. A reflection mirror 10 comprising a substrate 11, a silicon nitride film 14 and a silver film 13 formed between the substrate 11 and the silicon nitride film 14, wherein when 10 ppm of hydrogen sulfide is introduced, and the reflection mirror is left to stand for 100 hours in an atmosphere at a temperature of 50° C. under a relative humidity of 80%, the rate of change of the luminous reflectance (chromaticity Y of the tristimulus value as defined in JIS Z8701 (1982)) after being left to stand is within 10% based on the luminous reflectance before being left to stand. Further, a process for producing a reflection mirror 10, which comprises forming a silver film 13 by a sputtering method and then forming a silicon nitride film 14 by a chemical vapor deposition method.

摘要翻译： 提供可见光区域的高反射率的反射镜，耐湿性和耐硫性优异的反射镜及其制造方法。 反射镜10包括基板11，氮化硅膜14和形成在基板11和氮化硅膜14之间的银膜13，其中当引入10ppm的硫化氢时，将反射镜放置在 在相对湿度80％的温度为50℃的气氛中100小时，放置后的光反射率（JIS Z8701（1982）定义的三刺激值的色度Y）的变化率 基于放置前的光反射率在10％以内。 此外，制造反射镜10的方法包括通过溅射法形成银膜13，然后通过化学气相沉积法形成氮化硅膜14。

公开(公告)号：US20070224432A1

公开(公告)日：2007-09-27

申请号：US11755555

申请日：2007-05-30

申请人： Tamotsu Morimoto ,  Hideaki Miyazawa ,  Masahiro Fusen ,  Koichi Kanda ,  Susumu Nakagama

发明人： Tamotsu Morimoto ,  Hideaki Miyazawa ,  Masahiro Fusen ,  Koichi Kanda ,  Susumu Nakagama

IPC分类号： B32B15/04

CPC分类号： H05K9/0096 ,  H01J2211/446

摘要： To provide an electroconductive laminate having a broad transmission/reflection band and having excellent electrical conductivity (electromagnetic wave shielding properties), visible light transparency and near infrared shielding properties, and an electromagnetic wave shielding film for a plasma display and a protective plate for a plasma display. An electroconductive laminate 10 comprising a substrate 11 and an electroconductive film 12 formed on the substrate 11, wherein the electroconductive film 12 has a multilayer structure having an oxide layer 12a and a metal layer 12b alternately laminated from the substrate 11 side in a total layer number of (2n+1) (wherein n is an integer of at least 1), the oxide layer 12a contains zinc oxide and a high refractive index metal oxide having a refractive index of at least 2.3 as the main components, and the metal layer 12b contains silver or a silver alloy as the main component; and a protective plate for a plasma display comprising a support, an electroconductive laminate 10 provided on the support, and an electrode electrically in contact with an electroconductive film of the electroconductive laminate 10.

摘要翻译： 为了提供具有宽的透射/反射带并且具有优异的导电性（电磁波屏蔽性），可见光透明度和近红外屏蔽性能的导电层压板，以及用于等离子体显示器的电磁波屏蔽膜和用于等离子体的保护板 显示。 一种导电性层叠体10，其包含基板11和形成在基板11上的导电膜12，其中，导电膜12具有多层结构，该多层结构具有从基板11侧交替层叠的氧化物层12a和金属层12b （2n + 1）（其中n是至少为1的整数）的层数，氧化物层12a包含氧化锌和折射率为至少2.3的高折射率金属氧化物作为主要成分，并且 金属层12b包含银或银合金作为主要成分; 以及用于等离子体显示器的保护板，其包括支撑体，设置在支撑体上的导电层压体10以及与导电性层叠体10的导电膜电接触的电极。

公开(公告)号：US20050000654A1

公开(公告)日：2005-01-06

申请号：US10796116

申请日：2004-03-10

申请人： Tamotsu Morimoto ,  Takahiro Murakami

发明人： Tamotsu Morimoto ,  Takahiro Murakami

IPC分类号： H01L21/3065 ,  H01J37/32 ,  C23F1/00

CPC分类号： H01J37/32568 ,  H01J37/32082

摘要： At the time of plasma igniting or during plasma processing, only optimizing the distance between electrodes in each case caused a limitation to the prevention of charging damage. To resolve this, a novel plasma processing method employs a plasma processing apparatus which includes an upper electrode to which first high-frequency power is applied, a lower electrode to which second high-frequency power is applied, and a lift mechanism for controlling the spacing between the upper and lower electrodes. The first high-frequency power is applied to the upper electrode to cause plasma igniting. The method is adapted to make the spacing between the upper and lower electrodes larger at least at the time of plasma extinction than during plasma processing of a wafer on the lower electrode.

摘要翻译： 在等离子体点火或等离子体处理时，仅在每种情况下优化电极之间的距离会对防止充电损坏造成限制。 为了解决这个问题，一种新颖的等离子体处理方法采用等离子体处理装置，其包括施加第一高频功率的上电极，施加第二高频电力的下电极和用于控制间隔的升降机构 在上下电极之间。 将第一高频功率施加到上电极以引起等离子体点火。 该方法适于使得上等电极和下电极之间的间隔至少在等离子体消光时比在下电极上的晶片的等离子体处理期间更大。