公开(公告)号：US06974963B2

公开(公告)日：2005-12-13

申请号：US10494524

申请日：2002-11-13

申请人： Michio Tanaka ,  Makoto Kiyota ,  Takashi Aiuchi ,  Ryouichi Uemura

发明人： Michio Tanaka ,  Makoto Kiyota ,  Takashi Aiuchi ,  Ryouichi Uemura

IPC分类号： G01N21/86 ,  G01N21/956 ,  G03F7/20 ,  H01L21/027 ,  H01L21/66 ,  H01L23/544

CPC分类号： G03F7/70491 ,  G01N21/95607 ,  G03F7/70625 ,  H01L22/34 ,  H01L2924/0002 ,  H01L2924/00

摘要： When a base film of a substrate is formed, for instance, on a scribe line of a wafer, a quadrangular first inspection pattern is formed in advance, and when a resist pattern is formed, a second inspection pattern are formed so as to be on a straight line to the first inspection pattern in a top plan view. When light is irradiated to a region including the first inspection pattern and the second inspection pattern and a spectrum is formed based on the reflected diffracted light, information of a line width of the second inspection pattern and a pitch of both inspection patterns is contained therein. In this connection, by preparing in advance a group of spectra based on various kinds of inspection patterns according to simulation and by comparing with an actual spectrum, the most approximate spectrum is selected, and thereby the line width and the pitch are estimated to evaluate the resist pattern.

摘要翻译： 例如，在基板的划线上形成基板的基膜时，预先形成四边形的第一检查图案，形成抗蚀剂图案，形成第二检查图案，使其成为 在顶视图中与第一检查图案的直线。 当光照射到包括第一检查图案和第二检查图案的区域并且基于反射的衍射光形成光谱时，包含第二检查图案的线宽和两个检查图案的间距的信息。 在这方面，通过根据模拟预先准备基于各种检查图案的一组光谱，并且通过与实际光谱进行比较，选择最近的光谱，从而估计线宽和间距以评估 抗蚀图案

公开(公告)号：US20070293970A1

公开(公告)日：2007-12-20

申请号：US11889923

申请日：2007-08-17

申请人： Takashi Aiuchi ,  Akihito Suzuki ,  Hirotsugu Kamamoto ,  Shuichi Yonemura ,  Takashi Imafu ,  Kazuhisa Sakamoto

发明人： Takashi Aiuchi ,  Akihito Suzuki ,  Hirotsugu Kamamoto ,  Shuichi Yonemura ,  Takashi Imafu ,  Kazuhisa Sakamoto

IPC分类号： G06F17/00

CPC分类号： H01L21/67276

摘要： An object of the present invention is to perform replacement of parts of a substrate processing apparatus more rapidly than that by the prior art. The present invention is a substrate processing apparatus constituted of a plurality of component parts for performing predetermined processing for a substrate, identification marks being attached to the respective component parts, the apparatus including: a storage unit for storing part information on each of the component parts necessary when placing an order for a component part, in correspondence with the identification mark; an input unit for inputting an identification mark of a component part to be ordered; and a display unit for displaying the part information in the storage unit corresponding to the inputted identification mark.

摘要翻译： 本发明的目的是比现有技术更快地更换基板处理装置的部件。 本发明是一种由多个用于对基板进行预定处理的部件构成的基板处理装置，识别标记附着在各个部件上，该装置包括：存储单元，用于存储关于每个部件的部件信息 在与识别标记对应的情况下，对组件部分进行订购时必要; 用于输入要订购的部件的识别标记的输入单元; 以及显示单元，用于在与输入的识别标记相对应的存储单元中显示零件信息。

公开(公告)号：US20050038618A1

公开(公告)日：2005-02-17

申请号：US10494524

申请日：2002-11-13

申请人： Michio Tanaka ,  Makoto Kiyota ,  Takashi Aiuchi ,  Ryouichi Uemura

发明人： Michio Tanaka ,  Makoto Kiyota ,  Takashi Aiuchi ,  Ryouichi Uemura

IPC分类号： G01N21/86 ,  G01N21/956 ,  G03F7/20 ,  H01L21/027 ,  H01L21/66 ,  H01L23/544 ,  G06F19/00

CPC分类号： G03F7/70491 ,  G01N21/95607 ,  G03F7/70625 ,  H01L22/34 ,  H01L2924/0002 ,  H01L2924/00

摘要： When a base film of a substrate is formed, for instance, on a scribe line of a wafer, a quadrangular first inspection pattern is formed in advance, and when a resist pattern is formed, a second inspection pattern are formed so as to be on a straight line to the first inspection pattern in a top plan view. When light is irradiated to a region including the first inspection pattern and the second inspection pattern and a spectrum is formed based on the reflected diffracted light, information of a line width of the second inspection pattern and a pitch of both inspection patterns is contained therein. In this connection, by preparing in advance a group of spectra based on various kinds of inspection patterns according to simulation and by comparing with an actual spectrum, the most approximate spectrum is selected, and thereby the line width and the pitch are estimated to evaluate the resist pattern.

公开(公告)号：US08060244B2

公开(公告)日：2011-11-15

申请号：US11889923

申请日：2007-08-17

申请人： Takashi Aiuchi ,  Akihito Suzuki ,  Hirotsugu Kamamoto ,  Shuichi Yonemura ,  Takashi Imafu ,  Kazuhisa Sakamoto

发明人： Takashi Aiuchi ,  Akihito Suzuki ,  Hirotsugu Kamamoto ,  Shuichi Yonemura ,  Takashi Imafu ,  Kazuhisa Sakamoto

IPC分类号： G06F7/00

CPC分类号： H01L21/67276

摘要： An object of the present invention is to perform replacement of parts of a substrate processing apparatus more rapidly than that by the prior art. The present invention is a substrate processing apparatus constituted of a plurality of component parts for performing predetermined processing for a substrate, identification marks being attached to the respective component parts, the apparatus including: a storage unit for storing part information on each of the component parts necessary when placing an order for a component part, in correspondence with the identification mark; an input unit for inputting an identification mark of a component part to be ordered; and a display unit for displaying the part information in the storage unit corresponding to the inputted identification mark.

摘要翻译： 本发明的目的是比现有技术更快地更换基板处理装置的部件。 本发明是一种由多个用于对基板进行预定处理的部件构成的基板处理装置，识别标记附着在各个部件上，该装置包括：存储单元，用于存储关于每个部件的部件信息 在与识别标记对应的情况下，对组件部分进行订购时必要; 用于输入要订购的部件的识别标记的输入单元; 以及显示单元，用于在与输入的识别标记相对应的存储单元中显示零件信息。

公开(公告)号：US06766209B2

公开(公告)日：2004-07-20

申请号：US10178020

申请日：2002-06-24

申请人： Takashi Aiuchi ,  Makoto Kiyota ,  Ryouichi Uemura ,  Michio Tanaka

发明人： Takashi Aiuchi ,  Makoto Kiyota ,  Ryouichi Uemura ,  Michio Tanaka

IPC分类号： G06F1900

CPC分类号： G06Q10/06

摘要： The present invention is a managing system for managing a processing system of a substrate and it has an information accumulation section for accumulating information on the processing system, an information collecting unit for collecting the information from the information accumulation section, and a managing unit for obtaining the information in the information collecting unit via the Internet or an intranet to manage the processing system based on this information.

摘要翻译： 本发明是一种用于管理基板的处理系统的管理系统，并且具有用于累积关于处理系统的信息的信息累积部分，用于从信息累积部分收集信息的信息收集单元和用于获取 通过因特网或内联网的信息收集单元中的信息，以基于该信息来管理处理系统。

公开(公告)号：US06394670B2

公开(公告)日：2002-05-28

申请号：US09853748

申请日：2001-05-14

申请人： Kunie Ogata ,  Takashi Aiuchi ,  Masanori Tateyama

发明人： Kunie Ogata ,  Takashi Aiuchi ,  Masanori Tateyama

IPC分类号： G03D500

CPC分类号： G03F7/70525 ,  G03F7/70975

摘要： A system comprises a first maintenance interval storage for storing a first maintenance interval of each component which is not related to an actual utilization of an apparatus, a second maintenance interval storage storing a second maintenance interval of each component which is related to the actual utilization of the apparatus, a maintenance demander for demanding maintenance of some component based on the passing of the first maintenance interval of this component; and a maintenance interval prolonger for judging the second maintenance interval has passed or not based on the passing of the first maintenance interval, and when the second maintenance interval has not yet passed, suspending the demand for maintenance by the maintenance demander and prolonging the first maintenance interval. Consequently, it becomes possible to manage a maintenance timing of each component and give notice thereof on the side of the apparatus composed of a plurality of components.

摘要翻译： 一种系统，包括：第一维护间隔存储器，用于存储与设备的实际利用无关的每个组件的第一维护间隔;存储与每个组件的实际使用相关的每个组件的第二维护间隔的第二维护间隔存储 该装置是基于该部件的第一维护间隔的通过而要求维护一些部件的维护需求者; 并且用于判断第二维护间隔的维护间隔延长器是否已经通过了第一维护间隔的通过，并且当第二维护间隔还没有通过时，暂停维护需求者的维护需求并延长了第一维护间隔 间隔。 因此，可以管理每个部件的维护定时，并且在由多个部件组成的装置的侧面通知它。