公开(公告)号：US08428448B2

公开(公告)日：2013-04-23

申请号：US12588587

申请日：2009-10-20

Applicant: Takashi Iwata ,  Yoshizumi Ito ,  Katsuhiro Kano

Inventor： Takashi Iwata ,  Yoshizumi Ito ,  Katsuhiro Kano

IPC: A21B2/00

CPC classification number: B65G25/02 ,  F27B17/0025 ,  H01L21/67115 ,  H01L21/67706 ,  H01L21/6776 ,  H01L31/1864 ,  Y02P70/521

Abstract: A walking beam type heat treatment apparatus including a heating furnace having a heating body to heat a substrate by radiation, a pair of first beams that are rod-like and provided in the heating furnace and a second beam disposed between the pair of the first beams, one of the pair of the first beams and the second beam relatively moving alternately in longitudinal and vertical directions repeatedly to the other of the pair of the first beams and the second beam, to cause to deliver and receive the substrate between the pair of the first beams and the second beam, and accordingly, to convey the substrate through the heating furnace, includes a side edge support protrusion that protrudes from each of the pair of the first beams such that the side edge support protrusion can horizontally support the substrate in abutting contact with a side edge of the substrate; and a front edge support protrusion and a rear edge support protrusion that protrude from the second beam such that the front edge support protrusion and the rear edge support protrusion can horizontally support the substrate in abutting contact with a front edge and a rear edge of the substrate.

Abstract translation: 一种步进梁式热处理装置，包括：加热炉，具有加热体，用于通过辐射加热基板;一对第一梁，其杆状并设置在加热炉中，第二梁设置在所述一对第一梁之间 所述一对第一光束和所述第二光束中的一个在所述一对第一光束和所述第二光束中反复相对于所述一对第一光束和所述第二光束中的另一个反复相对地在纵向和垂直方向上交替移动，从而在所述一对 第一梁和第二梁，因此，通过加热炉输送基板，包括从所述一对第一梁中的每一个突出的侧边缘支撑突起，使得侧边缘支撑突起能够将基板水平地支撑在邻接 与基板的侧边缘接触; 以及从所述第二梁突出的前边缘支撑突起和后边缘支撑突起，使得所述前边缘支撑突起和所述后边缘支撑突起可水平地支撑所述基板，所述基板与所述基板的前边缘和后边缘抵接 。

公开(公告)号：US07649105B2

公开(公告)日：2010-01-19

申请号：US12478189

申请日：2009-06-04

Applicant: Eui-chul Kang ,  Atsuhiko Ogura ,  Shingo Kataoka ,  Takashi Iwata

Inventor： Eui-chul Kang ,  Atsuhiko Ogura ,  Shingo Kataoka ,  Takashi Iwata

IPC: C07C69/74

CPC classification number: C07C271/16 ,  C07D317/22 ,  C08G18/283 ,  C08G18/678 ,  C08G18/8116

Abstract: The present invention provides compounds having in their molecule a structure contributing to high hydrophilicity, and having high photopolymerizability, as well as polymers of such compounds, and a method for producing the compound. The compounds are diol (meth)acrylate having a urethane bond represented by the formula (1), and cyclic ketal (meth)acrylate having a urethane bond represented by the formula (2): (R1: H, —CH3; R2: —(CH2)n-; R3: —(CH2)m-; n: 1-4; m: 1-8; (AO): C2-C4 oxyalkylene group; x: 0-1000; R4, R5: H, —CH3, —C2H5).

公开(公告)号：US5844306A

公开(公告)日：1998-12-01

申请号：US590797

申请日：1996-01-24

Applicant: Kazumoto Fujita ,  Takashi Iwata ,  Tetsuya Kurokawa

Inventor： Kazumoto Fujita ,  Takashi Iwata ,  Tetsuya Kurokawa

IPC: H01L23/28 ,  H01L23/495 ,  H01L23/50

CPC classification number: H01L24/32 ,  H01L23/49503 ,  H01L24/83 ,  H01L2224/27013 ,  H01L2224/29007 ,  H01L2224/2919 ,  H01L2224/32014 ,  H01L2224/32057 ,  H01L2224/32245 ,  H01L2224/45144 ,  H01L2224/48091 ,  H01L2224/48247 ,  H01L2224/49171 ,  H01L2224/73265 ,  H01L2224/8319 ,  H01L2224/83385 ,  H01L2224/838 ,  H01L2224/92247 ,  H01L24/45 ,  H01L24/48 ,  H01L24/49 ,  H01L2924/00014 ,  H01L2924/01004 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01015 ,  H01L2924/01023 ,  H01L2924/01029 ,  H01L2924/0105 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/014 ,  H01L2924/0665 ,  H01L2924/181

Abstract: A lead frame having a die pad of such a shape that prevents scattering of solder to lead when a chip is mounted on the lead frame, and a semiconductor device using such a lead frame are provided. The lead frame includes a die pad having a region surrounded by a first side, a second side opposing to the first side, a third side different from the first and second sides, and a fourth side opposing to the third side, and a lead formed of a conductor and electrically connected to a semiconductor element. The die pad includes a notch extending along the first and the second sides and positioned opposing to a main surface of the semiconductor element, and a through hole extending along the third and fourth sides and positioned opposing to the main surface of the semiconductor element. The semiconductor device employs the die pad.

Abstract translation: 一种引线框架，具有这样一种形状的管芯焊盘，其在芯片安装在引线框架上时防止焊料引导引起的散射，以及使用这种引线框架的半导体器件。 引线框架包括具有由第一侧围绕的区域，与第一侧相对的第二侧，与第一和第二侧不同的第三侧以及与第三侧相对的第四侧的管芯焊盘， 并且电连接到半导体元件。 管芯焊盘包括沿着第一和第二侧延伸并且与半导体元件的主表面相对定位的凹口，以及沿着第三和第四侧延伸并且与半导体元件的主表面相对定位的通孔。 半导体器件采用管芯焊盘。

公开(公告)号：US4665296A

公开(公告)日：1987-05-12

申请号：US668995

申请日：1984-11-05

Applicant: Takashi Iwata ,  Seiji Yokota ,  Yoshiaki Inoue ,  Tadashi Koizumi

Inventor： Takashi Iwata ,  Seiji Yokota ,  Yoshiaki Inoue ,  Tadashi Koizumi

IPC: H05H1/30 ,  H05H1/34 ,  B23K15/00

CPC classification number: H05H1/34 ,  H05H1/30 ,  H05H2001/3426

Abstract: An ignition element for use in igniting a high-frequency plasma torch is ungrounded and displaceable. When a tip end of the ignition element is positioned in a location in a gas to be formed into a plasma, which flows under normal pressure, and a high-frequency energy is applied to the above location in the gas flow, the gas is ignited into a high-temperature plasma in a small period of time shorter than 1 second. After the gas has been ignited, the ignition element is immediately retracted out of the location. The ignition element may be in the form of an ignition rod of metal or an ignition tube of quartz or the like. Where the ignition rod is used, it instantaneously contacts the high-temperature plasma upon ignition so that the high-temperature plasma is of high purity consisting only of the component of the gas. The ignition tube may be used for producing a high-temperature plasma of higher purity on and after ignition. The ignition tube is employed while a pressure therein is reduced. A glow discharge is generated in the ignition tube of the reduced pressure by applying the high-frequency energy, and the gas flowing outside of the tube is ignited by the glow discharge into a plasma.

Abstract translation: 用于点燃高频等离子体焰炬的点火元件不接地并可移动。 当点火元件的尖端位于要形成等离子体的气体中的位置，该等离子体在常压下流动，并且高频能量被施加到气流中的上述位置时，气体被点燃 在短于1秒的短时间内进入高温等离子体。 在气体被点燃之后，点火元件立即退出该位置。 点火元件可以是金属点火棒或石英等的点火管的形式。 在使用点火杆时，点火时立即与高温等离子体接触，使高温等离子体纯度仅由气体成分组成。 点火管可以用于在点火之后产生高纯度的高温等离子体。 使用点火管，同时其中的压力降低。 通过施加高频能量在减压点火管中产生辉光放电，并且流过管外的气体被辉光放电点燃成等离子体。

公开(公告)号：US4260965A

公开(公告)日：1981-04-07

申请号：US54798

申请日：1979-07-05

Applicant: Kiichi Nakamura ,  Takashi Iwata

Inventor： Kiichi Nakamura ,  Takashi Iwata

IPC: H01P1/22 ,  H03H7/24 ,  H01P1/30

CPC classification number: H01P1/227

Abstract: A fixed attenuator for microwave band comprising of a dielectric substrate, with a resistance film and a conductor film attached on said substrate so as to form an attenuation circuit. The substrate further comprises of at least one hole provided through the dielectric substrate. The attenuator is mounted on a metallic board or a printed circuit board by a screw inserted in said hole. Thus, the cooling effect of the resistance film has been improved while keeping the low manufacturing cost and stable structure, by fixing the dielectric substrate on a metallic board by screws inserted in the mentioned holes.

Abstract translation: 一种用于微波频带的固定衰减器，包括电介质基片，电阻膜和连接在所述基片上的导体膜，以形成衰减电路。 衬底还包括通过电介质衬底提供的至少一个孔。 衰减器通过插入所述孔中的螺钉安装在金属板或印刷电路板上。 因此，通过将插入在所述孔中的螺钉固定在金属板上，电阻膜的冷却效果得到改善，同时保持低的制造成本和稳定的结构。

公开(公告)号：US20100195992A1

公开(公告)日：2010-08-05

申请号：US12588587

申请日：2009-10-20

Applicant: Takashi Iwata ,  Yoshizumi Ito ,  Katsuhiro Kano

Inventor： Takashi Iwata ,  Yoshizumi Ito ,  Katsuhiro Kano

IPC: F27B5/06

CPC classification number: B65G25/02 ,  F27B17/0025 ,  H01L21/67115 ,  H01L21/67706 ,  H01L21/6776 ,  H01L31/1864 ,  Y02P70/521

Abstract: A walking beam type heat treatment apparatus including a heating furnace having a heating body to heat a substrate by radiation, a pair of first beams that are rod-like and provided in the heating furnace and a second beam disposed between the pair of the first beams, one of the pair of the first beams and the second beam relatively moving alternately in longitudinal and vertical directions repeatedly to the other of the pair of the first beams and the second beam, to cause to deliver and receive the substrate between the pair of the first beams and the second beam, and accordingly, to convey the substrate through the heating furnace, includes a side edge support protrusion that protrudes from each of the pair of the first beams such that the side edge support protrusion can horizontally support the substrate in abutting contact with a side edge of the substrate; and a front edge support protrusion and a rear edge support protrusion that protrude from the second beam such that the front edge support protrusion and the rear edge support protrusion can horizontally support the substrate in abutting contact with a front edge and a rear edge of the substrate.

Abstract translation: 一种步进梁式热处理装置，包括：加热炉，具有加热体，用于通过辐射加热基板;一对第一梁，其杆状并设置在加热炉中，第二梁设置在所述一对第一梁之间 所述一对第一光束和所述第二光束中的一个在所述一对第一光束和所述第二光束中反复相对于所述一对第一光束和所述第二光束中的另一个反复相对地在纵向和垂直方向上交替移动，从而在所述一对 第一梁和第二梁，因此，通过加热炉输送基板，包括从所述一对第一梁中的每一个突出的侧边缘支撑突起，使得侧边缘支撑突起能够将基板水平地支撑在邻接 与基板的侧边缘接触; 以及从所述第二梁突出的前边缘支撑突起和后边缘支撑突起，使得所述前边缘支撑突起和所述后边缘支撑突起可水平地支撑所述基板，所述基板与所述基板的前边缘和后边缘抵接 。

公开(公告)号：US20100081779A1

公开(公告)日：2010-04-01

申请号：US12631049

申请日：2009-12-04

Applicant: Eui-chul Kang ,  Atsuhiko Ogura ,  Shingo Kataoka ,  Takashi Iwata

Inventor： Eui-chul Kang ,  Atsuhiko Ogura ,  Shingo Kataoka ,  Takashi Iwata

IPC: C08F24/00

CPC classification number: C07C271/16 ,  C07D317/22 ,  C08G18/283 ,  C08G18/678 ,  C08G18/8116

Abstract: The present invention provides compounds having in their molecule a structure contributing to high hydrophilicity, and having high photopolymerizability, as well as polymers of such compounds, and a method for producing the compound. The compounds are diol (meth)acrylate having a urethane bond represented by the formula (1), and cyclic ketal (meth)acrylate having a urethane bond represented by the formula (2): (R1: H, —CH3; R2: —(CH2)n—; R3: —(CH2)m—; n: 1-4; m: 1-8; (AO): C2-C4 oxyalkylene group; x: 0-1000; R4, R5: H, —CH3, —C2H5).

Abstract translation: 本发明提供了在其分子中具有有助于高亲水性和高光聚合性的结构的化合物，以及这些化合物的聚合物，以及该化合物的制备方法。 化合物是具有由式（1）表示的氨基甲酸酯键的二醇（甲基）丙烯酸酯和具有由式（2）表示的氨基甲酸酯键的环状缩酮（甲基）丙烯酸酯：（R1：H，-CH3; R2： - （CH2）n-; R3： - （CH2）m-; n：1-4; m：1-8;（AO）：C2-C4氧化烯基; x：0-1000; R4，R5：H， CH3，-C2H5）。

公开(公告)号：US07649106B2

公开(公告)日：2010-01-19

申请号：US12478230

申请日：2009-06-04

Applicant: Eui-chul Kang ,  Atsuhiko Ogura ,  Shingo Kataoka ,  Takashi Iwata

Inventor： Eui-chul Kang ,  Atsuhiko Ogura ,  Shingo Kataoka ,  Takashi Iwata

IPC: C07C69/00

CPC classification number: C07C271/16 ,  C07D317/22 ,  C08G18/283 ,  C08G18/678 ,  C08G18/8116

Abstract: The present invention provides compounds having in their molecule a structure contributing to high hydrophilicity, and having high photopolymerizability, as well as polymers of such compounds, and a method for producing the compound. The compounds are diol (meth)acrylate having a urethane bond represented by the formula (1), and cyclic ketal (meth)acrylate having a urethane bond represented by the formula (2): (R1: H, —CH3; R2: —(CH2)n-; R3: —(CH2)m-; n: 1-4; m: 1-8; (AO): C2-C4 oxyalkylene group; x: 0-1000; R4, R5: H, —CH3, —C2H5).

Abstract translation: 本发明提供了在其分子中具有有助于高亲水性和高光聚合性的结构的化合物，以及这些化合物的聚合物，以及该化合物的制备方法。 化合物是具有由式（1）表示的氨基甲酸酯键的二醇（甲基）丙烯酸酯和具有由式（2）表示的氨基甲酸酯键的环状缩酮（甲基）丙烯酸酯：（R1：H，-CH3; R2： - （CH2）n-; R3： - （CH2）m-; n：1-4; m：1-8;（AO）：C2-C4氧化烯基; x：0-1000; R4，R5：H， CH3，-C2H5）。

公开(公告)号：US06462794B1

公开(公告)日：2002-10-08

申请号：US09414481

申请日：1999-10-08

Applicant: Hiroki Yoshikawa ,  Tetsu Ohishi ,  Hideo Tanide ,  Takesuke Maruyama ,  Goro Ohnishi ,  Takashi Iwata ,  Takeshi Igarashi

Inventor： Hiroki Yoshikawa ,  Tetsu Ohishi ,  Hideo Tanide ,  Takesuke Maruyama ,  Goro Ohnishi ,  Takashi Iwata ,  Takeshi Igarashi

IPC: G02F11335

CPC classification number: G02B3/0062 ,  G02B3/0031 ,  G02B3/0068 ,  G02B3/0075 ,  G02F1/133526 ,  H04N5/7441 ,  H04N9/3141 ,  H04N9/3147

Abstract: An enlarging unit comprises a concave Fresnel lens warped convexly toward an image forming unit side, the image forming unit is held between a light transmissible support plate warped convexly toward the image forming unit side and the enlarging unit warped convexly toward the image forming unit side, and peripheries of the support plate and the enlarging unit are fixed or semi-fixed. Thereby, deformation caused when the incident side and emission side micro-lens arrays are molded and deformation due to environmental temperature and humidity change are corrected, and both components are always maintained in close contact.

Abstract translation: 放大单元包括朝向图像形成单元侧凸出翘曲的凹形菲涅尔透镜，图像形成单元保持在朝向图像形成单元侧凸形弯曲的透光性支撑板和朝向图像形成单元侧凸起的扩大单元之间， 并且支撑板和放大单元的周边是固定的或半固定的。 由此，修正了入射侧和发射侧微透镜阵列成型引起的变形，并且由于环境温度和湿度变化引起的变形，并且两者都始终保持紧密接触。

公开(公告)号：US3988373A

公开(公告)日：1976-10-26

申请号：US506001

申请日：1974-09-16

Applicant: Kazuo Nakanishi ,  Takashi Iwata ,  Hisae Haruta ,  Kazuhiko Yoshida ,  Hideo Yagi ,  Akira Hashimoto nee Matui

Inventor： Kazuo Nakanishi ,  Takashi Iwata ,  Hisae Haruta ,  Kazuhiko Yoshida ,  Hideo Yagi ,  Akira Hashimoto nee Matui

IPC: C07C87/46

Abstract: A quaternary ammonium salt of the formula: ##SPC1## ##EQU1## wherein A is a lower alkylene, a lower alkenylene or a lower alkadienylene; R.sub.1 and R.sub.2 are each lower alkyl which may be linked together directly or by an oxygen atom to form a saturated heterocyclic group; R.sub.3 is a lower alkyl, a halo (lower) alkyl, a lower alkynyl, phenyl (lower) alkyl which may have one or more halogen atoms as substituents on the phenyl ring, a lower alkenyl, a hydroxy (lower) alkyl, a carboxy (lower) alkyl or a lower alkenyloxycarbonyl (lower) alkyl; R.sub.4, R.sub.5 and R.sub.6 are each lower alkyl having 1 to 3 carbon atoms; X is an acid residue; and wherein the cyclohexyl ring may have one double bond, with the proviso that when the cyclohexyl ring has one double bond in the 1,2 position, A may not be ##EQU2## when X.sup.- is iodide, R.sub.4, R.sub.5 and R.sub.6 are all methyl; R.sub.1, R.sub.2 and R.sub.3 are all methyl or all ethyl, or R.sub.1 is methyl, R.sub.2 is ethyl and R.sub.3 is phenylisopropyl or isoamyl with the further proviso that when the double bond in the cyclohexyl ring is in the 2,3 position, A may not be ##EQU3## when X.sup.- is iodide, and R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5 and R.sub.6 are all methyl.

Abstract translation: 下式的季铵盐：+ q，10 -CH 2 -CH 2 -CH- | CH 3，其中A是低级亚烷基，低级亚烯基或低级亚二烯基; R1和R2各自是可以直接或由氧原子连接在一起形成饱和杂环基的低级烷基; R3是低级烷基，卤代（低级）烷基，低级炔基，苯基（低级）烷基，可以具有一个或多个卤素原子作为苯基环上的取代基，低级烯基，羟基（低级）烷基，羧基 （低级）烷基或低级链烯氧基羰基（低级）烷基; R4，R5和R6分别是具有1至3个碳原子的低级烷基; X是酸残基; 并且其中环己基环可以具有一个双键，条件是当环己基环在1,2位具有一个双键时，当X 1是碘时，A可以不是-CH 2 -CH 2 -CH- | CH 3 ，R4，R5和R6均为甲基; R1，R2和R3均为甲基或全部乙基，或R1为甲基，R2为乙基，R3为苯基异丙基或异戊基，条件是当环己基环中的双键为2,3位时，A不可以 当X 1 - 为碘时，为CH 3 | -CH = CH-CH = C-CH 2 - ，R 1，R 2，R 3，R 4，R 5和R 6均为甲基。