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    Patterning process
    1.
    发明授权
    Patterning process 有权
    图案化过程

    公开(公告)号：US08492078B2

    公开(公告)日：2013-07-23

    申请号：US13010318

    申请日：2011-01-20

    Applicant: Jun Hatakeyama ,  Takeshi Nagata ,  Koji Hasegawa

    Inventor： Jun Hatakeyama ,  Takeshi Nagata ,  Koji Hasegawa

    IPC: G03F7/26

    CPC classification number: G03F7/0397 ,  G03F7/0046 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325

    Abstract: A pattern is formed by coating a resist composition comprising a polymer comprising recurring units having an optionally acid labile group-substituted naphthol group, an acid generator, and an organic solvent onto a substrate, baking to form a resist film, exposing the resist film to high-energy radiation, baking, and developing the exposed film with an organic solvent developer to form a negative pattern wherein the unexposed region of film is dissolved and the exposed region of film is not dissolved. In the process of image formation via positive/negative reversal by organic solvent development, the resist film has a high dissolution contrast and controlled acid diffusion. By subjecting the resist film to exposure through a mask having a lattice-like pattern and organic solvent development, a fine hole pattern can be formed at a high precision of dimensional control.

    Abstract translation: 通过将包含含有任选的酸不稳定基取代的萘酚基的重复单元，酸产生剂和有机溶剂的聚合物的抗蚀剂组合物涂布在基材上，烘烤以形成抗蚀剂膜，将抗蚀剂膜暴露于 高能辐射，烘烤，并用有机溶剂显影剂显影曝光的薄膜以形成其中未暴露的薄膜区域溶解并且曝光区域不溶解的负图案。 在通过有机溶剂显影的正/负反转的图像形成过程中，抗蚀剂膜具有高的溶解对比度和受控的酸扩散。 通过使抗蚀剂膜通过具有格子状图案和有机溶剂显影的掩模进行曝光，可以以高精度的尺寸控制形成细孔图案。

    PATTERNING PROCESS
    2.
    发明申请
    PATTERNING PROCESS 有权
    绘图过程

    公开(公告)号：US20120276485A1

    公开(公告)日：2012-11-01

    申请号：US13456705

    申请日：2012-04-26

    Applicant: Tomohiro Kobayashi ,  Jun Hatakeyama ,  Takeshi Nagata

    Inventor： Tomohiro Kobayashi ,  Jun Hatakeyama ,  Takeshi Nagata

    IPC: G03F7/20

    CPC classification number: G03F7/0397

    Abstract: A negative pattern is formed by applying a resist composition onto a substrate, baking, exposing to high-energy radiation, baking (PEB), and developing the exposed resist film in an organic solvent developer to selectively dissolve the unexposed region of resist film. The resist composition comprising a hydrogenated ROMP polymer and a (meth)acrylate resin displays a high dissolution contrast in organic solvent development, and exhibits high dry etch resistance even when the acid labile group is deprotected through exposure and PEB.

    Abstract translation: 通过将抗蚀剂组合物涂布在基材上，烘烤，暴露于高能量辐射，烘烤（PEB）和在有机溶剂显影剂中曝光的抗蚀剂膜显影以选择性地溶解抗蚀剂膜的未曝光区域，形成负型图案。 包含氢化ROMP聚合物和（甲基）丙烯酸酯树脂的抗蚀剂组合物在有机溶剂显影中表现出高的溶解对比度，并且即使当酸不稳定基团通过曝光和PEB脱保护时也显示出高的耐干蚀刻性。

    Magnetic recording medium
    4.
    发明申请
    Magnetic recording medium 审中-公开
    磁记录介质

    公开(公告)号：US20060187589A1

    公开(公告)日：2006-08-24

    申请号：US11358123

    申请日：2006-02-22

    Applicant: Takeshi Harasawa ,  Naoto Abe ,  Takeshi Nagata

    Inventor： Takeshi Harasawa ,  Naoto Abe ,  Takeshi Nagata

    IPC: G11B5/33

    CPC classification number: G11B5/70 ,  G11B5/842

    Abstract: Provided is a magnetic recording medium capable of achieving high reproduction output in a short wavelength region. The magnetic recording medium comprises a nonmagnetic layer comprising a nonmagnetic powder and a binder and a magnetic layer comprising a ferromagnetic powder and a binder in this order on a nonmagnetic support. The magnetic layer has a squareness ranging from 0.6 to 1.0 in a perpendicular direction, and the magnetic recording medium is employed for recording a magnetic signal on the medium in a longitudinal direction at a linear recording density of equal to or greater than 300 Kbpi using a recording head with a gap length of equal to or less than 0.3 micrometer, and reproducing the magnetic signal using a magnetoresistive head with a shield spacing of equal to or less than 0.2 micrometer.

    Abstract translation: 提供了能够在短波长区域中实现高再现输出的磁记录介质。 该磁记录介质包括非磁性层，其包含非磁性粉末和粘合剂，以及磁性层，其包含铁磁粉末和粘合剂，其顺序为非磁性载体。 磁性层在垂直方向上具有0.6至1.0的正方形，并且磁记录介质用于以等于或大于300Kbpi的线性记录密度在纵向方向上在介质上记录磁信号，使用 记录头的间隙长度等于或小于0.3微米，并且使用屏蔽间距等于或小于0.2微米的磁阻头再现磁信号。

    Chemically amplified positive resist composition
    6.
    发明授权
    Chemically amplified positive resist composition 失效
    化学放大正光刻胶组合物

    公开(公告)号：US5750309A

    公开(公告)日：1998-05-12

    申请号：US684481

    申请日：1996-07-19

    Applicant: Jun Hatakeyama ,  Shigehiro Nagura ,  Kiyoshi Motomi ,  Takeshi Nagata ,  Toshinobu Ishihara

    Inventor： Jun Hatakeyama ,  Shigehiro Nagura ,  Kiyoshi Motomi ,  Takeshi Nagata ,  Toshinobu Ishihara

    IPC: G03F7/004 ,  G03F7/039

    CPC classification number: G03F7/039 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/111

    Abstract: In a chemical amplification positive resist composition comprising an organic solvent, a resin and a photoacid generator, at least two polymers having different molecular weights selected from polyhydroxystyrenes having some hydroxyl groups protected with acid labile groups are used. Among the polymers, a high molecular weight polymer has a molecular weight dispersity (Mw1/Mn1) of up to 1.5, and a low molecular weight polymer has a dispersity (Mw2/Mn2) of up to 5.0. The weight average molecular weight ratio Mw1/Mw2 is between 1.5/1 and 10.0/1. The resist composition is highly sensitive to actinic radiation, has improved sensitivity and resolution, and is suitable for use in a fine patterning technique and commercially acceptable.

    Abstract translation: 在包含有机溶剂，树脂和光致酸发生剂的化学放大正性抗蚀剂组合物中，使用至少两种具有不同分子量的聚合物，其选自具有用酸不稳定基保护的一些羟基的多羟基苯乙烯。 在聚合物中，高分子量聚合物的分子量分散性（Mw1 / Mn1）高达1.5，低分子量聚合物的分散性（Mw2 / Mn2）高达5.0。 重均分子量Mw1 / Mw2在1.5 / 1和10.0 / 1之间。 抗蚀剂组合物对光化辐射高度敏感，具有改进的灵敏度和分辨率，并且适用于精细图案化技术和商业上可接受的。

    Inverter device, transformer, and transformer manufacturing method
    7.
    发明授权
    Inverter device, transformer, and transformer manufacturing method 有权
    变频器，变压器和变压器制造方法

    公开(公告)号：US09537389B2

    公开(公告)日：2017-01-03

    申请号：US14433540

    申请日：2012-10-19

    Applicant: Yoshinobu Koji ,  Takeshi Tanaka ,  Takeshi Nagata

    Inventor： Yoshinobu Koji ,  Takeshi Tanaka ,  Takeshi Nagata

    IPC: H02M1/44 ,  H01F27/24 ,  H01F27/30 ,  H01F27/33 ,  H01F41/02 ,  H01F41/06 ,  H02M7/42 ,  H01F30/12

    CPC classification number: H02M1/44 ,  B60L2200/26 ,  H01F27/24 ,  H01F27/30 ,  H01F27/306 ,  H01F27/33 ,  H01F30/12 ,  H01F41/0233 ,  H01F41/06 ,  H02M7/42 ,  Y10T29/49071

    Abstract: Provided is an inverter device that can reduce high-frequency noise. The inverter device includes a transformer for converting the voltage of the AC power output from an inverter circuit and outputting the resulting power. Each of first to third coil sections for converting the voltage of the AC power output from the inverter circuit and outputting the resulting power includes an inner coil respectively wound around first to third core sections and an outer coil. The first to third core sections are each column shaped having an axis in the Y direction, and are arranged in the Z direction. Non-magnetic pressing members are provided between the adjacent coil sections and between the adjacent coil sections. The pressing members press against the adjacent coil sections and the adjacent coil sections respectively.

    Abstract translation: 提供了可以降低高频噪声的逆变器装置。 逆变器装置包括用于转换从逆变器电路输出的AC电力的电压并输出所得功率的变压器。 用于转换从逆变器电路输出的交流电力的电压并输出所得功率的第一至第三线圈部分包括分别绕第一至第三芯部分和外部线圈缠绕的内部线圈。 第一至第三芯部分各自具有在Y方向上具有轴的列成形，并且沿Z方向排列。 非磁性按压部件设置在相邻的线圈部之间和相邻的线圈部之间。 按压构件分别压靠相邻的线圈部分和相邻的线圈部分。

    Positive resist composition and patterning process
    9.
    发明授权
    Positive resist composition and patterning process 有权
    正抗蚀剂组成和图案化工艺

    公开(公告)号：US08778592B2

    公开(公告)日：2014-07-15

    申请号：US13404824

    申请日：2012-02-24

    Applicant: Jun Hatakeyama ,  Takeshi Nagata ,  Taku Morisawa

    Inventor： Jun Hatakeyama ,  Takeshi Nagata ,  Taku Morisawa

    IPC: G03F7/004 ,  G03F7/039 ,  G03F7/26

    CPC classification number: G03F7/0392 ,  G03F7/0397 ,  G03F7/085 ,  H01L21/265

    Abstract: A positive resist composition based on a polymer comprising recurring units of (meth)acrylate having a cyclic acid labile group and a dihydroxynaphthalene novolak resin, and containing a photoacid generator is improved in resolution, step coverage and adhesion on a highly reflective stepped substrate, has high resolution, and forms a pattern of good profile and minimal edge roughness through exposure and development.

    Abstract translation: 具有包含具有环酸不稳定基团的（甲基）丙烯酸酯和二羟基萘酚醛清漆树脂的重复单元并含有光酸产生剂的聚合物的正性抗蚀剂组合物在高反射性阶梯基材上的分辨率，台阶覆盖率和粘附性得到改善，具有 高分辨率，并且通过曝光和显影形成良好轮廓和最小边缘粗糙度的图案。

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