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13 条记录 (耗时 0.017 秒)

    Anti-reflective coating
    1.
    发明授权
    Anti-reflective coating 失效
    防反射涂层

    公开(公告)号：US4910122A

    公开(公告)日：1990-03-20

    申请号：US638258

    申请日：1984-08-06

    申请人： John W. Arnold ,  Terry L. Brewer ,  Sumalee Punyakumleard

    发明人： John W. Arnold ,  Terry L. Brewer ,  Sumalee Punyakumleard

    IPC分类号： G03F7/09 ,  H01L21/027

    CPC分类号： G03F7/091 ,  H01L21/0276 ,  Y10S438/952

    摘要： A light absorbing medium to be interposed under photosensitive layers, such as a photo-resist for integrated circuit "chips" to eliminate defects caused by reflected light, has a polymer vehicle which can penetrate into small depressions of a substrate and form a thin, smooth and uniform coating. The coating includes a light absorbing dye. This light absorbing layer is imageable in the process. The light absorbing material eliminates many of the defects caused by reflected light resulting in increased sharpness of the images in the photo-resist. The material reduces the losses due to defects and increases the yield of useable product.

    摘要翻译： 为了消除由反射光引起的缺陷，介于光敏层之间的光吸收介质，例如用于集成电路“芯片”的光致抗蚀剂，具有能够渗透到基板的小凹陷中并形成薄而平滑的聚合物载体 均匀涂层。 涂层包括吸光染料。 该光吸收层在该过程中是可成像的。 光吸收材料消除了由反射光引起的许多缺陷，导致光致抗蚀剂中的图像的清晰度增加。 该材料减少了由于缺陷造成的损失并增加了可用产品的产量。

    Pirani pressure sensor
    4.
    发明授权
    Pirani pressure sensor 失效
    皮拉尼压力传感器

    公开(公告)号：US5633465A

    公开(公告)日：1997-05-27

    申请号：US384826

    申请日：1995-02-07

    申请人： James Kaufmann ,  Mary G. Moss ,  Terry L. Brewer

    发明人： James Kaufmann ,  Mary G. Moss ,  Terry L. Brewer

    IPC分类号： G01L21/12

    CPC分类号： G01L21/12

    摘要： The invention is a method and apparatus for a pirani pressure sensor. The apparatus consists of a current supply and current receiving means affixed to a substrate. Bridging the current supply means and current receiving means is an electrically conductive polymer. The pirani pressure sensor may be made using conventional photolithographic techniques.

    摘要翻译： 本发明是一种用于玻璃压力传感器的方法和装置。 该装置由固定在基板上的电流源和电流接收装置组成。 桥接电流供应装置和电流接收装置是导电聚合物。 可以使用常规的光刻技术制造皮拉压力传感器。

    Homogeneously conductive polymer films as strain gauges
    5.
    发明授权
    Homogeneously conductive polymer films as strain gauges 失效
    均匀导电聚合物膜作为应变计

    公开(公告)号：US5505093A

    公开(公告)日：1996-04-09

    申请号：US342906

    申请日：1994-11-21

    申请人： Ryan E. Giedd ,  Yongqiang Wang ,  Mary G. Moss ,  James Kaufmann ,  Terry L. Brewer

    发明人： Ryan E. Giedd ,  Yongqiang Wang ,  Mary G. Moss ,  James Kaufmann ,  Terry L. Brewer

    IPC分类号： G01L1/22 ,  G01L1/18

    CPC分类号： G01L1/2293

    摘要： An electrical type strain gauge for measuring both micro and macro deformations. The gauge may be constructed from thin films of homogeneously conductive polymers, including soluble polyaniline-based conducting polymers and ion-implanted organic polymers. The gauges are characterized by unexpected piezoresistivity from materials having high bulk resistivity, thermal stability, good flexibility, photoimageability and without adding carbon or metal particulate material to the polymer.

    摘要翻译： 用于测量微观和微观变形的电气型应变片。 量规可以由均匀导电聚合物的薄膜构成，包括可溶性聚苯胺类导电聚合物和离子注入的有机聚合物。 测量仪的特征在于具有高体积电阻率，热稳定性，良好柔性，光像性能并且不向聚合物中添加碳或金属颗粒材料的材料的意想不到的压阻性。

    Light absorbing coating
    6.
    发明授权
    Light absorbing coating 失效
    吸光涂层

    公开(公告)号：US4822718A

    公开(公告)日：1989-04-18

    申请号：US825855

    申请日：1986-02-04

    申请人： William J. Latham ,  Terry L. Brewer ,  Jeffry Hunninghake

    发明人： William J. Latham ,  Terry L. Brewer ,  Jeffry Hunninghake

    IPC分类号： G03F1/00 ,  C08G73/06 ,  C09D5/00 ,  C09D5/32 ,  C09D179/08 ,  G02F1/1335 ,  G03F1/08 ,  G03F1/10 ,  G03F7/09 ,  G03F9/00 ,  H01L21/027 ,  G03C1/76

    CPC分类号： C08G73/06 ,  G02F1/133512 ,  G03F1/56 ,  G03F7/091 ,  G03F9/7026 ,  H01L21/0276

    摘要： A broad spectrum light absorbing medium to be coated over photosensitive layers, such as a photoresist for integrated circuit "chips" to act as a true surface for autofocus of the camera used to expose the photoresist. The product may also be used where a light impermeable, high contrast or black coating is needed, such as, in liquid crystal displays and light emitting diodes, photodiodes, solid state lasers, or patterning apertures on light-wave modulators. The coating absorbs light from 200 to 1000 nanometers. The coating has a polymer vehicle which can form a tightly adhering, thin, smooth and uniform coating. The coating includes a light absorbing dye. This light absorbing layer may be imageable.

    摘要翻译： 要在光敏层上涂覆的广谱光吸收介质，例如用于集成电路“芯片”的光致抗蚀剂，用作用于曝光光致抗蚀剂的相机的自动聚焦的真实表面。 该产品还可用于需要不透光，高对比度或黑色涂层的场合，例如在液晶显示器和发光二极管，光电二极管，固态激光器或光波形调制器上的图形化孔。 涂层吸收200至1000纳米的光。 该涂层具有聚合物载体，其可以形成紧密粘附，薄，光滑和均匀的涂层。 涂层包括吸光染料。 该光吸收层可以是可成像的。

    High resolution electron beam resist
    7.
    发明授权
    High resolution electron beam resist 失效
    高分辨率电子束抗蚀剂

    公开(公告)号：US4133907A

    公开(公告)日：1979-01-09

    申请号：US853673

    申请日：1977-11-21

    申请人： Terry L. Brewer

    发明人： Terry L. Brewer

    IPC分类号： G03F7/039 ,  G03F7/038 ,  H01L21/00 ,  H01L21/027 ,  H01L23/29 ,  H05K3/06 ,  B05D3/06

    CPC分类号： H01L21/00 ,  G03F7/038 ,  H01L23/293 ,  H01L2924/0002 ,  H01L2924/12044

    摘要： Disclosed is a method of forming patterned electron beam resists from polymers that undergo energy intensity or electron dosage dependent reactions. Upon the introduction of sufficient energy, the polymer generates two reactive species that react with each other. However, with a lower amount of energy, the polymer generates only one reactive species. A thin film of the dosage dependent polymer is applied to a support and is subjected to a programmed electron beam scan. The electron beam irradiates a portion of the polymer film according to the programmed pattern and furnishes enough energy in the path of the beam to cause the polymer to cross link where directly irradiated, thus causing the polymer to become insoluble in certain solvents. The portion of the polymer adjacent the directly irradiated portion is subjected to electrons back-scattering from the surface of the support, which electrons are a small percentage of the total beamed at the polymer. This adjacent portion of the polymer does not receive sufficient energy from the back-scattered electrons to effect much degree of cross linking in some cases, and in other cases the polymer may actually degrade. The back-scattered portion of the polymer along with the unirradiated portion of the polymer remains soluble in certain solvents and is removed resulting in the desired pattern of openings.

    摘要翻译： 公开了一种从经历能量强度或电子剂量依赖反应的聚合物形成图案化电子束抗蚀剂的方法。 在引入足够的能量时，聚合物产生彼此反应的两种反应性物质。 然而，由于能量较少，聚合物只产生一种反应性物质。 将剂量依赖性聚合物的薄膜施加到载体上并进行编程电子束扫描。 电子束根据编程图案照射聚合物膜的一部分，并在光束的路径中提供足够的能量以使聚合物在直接照射下交联，从而导致聚合物在某些溶剂中变得不溶。 邻近直接照射部分的聚合物的部分从载体的表面经受电子反向散射，该电子是在聚合物上的总光束的小百分比。 在某些情况下，该相邻部分的聚合物不会从后向散射的电子中获得足够的能量以实现很大程度的交联，而在其它情况下聚合物可能实际上降解。 聚合物的背散射部分以及聚合物的未照射部分保持溶于某些溶剂中，并且被去除，导致所需的开口图案。

    Method of patterning styrene diene block copolymer electron beam resists
    8.
    发明授权
    Method of patterning styrene diene block copolymer electron beam resists 失效
    苯乙烯二烯嵌段共聚物电子束抗蚀剂图案方法

    公开(公告)号：US4061799A

    公开(公告)日：1977-12-06

    申请号：US615447

    申请日：1975-09-22

    申请人： Terry L. Brewer

    发明人： Terry L. Brewer

    IPC分类号： G03F7/038 ,  B44C1/22 ,  B05D3/06 ,  C03C15/00

    CPC分类号： G03F7/038

    摘要： Disclosed is a method of forming patterned electron beam resists from styrene-diene block copolymers and the resists formed thereby. A thin film of a styrene-diene block copolymer is applied to a support and is subjected to an electron beam scan. An electron beam irradiates a portion of the copolymer film according to a programmed pattern; the copolymer cross links where irradiated, thus causing the irradiated portion of the copolymer to become insoluble in a solvent. The balance of the copolymer remains soluble in the solvent, dissolves and is removed, resulting in the desired pattern of openings.

    摘要翻译： 公开了一种从苯乙烯 - 二烯嵌段共聚物形成图案化电子束抗蚀剂的方法和由此形成的抗蚀剂。 将苯乙烯 - 二烯嵌段共聚物的薄膜施加到载体上并进行电子束扫描。 电子束根据编程图案照射共聚物膜的一部分; 所述共聚物交联链接被照射，从而使所述共聚物的照射部分变得不溶于溶剂。 共聚物的余量保持溶于溶剂中，溶解并除去，产生所需的开口图案。