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公开(公告)号：US5998090A
公开(公告)日：1999-12-07
申请号：US982233
申请日：1997-12-01
申请人： Ram W. Sabnis , Terry L. Brewer , Robert E. Nichols , Edith G. Hays , Michael D. Stroder , Akira Yanagimoto , Yasuhisa Sone , Yoshitane Watanabe , Kiyomi Ema
发明人： Ram W. Sabnis , Terry L. Brewer , Robert E. Nichols , Edith G. Hays , Michael D. Stroder , Akira Yanagimoto , Yasuhisa Sone , Yoshitane Watanabe , Kiyomi Ema
IPC分类号： G03F7/004 , C09D179/08 , G02B5/00 , G02B5/20 , G02F1/1335 , G03F7/00 , G03F7/11 , C08K3/04
CPC分类号： G03F7/0007 , G02F1/133512
摘要： A high optical density, i.e., .gtoreq.3.0, at 1 micron or less film thickness, black matrix is disclosed having improved stability and shelf life as a consequence of admixing Pigment Black 7 and organic dye or dye mixtures on a polyimide polymer vehicle.
摘要翻译： 公开了由于将颜料黑7和有机染料或染料混合物混合在聚酰亚胺聚合物载体上而具有改进的稳定性和保质期的高光密度，即> 1微米或更小膜厚度的> / = 3.0。
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2.发明授权
公开(公告)号：US5780201A
公开(公告)日：1998-07-14
申请号：US721841
申请日：1996-09-27
申请人： Ram W. Sabnis , Jonathan W. Mayo , Edith G. Hays , Terry L. Brewer , Michael D. Stroder , Akira Yanagimoto , Yasuhisa Sone , Yoshitane Watanabe , Kiyomi Ema
发明人： Ram W. Sabnis , Jonathan W. Mayo , Edith G. Hays , Terry L. Brewer , Michael D. Stroder , Akira Yanagimoto , Yasuhisa Sone , Yoshitane Watanabe , Kiyomi Ema
IPC分类号： G02B5/00 , C09D179/08 , G02B5/20 , G02F1/1335 , G03C1/73 , G03F7/00 , G09F9/30 , G03F7/004
CPC分类号： G02F1/133512 , G03F7/0007
摘要： An organic black matrix having high resistivity (.gtoreq.10.sup.11 ohm/square), high optical density (.gtoreq.2.0) at ultra thin film thicknesses (.ltoreq.1.0 microns) for improved STN and TFT pixel display applications is made possible by combining polyimide/dye solutions and mixed metal oxide pigment dispersions at a weight/weight ratio of dye to pigment of 1:15 to 3:15. The need for low resistivity carbon black, as a replacement for sputtered chrome, is negated.
摘要翻译： 对于改进的STN和TFT像素显示应用，超薄膜厚度（ / = 1011欧姆/平方），高光密度（> / = 2.0））的有机黑色矩阵是可以通过 将聚酰亚胺/染料溶液和混合金属氧化物颜料分散体以1:15至3:15的染料与颜料的重量/重量比组合。 需要低电阻率炭黑作为溅射铬的替代品被否定。
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3.发明授权
公开(公告)号：US4061799A
公开(公告)日：1977-12-06
申请号：US615447
申请日：1975-09-22
申请人： Terry L. Brewer
发明人： Terry L. Brewer
CPC分类号： G03F7/038
摘要： Disclosed is a method of forming patterned electron beam resists from styrene-diene block copolymers and the resists formed thereby. A thin film of a styrene-diene block copolymer is applied to a support and is subjected to an electron beam scan. An electron beam irradiates a portion of the copolymer film according to a programmed pattern; the copolymer cross links where irradiated, thus causing the irradiated portion of the copolymer to become insoluble in a solvent. The balance of the copolymer remains soluble in the solvent, dissolves and is removed, resulting in the desired pattern of openings.
摘要翻译： 公开了一种从苯乙烯 - 二烯嵌段共聚物形成图案化电子束抗蚀剂的方法和由此形成的抗蚀剂。 将苯乙烯 - 二烯嵌段共聚物的薄膜施加到载体上并进行电子束扫描。 电子束根据编程图案照射共聚物膜的一部分; 所述共聚物交联链接被照射，从而使所述共聚物的照射部分变得不溶于溶剂。 共聚物的余量保持溶于溶剂中，溶解并除去，产生所需的开口图案。
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公开(公告)号：US5674648A
公开(公告)日：1997-10-07
申请号：US465518
申请日：1995-06-01
CPC分类号： G03F7/091
摘要： A light absorbing medium to be interposed under photosensitive layers, such as a photo-resist for integrated circuit "chips" to eliminate defects caused by reflected light, has a polymer vehicle which can penetrate into small depressions of a substrate and form a thin, smooth and uniform coating. The coating includes a light absorbing dye. This light absorbing layer is imageable in the process. The light absorbing material eliminates many of the defects caused by reflected light resulting in increased sharpness of the images in the photo-resist. The material reduces the losses due to defects and increases the yield of useable product.
摘要翻译： 为了消除由反射光引起的缺陷，介于光敏层之间的光吸收介质，例如用于集成电路“芯片”的光致抗蚀剂，具有能够渗透到基板的小凹陷中并形成薄而平滑的聚合物载体 均匀涂层。 涂层包括吸光染料。 该光吸收层在该过程中是可成像的。 光吸收材料消除了由反射光引起的许多缺陷，导致光致抗蚀剂中的图像的清晰度增加。 该材料减少了由于缺陷造成的损失并增加了可用产品的产量。
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公开(公告)号：US4910122A
公开(公告)日：1990-03-20
申请号：US638258
申请日：1984-08-06
IPC分类号： G03F7/09 , H01L21/027
CPC分类号： G03F7/091 , H01L21/0276 , Y10S438/952
摘要： A light absorbing medium to be interposed under photosensitive layers, such as a photo-resist for integrated circuit "chips" to eliminate defects caused by reflected light, has a polymer vehicle which can penetrate into small depressions of a substrate and form a thin, smooth and uniform coating. The coating includes a light absorbing dye. This light absorbing layer is imageable in the process. The light absorbing material eliminates many of the defects caused by reflected light resulting in increased sharpness of the images in the photo-resist. The material reduces the losses due to defects and increases the yield of useable product.
摘要翻译： 为了消除由反射光引起的缺陷，介于光敏层之间的光吸收介质，例如用于集成电路“芯片”的光致抗蚀剂，具有能够渗透到基板的小凹陷中并形成薄而平滑的聚合物载体 均匀涂层。 涂层包括吸光染料。 该光吸收层在该过程中是可成像的。 光吸收材料消除了由反射光引起的许多缺陷，导致光致抗蚀剂中的图像的清晰度增加。 该材料减少了由于缺陷造成的损失并增加了可用产品的产量。
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公开(公告)号：US4876165A
公开(公告)日：1989-10-24
申请号：US2107
申请日：1987-01-12
IPC分类号： G03F1/00 , C08G73/06 , C09D5/00 , C09D5/32 , C09D179/08 , G02F1/1335 , G03F1/08 , G03F1/10 , G03F7/09 , G03F9/00 , H01L21/027
CPC分类号： C08G73/06 , G02F1/133512 , G03F1/56 , G03F7/091 , G03F9/7026 , H01L21/0276
摘要： Filters suitable for microelectronic uses and the like may be prepared directly on substrates either as monolithically integrated filters or as hybrid filters using a soluble dye material in a resin. The resin may be applied to microelectronic substrates and patterned by conventional microphotolithographic processes.
摘要翻译： 可以直接在衬底上制备适合于微电子用途的过滤器，作为单片集成过滤器，或者使用在树脂中使用可溶性染料材料的混合过滤器。 树脂可以施加到微电子衬底上，并通过常规的微光刻工艺进行图案化。
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公开(公告)号：US5629665A
公开(公告)日：1997-05-13
申请号：US561357
申请日：1995-11-21
申请人： James Kaufmann , Mary G. Moss , Ryan E. Giedd , Terry L. Brewer
发明人： James Kaufmann , Mary G. Moss , Ryan E. Giedd , Terry L. Brewer
CPC分类号： G01J5/20 , H01L31/08 , H01L51/002 , H01L51/42 , H01L51/0017 , H01L51/004 , Y02E10/549
摘要： The invention is an apparatus and method for making a polymer bolometer. The apparatus consists of a current supply and current receiving paths affixed to a substrate. Bridging the current supply paths and current receiving paths is an electrically conductive polymer. The polymer bolometer may be fabricated using conventional photolithographic techniques.
摘要翻译： 本发明是制造聚合物测辐射热计的装置和方法。 该装置由固定在基板上的电流供应和电流接收路径组成。 桥接电流供应路径和电流接收路径是导电聚合物。 可以使用常规光刻技术来制造聚合物测辐射热量计。
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8.发明授权Soluble conducting polymers and their use in manufacturing electronic devices 失效可溶性导电聚合物及其在制造电子器件中的应用
公开(公告)号：US5262195A
公开(公告)日：1993-11-16
申请号：US958286
申请日：1992-10-07
申请人： Mary G. Moss , Terry L. Brewer , Tony D. Flaim
发明人： Mary G. Moss , Terry L. Brewer , Tony D. Flaim
CPC分类号： H01M4/60 , C08G73/0266 , H01B1/128 , H01C17/065 , H01C7/003 , H01L51/0035 , H01L51/05
摘要： Soluble conducting polymers from substituted polyanilines and large organic counterions are disclosed and used directly from solution in the manufacture of electronic devices.
摘要翻译： 来自取代的聚苯胺和大的有机抗衡离子的可溶性导电聚合物被公开并直接用于制造电子器件的溶液。
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公开(公告)号：US4152286A
公开(公告)日：1979-05-01
申请号：US832857
申请日：1977-09-13
CPC分类号： H01L21/2225 , Y10S252/95
摘要： A boron doped, silicon oxide-forming film is produced on a semiconductor wafer by coating the wafer with a solution of a silicon compound and a boron compound, in a blend of two polar organic solvents, one of which has a low boiling point, and the other has a high boiling point, between 185.degree. and 300.degree. C. During a subsequent heating step, the high boiling point solvent redissolves any crystalline precipitate that forms during spin-on, giving a more uniform film for diffusion, and consequently a damage-free wafer surface.
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公开(公告)号：US5633465A
公开(公告)日：1997-05-27
申请号：US384826
申请日：1995-02-07
申请人： James Kaufmann , Mary G. Moss , Terry L. Brewer
发明人： James Kaufmann , Mary G. Moss , Terry L. Brewer
IPC分类号： G01L21/12
CPC分类号： G01L21/12
摘要： The invention is a method and apparatus for a pirani pressure sensor. The apparatus consists of a current supply and current receiving means affixed to a substrate. Bridging the current supply means and current receiving means is an electrically conductive polymer. The pirani pressure sensor may be made using conventional photolithographic techniques.
摘要翻译： 本发明是一种用于玻璃压力传感器的方法和装置。 该装置由固定在基板上的电流源和电流接收装置组成。 桥接电流供应装置和电流接收装置是导电聚合物。 可以使用常规的光刻技术制造皮拉压力传感器。
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