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公开(公告)号：US07961844B2
公开(公告)日：2011-06-14
申请号：US12438029
申请日：2007-08-29
申请人： Norio Takeda , Shigeji Kaneko , Tsutomu Yamashita , Hiroshi Saga
发明人： Norio Takeda , Shigeji Kaneko , Tsutomu Yamashita , Hiroshi Saga
CPC分类号： G21K5/10 , A61N5/10 , A61N5/1081 , A61N2005/1087
摘要： A rotating irradiation therapy apparatus used for particle beam therapy includes a rotating gantry equipped with a charged particle beam irradiation device beam transport devices for guiding a charged particle beam to the irradiation device and a roller in contact with a ring member included in the rotating gantry and supporting the gantry. A front ring is disposed in contact with the roller of a rotating body support device at one end in the axial direction of the rotating gantry, and a rear ring is disposed in contact with the roller at the other end in the axial direction of the rotating gantry. At least one intermediate ring is disposed in a position different in the axial direction of the gantry between the front and rear rings and in contact with the roller.
摘要翻译： 用于粒子束治疗的旋转照射治疗装置包括：装备有带电粒子束照射装置的旋转台架，用于将带电粒子束引导到照射装置的光束传送装置和与包括在旋转台架中的环构件接触的辊; 支撑龙门架。 在旋转机架的轴向的一端设置有与旋转体支撑装置的滚子接触的前环，在旋转轴的轴向的另一端设置有与滚子接触的后环 龙门架 至少一个中间环设置在前后环之间与台架的轴向不同的位置，并与辊接触。
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公开(公告)号：US20100163755A1
公开(公告)日：2010-07-01
申请号：US12438029
申请日：2007-08-29
申请人： Norio Takeda , Shigeji Kaneko , Tsutomu Yamashita , Hiroshi Saga
发明人： Norio Takeda , Shigeji Kaneko , Tsutomu Yamashita , Hiroshi Saga
CPC分类号： G21K5/10 , A61N5/10 , A61N5/1081 , A61N2005/1087
摘要： A rotating irradiation therapy apparatus used for particle beam therapy includes a rotating gantry equipped with a charged particle beam irradiation device beam transport devices for guiding a charged particle beam to the irradiation device and a roller in contact with a ring member included in the rotating gantry and supporting the gantry. A front ring is disposed in contact with the roller of a rotating body support device at one end in the axial direction of the rotating gantry and a rear ring is disposed in contact with the roller at the other end in the axial direction of the rotating gantry. At least one intermediate ring is disposed in a position different in the axial direction of the gantry between the front and rear rings and in contact with the roller.
摘要翻译： 用于粒子束治疗的旋转照射治疗装置包括：装备有带电粒子束照射装置的旋转台架，用于将带电粒子束引导到照射装置的光束传送装置和与包括在旋转台架中的环构件接触的辊; 支撑龙门架。 在旋转机架的轴向的一端设置有与旋转体支撑装置的辊接触的前环，并且在旋转机架的轴向上的另一端设置有与辊接触的后环 。 至少一个中间环设置在前后环之间与台架的轴向不同的位置，并与辊接触。
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公开(公告)号：US20070023699A1
公开(公告)日：2007-02-01
申请号：US11472387
申请日：2006-06-22
申请人： Tsutomu Yamashita , Shigeji Kaneko , Hiroshi Saga , Norio Takeda
发明人： Tsutomu Yamashita , Shigeji Kaneko , Hiroshi Saga , Norio Takeda
IPC分类号： H01J37/08
CPC分类号： A61N5/1081 , A61N5/10 , A61N2005/1087
摘要： A rotating irradiation apparatus includes a rotating gantry 3 including a front ring 19 and a rear ring 20 and is provided with a beam delivery device 11 and an irradiation device 4. The beam delivery device 11 delivers an ion beam used for particle radiotherapy. Radial support devices 61A and 61B support the front ring 19 and radial support devices 61A and 61B support the rear ring 20. Each radial support device includes a linear guide 41, an upper support structure disposed above the linear guide 41, and a lower support structure disposed below the linear guide 41. The upper support structure is movably mounted on the lower support structure and is movable in the direction of the rotational axis of the rotating gantry 3.
摘要翻译： 旋转照射装置包括旋转机架3，其包括前环19和后环20，并且设置有射束输送装置11和照射装置4.射束输送装置11输送用于粒子放射治疗的离子束。 径向支撑装置61A和61B支撑前环19，并且径向支撑装置61A和61B支撑后环20.每个径向支撑装置包括线性导向件41，设置在线性导向件41上方的上支撑结构，以及 下支撑结构设置在线性引导件41的下方。上支撑结构可移动地安装在下支撑结构上并且可沿旋转机架3的旋转轴线的方向移动。
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公开(公告)号：US20060192072A1
公开(公告)日：2006-08-31
申请号：US11359484
申请日：2006-02-23
CPC分类号： F16D55/40 , A61N5/10 , A61N5/1081 , A61N2005/1087 , F16D2121/12
摘要： A rotating gantry includes a link frame for supporting a plurality of rollers which rotatably support the rotating gantry, a brake for releasing a braking force applied to at least one of the rollers upon supply of air and applying the braking force to the one roller upon discharge of air, and a solenoid valve for sealing the supplied air in the brake when closed, and discharging the air from the brake when opened. The solenoid valve is supported by a solenoid valve support member mounted to the link frame such that the solenoid valve is positioned just near the brake. The rotating gantry can be more quickly braked and stopped while maintaining high irradiation accuracy.
摘要翻译： 旋转机架包括用于支撑可旋转地支撑旋转机架的多个辊的连杆框架，用于在供应空气时释放施加到至少一个辊的制动力的制动器，并且在排出时向一个辊施加制动力 的空气，以及用于在关闭时密封制动器中的供应空气的电磁阀，并且在打开时从制动器排出空气。 电磁阀由安装到连杆架的电磁阀支撑件支撑，使得电磁阀恰好靠近制动器。 旋转机架可以更快地制动和停止，同时保持高的照射精度。
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5.发明授权公开(公告)号：US06500567B1
公开(公告)日：2002-12-31
申请号：US09677644
申请日：2000-10-03
申请人： Gerardo Bertero , Charles Changqing Chen , Tu Chen , Tsutomu Yamashita , Makoto Imakawa , Michinobu Suekane
发明人： Gerardo Bertero , Charles Changqing Chen , Tu Chen , Tsutomu Yamashita , Makoto Imakawa , Michinobu Suekane
IPC分类号： G11B566
CPC分类号： G11B5/7325 , G11B5/8404 , Y10S428/90 , Y10T428/12854 , Y10T428/26 , Y10T428/265
摘要： In this invention, an ultra thin layer of CoCr alloy nucleation layer is sputtered at an extremely low deposition rate above a predominantly (200) oriented Cr film followed by a CoCrPt based alloy sputtered film at higher rates and moderate temperatures. This structure creates a media which has very high Hc, and excellent PW50, low noise and excellent low TNLD values. By using this technique, the CoCrPt magnetic film achieves excellent in-plane crystallographic orientation, and high Hc is achieved with minimal amount of Pt addition to the magnetic film. The method allows very fine grain structure of cobalt to be formed which contributes to good signal to noise ratio. A fine grain structure combined with chromium segregation between the grains improve the signal to noise ratio even more. A high degree of in-plane c-axis orientation is achieved in the cobalt layer which provides very high hysteresis loop squareness which helps to improve the OW and TNLD. The perfection of the grains is very high so that high anisotropy is obtained in the magnetic layer, resulting in high Hc without the necessity of addition of high level of Pt. The high degree of crystalline perfection also contributes to low TNLD.
摘要翻译： 在本发明中，CoCr合金成核层的超薄层以高于主要（200）取向的Cr膜的极低的沉积速率溅射，接着以较高的速率和中等温度的CoCrPt基合金溅射膜溅射。 该结构产生了具有非常高的Hc，优良的PW50，低噪音和优异的低TNLD值的介质。 通过使用该技术，CoCrPt磁性膜实现了优异的面内晶体取向，并且以最小量的Pt添加到磁性膜来实现高Hc。 该方法允许形成钴的非常细的晶粒结构，这有助于良好的信噪比。 晶粒结构与晶粒间的铬分离结合，提高了信噪比。 在钴层中实现高度的面内c轴取向，其提供非常高的磁滞回线矩形度，这有助于改善OW和TNLD。 晶粒的完整性非常高，从而在磁性层中获得高各向异性，导致高Hc，而不需要添加高水平的Pt。 高度的结晶完善也有助于TNLD的低下。
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6.发明授权Method of sputtering a carbon protective film on a magnetic disk with high sp.sup.3 content 有权在具有高sp3含量的磁盘上溅射碳保护膜的方法
公开(公告)号：US6086730A
公开(公告)日：2000-07-11
申请号：US298107
申请日：1999-04-22
申请人： Wen Hong Liu , Gang Peng , Tsutomu Yamashita , Tu Chen
发明人： Wen Hong Liu , Gang Peng , Tsutomu Yamashita , Tu Chen
CPC分类号： G11B5/8408 , C23C14/0605 , C23C14/34 , G11B5/851
摘要： Sputtering method for producing amorphous hydrogenated carbon thin films with high sp.sup.3 content. By sputtering the carbon with a pulsed DC power supply having high voltage peaks, a carbon film with remarkably high sp.sup.3 bonding fraction can be obtained. Previously, carbon films with a very high sp.sup.3 fraction film with content as high (e.g. as 80%) could only be produced by methods such as filtered cathodic arc deposition or chemical vapor deposition methods (CVD) such as plasma-enhanced chemical vapor deposition (PE-CVD) and ion-beam deposition operating at some narrowly defined range of deposition conditions. It is very advantageous to use sputtering to create a high sp.sup.3 content film, since sputtering is more manufacturable and has higher productivity compared to CVD or ion-beam deposition methods. The resultant carbon film has excellent durability and corrosion resistance capability down to very low thickness. Also compared to PE-CVD and ion-beam deposition, the new sputtering process produce much less particles and the process can be run on a manufacturing tool for much longer time, thereby increasing the productivity of the machine, and providing disks with higher quality.
摘要翻译： 用于生产具有高sp3含量的无定形氢化碳薄膜的溅射方法。 通过用具有高电压峰值的脉冲直流电源溅射碳，可以获得具有非常高的sp 3键合分数的碳膜。 以前，具有高含量（例如80％）的非常高的sp 3级分的膜的碳膜只能通过诸如过滤阴极电弧沉积或化学气相沉积法（CVD）的方法来产生，例如等离子体增强化学气相沉积（ PE-CVD）和离子束沉积操作在一些狭窄的沉积条件范围内。 使用溅射以产生高的sp3含量膜是非常有利的，因为与CVD或离子束沉积方法相比，溅射更可制造并且具有更高的生产率。 所得的碳膜具有优异的耐久性和耐腐蚀性能，从而达到非常低的厚度。 与PE-CVD和离子束沉积相比，新的溅射工艺产生的颗粒少得多，该工艺可以在制造工具上运行更长时间，从而提高机器的生产率，并提供更高质量的磁盘。
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7.发明授权UV-curable fresnel lens resin composition, fresnel lens, and back projection screen 失效紫外线固化菲涅尔透镜树脂组合物，菲涅尔透镜和背投屏幕
公开(公告)号：US5805358A
公开(公告)日：1998-09-08
申请号：US688260
申请日：1996-07-29
CPC分类号： G03B21/602 , G02B1/041 , G02B3/08 , Y10T428/31573
摘要： UV-curable Fresnel lens resin compositions �1a! comprising a (meth)acrylate containing hydroxyl group and aromatic ring (A1), a urethane group-containing (meth)acrylate (A2) comprising an aromatic diol, an aromatic ring-containing monofunctional (meth)acrylate (A3), and a photopolymerization initiator (B) and �1b! comprising (A1), a mono- or di(meth)acrylate monomer (A4), and (B), further supplemented with a polyester (C1) comprising an aromatic diol and a phosphate (C2) for the formation of a Fresnel lens on a sheet or plate made of a methyl methacrylate (co)polymer; a Fresnel lens formed by UV cure of composition �1a! or �1b!; and a rear projection screen including a sheet or plate carrying said Fresnel lens. The Fresnel lens has high refractive index, antistatic properties and is satisfactory in adhesion to a sheet or plate.
摘要翻译： 包含含有羟基的（甲基）丙烯酸酯和芳香环（A1）的含紫外线固化菲涅尔透镜树脂组合物[1a]，包含芳族二醇的含氨基甲酸酯的（甲基）丙烯酸酯（A2），含芳香族环的单官能 （A），单或二（甲基）丙烯酸酯单体（A4）和（B）的光聚合引发剂（B）和[1b]，进一步补充有聚酯（C1） 包括在由甲基丙烯酸甲酯（共）聚合物制成的片材或板上形成菲涅尔透镜的芳族二醇和磷酸酯（C2）; 通过组合物[1a]或[1b]的UV固化形成的菲涅尔透镜; 以及包括承载所述菲涅耳透镜的片或板的背投屏幕。 菲涅尔透镜具有高折射率，抗静电性能，并且对于片材或板材的粘附性是令人满意的。
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公开(公告)号：US06803591B2
公开(公告)日：2004-10-12
申请号：US10426883
申请日：2003-05-01
IPC分类号： G21G500
CPC分类号： A61N5/1081 , A61N5/10 , A61N2005/1087
摘要： Disclosed is a medical particle irradiation apparatus comprising a rotating gantry 1 including an irradiation unit 4 emitting particle beams; an annular frame 16 located within and supported by the rotating gantry 1 such that it can rotate relative to the rotating gantry 1; an annular frame 15 fixedly located opposite the annular frame 16; an anti-corotation mechanism 34 being in contact with both the annular frames 16 and 15 to prevent the annular frame 16 from rotating together with the rotating gantry 1 during rotation of the rotating gantry 1; and a flexible moving floor 17 interposed between the annular frames 15 and 16, the flexible moving floor 17 being engaged with the annular frames 15 and 16 in such a manner as to move freely such that its bottom is substantially level and that it moves as the rotating gantry rotates.
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9.发明授权
公开(公告)号：US4762695A
公开(公告)日：1988-08-09
申请号：US94074
申请日：1987-09-04
申请人： Hiroshi Endo , Shigeo Iiri , Masaru Hayashi , Tsutomu Yamashita , Satoshi Yamaguchi , Motoo Seimiya
发明人： Hiroshi Endo , Shigeo Iiri , Masaru Hayashi , Tsutomu Yamashita , Satoshi Yamaguchi , Motoo Seimiya
CPC分类号： C22B34/36 , B22F9/22 , C01G39/003 , C01G41/003 , C22B3/42 , C22B34/34 , Y02P10/234 , Y10S423/14
摘要： High-purity molybdenum or tungsten powder can be produced by a process comprising (a) decomposing a powder or an oxide powder of molybdenum or tungsten with hydrogen peroxide water; (b) bringing the resulting aqueous solution of molybdenum or tungsten into contact with a cation exchange resin; (c) concentrating the aqueous solution; and (d) reducing a concentrated solid material. By omitting reducing step (d), one can obtain high-purity molybdenum or tungsten oxide powders. Because the Mo and W powders and MoO.sub.3 and WO.sub.3 powders prepared by this invention are of an extremely high purity, they are useful as materials for targets of VLSI elements.
摘要翻译： 可以通过以下方法制备高纯度的钼或钨粉末：（a）用过氧化氢水分解钼或钨的粉末或氧化物粉末; （b）使所得到的钼或钨水溶液与阳离子交换树脂接触; （c）浓缩水溶液; 和（d）还原浓缩的固体物质。 通过省略步骤（d），可以获得高纯度的钼或氧化钨粉末。 由于通过本发明制备的Mo和W粉末和MoO 3和WO 3粉末具有非常高的纯度，因此它们可用作VLSI元素靶的材料。
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公开(公告)号：US06903356B2
公开(公告)日：2005-06-07
申请号：US10673788
申请日：2003-09-30
CPC分类号： A61N5/1081 , A61N5/10 , A61N2005/1087
摘要： Disclosed is a medical particle irradiation apparatus comprising a rotating gantry 1 including an irradiation unit 4 emitting particle beams; an annular frame 16 located within and supported by the rotating gantry 1 such that it can rotate relative to the rotating gantry 1; an annular frame 15 fixedly located opposite the annular frame 16; an anti-corotation mechanism 34 being in contact with both the annular frames 16 and 15 to prevent the annular frame 16 from rotating together with the rotating gantry 1 during rotation of the rotating gantry 1; and a flexible moving floor 17 interposed between the annular frames 15 and 16, the flexible moving floor 17 being engaged with the annular frames 15 and 16 in such a manner as to move freely such that its bottom is substantially level and that it moves as the rotating gantry rotates.
摘要翻译： 公开了一种医用颗粒物照射装置，包括：旋转台架1，其包括发射粒子束的照射单元4; 位于旋转机架1内并由其支撑的环形框架16，使得其可相对于旋转机架1旋转; 固定地与环形框架16相对的环形框架15; 防旋转机构34与环形框架16和15两者接触，以防止环形框架16在旋转机架1的旋转期间与旋转机架1一起旋转; 以及插入在环形框架15和16之间的柔性移动地板17，柔性移动地板17以可自由移动的方式与环形框架15和16接合，使得其底部基本上平齐，并且其随着 旋转龙门旋转。
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