摘要:
A friction damper includes: a base body; a support secured to an elongated member of the base body and having a through hole; a rod which extends in such a manner as to pass through the through hole of the support and is movable in an axial direction with respect to the support; a friction member which has a hollow cylindrical portion interposed between the support and a main body portion of the rod in the through hole of the support, and which is fixed immovably with respect to the relative movement of the rod in the axial direction with respect to the base body; and a tightening device provided for the support so as to tighten the hollow cylindrical portion of the friction member onto the main body portion of the rod.
摘要:
Provided is a safe and simple method for producing an epoxy compound, wherein a compound with a carbon-carbon double bond is epoxidized by using hydrogen peroxide as an oxidizing agent in the presence of acetonitrile, wherein there is no need for concentration of a reaction mixture that contains residual hydrogen peroxide. A method for producing an epoxy compound wherein a compound with a carbon-carbon double bond is epoxidized by using hydrogen peroxide as an oxidizing agent, in the presence of acetonitrile, comprises a first step of adding water and an organic solvent that is incompatible with water and does not dissolve an acetamide by-product of the epoxidation reaction to a reaction mixture, upon completion of the epoxidation reaction, to dissolve the acetamide in the water, a second step of separating an organic layer and an aqueous layer, and a third step of subjecting the organic layer to reduction treatment, and then rinsing and concentrating it to provide an epoxy compound.
摘要:
A shape measurement method for measuring a shape of an object to be measured, which has a substantially rotating symmetric shape, includes: placing an aperture having an opening larger than an outer shape of the object to be measured and the object to be measured on an optical axis; taking an image generated by light projected to the object to be measured, by using an image pickup unit; and calculating one cross-sectional shape of the object to be measured based on a light intensity distribution of the image taken by the image pickup unit.
摘要:
Provided is a safe and simple method for producing an epoxy compound, wherein a compound with a carbon-carbon double bond is epoxidized by using hydrogen peroxide as an oxidizing agent in the presence of acetonitrile, wherein there is no need for concentration of a reaction mixture that contains residual hydrogen peroxide. A method for producing an epoxy compound wherein a compound with a carbon-carbon double bond is epoxidized by using hydrogen peroxide as an oxidizing agent, in the presence of acetonitrile, comprises a first step of adding water and an organic solvent that is incompatible with water and does not dissolve an acetamide by-product of the epoxidation reaction to a reaction mixture, upon completion of the epoxidation reaction, to dissolve the acetamide in the water, a second step of separating an organic layer and an aqueous layer, and a third step of subjecting the organic layer to reduction treatment, and then rinsing and concentrating it to provide an epoxy compound.
摘要:
The present invention has an object to provide a curable composition for transfer materials. The curable composition is applicable to a UV nanoimprint process capable of forming micropatterns with high throughput, is applicable to a thermal nanoimprint process in some cases, and is capable of forming a micropattern having high selectivity on etching rates regarding a fluorine-based gas and an oxygen gas. The curable composition for transfer materials comprises a silsesquioxane skeleton-containing compound having, in its molecule, a specific silsesquioxane skeleton and a curable functional group.
摘要:
The present invention has an object to provide a curable composition for transfer materials. The curable composition is applicable to a UV nanoimprint process capable of forming micropatterns with high throughput, is applicable to a thermal nanoimprint process in some cases, and is capable of forming a micropattern having high selectivity on etching rates regarding a fluorine-based gas and an oxygen gas. The curable composition for transfer materials comprises a silsesquioxane skeleton-containing compound having, in its molecule, a specific silsesquioxane skeleton and a curable functional group.
摘要:
A friction damper includes a base body; a support secured to an elongated member of the base body and having a through hole; a rod which extends in such a manner as to pass through the through hole of the support and is movable in an axial direction with respect to the support; a friction member which has a hollow cylindrical portion interposed between the support and a main body portion of the rod in the through hole of the support, and which is fixed immovably with respect to the relative movement of the rod in the axial direction with respect to the base body; and a tightening structure provided for the support so as to tighten the hollow cylindrical portion of the friction member onto the main body portion of the rod.
摘要:
The invention provides curable compositions for transfer materials suited for nanoimprinting, which have very high transfer properties in a nanoimprinting process, show high selectivity in dry etching rate between by argon gas and by oxygen gas, and can be fabricated into fine patterns with high throughput. The curable composition for transfer materials includes a compound (A) having at least one skeleton selected from Formulae (1) to (3) below, and a (meth)acryloyl group:
摘要:
A processing apparatus is provided. The processing apparatus includes a processing portion, an actuator, a casing, a preload mechanism, a force sensor, and a detection unit. The processing portion includes a cutting edge. The actuator is configured to cause the processing portion to vibrate microscopically. The casing is configured to accommodate the actuator. The preload mechanism is disposed inside the casing and configured to impart a preload to the actuator. The force sensor is disposed between the cutting edge and the preload mechanism. The detection unit detects a cutting force of the processing portion based on an output of the force sensor.
摘要:
The present invention has an object to provide a curable composition for transfer materials. The curable composition is applicable to a UV nanoimprint process capable of forming micropatterns with high throughput, is applicable to a thermal nanoimprint process in some cases, and is capable of forming a micropattern having high selectivity on etching rates regarding a fluorine-based gas and an oxygen gas. A curable composition for transfer materials of the present invention contains a curable silicon compound produced by subjecting a silicon compound (A) having a Si—H group and a compound (B) having a curable functional group and a carbon-carbon double bond other than the curable functional group to a hydrosilylation reaction.