Image printing apparatus and method of controlling thereof
    2.
    发明授权
    Image printing apparatus and method of controlling thereof 失效
    图像打印装置及其控制方法

    公开(公告)号:US07010238B2

    公开(公告)日:2006-03-07

    申请号:US10453615

    申请日:2003-06-04

    申请人: Young-gook Park

    发明人: Young-gook Park

    IPC分类号: G03G15/043 G03G15/16

    CPC分类号: H04N1/40025 G03G15/50

    摘要: An image printing apparatus and method thereof. The apparatus includes a photosensitive medium, and a transfer roller to transfer an image developed on the photosensitive medium with a developer to a fed paper, a printing engine state diagnosing portion to detect an effective resistance between the photosensitive medium and the transfer roller, a controller to determine a transfer voltage to be supplied to the transfer roller to print according to the effective resistance value in a printing engine driving condition determining mode, and determine a driving voltage for a printing mode with respect to a light source of the apparatus based on the determined transfer voltage, and a light source drive unit to drive the light source according to the driving voltage for the printing mode under the control of the controller.

    摘要翻译: 一种图像打印装置及其方法。 该装置包括感光介质和用显影剂将显影在感光介质上的图像转印到进纸的转印辊,用于检测感光介质和转印辊之间的有效电阻的印刷引擎状态诊断部分,控制器 根据打印引擎驱动条件确定模式确定要提供给转印辊以进行打印的转印电压,并且基于该打印机驱动条件确定模式确定相对于装置的光源的打印模式的驱动电压 以及光源驱动单元,以在控制器的控制下根据用于打印模式的驱动电压来驱动光源。

    LAYOUT DESIGN SYSTEM, SYSTEM AND METHOD FOR FABRICATING MASK PATTERN USING THE SAME
    3.
    发明申请
    LAYOUT DESIGN SYSTEM, SYSTEM AND METHOD FOR FABRICATING MASK PATTERN USING THE SAME 审中-公开
    布局设计系统,使用其制造掩模图案的系统和方法

    公开(公告)号:US20160306914A1

    公开(公告)日:2016-10-20

    申请号:US15001854

    申请日:2016-01-20

    IPC分类号: G06F17/50

    摘要: According to example embodiments of inventive concepts, a layout design system includes a processor, a storage unit configured to store a layout design, and a stitch module. The layout design includes a first pattern group and a second pattern group disposed in accordance with a design. The first pattern group including a first pattern for patterning at a first time. The second pattern group including a second pattern for patterning at a second time that is different than the first time. The stitch module is configured to detect an iso-pattern of the second pattern using the processor. The stitch module is configured to repetitively designate at least one of the first pattern, which is spaced apart from the iso-pattern by a pitch or more, to the second pattern group using the processor.

    摘要翻译: 根据发明构思的示例实施例,布局设计系统包括处理器,被配置为存储布局设计的存储单元和针脚模块。 布局设计包括根据设计布置的第一图案组和第二图案组。 第一图案组包括第一次图案化的第一图案。 第二图案组包括在第二次不同于第一次的图案化的第二图案。 针脚模块被配置为使用处理器来检测第二图案的等图案。 缝合模块被配置为使用处理器将与等图案间隔开等距或间隔的第一图案中的至少一个重复指定到第二图案组。