摘要:
According to example embodiments of inventive concepts, a layout design system includes a processor, a storage unit configured to store a layout design, and a stitch module. The layout design includes a first pattern group and a second pattern group disposed in accordance with a design. The first pattern group including a first pattern for patterning at a first time. The second pattern group including a second pattern for patterning at a second time that is different than the first time. The stitch module is configured to detect an iso-pattern of the second pattern using the processor. The stitch module is configured to repetitively designate at least one of the first pattern, which is spaced apart from the iso-pattern by a pitch or more, to the second pattern group using the processor.
摘要:
An image printing apparatus and method thereof. The apparatus includes a photosensitive medium, and a transfer roller to transfer an image developed on the photosensitive medium with a developer to a fed paper, a printing engine state diagnosing portion to detect an effective resistance between the photosensitive medium and the transfer roller, a controller to determine a transfer voltage to be supplied to the transfer roller to print according to the effective resistance value in a printing engine driving condition determining mode, and determine a driving voltage for a printing mode with respect to a light source of the apparatus based on the determined transfer voltage, and a light source drive unit to drive the light source according to the driving voltage for the printing mode under the control of the controller.
摘要:
According to example embodiments of inventive concepts, a layout design system includes a processor, a storage unit configured to store a layout design, and a stitch module. The layout design includes a first pattern group and a second pattern group disposed in accordance with a design. The first pattern group including a first pattern for patterning at a first time. The second pattern group including a second pattern for patterning at a second time that is different than the first time. The stitch module is configured to detect an iso-pattern of the second pattern using the processor. The stitch module is configured to repetitively designate at least one of the first pattern, which is spaced apart from the iso-pattern by a pitch or more, to the second pattern group using the processor.