ORGANIC LIGHT EMITTING DIODE DISPLAY
    1.
    发明申请
    ORGANIC LIGHT EMITTING DIODE DISPLAY 有权
    有机发光二极管显示

    公开(公告)号:US20050140273A1

    公开(公告)日:2005-06-30

    申请号:US10711021

    申请日:2004-08-18

    摘要: An organic light emitting diode (OLED) display includes a substrate defined with a plurality of pixel areas, a heating circuit structure disposed on the substrate, and a plurality of OLEDs corresponding to each pixel area. The heating circuit structure includes two conductive lines not connected to each other, a plurality of heating lines electrically connected to the two conductive lines and covering portions of each pixel areas, and a ground electrode.

    摘要翻译: 有机发光二极管(OLED)显示器包括限定有多个像素区域的衬底,设置在衬底上的加热电路结构以及对应于每个像素区域的多个OLED。 加热电路结构包括彼此不连接的两条导线,与两个导电线电连接并覆盖每个像素区域的多个加热线,以及接地电极。

    Non-destructive contact test
    2.
    发明申请
    Non-destructive contact test 有权
    非破坏性接触试验

    公开(公告)号:US20050077914A1

    公开(公告)日:2005-04-14

    申请号:US10848995

    申请日:2004-05-18

    IPC分类号: G01R1/067 H01L27/32 G01R31/02

    CPC分类号: G01R1/06783 H01L27/3244

    摘要: A non-destructive contact test method for testing an electric characteristic of a test object is provided. The method includes providing an apparatus having a conductor, wherein the conductor is in a liquid state; and using the conductor to contact a surface of the test object for testing the electric characteristic of the test object. Thus, damage to the test object during the test can be effectively avoided.

    摘要翻译: 提供了一种用于测试测试对象的电气特性的非破坏性接触测试方法。 该方法包括提供具有导体的装置,其中导体处于液态; 并且使用导体接触测试对象的表面以测试测试对象的电特性。 因此,可以有效地避免测试期间对测试对象的损坏。

    Process for producing thin film transistor having LDD region
    4.
    发明授权
    Process for producing thin film transistor having LDD region 失效
    具有LDD区域的薄膜晶体管的制造方法

    公开(公告)号:US07678627B2

    公开(公告)日:2010-03-16

    申请号:US11435333

    申请日:2006-05-16

    IPC分类号: H01L21/00 H01L21/84

    摘要: In a process for producing a TFT display, a polysilicon layer is patterned to define a first and a second TFT regions. A first doping material is implanted into a first exposed portion in the first TFT region to define a first doped region and a first channel region, and implanted into a second exposed portion in the second TFT region to define a second doped region and a second channel region. A second doping material is implanted into a third exposed portion smaller than the first exposed portion to form first source/drain regions and simultaneously define a first LDD region in the first TFT region. A first and a second gate structures are formed over the first and the second channel regions, respectively. In a certain direction, the first gate structure is longer than the first channel, and the second gate structure isn't longer than the second channel region.

    摘要翻译: 在制造TFT显示器的工艺中,对多晶硅层进行构图以限定第一和第二TFT区域。 将第一掺杂材料注入到第一TFT区域中的第一暴露部分中以限定第一掺杂区域和第一沟道区域,并且注入到第二TFT区域中的第二暴露部分中以限定第二掺杂区域和第二沟道 地区。 将第二掺杂材料注入到比第一暴露部分小的第三暴露部分中,以形成第一源极/漏极区域,同时限定第一TFT区域中的第一LDD区域。 第一和第二栅极结构分别形成在第一和第二沟道区上。 在一定方向上,第一栅极结构比第一沟道长,第二栅极结构不比第二沟道区长。

    Thin film transistor having LDD region and process for producing same
    6.
    发明授权
    Thin film transistor having LDD region and process for producing same 有权
    具有LDD区域的薄膜晶体管及其制造方法

    公开(公告)号:US07098492B2

    公开(公告)日:2006-08-29

    申请号:US10782533

    申请日:2004-02-19

    IPC分类号: H01L31/062

    摘要: A thin film transistor display includes a driving circuit and an active matrix. The driving circuit comprises a first thin film transistor structure. The first thin film transistor structure includes a first gate, source and drain regions, a first LDD region, a second LDD region and a first channel region between the first and the second LDD regions. The first gate region is disposed over the first channel region, and partially or completely overlies the first and the second LDD regions. The active matrix is controlled by the driving circuit and comprises a second thin film transistor structure. The second thin film transistor structure includes a second gate, source and drain regions, a third LDD region, a fourth LDD region and a second channel region between the third and the fourth LDD regions. The second gate region is disposed over the second channel region and substantially overlaps with neither of the first and the second LDD regions.

    摘要翻译: 薄膜晶体管显示器包括驱动电路和有源矩阵。 驱动电路包括第一薄膜晶体管结构。 第一薄膜晶体管结构包括第一栅极,源极和漏极区域,第一LDD区域,第二LDD区域和第一和第二LDD区域之间的第一沟道区域。 第一栅极区域设置在第一沟道区域上,并且部分或完全覆盖第一和第二LDD区域。 有源矩阵由驱动电路控制并且包括第二薄膜晶体管结构。 第二薄膜晶体管结构包括第三栅极,源极和漏极区域,第三LDD区域,第四LDD区域和第三和第四LDD区域之间的第二沟道区域。 第二栅极区域设置在第二沟道区域上并且基本上与第一和第二LDD区域中的任一个重叠。

    Non-destructive contact test
    7.
    发明授权
    Non-destructive contact test 有权
    非破坏性接触试验

    公开(公告)号:US07084652B2

    公开(公告)日:2006-08-01

    申请号:US10848995

    申请日:2004-05-18

    IPC分类号: G01R31/02 G01R1/07

    CPC分类号: G01R1/06783 H01L27/3244

    摘要: A non-destructive contact test method and apparatus for testing an electric characteristic of a test object is provided. The method includes providing an apparatus having a conductor, wherein the conductor is in a liquid state; and using the conductor to contact a surface of the test object for testing the electric characteristic of the test object. Thus, damage to the test object during the test can be effectively avoided.

    摘要翻译: 提供了一种用于测试被测物体的电特性的非破坏性接触测试方法和设备。 该方法包括提供具有导体的装置,其中导体处于液态; 并且使用导体接触测试对象的表面以测试测试对象的电特性。 因此,可以有效地避免测试期间对测试对象的损坏。

    Conducting line terminal structure for display device
    8.
    发明申请
    Conducting line terminal structure for display device 审中-公开
    导线显示装置的线路端子结构

    公开(公告)号:US20060046374A1

    公开(公告)日:2006-03-02

    申请号:US10933120

    申请日:2004-09-01

    IPC分类号: H01L21/8238

    摘要: A conducting line terminal structure for a display device. The conducting line terminal structure comprises a conducting member and an insulating layer covering a first section of the conductive member. A planarization layer is formed above a second section of the conductive member and overlaps a first section of the insulating layer and a conducting layer conductively couples to a third section of the conductive member.

    摘要翻译: 一种用于显示装置的导线端子结构。 导线端子结构包括导电构件和覆盖导电构件的第一部分的绝缘层。 在导电部件的第二部分上方形成平坦化层,并且与绝缘层的第一部分重叠,并且导电层导电耦合到导电部件的第三部分。