公开(公告)号：US09256140B2

公开(公告)日：2016-02-09

申请号：US12263659

申请日：2008-11-03

Applicant: Yuho Kanaya

Inventor： Yuho Kanaya

IPC: G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70775 ,  G03F9/7034

Abstract: On the +X and −X sides of a projection unit, a plurality of Z heads are arranged in parallel to the X-axis, by a predetermined distance half or less than half the effective width of the Y scale so that two Z heads each constantly form a pair and face a pair of Y scales. Of the pair of heads consisting of two Z heads which simultaneously face the scale, measurement values of a priority head is used, and when abnormality occurs in the measurement values of the priority head due to malfunction of the head, measurement values of the other head is used, and the positional information of the stage in at least the Z-axis direction can be measured in a stable manner and with high precision.

Abstract translation: 在投影单元的+ X和-X侧上，多个Z头平行于X轴排列预定距离的一半或小于Y标尺的有效宽度的一半，从而每个Z头 不断形成一对，面对一对Y尺度。 在由同时面对刻度的两个Z头组成的一对头中，使用优先级头的测量值，并且当由于头部故障导致的优先级头的测量值发生异常时，另一头的测量值 并且能够以高精度稳定地测量台阶的至少Z轴方向的位置信息。

公开(公告)号：US08547527B2

公开(公告)日：2013-10-01

申请号：US12175783

申请日：2008-07-18

Applicant: Yuho Kanaya

Inventor： Yuho Kanaya

IPC: G03B27/58 ,  G03B27/42

CPC classification number: G03F7/70775 ,  G03F7/70516

Abstract: First positional information of a stage is measured using an interferometer system, for example, an X interferometer and a Y interferometer. At the same time, second positional information of the stage is measured using an encoder system, for example, one X head and one Y head. A coordinate offset is set by performing a moving average of the difference between the first positional information and the second positional information for over a predetermined measurement time, and the reliability of output signals of the encoder system is verified using the coordinate offset. In the case the output signals are determined to be normal, the stage is servocontrolled using the sum of the first positional information and the coordinate offset. Such servocontrol by a hybrid method makes it possible to perform drive control of the stage having stability of the interferometer and accuracy of the encoder together.

Abstract translation: 使用干涉仪系统例如X干涉仪和Y干涉仪来测量舞台的第一位置信息。 同时，使用编码器系统例如一个X头和一个Y头测量舞台的第二位置信息。 通过在预定的测量时间内执行第一位置信息和第二位置信息之间的差的移动平均值来设置坐标偏移，并且使用坐标偏移验证编码器系统的输出信号的可靠性。 在输出信号被确定为正常的情况下，使用第一位置信息和坐标偏移的和对伺服电机进行伺服控制。 通过混合方式的这种伺服控制使得可以执行具有干涉仪的稳定性的台阶的驱动控制和编码器的精度。

公开(公告)号：US08237919B2

公开(公告)日：2012-08-07

申请号：US12196133

申请日：2008-08-21

Applicant: Yuichi Shibazaki ,  Yuho Kanaya

Inventor： Yuichi Shibazaki ,  Yuho Kanaya

IPC: G03B27/58

CPC classification number: G03F7/7085 ,  G03F7/70775 ,  G03F9/7026 ,  G03F9/7034

Abstract: A controller uses two Z heads, which are positioned above a reflection surface installed on the ±X ends of the upper surface of a table, to measure the height and tilt of the table. According to the XY position of the table, the Z heads to be used are switched from ZsR and ZsL to ZsR′ and ZsL. On the switching of the heads, the controller applies a coordinate linkage method to set an initial value of the Z heads which are to be newly used. Accordingly, although the Z heads to be used are sequentially switched according to the XY position of the table, measurement results of the height and the tilt of the table are stored before and after the switching, and it becomes possible to drive the table with high precision.

Abstract translation: 控制器使用两个Z头，它们位于安装在桌子上表面的±X端的反射表面上方，以测量桌子的高度和倾斜度。 根据表的XY位置，要使用的Z头从ZsR和ZsL切换到ZsR'和ZsL。 在切换头部时，控制器应用坐标联动方法来设定要被新使用的Z头的初始值。 因此，尽管根据工作台的XY位置依次切换要使用的Z头，但是在切换之前和之后存储表的高度和倾斜度的测量结果，并且可以以高的速度驱动工作台 精确。

公开(公告)号：US08218129B2

公开(公告)日：2012-07-10

申请号：US12195923

申请日：2008-08-21

Applicant: Yuichi Shibazaki ,  Yuho Kanaya

Inventor： Yuichi Shibazaki ,  Yuho Kanaya

IPC: G03B27/58 ,  G03B27/42

CPC classification number: G03F7/7085 ,  G03F7/70516 ,  G03F7/70775 ,  G03F9/7026 ,  G03F9/7034

Abstract: By moving a wafer stage while monitoring an XY position of a wafer stage WST using an interferometer system, and scanning a Y scale in an X-axis direction and a Y-axis direction using a surface position sensor, an XY setting position of the surface position sensor is measured. Based on information of the setting position obtained, by measuring a position coordinate of the wafer stage in a perpendicular direction with respect to an XY plane and a tilt direction, the wafer stage is driven in a stable manner and with high precision.

Abstract translation: 通过使用干涉仪系统监视晶片载台WST的XY位置并使用表面位置传感器在X轴方向和Y轴方向上扫描Y刻度来移动晶片台，将表面的XY设定位置 测量位置传感器。 基于所获得的设定位置的信息，通过相对于XY平面和倾斜方向测量晶片台的垂直方向的位置坐标，以稳定的方式高精度地驱动晶片台。

公开(公告)号：US20110299058A1

公开(公告)日：2011-12-08

申请号：US13137406

申请日：2011-08-11

Applicant: Yuichi Shibazaki ,  Yuho Kanaya

Inventor： Yuichi Shibazaki ,  Yuho Kanaya

IPC: G03B27/58 ,  B65G47/00

CPC classification number: G03F7/70775

Abstract: Positional information of a wafer stage in a Z-axis direction and a tilt direction with respect to the XY plane (for example, a θy direction) is measured, using a surface position measurement system, such as, for example, a Z head and the like, and the wafer stage is driven based on the measurement results. At the same time, positional information of the wafer stage is measured using an interferometer system such as, for example, a Z interferometer. When abnormality of the surface position measurement system is detected or when the wafer stage moves off from a measurement area of the surface position measurement system, drive control is switched to a drive control based on the measurement results of the interferometer system. Accordingly, the wafer stage can be driven continuously even at the time of abnormality generation in the surface position measurement system.

公开(公告)号：US20090284724A1

公开(公告)日：2009-11-19

申请号：US12463562

申请日：2009-05-11

Applicant: Yuho KANAYA

Inventor： Yuho KANAYA

IPC: G03B27/42

CPC classification number: G03F7/7085 ,  G03F7/70725 ,  G03F7/70775 ,  Y10T29/49002

Abstract: A plurality of heads configuring an encoder system is arranged on a wafer table, and positional information of a wafer table in the XY plane is measured, based on an output of a head opposed to a scale plate (diffraction grating). And, a relative position (including relative attitude and rotation) of each head with the wafer table is measured herein by a measurement system arranged inside the head. Accordingly, by correcting the positional information based on the information of the relative position which has been measured, a highly precise measurement of the positional information of the wafer table becomes possible even in the case when the position (attitude, rotation) of the head changes with the movement of the wafer table.

Abstract translation: 构成编码器系统的多个头被布置在晶片台上，并且基于与刻度盘（衍射光栅）相对的头的输出来测量XY平面中的晶片台的位置信息。 并且，这里通过布置在头部内部的测量系统来测量每个头部与晶片台的相对位置（包括相对姿态和旋转）。 因此，通过基于已经测量的相对位置的信息校正位置信息，即使在头部的位置（姿态，旋转）变化的情况下，也可以高精度地测量晶片台的位置信息 随着晶片台的移动。

公开(公告)号：US20090059198A1

公开(公告)日：2009-03-05

申请号：US12196133

申请日：2008-08-21

Applicant: Yuichi SHIBAZAKI ,  Yuho KANAYA

Inventor： Yuichi SHIBAZAKI ,  Yuho KANAYA

IPC: G03B27/58 ,  G05B11/32

CPC classification number: G03F7/7085 ,  G03F7/70775 ,  G03F9/7026 ,  G03F9/7034

Abstract: A controller uses two Z heads, which are positioned above a reflection surface installed on the ±X ends of the upper surf ace of a table, to measure the height and tilt of the table. According to the XY position of the table, the Z heads to be used are switched from ZsR and ZsL to ZsR′ and ZsL. On the switching of the heads, the controller applies a coordinate linkage method to set an initial value of the Z heads which are to be newly used. Accordingly, although the Z heads to be used are sequentially switched according the XY position of the table, measurement results of the height and the tilt of the table are stored before and after the switching, and it becomes possible to drive the table with high precision.

Abstract translation: 控制器使用两个Z头，它们位于安装在桌子上面的±X端的反射表面上方，以测量桌子的高度和倾斜度。 根据表的XY位置，要使用的Z头从ZsR和ZsL切换到ZsR'和ZsL。 在切换头部时，控制器应用坐标联动方法来设定要被新使用的Z头的初始值。 因此，虽然根据工作台的XY位置顺序地切换要使用的Z头，但是在切换之前和之后存储表的高度和倾斜度的测量结果，并且可以以高精度驱动工作台 。

公开(公告)号：US20090051894A1

公开(公告)日：2009-02-26

申请号：US12196047

申请日：2008-08-21

Applicant: Yuichi SHIBAZAKI ,  Yuho KANAYA

Inventor： Yuichi SHIBAZAKI ,  Yuho KANAYA

IPC: G03B27/58 ,  H02K41/00

CPC classification number: G03F7/7085 ,  G03F7/70725 ,  G03F7/70775 ,  G03F9/7026 ,  G03F9/7034 ,  G03F9/7049

Abstract: A wafer stage is moved while monitoring a position using an X interferometer and a Y interferometer, and a Z position of a Y scale arranged on the wafer stage upper surface is measured using a surface position sensor. In this case, for example, from a difference of measurement results of two surface position sensors, tilt of the Y scale in the Y-axis direction is obtained. By measuring the tilt of the entire surface of a pair of Y scales, two-dimensional unevenness data of the scales are made. By correcting the measurement results of the position surface sensor using the unevenness data, and then using the corrected measurement results, it becomes possible to drive wafer stage WST two-dimensionally with high precision.

Abstract translation: 使用X干涉仪和Y干涉仪监视位置，移动晶片台，并使用表面位置传感器测量布置在晶片台上表面上的Y刻度的Z位置。 在这种情况下，例如，根据两个表面位置传感器的测量结果的差异，可以获得Y标尺在Y轴方向上的倾斜。 通过测量一对Y刻度的整个表面的倾斜度，进行刻度的二维不均匀性数据。 通过使用不平坦度数据校正位置面传感器的测量结果，然后使用校正的测量结果，可以以高精度二维地驱动晶片台WST。

公开(公告)号：US09013681B2

公开(公告)日：2015-04-21

申请号：US12262484

申请日：2008-10-31

Applicant: Yuho Kanaya

Inventor： Yuho Kanaya

IPC: G03F7/20

CPC classification number: G03F7/70775

Abstract: On the +X and −X sides of a projection unit, a plurality of Y heads are arranged in parallel to the X-axis by a predetermined distance half or less than half the effective width of the scale, so that two heads each constantly form a pair and face a pair of Y scales. Similarly, on the +Y and −Y sides of the projection unit, a plurality of X heads are arranged in parallel to the Y-axis by the predetermined distance described above, so that two heads each constantly form a pair and face a pair of X scales. Of the pair of heads consisting of two heads which simultaneously face the scale, measurement values of a priority head is used, and when abnormality occurs in the measurement values of the priority head due to malfunction of the head, measurement values of the other head is used. Then, by using the measurement values of the two pairs of Y heads and the pair of X heads, a position of a stage within a two-dimensional plane is measured in a stable manner and with high precision.

Abstract translation: 在投影单元的+ X和-X侧上，多个Y头与X轴平行布置预定距离的一半或小于刻度的有效宽度的一半，从而使两个头不断地形成 一对，面对一对Y尺度。 类似地，在投影单元的+ Y和-Y侧，多个X头与Y轴平行设置上述预定距离，使得两个头每个不断地形成一对并面对一对 X尺度 在由同时面对刻度的两个头组成的一对头中，使用优先头的测量值，并且当由于头的故障而在优先级头的测量值中出现异常时，另一头的测量值为 用过的。 然后，通过使用两对Y头和一对X头的测量值，以稳定的方式和高精度测量二维平面内的平台的位置。

公开(公告)号：US08792086B2

公开(公告)日：2014-07-29

申请号：US13296792

申请日：2011-11-15

Applicant: Yuho Kanaya

Inventor： Yuho Kanaya

IPC: G03B27/58 ,  G03F7/20

CPC classification number: G03F7/70775 ,  G03F7/70725 ,  G03F7/7085 ,  G03F9/7011 ,  G03F9/7019 ,  G03F9/7088

Abstract: A first positional information of a wafer stage is measured using an interferometer system such as, for example, a Z interferometer. At the same time, a second positional information of the wafer stage is measured using a surface position measurement system such as, for example, two Z heads. Moving average is applied to a difference between the first positional information and the second positional information for a predetermined measurement time to set a coordinate offset, which is used to inspect the reliability of output signals of the surface position measurement system. When the output signals are confirmed to be normal, servo control of the wafer stage is performed using a sum of the first positional information and the coordinate offset. According to this hybrid method, drive control of the wafer stage which has the stability of the interferometer and the precision of the Z heads becomes possible.

Abstract translation: 使用诸如例如Z干涉仪的干涉仪系统测量晶片台的第一位置信息。 同时，使用例如两个Z头的表面位置测量系统来测量晶片台的第二位置信息。 将移动平均值应用于第一位置信息和第二位置信息之间的预定测量时间的差，以设置用于检查表面位置测量系统的输出信号的可靠性的坐标偏移。 当输出信号被确认为正常时，使用第一位置信息和坐标偏移的和执行晶片台的伺服控制。 根据该混合方式，可以实现具有干涉仪的稳定性和Z头的精度的晶片台的驱动控制。