公开(公告)号：US20090027638A1

公开(公告)日：2009-01-29

申请号：US12232861

申请日：2008-09-25

申请人： Tjarko Adriaan Rudolf Van Empel ,  Erik Roelof Loopstra ,  Antonius Johannes Van Der Net ,  Yuri Johannes Gabriel Van De Vijver ,  Bernhard Gellrich ,  Bauke Jansen ,  Rens Sanderse

发明人： Tjarko Adriaan Rudolf Van Empel ,  Erik Roelof Loopstra ,  Antonius Johannes Van Der Net ,  Yuri Johannes Gabriel Van De Vijver ,  Bernhard Gellrich ,  Bauke Jansen ,  Rens Sanderse

IPC分类号： G03B27/52 ,  G01N7/00

CPC分类号： G03F7/70933 ,  G03F7/70908

摘要： A lithographic apparatus includes a projection system configured to project a patterned beam of radiation onto a target portion of a substrate. The projection system includes a first gas-conditioned sub-environment and a second gas-conditioned sub-environment. The apparatus includes a gas control unit configured to control the feeding of conditioned gas into the first sub-environment and into the second sub-environment via the first sub-environment so as to prevent contamination from the second sub-environment to the first sub-environment. The apparatus includes a gate configured to leak the conditioned gas at a rate from the second sub-environment to ambient atmosphere, and a detector configured to detect at least one property of the second gas-conditioned environment.

摘要翻译： 光刻设备包括投影系统，该投影系统被配置为将图案化的辐射束投影到基板的目标部分上。 投影系统包括第一气体调节子环境和第二气体调节子环境。 该装置包括：气体控制单元，被配置为控制经由第一子环境将调节气体进入第一子环境并进入第二子环境，以防止从第二子环境到第一子环境的污染， 环境。 该装置包括：门，该门被配置为以从第二子环境到环境大气的速率泄漏经调节的气体;以及检测器，被配置为检测第二气体条件环境的至少一个性质。

公开(公告)号：US07476491B2

公开(公告)日：2009-01-13

申请号：US10941017

申请日：2004-09-15

申请人： Antonius Johannes Van Der Net ,  Paul Van Der Veen ,  Yuri Johannes Gabriel Van De Vijver

发明人： Antonius Johannes Van Der Net ,  Paul Van Der Veen ,  Yuri Johannes Gabriel Van De Vijver

IPC分类号： G03F7/20

CPC分类号： G03F7/70933 ,  G03F7/70925

摘要： A lithographic apparatus includes an illumination system for providing beam of radiation, and a support structure for supporting a patterning device. The patterning device imparts the beam of radiation with a pattern. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and a gas supply system for supplying a purge gas including oxygen to a plurality of spaces in the apparatus. The gas supply system is arranged so that the purge gas supplied to each of the plurality of spaces is a premixed purge gas mixture composed by the gas supply system for each of the plurality of spaces on the basis of a predetermined relationship that relates a desired amount of oxygen in the premixed purge gas mixture to the respective space to which that premixed purge gas mixture is supplied.

摘要翻译： 光刻设备包括用于提供辐射束的照明系统和用于支撑图案形成装置的支撑结构。 图案形成装置用图案赋予辐射束。 该装置还包括用于保持基板的基板台，用于将图案化的光束投影到基板的目标部分上的投影系统，以及用于将包括氧的吹扫气体供应到设备中的多个空间的气体供应系统。 气体供给系统被布置成使得供应到多个空间中的每一个的吹扫气体是由多个空间中的每一个的气体供应系统组成的预混吹扫气体混合物，其基于预定的关系， 的预混吹扫气体混合物中的氧气供应到提供预混吹扫气体混合物的相应空间。

公开(公告)号：US20090090877A1

公开(公告)日：2009-04-09

申请号：US12197693

申请日：2008-08-25

申请人： Tjarko Adriaan Rudolf Van Empel ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Yuri Johannes Gabriel Van De Vijver ,  Gerardus Hubertus Petrus Maria Swinkels ,  Hendrikus Gijsbertus Schimmel ,  Dzmitry Labetski

发明人： Tjarko Adriaan Rudolf Van Empel ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Yuri Johannes Gabriel Van De Vijver ,  Gerardus Hubertus Petrus Maria Swinkels ,  Hendrikus Gijsbertus Schimmel ,  Dzmitry Labetski

IPC分类号： G01J3/10 ,  G03B27/54

CPC分类号： H05G2/008 ,  G03F7/70175 ,  G03F7/70891 ,  G03F7/70916 ,  G03F7/70983 ,  H05G2/003 ,  H05G2/006 ,  H05K7/2039

摘要： A module for producing extreme ultraviolet radiation includes a supply configured to supply droplets of an ignition material to a predetermined target ignition position and a laser arranged to be focused on the predetermined target ignition position and to produce a plasma by hitting such a droplet which is located at the predetermined target ignition position in order to change the droplet into an extreme ultraviolet producing plasma. Also, the module includes a collector mirror having a mirror surface constructed and arranged to reflect the radiation in order to focus the radiation on a focal point. A fluid supply is constructed and arranged to form a gas flow flowing away from the mirror surface in a direction transverse with respect to the mirror surface in order to mitigate particle debris produced by the plasma.

摘要翻译： 用于产生极紫外线辐射的模块包括被配置为将点火材料的液滴供应到预定的目标点火位置的电源和布置成聚焦在预定的目标点火位置上的激光器，并且通过击打位于 在预定的目标点火位置，以便将液滴变成极紫外线产生等离子体。 此外，模块包括收集器反射镜，其具有构造和布置成反射辐射的镜面，以便将辐射聚焦在焦点上。 流体供应器被构造和布置成在相对于镜面横向的方向上形成从镜面流出的气流，以便减轻由等离子体产生的颗粒碎片。

公开(公告)号：US20090073396A1

公开(公告)日：2009-03-19

申请号：US11898933

申请日：2007-09-17

申请人： Yuri Johannes Gabriel Van De Vijver ,  Tjarko Adriaan Rudolf Van Empel ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels ,  Hendrikus Gijsbertus Schimmel ,  Dzmitry Labetski

发明人： Yuri Johannes Gabriel Van De Vijver ,  Tjarko Adriaan Rudolf Van Empel ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels ,  Hendrikus Gijsbertus Schimmel ,  Dzmitry Labetski

IPC分类号： G03B27/52

CPC分类号： G03F7/70033 ,  B82Y10/00 ,  G03F7/70841 ,  G03F7/70908 ,  G03F7/70916 ,  G03F7/70933 ,  H05G2/003 ,  H05G2/008

摘要： A lithographic apparatus is arranged to project a pattern from a patterning device onto a substrate is disclosed. The lithographic apparatus includes an illumination system and an outlet connected to a pumping system to pump away gas from between an inner wall and outer wall of the illumination system or, if a radiation source is present, between the inner wall of the illumination system and an inner wall of the radiation source.

摘要翻译： 公开了一种光刻设备，用于将图案从图案形成装置突出到衬底上。 光刻设备包括照明系统和连接到泵送系统的出口，以从照明系统的内壁和外壁之间泵送气体，或者如果存在辐射源，则在照明系统的内壁和 辐射源的内壁。

公开(公告)号：US20120147348A1

公开(公告)日：2012-06-14

申请号：US13361545

申请日：2012-01-30

申请人： Yuri Johannes Gabriel VAN DE VIJVER ,  Tjarko Adriaan Rudolf VAN EMPEL ,  Jan Bernard Plechelmus VAN SCHOOT ,  Gerardus Hubertus Petrus Maria SWINKELS ,  Hendrikus Gijsbertus SCHIMMEL ,  Dzmitry LABETSKI

发明人： Yuri Johannes Gabriel VAN DE VIJVER ,  Tjarko Adriaan Rudolf VAN EMPEL ,  Jan Bernard Plechelmus VAN SCHOOT ,  Gerardus Hubertus Petrus Maria SWINKELS ,  Hendrikus Gijsbertus SCHIMMEL ,  Dzmitry LABETSKI

IPC分类号： G03B27/54

CPC分类号： G03F7/70033 ,  B82Y10/00 ,  G03F7/70841 ,  G03F7/70908 ,  G03F7/70916 ,  G03F7/70933 ,  H05G2/003 ,  H05G2/008

摘要： A lithographic apparatus is arranged to project a pattern from a patterning device onto a substrate is disclosed. The lithographic apparatus includes an illumination system and an outlet connected to a pumping system to pump away gas from between an inner wall and outer wall of the illumination system or, if a radiation source is present, between the inner wall of the illumination system and an inner wall of the radiation source.

摘要翻译： 公开了一种光刻设备，用于将图案从图案形成装置突出到衬底上。 光刻设备包括照明系统和连接到泵送系统的出口，以从照明系统的内壁和外壁之间泵送气体，或者如果存在辐射源，则在照明系统的内壁和 辐射源的内壁。

公开(公告)号：US08094287B2

公开(公告)日：2012-01-10

申请号：US12232861

申请日：2008-09-25

申请人： Tjarko Adriaan Rudolf Van Empel ,  Erik Roelof Loopstra ,  Antonius Johannes Van Der Net ,  Yuri Johannes Gabriel Van De Vijver ,  Bernhard Gellrich ,  Bauke Jansen ,  Rens Sanderse

发明人： Tjarko Adriaan Rudolf Van Empel ,  Erik Roelof Loopstra ,  Antonius Johannes Van Der Net ,  Yuri Johannes Gabriel Van De Vijver ,  Bernhard Gellrich ,  Bauke Jansen ,  Rens Sanderse

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03F7/70933 ,  G03F7/70908

摘要： A lithographic apparatus includes a projection system configured to project a patterned beam of radiation onto a target portion of a substrate. The projection system includes a first gas-conditioned sub-environment and a second gas-conditioned sub-environment. The apparatus includes a gas control unit configured to control the feeding of conditioned gas into the first sub-environment and into the second sub-environment via the first sub-environment so as to prevent contamination from the second sub-environment to the first sub-environment. The apparatus includes a gate configured to leak the conditioned gas at a rate from the second sub-environment to ambient atmosphere, and a detector configured to detect at least one property of the second gas-conditioned environment.

摘要翻译： 光刻设备包括投影系统，该投影系统被配置为将图案化的辐射束投影到基板的目标部分上。 投影系统包括第一气体调节子环境和第二气体调节子环境。 该装置包括：气体控制单元，被配置为控制经由第一子环境将调节气体进入第一子环境并进入第二子环境，以防止从第二子环境到第一子环境的污染， 环境。 该装置包括：门，该门被配置为以从第二子环境到环境大气的速率泄漏经调节的气体;以及检测器，被配置为检测第二气体条件环境的至少一个性质。

公开(公告)号：US20100309447A1

公开(公告)日：2010-12-09

申请号：US12745344

申请日：2008-11-18

申请人： Yuri Johannes Gabriel Van de Vijver ,  Johannes Hubertus Josephina Moors ,  Wendelin Johanna Maria Versteeg ,  Peter Geradus Jonkers

发明人： Yuri Johannes Gabriel Van de Vijver ,  Johannes Hubertus Josephina Moors ,  Wendelin Johanna Maria Versteeg ,  Peter Geradus Jonkers

IPC分类号： G03B27/42

CPC分类号： G03F7/70933 ,  G03F7/70841 ,  G03F7/70866 ,  G03F7/70883 ,  G03F7/70916

摘要： A lithographic apparatus is disclosed that includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate, a vacuum chamber through which the patterned beam of radiation is projected during use, and a purge system configured to provide a purge gas flow in the chamber.

摘要翻译： 公开了一种光刻设备，其包括被配置为将图案化的辐射束投影到基板的目标部分上的投影系统，在使用期间投影图案化的辐射束的真空室，以及构造成提供吹扫气体 在室内流动。

公开(公告)号：US07446849B2

公开(公告)日：2008-11-04

申请号：US10896000

申请日：2004-07-22

申请人： Tjarko Adriaan Rudolf Van Empel ,  Erik Roelof Loopstra ,  Antonius Johannes Van Der Net ,  Yuri Johannes Gabriel Van De Vijver ,  Bernard Gellrich ,  Bauke Jansen ,  Rens Sanderse

发明人： Tjarko Adriaan Rudolf Van Empel ,  Erik Roelof Loopstra ,  Antonius Johannes Van Der Net ,  Yuri Johannes Gabriel Van De Vijver ,  Bernard Gellrich ,  Bauke Jansen ,  Rens Sanderse

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03F7/70933 ,  G03F7/70908

摘要： A lithographic apparatus is disclosed. The apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system includes a housing and a plurality of optical elements arranged in the housing. The apparatus also includes an inlet for feeding conditioned gas to the housing and a gas exhaust for exhausting the conditioned gas from the housing for providing a gas conditioned environment in the housing. At least one gate is provided for providing communication of the gas conditioned environment with ambient atmosphere. The gate is arranged to provide a predetermined leakage of the conditioned gas to the ambient atmosphere.

摘要翻译： 公开了一种光刻设备。 该装置包括投影系统，其配置成将图案化的辐射束投影到基板的目标部分上。 投影系统包括壳体和布置在壳体中的多个光学元件。 该设备还包括用于将调节气体供给到壳体的入口和用于从壳体排出调节气体的排气口，以在壳体中提供气体调节环境。 提供至少一个门，用于提供气体环境与环境气氛的通信。 门被设置成将经调节的气体预定的泄漏提供给环境大气。